DE102007024266A1 - Verfahren zur Steuerung der Prozessgaskonzentration - Google Patents

Verfahren zur Steuerung der Prozessgaskonzentration Download PDF

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Publication number
DE102007024266A1
DE102007024266A1 DE102007024266A DE102007024266A DE102007024266A1 DE 102007024266 A1 DE102007024266 A1 DE 102007024266A1 DE 102007024266 A DE102007024266 A DE 102007024266A DE 102007024266 A DE102007024266 A DE 102007024266A DE 102007024266 A1 DE102007024266 A1 DE 102007024266A1
Authority
DE
Germany
Prior art keywords
bubbler
carrier gas
medium
concentration
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102007024266A
Other languages
German (de)
English (en)
Inventor
Rolf Müller
Hans Ulrich Völler
Robert Michael Hartung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centrotherm Photovoltaics AG
Original Assignee
Centrotherm Thermal Solutions GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centrotherm Thermal Solutions GmbH and Co KG filed Critical Centrotherm Thermal Solutions GmbH and Co KG
Priority to DE102007024266A priority Critical patent/DE102007024266A1/de
Priority to TW097117912A priority patent/TW200902132A/zh
Priority to JP2010508817A priority patent/JP2010527794A/ja
Priority to PCT/EP2008/056104 priority patent/WO2008142043A1/de
Priority to US12/601,311 priority patent/US20100215853A1/en
Priority to EP08750339A priority patent/EP2150634A1/de
Priority to CN200880019517A priority patent/CN101688304A/zh
Priority to KR1020097026555A priority patent/KR20100030620A/ko
Publication of DE102007024266A1 publication Critical patent/DE102007024266A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE102007024266A 2007-05-23 2007-05-23 Verfahren zur Steuerung der Prozessgaskonzentration Withdrawn DE102007024266A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE102007024266A DE102007024266A1 (de) 2007-05-23 2007-05-23 Verfahren zur Steuerung der Prozessgaskonzentration
TW097117912A TW200902132A (en) 2007-05-23 2008-05-15 Method for controlling process gas concentration
JP2010508817A JP2010527794A (ja) 2007-05-23 2008-05-19 プロセスガスの濃度制御方法
PCT/EP2008/056104 WO2008142043A1 (de) 2007-05-23 2008-05-19 Verfahren zur steuerung der prozessgaskonzentration
US12/601,311 US20100215853A1 (en) 2007-05-23 2008-05-19 Method for controlling process gas concentration
EP08750339A EP2150634A1 (de) 2007-05-23 2008-05-19 Verfahren zur steuerung der prozessgaskonzentration
CN200880019517A CN101688304A (zh) 2007-05-23 2008-05-19 控制生产气体浓度的方法
KR1020097026555A KR20100030620A (ko) 2007-05-23 2008-05-19 공정 가스 농도를 제어하기 위한 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007024266A DE102007024266A1 (de) 2007-05-23 2007-05-23 Verfahren zur Steuerung der Prozessgaskonzentration

Publications (1)

Publication Number Publication Date
DE102007024266A1 true DE102007024266A1 (de) 2008-11-27

Family

ID=39637712

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102007024266A Withdrawn DE102007024266A1 (de) 2007-05-23 2007-05-23 Verfahren zur Steuerung der Prozessgaskonzentration

Country Status (8)

Country Link
US (1) US20100215853A1 (https=)
EP (1) EP2150634A1 (https=)
JP (1) JP2010527794A (https=)
KR (1) KR20100030620A (https=)
CN (1) CN101688304A (https=)
DE (1) DE102007024266A1 (https=)
TW (1) TW200902132A (https=)
WO (1) WO2008142043A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009012200A1 (de) * 2009-03-11 2010-09-16 Centrotherm Photovoltaics Ag Verfahren und Vorrichtung zur thermischen Umsetzung metallischer Precursorschichten in halbleitende Schichten mit Chalkogenquelle
DE102012021527A1 (de) 2012-10-31 2014-04-30 Dockweiler Ag Vorrichtung zur Erzeugung eines Gasgemisches
WO2025190596A1 (de) 2024-03-13 2025-09-18 Pink Gmbh Thermosysteme Befüllvorrichtung zum befüllen eines bubblers, befüllsystem und damit ausgerüstete löt- oder sinteranlage, sowie verfahren zum betreiben der befüllvorrichtung

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5884448B2 (ja) * 2011-12-01 2016-03-15 富士電機株式会社 はんだ接合装置およびはんだ接合方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276243A (en) * 1978-12-08 1981-06-30 Western Electric Company, Inc. Vapor delivery control system and method
JPS60211072A (ja) * 1984-04-06 1985-10-23 Matsushita Electric Ind Co Ltd 揮発性物質の気化装置
US4911101A (en) * 1988-07-20 1990-03-27 General Electric Company Metal organic molecular beam epitaxy (MOMBE) apparatus
US5227604A (en) * 1991-06-28 1993-07-13 Digital Equipment Corporation Atmospheric pressure gaseous-flux-assisted laser reflow soldering
JPH0610144A (ja) * 1992-06-29 1994-01-18 Matsushita Electric Ind Co Ltd 低蒸気圧材料供給装置
US5249733A (en) * 1992-07-16 1993-10-05 At&T Bell Laboratories Solder self-alignment methods
JPH07164141A (ja) * 1993-10-22 1995-06-27 Nippon Sanso Kk はんだ付け方法及び装置
EP0784713A4 (en) * 1994-10-11 2000-03-01 Gelest Inc Uniform TITANIUM BASE FILMS AND THEIR PRODUCTION
US6616767B2 (en) * 1997-02-12 2003-09-09 Applied Materials, Inc. High temperature ceramic heater assembly with RF capability
DE60021955T2 (de) * 1999-06-03 2006-06-14 Shinetsu Chemical Co Verfahren und Vorrichtung zum Verdampfen von einem flüssigen Glasvorläufer für die Herstellung von Vorformen für optische Fasern
US20050095859A1 (en) * 2003-11-03 2005-05-05 Applied Materials, Inc. Precursor delivery system with rate control

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009012200A1 (de) * 2009-03-11 2010-09-16 Centrotherm Photovoltaics Ag Verfahren und Vorrichtung zur thermischen Umsetzung metallischer Precursorschichten in halbleitende Schichten mit Chalkogenquelle
DE102012021527A1 (de) 2012-10-31 2014-04-30 Dockweiler Ag Vorrichtung zur Erzeugung eines Gasgemisches
EP2730675A1 (de) 2012-10-31 2014-05-14 Dockweiler AG Vorrichtung zur Erzeugung eines Gasgemisches
WO2025190596A1 (de) 2024-03-13 2025-09-18 Pink Gmbh Thermosysteme Befüllvorrichtung zum befüllen eines bubblers, befüllsystem und damit ausgerüstete löt- oder sinteranlage, sowie verfahren zum betreiben der befüllvorrichtung

Also Published As

Publication number Publication date
JP2010527794A (ja) 2010-08-19
TWI372650B (https=) 2012-09-21
KR20100030620A (ko) 2010-03-18
EP2150634A1 (de) 2010-02-10
US20100215853A1 (en) 2010-08-26
CN101688304A (zh) 2010-03-31
WO2008142043A1 (de) 2008-11-27
TW200902132A (en) 2009-01-16

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Legal Events

Date Code Title Description
R082 Change of representative

Representative=s name: PATENTANWAELTE LIPPERT, STACHOW & PARTNER, DE

R081 Change of applicant/patentee

Owner name: CENTROTHERM PHOTOVOLTAICS AG, DE

Free format text: FORMER OWNER: CENTROTHERM THERMAL SOLUTIONS GMBH & CO. KG, 89143 BLAUBEUREN, DE

Effective date: 20140416

R082 Change of representative

Representative=s name: PATENTANWAELTE LIPPERT, STACHOW & PARTNER, DE

Effective date: 20140416

R005 Application deemed withdrawn due to failure to request examination

Effective date: 20140524