DD146307A1 - Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten - Google Patents

Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten Download PDF

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Publication number
DD146307A1
DD146307A1 DD21595179A DD21595179A DD146307A1 DD 146307 A1 DD146307 A1 DD 146307A1 DD 21595179 A DD21595179 A DD 21595179A DD 21595179 A DD21595179 A DD 21595179A DD 146307 A1 DD146307 A1 DD 146307A1
Authority
DD
German Democratic Republic
Prior art keywords
cathode
substrates
item
glühkatode
electrodes
Prior art date
Application number
DD21595179A
Other languages
German (de)
English (en)
Inventor
Helmut Bollinger
Bernd Buecken
Ruediger Wilberg
Original Assignee
Helmut Bollinger
Bernd Buecken
Ruediger Wilberg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helmut Bollinger, Bernd Buecken, Ruediger Wilberg filed Critical Helmut Bollinger
Priority to DD21595179A priority Critical patent/DD146307A1/de
Priority to DE19803030454 priority patent/DE3030454C2/de
Priority to CH737480A priority patent/CH653708A5/de
Priority to JP13680180A priority patent/JPS5941509B2/ja
Publication of DD146307A1 publication Critical patent/DD146307A1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
DD21595179A 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten DD146307A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten
DE19803030454 DE3030454C2 (de) 1979-10-02 1980-08-12 Vorrichtung zur großflächigen Abscheidung von haftfesten, insbesondere harten Kohlenstoffschichten
CH737480A CH653708A5 (en) 1979-10-02 1980-10-02 Process and device for applying strongly adhesive layers to large-area substrates by means of ionised gases and/or vapours
JP13680180A JPS5941509B2 (ja) 1979-10-02 1980-10-02 強付着性の特に硬質炭素層を大きな面積に蒸着するための装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten

Publications (1)

Publication Number Publication Date
DD146307A1 true DD146307A1 (de) 1981-02-04

Family

ID=5520396

Family Applications (1)

Application Number Title Priority Date Filing Date
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten

Country Status (4)

Country Link
JP (1) JPS5941509B2 (US07122603-20061017-C00294.png)
CH (1) CH653708A5 (US07122603-20061017-C00294.png)
DD (1) DD146307A1 (US07122603-20061017-C00294.png)
DE (1) DE3030454C2 (US07122603-20061017-C00294.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0087836A1 (de) * 1982-02-27 1983-09-07 Philips Patentverwaltung GmbH Kohlenstoff enthaltende Gleitschicht

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
US6795929B2 (en) 1990-03-23 2004-09-21 Matsushita Electric Industrial Co., Ltd. Data processing apparatus
JPH0560537U (ja) * 1992-01-22 1993-08-10 弘 小川 厨房用塵芥処理装置
JP4080503B2 (ja) 2005-10-03 2008-04-23 中部日本マルコ株式会社 非接触コネクタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0087836A1 (de) * 1982-02-27 1983-09-07 Philips Patentverwaltung GmbH Kohlenstoff enthaltende Gleitschicht

Also Published As

Publication number Publication date
DE3030454C2 (de) 1987-04-02
JPS5941509B2 (ja) 1984-10-08
DE3030454A1 (de) 1981-04-16
CH653708A5 (en) 1986-01-15
JPS56102576A (en) 1981-08-17

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