CN213771334U

CN213771334U - Photoresist recovery device

Info

Publication number: CN213771334U
Application number: CN202021772822.9U
Authority: CN
Inventors: 张卫丽; 申浩; 司斌; 李伟界
Original assignee: Truly Huizhou Smart Display Ltd
Current assignee: Truly Huizhou Smart Display Ltd
Priority date: 2020-08-21
Filing date: 2020-08-21
Publication date: 2021-07-23
Anticipated expiration: 2030-08-21

Abstract

The utility model discloses a photoresist recovery unit, including rotating assembly, lift isolation assembly and recovery subassembly, lift isolation assembly includes isolation baffle, lifting rod and lift driving piece, and the lift driving piece sets up on the base, and the one end and the lift driving piece of lifting rod are connected, and the other end of lifting rod sets up on isolation baffle to isolation baffle accepts in the storage tank, and the lift driving piece is used for driving lifting rod to go up and down, and then makes isolation baffle do and reciprocate. The utility model discloses a set up isolation baffle between waste liquid recovery cell body and photoresist recovery cell body for the device can raise or descend isolation baffle when being in different states, and then realizes the separation of photoresist and waste liquid and retrieve, improves recovery efficiency. The device separates the cleaning and draining system from the production and draining system so as to prevent the photoresist from being polluted and effectively recycle the photoresist.

Description

Photoresist recovery device

Technical Field

The utility model relates to a photoresist rubber coating production field especially relates to a photoresist recovery unit.

Background

The integrated circuit manufacturing technology is the foundation of the microelectronic industry, and in recent years, with the vigorous development of integrated circuit devices, the development of semiconductor manufacturing processes is also driven, and the production scale of the integrated circuit devices is larger and larger; certainly, in the process of manufacturing a semiconductor, the coating of the photoresist is a very important process, because the photoresist is coated on samples such as a semiconductor, a conductor, an insulator and the like, then the photoresist remained after exposure and development in the yellow light process plays a role in protecting a bottom layer, and then a corresponding ultra-clean high-purity reagent is adopted to etch the part where the photoresist is not remained, so that a pattern transfer process of transferring a Mask pattern onto the sample can be completed, and very fine patterns can be manufactured on the sample, which is a relatively fine and precise process. Therefore, the coating requirements for the photoresist are relatively high, especially the quality and uniformity of the coated photoresist film layer.

At present, photoresist coating processes and devices used in semiconductor yellow light processes in the industry mainly include Spin coating, roll coating, dip coating, spray coating and the like. Spin coating is applied most because its photoresist membrane thickness coating is more even in the semiconductor manufacturing process of electronic industry, but Spin spreading machine is because the characteristics of self equipment technology, when revolving stage high-speed rotatory, when photoresist evenly spreads on whole base plate, most photoresist then can be thrown away, this part by the photoresist and the photoresist cleaner of throwing away mix, lead to the photoresist to be contaminated, simple effectual recycle can not, can only regard as waste liquid discharge finally, cause very big waste.

SUMMERY OF THE UTILITY MODEL

The utility model aims at overcoming the weak point among the prior art, provide one kind and separately clean drainage system and production drainage system to reach the photoresist and not contaminated, can carry out effective recycle's photoresist recovery unit.

The purpose of the utility model is realized through the following technical scheme:

a photoresist reclamation apparatus, comprising:

the rotary assembly comprises a base, a rotary shell and a rotary driving piece, wherein the rotary driving piece is arranged on the base, the rotary shell is fixed on the rotary driving piece, a containing groove is formed in the rotary shell, the rotary base is contained in the containing groove, and the rotary base is arranged at the output end of the rotary driving piece;

the lifting isolation assembly comprises an isolation baffle, a lifting rod and a lifting driving piece, the lifting driving piece is arranged on the base, one end of the lifting rod is connected with the lifting driving piece, the other end of the lifting rod is arranged on the isolation baffle, the isolation baffle is contained in the containing groove, and the lifting driving piece is used for driving the lifting rod to lift so as to enable the isolation baffle to move up and down; and

retrieve the subassembly, retrieve the subassembly and include waste liquid recovery cell body and photoresist recovery cell body, the waste liquid recovery cell body set up in keep apart the inboard regional department of baffle, the photoresist recovery cell body set up in keep apart the outside region of baffle and between the rotatory shell.

