CN109182991B - Relative movement mechanism of magnetron sputtering coating device suitable for coating film on conformal substrate surface and coating method thereof - Google Patents

Relative movement mechanism of magnetron sputtering coating device suitable for coating film on conformal substrate surface and coating method thereof Download PDF

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Publication number
CN109182991B
CN109182991B CN201811313451.5A CN201811313451A CN109182991B CN 109182991 B CN109182991 B CN 109182991B CN 201811313451 A CN201811313451 A CN 201811313451A CN 109182991 B CN109182991 B CN 109182991B
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target head
target
lifting
coating
vacuum chamber
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CN109182991A (en
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朱嘉琦
杨振怀
杨磊
郭帅
高岗
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Harbin Institute of Technology
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Harbin Institute of Technology
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate

Abstract

A relative movement mechanism of a magnetron sputtering coating device and a coating method thereof suitable for coating the surface of a conformal substrate relate to a relative movement mechanism of a magnetron sputtering coating device and a coating method. The purpose is to solve the problem that the magnetron sputtering device has large difficulty in uniformly coating the film on the surface of the conformal structure. The mechanism consists of a movable sample platform and a swinging target head; the bottom of the groove of the target head track in the swing target head is provided with steps which rise from the left end to the right end, and the adjacent steps are arc transition surfaces; the walking wheel of the target head bracket is arranged in the target head track. In the device, the target head support can swing up and down in the process of moving back and forth along the bottom of the target head track, and the target head support can drive the target head to move back and forth and swing up and down at the same time, so that the orientation of the target head is changed; and realizing conformal substrate surface coating. The device avoids the use of a mask plate, further improves the deposition rate and solves the problem of uniform film coating on the conformal surface. The invention is suitable for coating the surface of the conformal substrate.

Description

Relative movement mechanism of magnetron sputtering coating device suitable for coating film on conformal substrate surface and coating method thereof
Technical Field
The invention relates to a relative movement mechanism of a magnetron sputtering coating device and a coating method thereof.
Background
At present, with the wide application of conformal structural functional components in the field of civil science (such as conformal optical elements, conformal corrosion-resistant components, etc.), the deposition of a uniform functional film layer on a conformal surface becomes a very urgent need. Compared with the existing mature process for uniformly coating the surfaces of the plane and the hemisphere, the process for uniformly coating the surface of the ellipsoid is too complex as a conformal surface of a part of the ellipsoid, and is difficult to realize a deposition process with a universal effect.
The deposition of the functional film layer on the surface of the conformal functional component is mostly realized by magnetron sputtering equipment. The process needs to add a mask plate as an aid, the appearance of the mask plate needs to be designed, and the relative position of the mask plate is not easy to select, so that the process parameter regulation and control variable is invisibly increased, and the uniform deposition process is extremely complex. In addition, when the magnetron sputtering coating is carried out by adopting a mask plate mode, a part of coating materials are necessarily shielded by the mask plate, the target material is seriously wasted, and the film layer deposition efficiency is reduced. In conclusion, the conventional magnetron sputtering device has high difficulty in uniformly coating the surface of the conformal structure.
Disclosure of Invention
The invention provides a relative movement mechanism of a magnetron sputtering coating device and a coating method thereof, which are suitable for coating the surface of a conformal substrate, and aims to solve the problem that the conventional magnetron sputtering device has high difficulty in uniformly coating the surface of the conformal structure.
