CS214811B2 - Galvanic bath for the chrome-plating - Google Patents
Galvanic bath for the chrome-plating Download PDFInfo
- Publication number
- CS214811B2 CS214811B2 CS797649A CS764979A CS214811B2 CS 214811 B2 CS214811 B2 CS 214811B2 CS 797649 A CS797649 A CS 797649A CS 764979 A CS764979 A CS 764979A CS 214811 B2 CS214811 B2 CS 214811B2
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- chromium
- bath
- plating
- thiocyanate
- solution
- Prior art date
Links
- 238000007747 plating Methods 0.000 title claims abstract description 18
- 239000011651 chromium Substances 0.000 claims abstract description 52
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 50
- YRTKBCIAQCXVCM-UHFFFAOYSA-K chromium(3+);trithiocyanate Chemical compound [Cr+3].[S-]C#N.[S-]C#N.[S-]C#N YRTKBCIAQCXVCM-UHFFFAOYSA-K 0.000 claims abstract description 7
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- 150000001413 amino acids Chemical class 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 8
- 239000000243 solution Substances 0.000 description 21
- 238000000576 coating method Methods 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 17
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 239000004327 boric acid Substances 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 5
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 4
- 235000001014 amino acid Nutrition 0.000 description 4
- 235000003704 aspartic acid Nutrition 0.000 description 4
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 4
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical class OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241001085205 Prenanthella exigua Species 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004532 chromating Methods 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- AKWOHYNZFKKVPC-UHFFFAOYSA-N chromium(3+) chromium(6+) Chemical compound [Cr+3].[Cr+6] AKWOHYNZFKKVPC-UHFFFAOYSA-N 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 239000011696 chromium(III) sulphate Substances 0.000 description 1
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 1
- 238000009500 colour coating Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7844177A GB2033427B (en) | 1978-11-11 | 1978-11-11 | Chromium electroplating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS214811B2 true CS214811B2 (en) | 1982-06-25 |
Family
ID=10500991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS797649A CS214811B2 (en) | 1978-11-11 | 1979-11-09 | Galvanic bath for the chrome-plating |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS5565386A (pl) |
| AU (1) | AU528649B2 (pl) |
| BE (1) | BE879492A (pl) |
| CS (1) | CS214811B2 (pl) |
| DE (1) | DE2930981A1 (pl) |
| GB (1) | GB2033427B (pl) |
| PL (1) | PL122271B1 (pl) |
| ZA (1) | ZA795270B (pl) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2093861B (en) * | 1981-02-09 | 1984-08-22 | Canning Materials W Ltd | Bath for electrodeposition of chromium |
| GB2109815B (en) * | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
| CN103993336A (zh) * | 2014-06-04 | 2014-08-20 | 湖南工业大学 | 离子液体中三价铬电镀无微裂纹晶态铬及铬合金镀层的方法 |
| CN103993337A (zh) * | 2014-06-04 | 2014-08-20 | 湖南工业大学 | 硫酸氢盐离子液体中直接电沉积晶态铬镀层的方法 |
-
1978
- 1978-11-11 GB GB7844177A patent/GB2033427B/en not_active Expired
-
1979
- 1979-07-31 DE DE19792930981 patent/DE2930981A1/de not_active Withdrawn
- 1979-10-03 ZA ZA00795270A patent/ZA795270B/xx unknown
- 1979-10-18 BE BE0/197708A patent/BE879492A/fr not_active IP Right Cessation
- 1979-11-02 JP JP14141079A patent/JPS5565386A/ja active Granted
- 1979-11-09 CS CS797649A patent/CS214811B2/cs unknown
- 1979-11-09 AU AU52689/79A patent/AU528649B2/en not_active Ceased
- 1979-11-09 PL PL1979219515A patent/PL122271B1/pl unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB2033427B (en) | 1982-05-06 |
| DE2930981A1 (de) | 1980-05-22 |
| JPS5565386A (en) | 1980-05-16 |
| PL122271B1 (en) | 1982-07-31 |
| AU528649B2 (en) | 1983-05-05 |
| AU5268979A (en) | 1980-05-15 |
| ZA795270B (en) | 1980-09-24 |
| BE879492A (fr) | 1980-02-15 |
| JPS5645996B2 (pl) | 1981-10-30 |
| PL219515A1 (pl) | 1980-08-11 |
| GB2033427A (en) | 1980-05-21 |
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