In one embodiment, the rotary driving member includes a rotary motor, a rotary driving rod, and a fixed sleeve, the rotary motor is disposed on the base, one end of the rotary driving rod is connected to an output end of the rotary motor, the other end of the rotary driving rod is disposed on the rotary base, the fixed sleeve is disposed outside the rotary driving rod, and the rotary housing is disposed on an end of the fixed sleeve away from the rotary motor.

In one embodiment, the isolation barrier is an annular structure.

In one embodiment, the lifting rod is provided with a plurality of lifting driving members, the lifting driving members are provided with a plurality of lifting driving members, each lifting driving member is correspondingly connected with one lifting rod, a plurality of through holes are formed in the bottom plate of the rotating shell, one end, far away from the lifting driving member, of each lifting rod is correspondingly penetrated through one through hole, and one end, far away from the lifting driving member, of each lifting rod is arranged on the isolation baffle.

In one embodiment, the lift drive is a lift motor.

In one embodiment, the lift isolating assembly further comprises a supporting base, the supporting base is disposed on the base, and the lift driving member is disposed on the supporting base.

In one embodiment, the recovery assembly further comprises a lower sliding disc, the circle center of the lower sliding disc is sleeved on the rotary driving rod, and the edge of the lower sliding disc is connected with the waste liquid recovery tank body.

In one embodiment, the side wall of the waste liquid recovery groove body is provided with an inclined slope, and the side wall of the photoresist recovery groove body is provided with a downward inclined slope.

In one embodiment, the recycling assembly further comprises a waste liquid recycling pipe and a waste liquid collecting box, the waste liquid collecting box is placed on the base, a waste liquid leaking hole is formed in the position, located at the bottom of the waste liquid recycling groove, of the rotating shell, one end of the waste liquid recycling pipe is communicated with the waste liquid leaking hole, and the other end of the waste liquid recycling pipe is communicated with a liquid inlet of the waste liquid collecting box.

In one embodiment, the recycling assembly further comprises a photoresist recycling pipe and a photoresist collecting box, the photoresist collecting box is placed on the base, a photoresist liquid leakage hole is formed in the position, located at the bottom of the photoresist recycling groove body, of the rotating shell, one end of the photoresist recycling pipe is communicated with the photoresist liquid leakage hole, and the other end of the photoresist recycling pipe is communicated with a liquid inlet of the photoresist collecting box.

The utility model discloses compare in prior art's advantage and beneficial effect as follows:

the utility model relates to a photoresist recovery unit retrieves cell body and photoresist through retrieving at the waste liquid and sets up isolation baffle between the cell body for the device can raise or descend isolation baffle when being in different states, and then realizes the separation of photoresist and waste liquid and retrieve, improves recovery efficiency. The device separates the cleaning and draining system from the production and draining system so as to prevent the photoresist from being polluted and effectively recycle the photoresist.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.

FIG. 1 is a schematic structural view of a photoresist recovery apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic diagram of the internal structure of the photoresist recovery apparatus shown in FIG. 1.

Detailed Description

In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the accompanying drawings. The preferred embodiments of the present invention are shown in the drawings. The invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not represent the only embodiments.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

Referring to fig. 1, a photoresist recycling apparatus includes: the rotating assembly 100 is used for rotating the rotating base, the lifting isolation assembly 200 is used for isolating waste liquid and photoresist in the rotating process, and the recovery assembly 300 is used for recovering the waste liquid or the photoresist.

Referring to fig. 1 and 2, the rotating assembly 100 includes a base 110, a rotating base 120, a rotating housing 130 and a rotating driving member 140, the rotating driving member is disposed on the base, the rotating housing is fixed on the rotating driving member, a receiving groove 131 is formed on the rotating housing, the rotating base is received in the receiving groove, and the rotating base is disposed on an output end of the rotating driving member. It should be noted that the base 110 is used for fixing the whole device; the rotary base 120 is used for placing a liquid crystal panel to be glued, and gluing is achieved through an external glue placing device; the rotating housing 130 is used for accommodating the lifting isolation assembly 200 and the recovery assembly 300; the rotary driving member 140 is used for driving the rotary base to rotate.

