DE102004027347B4 - Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich - Google Patents

Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich Download PDF

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Publication number
DE102004027347B4
DE102004027347B4 DE200410027347 DE102004027347A DE102004027347B4 DE 102004027347 B4 DE102004027347 B4 DE 102004027347B4 DE 200410027347 DE200410027347 DE 200410027347 DE 102004027347 A DE102004027347 A DE 102004027347A DE 102004027347 B4 DE102004027347 B4 DE 102004027347B4
Authority
DE
Germany
Prior art keywords
wavelength
reflectors
incidence
angle
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE200410027347
Other languages
German (de)
English (en)
Other versions
DE102004027347A1 (de
Inventor
Siegfried Dr. Schwarzl
Stefan Dr. Austin Wurm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polaris Innovations Ltd
Original Assignee
Qimonda AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qimonda AG filed Critical Qimonda AG
Priority to DE200410027347 priority Critical patent/DE102004027347B4/de
Priority to PCT/DE2005/000973 priority patent/WO2005116771A2/fr
Publication of DE102004027347A1 publication Critical patent/DE102004027347A1/de
Application granted granted Critical
Publication of DE102004027347B4 publication Critical patent/DE102004027347B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE200410027347 2004-05-27 2004-05-27 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich Expired - Fee Related DE102004027347B4 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE200410027347 DE102004027347B4 (de) 2004-05-27 2004-05-27 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich
PCT/DE2005/000973 WO2005116771A2 (fr) 2004-05-27 2005-05-26 Selecteur de longueur d'onde pour la plage des rayons x a faible energie et la plage des ultraviolets extremes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200410027347 DE102004027347B4 (de) 2004-05-27 2004-05-27 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich

Publications (2)

Publication Number Publication Date
DE102004027347A1 DE102004027347A1 (de) 2005-12-22
DE102004027347B4 true DE102004027347B4 (de) 2008-12-24

Family

ID=34971253

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200410027347 Expired - Fee Related DE102004027347B4 (de) 2004-05-27 2004-05-27 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich

Country Status (2)

Country Link
DE (1) DE102004027347B4 (fr)
WO (1) WO2005116771A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015140924A1 (fr) * 2014-03-18 2015-09-24 エヌ・ティ・ティ・アドバンステクノロジ株式会社 Miroir multicouche, dispositif spectroscopique et procédé spectroscopique pour harmonique supérieure

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173930A (en) * 1991-11-22 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration X-ray monochromator
DE69429598T2 (de) * 1993-07-19 2002-08-29 Koninklijke Philips Electronics N.V., Eindhoven Asymmetrischer 4-Kristallmonochromator
DE10305813A1 (de) * 2002-03-05 2003-09-25 Rigaku Ind Corp Röntgenmonochromator und Röntgenfluoreszenzspektrometer, in dem der Röntgenmonochromator verwendet wird

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2688958B2 (ja) * 1988-12-05 1997-12-10 三菱電機株式会社 露光装置およびその露光方法
JPH0320712A (ja) * 1989-04-25 1991-01-29 Matsushita Electric Works Ltd 色彩調整装置
JPH03152426A (ja) * 1989-11-08 1991-06-28 Fujitsu Ltd 分光器
JPH0627298A (ja) * 1992-07-09 1994-02-04 Ricoh Co Ltd 単色同位相ｘ線集光器
JPH06174897A (ja) * 1992-12-10 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線ミラーおよび多層膜ｘ線光学系
SK68395A3 (en) * 1995-05-23 1997-05-07 Dusan Korytar Device for x-ray beam-forming

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173930A (en) * 1991-11-22 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration X-ray monochromator
DE69429598T2 (de) * 1993-07-19 2002-08-29 Koninklijke Philips Electronics N.V., Eindhoven Asymmetrischer 4-Kristallmonochromator
DE10305813A1 (de) * 2002-03-05 2003-09-25 Rigaku Ind Corp Röntgenmonochromator und Röntgenfluoreszenzspektrometer, in dem der Röntgenmonochromator verwendet wird

Also Published As

Publication number Publication date
DE102004027347A1 (de) 2005-12-22
WO2005116771A2 (fr) 2005-12-08
WO2005116771A3 (fr) 2006-06-08

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: QIMONDA AG, 81739 MUENCHEN, DE

8364 No opposition during term of opposition
R081 Change of applicant/patentee

Owner name: POLARIS INNOVATIONS LTD., IE

Free format text: FORMER OWNER: QIMONDA AG, 81739 MUENCHEN, DE

Owner name: INFINEON TECHNOLOGIES AG, DE

Free format text: FORMER OWNER: QIMONDA AG, 81739 MUENCHEN, DE

R081 Change of applicant/patentee

Owner name: POLARIS INNOVATIONS LTD., IE

Free format text: FORMER OWNER: INFINEON TECHNOLOGIES AG, 85579 NEUBIBERG, DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee