CN210636066U - Novel physical vapor deposition equipment - Google Patents

Novel physical vapor deposition equipment Download PDF

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Publication number
CN210636066U
CN210636066U CN201921863860.2U CN201921863860U CN210636066U CN 210636066 U CN210636066 U CN 210636066U CN 201921863860 U CN201921863860 U CN 201921863860U CN 210636066 U CN210636066 U CN 210636066U
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vapor deposition
shell
physical vapor
deposition equipment
motor
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CN201921863860.2U
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海玉龙
郭红波
周杰
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Suzhou Serrida Nano Technology Co Ltd
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Suzhou Serrida Nano Technology Co Ltd
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Abstract

The utility model relates to the technical field of vapor deposition equipment, in particular to novel physical vapor deposition equipment, which solves the defects of high cost and low working efficiency in the prior art, and comprises a base, wherein the top of the base is sequentially provided with a shell and a PLC controller through bolts, the shell is in a cavity structure, the interior of the shell is provided with a sputtering target, the inner wall of the shell is fixedly connected with a guide plate through bolts, a supporting platform is also fixed in the inner cavity of the shell through bolts, a groove is arranged on the supporting platform, a motor is arranged in the groove through screws, and through the arrangement of the structures such as the supporting platform, the motor, a rotating rod, a telescopic rod, a connecting rod, a side plate and the like, when the equipment runs, only one motor is adopted as a driving source, when the motor runs to drive a turntable to rotate, the combing sand on the left, the purpose of uniform deposition is realized, and the production cost is reduced.

Description

Novel physical vapor deposition equipment
Technical Field
The utility model relates to a vapor deposition equipment technical field especially relates to a novel physical vapor deposition equipment.
Background
The vapor deposition technique is a technique of forming a functional or decorative metal, nonmetal or compound coating on the surface of a workpiece by using physical and chemical processes occurring in a vapor phase, and the vapor deposition technique can be classified into chemical vapor deposition, physical vapor deposition and plasma vapor deposition according to a film forming mechanism.
At present, vapor deposition equipment used for powder materials in the market has the following defects: firstly, a turntable for bearing powder materials and a sand combing mechanism for stirring powder need to be driven by two driving sources, so that the cost of the equipment is high; secondly, in the vapor deposition process, the target material can not be sputtered on the material in a concentrated manner, the coating effect is poor, the vapor deposition time is long, and the working efficiency is low.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the defects of high cost and low working efficiency in the prior art and providing a novel physical vapor deposition device.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a novel physical vapor deposition device comprises a base, wherein a shell and a PLC (programmable logic controller) are sequentially and fixedly installed at the top of the base through bolts, the shell is of a cavity structure, a sputtering target is arranged in the shell, a guide plate is fixedly connected to the inner wall of the shell through a screw, a supporting table is further fixedly installed in the inner cavity of the shell through a bolt, a groove is formed in the supporting table, a motor is installed in the groove through a screw, the output end of the motor is connected with a driving shaft through a coupler, the other end of the driving shaft is fixedly connected with a rotary table through a nut and a bolt, a rotary rod is welded on the outer side of the driving shaft, a telescopic rod is slidably arranged in the rotary rod, a connecting rod and a sliding block are respectively welded on two sides of the telescopic rod, the sliding, the bottom of the side plate is welded with a fixing plate, and the bottom of the fixing plate is fixedly provided with sand combing needles which are arranged and distributed.
Preferably, a vacuum pump is installed on one side of the casing through screws, an air suction pipe is fixedly connected to the vacuum pump, and the other end of the air suction pipe is installed on one side of the casing through a flange plate.
Preferably, the number of guide plates is set to two, and two guide plates are symmetrically arranged in the inner cavity of the casing, and the included angle formed between the guide plates and the horizontal direction is 75 degrees.
Preferably, the sputtering target is located right above the turntable, a projection of an integrated structure is arranged at the central position of the upper surface of the turntable, and the outer side of the projection is arc-shaped.
Preferably, a telescopic groove is formed in the rotating rod, and the telescopic rod is embedded in the telescopic groove.
Preferably, the top of the support platform is provided with a lace groove, and the sliding block is connected with the inside of the lace groove in a sliding manner.
Preferably, the sputtering target, the motor and the vacuum pump are all electrically connected with the PLC controller.
The utility model has the advantages that:
1. the utility model discloses in through the setting of brace table, motor, rotary rod, telescopic link, connecting rod, curb plate isotructure, equipment only adopts a motor as the driving source when moving, and the motor drives the carousel when rotating in the operation, and the comb sand of the left and right sides simultaneously disperses to powder material, realizes even sedimentary purpose, has reduced manufacturing cost.
2. The utility model discloses in through the setting of guide plate, when the target of sputter target sedimentary to the top layer of powder, the guide plate concentrates on the target in the scope of carousel, can promote the deposit effect effectively, shortens vapor deposition's time, and work efficiency improves greatly.
Drawings
Fig. 1 is a front view of a novel physical vapor deposition apparatus provided by the present invention;
fig. 2 is a top view of the supporting table according to the present invention;
fig. 3 is a side view of the fixing plate according to the present invention.
In the figure: the device comprises a base 1, a machine shell 2, a supporting table 3, a sputtering target 4, a guide plate 5, a PLC controller 6, a rotary table 7, a motor 8, a lace groove 9, a vacuum pump 10, an air suction pipe 11, a connecting rod 12, a rotating rod 13, a telescopic rod 14, a convex block 15, a side plate 16, a sliding block 17, a fixing plate 18 and a sand combing needle 19.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
Referring to fig. 1-3, a novel physical vapor deposition device comprises a base 1, wherein a casing 2 and a PLC controller 6 are sequentially fixedly installed at the top of the base 1 through bolts, the casing 2 is of a cavity structure, a sputtering target 4 is arranged inside the casing 2, a guide plate 5 is fixedly connected to the inner wall of the casing 2 through screws, a support table 3 is further fixedly installed in an inner cavity of the casing 2 through bolts, a groove is formed in the support table 3, a motor 8 is installed inside the groove through screws, the output end of the motor 8 is connected with a drive shaft through a coupler, the other end of the drive shaft is fixedly connected with a turntable 7 through a nut bolt, a rotating rod 13 is welded on the outer side of the drive shaft, a telescopic rod 14 is slidably arranged inside the rotating rod 13, a connecting rod 12 and a sliding block 17 are respectively welded on two, one side of the connecting rod 12 is fixed with a side plate 16 through a screw, the bottom of the side plate 16 is welded with a fixing plate 18, the bottom of the fixing plate 18 is fixedly provided with a sand combing needle 19 which is arranged and distributed, through the arrangement of the structures such as the supporting table 3, the motor 8, the rotating rod 13, the telescopic rod 14, the connecting rod 12 and the side plate 16, when the equipment is operated, only one motor 8 is adopted as a driving source, when the motor 8 operates to drive the turntable 7 to rotate, the sand combing needles 19 on the left side and the right side can disperse powder materials at the same time, the aim of uniform deposition is realized, the production cost is reduced, through the arrangement of the guide plate 5, when the target material of the sputtering target 4 is deposited on the surface layer of the powder, the guide plate 5 concentrates the target material in the range of the turntable 7, the deposition effect can be effectively improved, the time of, fixedly connected with breathing pipe 11 on vacuum pump 10, the other end of breathing pipe 11 passes through the ring flange and installs in one side of casing 2, the quantity of guide plate 5 sets up to two, 5 symmetrical arrangement of two guide plates are in the inner chamber of casing 2, and the contained angle that guide plate 5 and horizontal direction formed is 75, sputter target 4 is located carousel 7 directly over, the central point of carousel 7 upper surface puts the lug 15 that is provided with a body structure, lug 15's the outside is the arc form, the flexible groove has been seted up to rotary rod 13's inside, the inside at the flexible groove is embedded in to telescopic link 14, lace groove 9 has been seted up at brace table 3's top, slider 17 and lace groove 9's inside sliding connection, sputter target 4, motor 8 and vacuum pump 10 all with 6 electric connection of PLC controller.
In the embodiment, when the equipment works, a user firstly places powder materials on the turntable 7, after a cabin door is closed, the PLC 6 is used for controlling, the vacuum pump 10 pumps the interior of the shell 2 to vacuum, the sputtering target 4 bombards the surface of a target material through functional particles to deposit the target material on the powder materials, and the target material can be concentrated in the range of the turntable 7 through the symmetrical guide plates 5, so that the powder materials are uniformly and quickly deposited;
further, simultaneously, motor 8 starts in the deposition process, drive carousel 7 and rotate, make powder material deposit more even, and motor 8 drives the drive shaft when rotating, make the rotary rod 13 of both sides rotate simultaneously, rotary rod 13 drives telescopic link 14 and slider 17 and rotates, slider 17 slides along lace groove 9, telescopic link 14 can slide in rotary rod 13, in order to adapt to the displacement difference that slider 17 produced when sliding, because slider 17 produces continuous reciprocating type displacement action when sliding along lace groove 9, then drive connecting rod 12, curb plate 16, fixed plate 18 and comb sand needle 19 round trip movement simultaneously when slider 17 displaces, comb sand needle 19 then turns over the powder material, promote the deposition effect, be equipped with lug 15 between carousel 7, can make the powder material keep away from the central point of carousel 7, can with the fine contact of comb sand needle 19.
The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.

Claims (7)

1. The novel physical vapor deposition equipment comprises a base (1) and is characterized in that a shell (2) and a PLC (programmable logic controller) (6) are sequentially arranged at the top of the base (1) through bolt fixing, the shell (2) is of a cavity structure, a sputtering target (4) is arranged inside the shell (2), a guide plate (5) is fixedly connected to the inner wall of the shell (2) through a bolt, a supporting table (3) is further fixedly arranged in the inner cavity of the shell (2) through the bolt, a groove is formed in the supporting table (3), a motor (8) is arranged inside the groove through a screw, the output end of the motor (8) is connected with a driving shaft through a coupling, the other end of the driving shaft is fixedly connected with a turntable (7) through a nut bolt, a rotating rod (13) is welded on the outer side of the driving shaft, and a telescopic rod (14, the sand carding machine is characterized in that a connecting rod (12) and a sliding block (17) are welded on two sides of the telescopic rod (14) respectively, the sliding block (17) is arranged at the top of the supporting table (3) in a sliding mode, a side plate (16) is fixed to one side of the connecting rod (12) through screws, a fixing plate (18) is welded to the bottom of the side plate (16), and sand carding needles (19) which are distributed in a display mode are fixedly arranged at the bottom of the fixing plate (18).
2. The physical vapor deposition equipment as claimed in claim 1, wherein a vacuum pump (10) is installed on one side of the casing (2) through screws, an air suction pipe (11) is fixedly connected to the vacuum pump (10), and the other end of the air suction pipe (11) is installed on one side of the casing (2) through a flange.
3. The novel physical vapor deposition equipment as claimed in claim 1, wherein the number of the guide plates (5) is two, the two guide plates (5) are symmetrically arranged in the inner cavity of the casing (2), and the included angle formed between the guide plates (5) and the horizontal direction is 75 degrees.
4. The physical vapor deposition equipment as claimed in claim 1, wherein the sputtering target (4) is located right above the rotating disc (7), a bump (15) with an integral structure is arranged at the center of the upper surface of the rotating disc (7), and the outer side of the bump (15) is arc-shaped.
5. The physical vapor deposition equipment as claimed in claim 1, wherein the rotating rod (13) is provided with a telescopic slot inside, and the telescopic rod (14) is embedded inside the telescopic slot.
6. The physical vapor deposition equipment as claimed in claim 1, wherein the supporting table (3) is provided with a lace groove (9) at the top, and the sliding block (17) is slidably connected with the inside of the lace groove (9).
7. The physical vapor deposition equipment according to claim 2, wherein the sputtering target (4), the motor (8) and the vacuum pump (10) are electrically connected with the PLC controller (6).
CN201921863860.2U 2019-11-01 2019-11-01 Novel physical vapor deposition equipment Active CN210636066U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921863860.2U CN210636066U (en) 2019-11-01 2019-11-01 Novel physical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921863860.2U CN210636066U (en) 2019-11-01 2019-11-01 Novel physical vapor deposition equipment

Publications (1)

Publication Number Publication Date
CN210636066U true CN210636066U (en) 2020-05-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921863860.2U Active CN210636066U (en) 2019-11-01 2019-11-01 Novel physical vapor deposition equipment

Country Status (1)

Country Link
CN (1) CN210636066U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113789500A (en) * 2021-08-04 2021-12-14 湖北三峡职业技术学院 Ion plating device and method for automatically adjusting ion beam sputtering angle and incidence angle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113789500A (en) * 2021-08-04 2021-12-14 湖北三峡职业技术学院 Ion plating device and method for automatically adjusting ion beam sputtering angle and incidence angle
CN113789500B (en) * 2021-08-04 2023-07-25 湖北三峡职业技术学院 Ion plating device and method capable of automatically adjusting sputtering angle and incidence angle of ion beam

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