Referring to fig. 1 and 2, the lifting isolation assembly 200 includes an isolation baffle 210, a lifting rod 220 and a lifting driving member 230, the lifting driving member is disposed on the base, one end of the lifting rod is connected to the lifting driving member, the other end of the lifting rod is disposed on the isolation baffle, the isolation baffle is accommodated in the accommodating groove, and the lifting driving member is configured to drive the lifting rod to lift, so that the isolation baffle moves up and down. It should be noted that the isolation baffle 210 is used for isolating waste liquid recovery and photoresist recovery, and the lifting rod 220 is used for lifting up the isolation baffle 210; the lifting driving member 230 is used for driving the lifting of the lifting rod. In this embodiment, the isolation baffle is of an annular structure.

Referring to fig. 2, the recycling assembly 300 includes a waste liquid recycling tank 310 disposed at an inner region of the isolation baffle and a photoresist recycling tank 320 disposed between an outer region of the isolation baffle and the rotating housing. It should be noted that the waste liquid recovery tank 310 is used for collecting waste liquid; the photoresist recovery tank 320 is used for collecting photoresist.

It can be understood that, in Spin coating equipment, when photoresist evenly spreads the whole base plate, most photoresist then can be thrown out, namely when Spin coating equipment rotates at a high speed, photoresist or cleaning agent on the rotating base station flows into the discharge groove after being thrown out to the side baffle plate of the rotating shell at the centrifugal force of high-speed rotation, and the part of thrown-out photoresist is mixed with the photoresist cleaning agent, so that the photoresist is polluted, and can not be effectively recycled, and finally can only be discharged as waste liquid, thereby causing great waste.

Specifically, this device is when carrying out the rubber coating, and isolation baffle 210 is in the state that descends, and isolation baffle does not retrieve the cell body with the waste liquid and the cell body is retrieved to the photoresist separates promptly, and rotatory base station can carry out high-speed rotation this moment in addition for photoresist on the rotatory base station is direct to be got rid of on the lateral wall of rotatory shell, then flows into the photoresist along the lateral wall of rotatory shell again and retrieves the cell body, has realized retrieving the collection of photoresist. And when this device was in the cleaning state, then the lifting drive spare drive isolation baffle rises, retrieves the cell body with waste liquid and the cell body is retrieved to the photoresist and separates, and rotatory base station carries out high-speed rotatory back this moment in addition, gets rid of the clean waste liquid on the rotatory base station on the isolation baffle to in flowing into the waste liquid along isolation baffle and retrieving the cell body, realize the collection recovery operation to the waste liquid. Therefore, the isolation baffle is arranged between the waste liquid recovery tank body and the photoresist recovery tank body, so that the device can be lifted or lowered when being in different states, the separation and recovery of the photoresist and the waste liquid are realized, and the recovery efficiency is improved. The device separates the cleaning and draining system from the production and draining system so as to prevent the photoresist from being polluted and effectively recycle the photoresist.

Referring to fig. 2, the rotary driving member 140 includes a rotary motor, a rotary driving rod and a fixed shaft sleeve, the rotary motor is disposed on the base, one end of the rotary driving rod is connected to an output end of the rotary motor, the other end of the rotary driving rod is disposed on the rotary base, the fixed shaft sleeve is disposed outside the rotary driving rod, and the rotary housing is disposed on an end of the fixed shaft sleeve away from the rotary motor. So, through setting up rotating electrical machines, rotatory actuating lever and fixed axle sleeve, can be so that the rotation is more stable, and the structural stability of device is better.

It should be noted that the lifting rods are provided with a plurality of lifting driving pieces, the lifting driving pieces are provided with a plurality of lifting driving pieces, each lifting driving piece is correspondingly connected with one lifting rod, a plurality of through holes are formed in a bottom plate of the rotating shell, one end, far away from the lifting driving pieces, of each lifting rod correspondingly penetrates through one through hole, and one end, far away from the lifting driving pieces, of each lifting rod is arranged on the isolation baffle. So, through setting up a plurality of jacking poles and upgrading driving piece, can improve the lift stability to isolation barrier. In this embodiment, the lifting driving member is a lifting motor.

Referring to fig. 1, the lifting isolation assembly further includes a supporting base 240 disposed on the base, and the lifting driving member is disposed on the supporting base. So, through setting up the supporting seat, can play the effect to the support of whole lift isolation component.

Referring to fig. 2, the recycling assembly 300 further includes a lower sliding disk 330, a circle center of the lower sliding disk is sleeved on the rotation driving rod, and an edge of the lower sliding disk is connected to the waste liquid recycling tank. So, can flow into waste liquid recovery cell body along the gliding disc of slope with the waste liquid that stops on rotatory shell, preferably, the gliding disc is round platform or conical structure.

It should be noted that the side wall of the waste liquid recovery tank body is provided with an inclined slope 311, and the side wall of the photoresist recovery tank body is provided with a downward sliding slope 321. Therefore, the waste liquid or the photoresist can be more conveniently and effectively refluxed by arranging the inclined plane.

Referring to fig. 1, the recycling assembly 300 further includes a waste liquid recycling pipe 340 and a waste liquid collecting box 350, the waste liquid collecting box is disposed on the base, a waste liquid leaking hole is formed at a bottom position of the waste liquid recycling tank, one end of the waste liquid recycling pipe is communicated with the waste liquid leaking hole, and the other end of the waste liquid recycling pipe is communicated with a liquid inlet of the waste liquid collecting box. Thus, by arranging waste liquid recovery pipe 340 and waste liquid collection box 350, waste liquid in the waste liquid recovery tank body can flow into the waste liquid collection box through the waste liquid recovery pipe and be collected.

Referring to fig. 1, the recycling assembly 300 further includes a photoresist recycling pipe 360 and a photoresist collecting box 370, the photoresist collecting box is placed on the base, a photoresist weep hole is formed at a position of the rotating housing at the bottom of the photoresist recycling tank, one end of the photoresist recycling pipe is communicated with the photoresist weep hole, and the other end of the photoresist recycling pipe is communicated with a liquid inlet of the photoresist collecting box. Therefore, by arranging the photoresist recovery pipe 360 and the photoresist collection box 370, the photoresist in the photoresist recovery tank body can flow into the photoresist collection box through the photoresist recovery pipe and be collected.

The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is more specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims

1. A photoresist recovery apparatus, comprising:

2. The photoresist recovery apparatus according to claim 1, wherein the rotary driving member comprises a rotary motor, a rotary driving rod and a fixed shaft sleeve, the rotary motor is disposed on the base, one end of the rotary driving rod is connected to an output end of the rotary motor, the other end of the rotary driving rod is disposed on the rotary base, the fixed shaft sleeve is disposed outside the rotary driving rod, and the rotary housing is disposed on an end of the fixed shaft sleeve away from the rotary motor.

3. The photoresist recovery apparatus of claim 1, wherein the isolation barrier is an annular structure.

4. The photoresist recovery apparatus according to claim 1, wherein a plurality of lifting rods are provided, a plurality of lifting driving members are provided, each lifting driving member is correspondingly connected to one lifting rod, a plurality of through holes are provided on the bottom plate of the rotating housing, one end of each lifting rod away from the lifting driving member correspondingly penetrates through one through hole, and one end of each lifting rod away from the lifting driving member is provided on the isolation baffle.

5. The photoresist recovery apparatus of claim 4, wherein the lift drive is a lift motor.

6. The apparatus of claim 1, wherein the lift isolator assembly further comprises a support base, the support base being disposed on the pedestal, the lift actuator being disposed on the support base.

7. The photoresist recovery device according to claim 2, wherein the recovery assembly further comprises a lower sliding disk, the center of the lower sliding disk is sleeved on the rotary driving rod, and the edge of the lower sliding disk is connected with the waste liquid recovery tank.

8. The photoresist recovery device of claim 1, wherein the side wall of the waste liquid recovery tank body is provided with an inclined slope, and the side wall of the photoresist recovery tank body is provided with a downward inclined slope.

9. The photoresist recovery device according to claim 1, wherein the recovery assembly further comprises a waste liquid recovery tube and a waste liquid collection box, the waste liquid collection box is placed on the base, a waste liquid leakage hole is formed in the bottom of the waste liquid recovery groove body of the rotary shell, one end of the waste liquid recovery tube is communicated with the waste liquid leakage hole, and the other end of the waste liquid recovery tube is communicated with a liquid inlet of the waste liquid collection box.

10. The photoresist recovery device according to claim 1, wherein the recovery assembly further comprises a photoresist recovery tube and a photoresist collection box, the photoresist collection box is placed on the base, a photoresist weep hole is formed in the bottom of the photoresist recovery groove body of the rotating shell, one end of the photoresist recovery tube is communicated with the photoresist weep hole, and the other end of the photoresist recovery tube is communicated with a liquid inlet of the photoresist collection box.