CN2937161Y - Electroplating liquid circulation device for electroplating production - Google Patents

Electroplating liquid circulation device for electroplating production Download PDF

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Publication number
CN2937161Y
CN2937161Y CN 200620134511 CN200620134511U CN2937161Y CN 2937161 Y CN2937161 Y CN 2937161Y CN 200620134511 CN200620134511 CN 200620134511 CN 200620134511 U CN200620134511 U CN 200620134511U CN 2937161 Y CN2937161 Y CN 2937161Y
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CN
China
Prior art keywords
electroplate liquid
liquid
plating
electroplate
electroplating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 200620134511
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Chinese (zh)
Inventor
周远富
梁冬梅
褚丙武
赵群
姚素娟
张英
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aluminum Corp of China Ltd
Original Assignee
Aluminum Corp of China Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aluminum Corp of China Ltd filed Critical Aluminum Corp of China Ltd
Priority to CN 200620134511 priority Critical patent/CN2937161Y/en
Application granted granted Critical
Publication of CN2937161Y publication Critical patent/CN2937161Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model relates to a plating solution recycling device used in electroplating industry. The product produced by the device has the anti-corrosion, anti-grinding, and decorating characters. The utility model comprises a casing of plating bath, an overflow of plating solution, a spilling discharge of plating solution, a liquid feed inlet and outlet of plating solution, a liquid supply ripple pipe, and a filter of plating solution as well as a pressure increasing pump. The plating solution and the spilling liquid are filtrated continuously by using the utility model, then back to plating bath by using centrifugal pump, and discharged through bottom outlet pipe. The agitated recycling liquid around the product to avoid the solid particulate adhered to the plating product, and avoid the bubble either. By reducing the concentration polarization of the plating solution, the speed of plating is enhanced. The utility model is particularly suitable for the continuous plating process.

Description

A kind of electroplate liquid circulation device that is used for Electroplating Production
Technical field
A kind of electroplate liquid circulation device that is used for Electroplating Production relates to a kind of corrosion stability, wear resistance that is used to improve product, decorates or makes product have the electroplate liquid circulation device of the Electroplating Production of certain function.
Background technology
Plating be mainly used to improve product corrosion stability, wear resistance, decorate or make product have certain function, it is widely used.In order to guarantee the quality of coating, except processing parameters such as strict controlled temperature, current density, pH, factors such as impurity in also necessary attention stirring and the electroplate liquid are to the influence of plating quality, in order to prevent the concentration polarization of bubble when coating surface is detained and electroplate, usually adopt the mode of mechanical stirring or pneumatic blending, or adopt of the circulation of systemic circulation flow mode with the enhancement electroplate liquid, but the decomposition that can bring prussiate, and bring into plating bath such as greasy dirt, dust, thereby influence electroplating quality.
Summary of the invention
Order of the present utility model and be exactly the deficiency that exists at above-mentioned prior art provides a kind of and can prevent effectively that solia particle from adhering to and form burr on the plating piece, avoid steam bubble to be trapped in the plating piece surface forming the pin hole class and electroplate defective, reduce the concentration polarization of electroplate liquid, the cathode current density upper limit that improves permission and the electroplate liquid circulation device that is used for Electroplating Production of electroplating velocity.
The purpose of this utility model is achieved through the following technical solutions.
A kind of electroplate liquid circulation device that is used for Electroplating Production, its feature are formed in its structure and are comprised:
The electroplate liquid inside groove that is divided into the axially vertical interior frid of plating piece is arranged in plating tank casing-this plating tank wall box; Frid is having the electroplate liquid overflow weir in it by the upper end; The coaxial plated item that runs through out of the sidewall of plating tank and electroplate liquid inside groove passes through the hole; On the base plate between the sidewall of plating tank sidewall and electroplate liquid inside groove, have overflow electroplate liquid relief outlet; In electroplate liquid, have liquid discharge outlet at the bottom of electroplate liquid supply opening and the electrolytic solution on the trough floor;
Comb shape feed pipe-this feed pipe is the uniform pipe manifold of electroplating ejiction opening that has in upper end, and its pipe bottom is linked with the electroplate liquid feed pipe between two parties, and this feed pipe passes and is fixed on the electroplate liquid supply opening that has on the trough floor in the electroplate liquid;
Level is provided with that the vertical dividing plate that is provided with is divided into fluid reservoir behind electroplate liquid fluid reservoir and the electrolyte filtering with filter vat in a filter septum and the groove in electroplate liquid liquid storage filter vat-this groove; Have electroplate liquid outlet on the filtration separate slot sidewall of filter septum lower end being positioned at; Filtering the mouth that enters that separate slot sidewall upper portion has an electroplate liquid overflow and underflow liquid;
Force (forcing) pump-this pump is a liquid stream force (forcing) pump, and input terminus links by connection pipe and the outlet of electroplate liquid liquid storage filter vat electroplate liquid, and output terminal links by the supply opening of connection pipe with the comb shape feed pipe.
A kind of electroplate liquid circulation device that is used for Electroplating Production of the present utility model returns electroplate liquid and plating overflowing liquid to plating tank by continuous filtration after magnetic centrifugal pump pressurizes, and the pipe manifold ejection by bottom land forms the stirring that circulates around plating piece.Prevented that effectively solia particle from adhering on the plating piece, causes burr; Avoid simultaneously being trapped in the plating piece surface, form the pin hole class and electroplate defective in steam bubble; Reduce the concentration polarization of electroplate liquid, improve the cathode current density upper limit that allows, thereby improved electroplating velocity, be particularly useful for continuous electroplating.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
Fig. 2 is that the A-A of Fig. 1 is to sectional view.
Embodiment
A kind of electroplate liquid circulation device that is used for Electroplating Production, its structure is formed and is comprised: the electroplate liquid inside groove that is divided into the axially vertical interior frid 2 of plating piece is arranged in this plating tank wall box of plating tank casing 1-; Frid is having electroplate liquid overflow weir 3 in it by the upper end; The coaxial plated item that runs through out of the sidewall of plating tank casing and electroplate liquid inside groove is by hole 4; On the base plate between the sidewall of plating tank sidewall and electroplate liquid inside groove, have overflow electroplate liquid relief outlet 5; In electroplate liquid, have liquid discharge outlet 7 at the bottom of electroplate liquid supply opening 6 and the electrolytic solution on the trough floor; This feed pipe of comb shape feed pipe 8-is the uniform pipe manifold of electroplating ejiction opening that has in upper end, and its pipe bottom is linked with electroplate liquid feed pipe 9 between two parties, and this feed pipe passes and is fixed on the electroplate liquid supply opening that has on the trough floor in the electroplate liquid; Level is provided with that the vertical dividing plate 17 that is provided with is divided into fluid reservoir behind electroplate liquid fluid reservoir and the electrolyte filtering with filter vat in a filter septum 11 and the groove in this groove of electroplate liquid liquid storage filter vat 10-; Have electroplate liquid outlet 12 on the filtration separate slot sidewall of filter septum lower end being positioned at; Enter mouthfuls 13 what filter that separate slot sidewall upper portion has an electroplate liquid overflow and underflow liquid; Force (forcing) pump-this pump is a liquid stream force (forcing) pump 14, and input terminus links by connection pipe and the outlet of electroplate liquid liquid storage filter vat electroplate liquid, and output terminal links by the supply opening of connection pipe with the comb shape feed pipe.15 is flow valve among the figure
Electroplate liquid underflow and plating overflowing liquid enter the electroplate liquid fluid reservoir during operation, electrolytic solution dividing plate after filtration becomes filtration back liquid storage, and the electrolytic solution after the filtration returns the pipe manifold in the plating tank by force (forcing) pump after the pressurization, electroplate liquid sprays from the mouth of pipe, forms circulation and stir around plating piece 16.The electroplate liquid recycle system of the present invention is particularly useful for continuous electroplating, can significantly improve electroplating velocity, and the plating piece surface quality is good, does not have defectives such as pin hole.

Claims (1)

1. electroplate liquid circulation device that is used for Electroplating Production, its feature are formed in its structure and are comprised:
The electroplate liquid inside groove that is divided into the axially vertical interior frid of plating piece is arranged in plating tank casing-this plating tank wall box; Frid is having the electroplate liquid overflow weir in it by the upper end; The coaxial plated item that runs through out of the sidewall of plating tank and electroplate liquid inside groove passes through the hole; On the base plate between the sidewall of plating tank sidewall and electroplate liquid inside groove, have overflow electroplate liquid relief outlet; In electroplate liquid, have liquid discharge outlet at the bottom of electroplate liquid supply opening and the electrolytic solution on the trough floor;
Comb shape feed pipe-this feed pipe is the uniform pipe manifold of electroplating ejiction opening that has in upper end, and its pipe bottom is linked with the electroplate liquid feed pipe between two parties, and this feed pipe passes and is fixed on the electroplate liquid supply opening that has on the trough floor in the electroplate liquid;
Level is provided with that the vertical dividing plate that is provided with is divided into fluid reservoir behind electroplate liquid fluid reservoir and the electrolyte filtering with filter vat in a filter septum and the groove in electroplate liquid liquid storage filter vat-this groove; Have electroplate liquid outlet on the filtration separate slot sidewall of filter septum lower end being positioned at; Filtering the mouth that enters that separate slot sidewall upper portion has an electroplate liquid overflow and underflow liquid;
Force (forcing) pump-this pump is a liquid stream force (forcing) pump, and input terminus links by connection pipe and the outlet of electroplate liquid liquid storage filter vat electroplate liquid, and output terminal links by the supply opening of connection pipe with the comb shape feed pipe.
CN 200620134511 2006-08-14 2006-08-14 Electroplating liquid circulation device for electroplating production Expired - Fee Related CN2937161Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200620134511 CN2937161Y (en) 2006-08-14 2006-08-14 Electroplating liquid circulation device for electroplating production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200620134511 CN2937161Y (en) 2006-08-14 2006-08-14 Electroplating liquid circulation device for electroplating production

Publications (1)

Publication Number Publication Date
CN2937161Y true CN2937161Y (en) 2007-08-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200620134511 Expired - Fee Related CN2937161Y (en) 2006-08-14 2006-08-14 Electroplating liquid circulation device for electroplating production

Country Status (1)

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CN (1) CN2937161Y (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101302645B (en) * 2008-06-09 2012-12-05 匡优新 Plating bath circulating device of electroplating production facility
CN102851728A (en) * 2012-08-10 2013-01-02 梅州市志浩电子科技有限公司 System and method for plating solution circulating filtration
CN102938286A (en) * 2012-11-26 2013-02-20 核工业理化工程研究院 Electroplating solution magnetization method and device
CN103469288A (en) * 2013-09-02 2013-12-25 陈文智 Electroplating bath provided with circulating filtration device
CN103924282A (en) * 2013-01-15 2014-07-16 深南电路有限公司 Electroplating cylinder
CN105803497A (en) * 2016-05-24 2016-07-27 广州杰赛科技股份有限公司 Novel electroplating device
CN107604426A (en) * 2007-12-04 2018-01-19 株式会社荏原制作所 Electroplanting device and electro-plating method
CN108103563A (en) * 2018-02-08 2018-06-01 遵义市汇川区吉美电镀有限责任公司 A kind of plating deslagging device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107604426A (en) * 2007-12-04 2018-01-19 株式会社荏原制作所 Electroplanting device and electro-plating method
CN107604426B (en) * 2007-12-04 2019-08-30 株式会社荏原制作所 Electroplanting device and electro-plating method
CN101302645B (en) * 2008-06-09 2012-12-05 匡优新 Plating bath circulating device of electroplating production facility
CN102851728A (en) * 2012-08-10 2013-01-02 梅州市志浩电子科技有限公司 System and method for plating solution circulating filtration
CN102938286A (en) * 2012-11-26 2013-02-20 核工业理化工程研究院 Electroplating solution magnetization method and device
CN102938286B (en) * 2012-11-26 2016-09-28 核工业理化工程研究院 The Magnitizing method of a kind of electroplating solution and magnetizing assembly
CN103924282A (en) * 2013-01-15 2014-07-16 深南电路有限公司 Electroplating cylinder
CN103469288A (en) * 2013-09-02 2013-12-25 陈文智 Electroplating bath provided with circulating filtration device
CN105803497A (en) * 2016-05-24 2016-07-27 广州杰赛科技股份有限公司 Novel electroplating device
CN105803497B (en) * 2016-05-24 2018-05-18 广州杰赛科技股份有限公司 Novel electroplating device
CN108103563A (en) * 2018-02-08 2018-06-01 遵义市汇川区吉美电镀有限责任公司 A kind of plating deslagging device

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070822

Termination date: 20150814

EXPY Termination of patent right or utility model