DE102004051899A1 - Verfahren zur Herstellung von Organosilazanen - Google Patents
Verfahren zur Herstellung von Organosilazanen Download PDFInfo
- Publication number
- DE102004051899A1 DE102004051899A1 DE102004051899A DE102004051899A DE102004051899A1 DE 102004051899 A1 DE102004051899 A1 DE 102004051899A1 DE 102004051899 A DE102004051899 A DE 102004051899A DE 102004051899 A DE102004051899 A DE 102004051899A DE 102004051899 A1 DE102004051899 A1 DE 102004051899A1
- Authority
- DE
- Germany
- Prior art keywords
- ammonia
- pressure
- bar
- ammonium halide
- organosilazane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- 238000000034 method Methods 0.000 title claims description 30
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 72
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 36
- -1 ammonium halide Chemical class 0.000 claims abstract description 27
- 239000011541 reaction mixture Substances 0.000 claims abstract description 12
- 238000010924 continuous production Methods 0.000 claims abstract description 4
- 238000000926 separation method Methods 0.000 claims description 22
- 238000006243 chemical reaction Methods 0.000 claims description 6
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 50
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 38
- 235000019270 ammonium chloride Nutrition 0.000 description 25
- 239000012071 phase Substances 0.000 description 20
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000004821 distillation Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000010297 mechanical methods and process Methods 0.000 description 3
- 230000005226 mechanical processes and functions Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000005051 trimethylchlorosilane Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- WYUIWUCVZCRTRH-UHFFFAOYSA-N [[[ethenyl(dimethyl)silyl]amino]-dimethylsilyl]ethene Chemical compound C=C[Si](C)(C)N[Si](C)(C)C=C WYUIWUCVZCRTRH-UHFFFAOYSA-N 0.000 description 1
- 230000002051 biphasic effect Effects 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004051899A DE102004051899A1 (de) | 2004-10-26 | 2004-10-26 | Verfahren zur Herstellung von Organosilazanen |
| CNA2005800352777A CN101039950A (zh) | 2004-10-26 | 2005-10-13 | 生产有机硅氮烷的方法 |
| PCT/EP2005/011036 WO2006045444A1 (de) | 2004-10-26 | 2005-10-13 | Verfahren zur herstellung von organosilazanen |
| JP2007537167A JP2008517012A (ja) | 2004-10-26 | 2005-10-13 | オルガノシラザンの製造方法 |
| KR1020077006521A KR100839552B1 (ko) | 2004-10-26 | 2005-10-13 | 오가노실라잔의 제조 방법 |
| DE502005004757T DE502005004757D1 (https=) | 2004-10-26 | 2005-10-13 | |
| EP05794420A EP1805189B1 (de) | 2004-10-26 | 2005-10-13 | Verfahren zur herstellung von organosilazanen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004051899A DE102004051899A1 (de) | 2004-10-26 | 2004-10-26 | Verfahren zur Herstellung von Organosilazanen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102004051899A1 true DE102004051899A1 (de) | 2006-04-27 |
Family
ID=35457663
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102004051899A Withdrawn DE102004051899A1 (de) | 2004-10-26 | 2004-10-26 | Verfahren zur Herstellung von Organosilazanen |
| DE502005004757T Expired - Fee Related DE502005004757D1 (https=) | 2004-10-26 | 2005-10-13 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE502005004757T Expired - Fee Related DE502005004757D1 (https=) | 2004-10-26 | 2005-10-13 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1805189B1 (https=) |
| JP (1) | JP2008517012A (https=) |
| KR (1) | KR100839552B1 (https=) |
| CN (1) | CN101039950A (https=) |
| DE (2) | DE102004051899A1 (https=) |
| WO (1) | WO2006045444A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101613363B (zh) * | 2009-07-22 | 2012-05-16 | 吉林新亚强生物化工有限公司 | 六甲基二硅氮烷的制备工艺 |
| CN109776596A (zh) * | 2017-11-14 | 2019-05-21 | 石家庄圣泰化工有限公司 | 1,3-二乙烯基-1,1,3,3-四甲基二硅氮烷的制备方法 |
| CN112442061A (zh) * | 2020-12-08 | 2021-03-05 | 江西贝特利新材料有限公司 | 一种硅氮烷的水洗方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19753480C1 (de) * | 1997-12-02 | 1999-01-07 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Organosilazanen und Ammonchlorid |
| DE19938475A1 (de) * | 1999-08-13 | 2001-02-15 | Bayer Ag | Verfahren zur Herstellung von Hexamethyldisilazan |
-
2004
- 2004-10-26 DE DE102004051899A patent/DE102004051899A1/de not_active Withdrawn
-
2005
- 2005-10-13 WO PCT/EP2005/011036 patent/WO2006045444A1/de not_active Ceased
- 2005-10-13 KR KR1020077006521A patent/KR100839552B1/ko not_active Expired - Fee Related
- 2005-10-13 EP EP05794420A patent/EP1805189B1/de not_active Expired - Lifetime
- 2005-10-13 DE DE502005004757T patent/DE502005004757D1/de not_active Expired - Fee Related
- 2005-10-13 JP JP2007537167A patent/JP2008517012A/ja not_active Withdrawn
- 2005-10-13 CN CNA2005800352777A patent/CN101039950A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN101039950A (zh) | 2007-09-19 |
| DE502005004757D1 (https=) | 2008-08-28 |
| WO2006045444A1 (de) | 2006-05-04 |
| KR100839552B1 (ko) | 2008-06-19 |
| EP1805189A1 (de) | 2007-07-11 |
| JP2008517012A (ja) | 2008-05-22 |
| KR20070045336A (ko) | 2007-05-02 |
| EP1805189B1 (de) | 2008-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8130 | Withdrawal |