The relative movement mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate consists of a movable sample platform and a swinging target head;
the movable sample stage consists of a lower vacuum chamber flange, a sample frame supporting plate, a sample frame, a driving gear shaft, a rotating motor bracket, a lifting rod, a lifting block, a lifting threaded rod and a lifting motor; the sample rack consists of a sample rack top plate, a sample rack bottom plate and a plurality of supporting rods; the sample rack bottom plate is disc-shaped, and gear teeth are arranged on the outer edge of the sample rack bottom plate; the sample rack top plate and the sample rack bottom plate are arranged in parallel, the supporting rod is arranged between the sample rack top plate and the sample rack bottom plate, the upper end of the supporting rod is fixedly connected with the sample rack top plate, and the lower end of the supporting rod is fixedly connected with the sample rack bottom plate; the lower vacuum chamber flange is disc-shaped, the center of the lower vacuum chamber flange is provided with a lifting rod through hole, and a driving gear shaft through hole is arranged beside the lifting rod through hole; the lower vacuum chamber flange is horizontally arranged, and the lifting rod is vertically arranged in the lifting rod through hole; the lifting block is in a cube shape, a through hole is formed in the lifting block, and an internal thread is arranged in the through hole in the lifting block; the lower end of the lifting rod is fixedly connected to the side part of the through hole in the lifting block, a lifting threaded rod is arranged in the through hole of the lifting block, the lifting threaded rod is an external threaded rod, and the thread of the lifting threaded rod is matched with the internal thread of the through hole in the lifting block; the lower end of the lifting threaded rod is sleeved with a driven gear, a power output gear is sleeved on a power output shaft of the lifting motor, and the driven gear is connected with the power output gear through a crawler; the upper end of the lifting rod is fixedly connected with a horizontally arranged sample frame supporting plate, the surface of the sample frame supporting plate is provided with an annular groove, the lower surface of a sample frame bottom plate is provided with a second annular groove corresponding to the annular groove, the sample frame bottom plate is arranged above the sample frame supporting plate, and a ball is arranged between the annular groove and the second annular groove; the rotating motor bracket is horizontally arranged, one end of the rotating motor bracket is fixedly connected with the middle part of the lifting rod, the upper surface of the rotating motor bracket is provided with a rotating motor, a power output shaft of the rotating motor is connected with the lower end of a driving gear shaft, the upper end of the driving gear shaft penetrates through a hole in the driving gear shaft and is arranged, the upper end of the driving gear shaft is provided with a driving gear, and the driving gear is meshed with gear teeth arranged on the outer edge of the bottom plate;
the swing target head consists of a target head, a target head bracket, a corrugated pipe, a side vacuum chamber flange, a target head supporting pipe, a target head sliding seat, a coupling, a target head driving motor, a threaded push rod and a target head track; the side vacuum chamber flange is vertically arranged, a target head supporting tube through hole is formed in the center of the side vacuum chamber flange, and the target head supporting tube is horizontally arranged in the target head supporting tube through hole; the target head sliding seat is vertically arranged in a rectangular shape, the upper part of the target head sliding seat is fixedly connected with the right end of the target head supporting tube, the lower part of the target head sliding seat is provided with a horizontal through hole, the threaded push rod is arranged in the horizontal through hole at the lower part of the target head sliding seat, and an internal thread matched with the threaded push rod is arranged in the horizontal through hole at the lower part of the target head sliding seat; the right end of the threaded push rod is connected with a coupler, and the coupler is arranged on a power output shaft of the target head driving motor; the left end of the target head supporting tube is connected with a corrugated tube, and a connecting tube is arranged between the left end of the corrugated tube and the target head; the upper end of the target head bracket is provided with a hoop which is sleeved on a connecting pipe between the left end of the corrugated pipe and the target head; the lower end of the target head bracket is provided with a travelling wheel; the target head rail is groove-shaped, the bottom of the groove of the target head rail is provided with steps which rise from the left end to the right end, and an arc transition surface is arranged between every two adjacent steps; the traveling wheels are arranged in the target head track;
the rotating center line of the threaded push rod in the swinging target head is perpendicular to the rotating center line of the lifting rod in the movable sample table, and the target head is arranged on one side of a top plate of the sample rack.
A mechanical seal is arranged between the lifting rod and the lifting rod through hole; a mechanical seal is arranged between the driving gear shaft and the driving gear shaft through hole; and a mechanical seal is arranged between the target head supporting tube through hole and the target head supporting tube.
The method for coating the conformal substrate surface by utilizing the relative movement mechanism of the magnetron sputtering coating device suitable for coating the conformal substrate surface comprises the following steps:
firstly, extending a target head, a target head bracket, a corrugated pipe and a target head track into a target head mounting pipe in a magnetron sputtering coating device, and connecting a side vacuum chamber flange of a swinging target head with a target head mounting flange plate arranged at the end part of the target head mounting pipe; a sample frame supporting plate, a sample frame and a driving gear are extended into a vacuum chamber in a magnetron sputtering coating device, and a lower vacuum chamber flange of a movable sample table is connected with a vacuum chamber sealing flange arranged at the bottom open end of the vacuum chamber in the magnetron sputtering coating device;
secondly, preparation before film coating:
cleaning the target material and the conformal substrate to obtain a clean target material, then mounting the clean target material on a target head, simultaneously clamping the conformal substrate on a sample rack top plate of a sample bracket, and vacuumizing a vacuum chamber in the magnetron sputtering coating device;
the vacuum chamber in the magnetron sputtering coating device is vacuumized to 5.0 multiplied by 10-5～8.0×10-4Pa；
The cleaning process of the target and the conformal substrate comprises the following steps: sequentially placing the target and the conformal substrate in acetone, alcohol and deionized water, and respectively cleaning for 10-15 min under the condition that the ultrasonic power is 300-600W;
step setting of target head
The step number of the target heads is adjusted to be 10-50 times through a target head driving motor, the step distance is 5-30 mm, and the residence time at each position is 20-500 s;
setting the rotating speed and the lifting speed of the sample rack
Adjusting the rotating speed of the sample rack to be 1-20 r/min by rotating a motor; adjusting the lifting speed of the sample rack to be 1-200 mm/min by a lifting motor;
fifthly, film coating:
heating the temperature of a vacuum chamber in a magnetron sputtering coating device to 100-600 ℃, and preserving the heat for 30-60 min; then introducing argon into the vacuum chamber, and then starting coating; and after the film coating is finished, closing the power supply of the magnetron sputtering film coating device, and finishing after the temperature in the vacuum chamber is reduced to 25-70 ℃.
In the coating process, the target power parameters are set as follows: the power is 100-300W, the pulse width is set to be 10-100 mus, and the frequency is set to be 100-3000 Hz;
the pressure of the argon is 0.1-1.0 Pa;
the principle and the beneficial effects of the invention are as follows:
the invention is suitable for a relative motion mechanism of a magnetron sputtering coating device for coating a film on the surface of a conformal substrate, a lifting motor rotates to drive a lifting block to move up and down along a lifting threaded rod, and the lifting block drives a driving gear, a driving gear shaft, a rotating motor, a sample rack supporting plate and a sample rack to move up and down; the rotating motor drives the driving gear to rotate after rotating, the driving gear is meshed with gear teeth arranged on the outer edge of the sample rack bottom plate, and the driving gear rotates to drive the sample rack bottom plate to rotate, so that the rotation of the conformal substrate is finally realized; the target head driving motor rotates to drive the target head sliding seat to move back and forth, the head sliding seat drives the target head, the target head support, the corrugated pipe, the target head track and the target head supporting pipe to move back and forth, the traveling wheels arranged at the lower end of the target head support are arranged in the target head track, the traveling wheels are driven by the target head support to move back and forth along the groove bottom of the target head track, and the target head support can swing up and down in the process of moving back and forth along the groove bottom of the target head track due to the ladder that the groove bottom of the target head track rises from the left end to the right end;
the magnetron sputtering coating device relative motion mechanism suitable for coating the conformal substrate surface can realize uniform deposition coating of the conformal surface, only adjusts the motion parameters of the movable sample platform and the swinging target head in the coating process, realizes the up-and-down swinging and the back-and-forth movement of the target head by utilizing the stepped bottom surface of the target head track, further realizes the adjustment of the orientation of the target head, realizes the functions of controlling the distance from the target material to the sample surface and sequentially aligning the target head to all conformal substrate surfaces under the coordination of the rotation and the lifting of the movable sample platform and the back-and-forth movement and the up-and-down swinging of the target head, and realizes the coating of the conformal substrate surface. The use of a mask plate is avoided in the film coating process, and the deposition rate is further improved. The error between the thickness of the film layer of the prepared film and the target value is within +/-3 percent, and the problem that the coating difficulty of the conventional magnetron sputtering device for uniformly depositing the film on the surface of the conformal structure is high is solved.
Drawings
FIG. 1 is a schematic structural view of a movable sample stage, wherein d is a conformal base;
FIG. 2 is a schematic view of the construction of a wobble target;
FIG. 3 is a schematic diagram of the construction of sample holder pallet 102;
fig. 4 is a schematic structural diagram of a vacuum chamber in a magnetron sputtering coating device, wherein a is a main body of the vacuum chamber and b is a target head mounting tube.
The specific implementation mode is as follows:
the technical scheme of the invention is not limited to the specific embodiments listed below, and any reasonable combination of the specific embodiments is included.
The first embodiment is as follows: the embodiment is described with reference to fig. 1 to 4, and the relative movement mechanism of the magnetron sputtering coating device suitable for coating the conformal substrate surface in the embodiment is composed of a movable sample stage and a swinging target head;
the movable sample stage is composed of a lower vacuum chamber flange 101, a sample frame supporting plate 102, a sample frame, a driving gear 106, a driving gear shaft 107, a rotating motor 108, a rotating motor bracket 109, a lifting rod 110, a lifting block 111, a lifting threaded rod 112 and a lifting motor 113; the sample holder is composed of a sample holder top plate 103, a sample holder bottom plate 104 and a plurality of supporting rods 105; the sample holder bottom plate 104 is disc-shaped, and gear teeth are arranged on the outer edge of the sample holder bottom plate 104; the sample rack top plate 103 and the sample rack bottom plate 104 are arranged in parallel, the support rod 105 is arranged between the sample rack top plate 103 and the sample rack bottom plate 104, the upper end of the support rod 105 is fixedly connected with the sample rack top plate 103, and the lower end of the support rod 105 is fixedly connected with the sample rack bottom plate 104; the lower vacuum chamber flange 101 is disc-shaped, the center of the lower vacuum chamber flange 101 is provided with a lifting rod through hole, and a driving gear shaft through hole is arranged beside the lifting rod through hole; the lower vacuum chamber flange 101 is horizontally arranged, and the lifting rod 110 is vertically arranged in the lifting rod through hole; the lifting block 111 is in a cube shape, a through hole is formed in the lifting block 111, and an internal thread is arranged in the through hole in the lifting block 111; the lower end of the lifting rod 110 is fixedly connected to the side part of the through hole in the lifting block 111, a lifting threaded rod 112 is arranged in the through hole in the lifting block 111, the lifting threaded rod 112 is an external threaded rod, and the thread of the lifting threaded rod 112 is matched with the internal thread of the through hole in the lifting block 111; a driven gear is sleeved at the lower end of the lifting threaded rod 112, a power output gear is sleeved on a power output shaft of the lifting motor 113, and the driven gear and the power output gear are connected through a crawler; the upper end of the lifting rod 110 is fixedly connected with a horizontally arranged sample frame supporting plate 102, the surface of the sample frame supporting plate 102 is provided with an annular groove 3, the lower surface of the sample frame bottom plate 104 is provided with a second annular groove corresponding to the annular groove 3, the sample frame bottom plate 104 is arranged above the sample frame supporting plate 102, and a ball is arranged between the annular groove 3 and the second annular groove; the rotating motor bracket 109 is horizontally arranged, one end of the rotating motor bracket 109 is fixedly connected with the middle part of the lifting rod 110, the rotating motor 108 is arranged on the upper surface of the rotating motor bracket 109, a power output shaft of the rotating motor 108 is connected with the lower end of the driving gear shaft 107, the upper end of the driving gear shaft 107 penetrates through a driving gear shaft through hole to be arranged, the driving gear 106 is arranged at the upper end of the driving gear shaft 107, and the driving gear 106 is meshed with gear teeth arranged on the outer edge of the sample rack bottom plate 104;
the swing target head is composed of a target head 201, a target head bracket 202, a corrugated pipe 203, a side vacuum chamber flange 204, a target head supporting pipe 205, a target head slide seat 206, a coupling 207, a target head driving motor 208, a threaded push rod 209 and a target head track 211; the side vacuum chamber flange 204 is vertically arranged, a target supporting tube through hole is arranged at the center of the side vacuum chamber flange 204, and the target supporting tube 205 is horizontally arranged in the target supporting tube through hole; the target head slide seat 206 is vertically arranged in a cuboid shape, the upper part of the target head slide seat 206 is fixedly connected with the right end of the target head support tube 205, the lower part of the target head slide seat 206 is provided with a horizontal through hole, the threaded push rod 209 is arranged in the horizontal through hole at the lower part of the target head slide seat 206, and the horizontal through hole at the lower part of the target head slide seat 206 is internally provided with an internal thread matched with the threaded push rod 209; the right end of the threaded push rod 209 is connected with a coupling 207, and the coupling 207 is arranged on the power output shaft of the target head driving motor 208; the left end of the target head supporting tube 205 is connected with a corrugated tube 203, and a connecting tube is arranged between the left end of the corrugated tube 203 and the target head 201; a hoop is arranged at the upper end of the target head support 202, and is sleeved on a connecting pipe between the left end of the corrugated pipe 203 and the target head 201; the lower end of the target head bracket 202 is provided with a travelling wheel; the target head track 211 is groove-shaped, the bottom of the groove of the target head track 211 is provided with steps which rise from the left end to the right end, and an arc transition surface is arranged between the adjacent steps; the traveling wheels are arranged in the target head track 211;
the rotating center line of the threaded push rod 209 in the swinging target head is perpendicular to the rotating center line of the lifting rod 110 in the movable sample platform, and the target head 201 is arranged on one side of the sample rack top plate 103.
The embodiment has the following beneficial effects:
in the relative movement mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate, the lifting motor 113 rotates to drive the lifting block 111 to move up and down along the lifting threaded rod 112, and the lifting block 111 drives the driving gear 106, the driving gear shaft 107, the rotating motor 108, the sample rack supporting plate 102 and the sample rack to move up and down; the rotation motor 108 rotates to drive the driving gear 106 to rotate, the driving gear 106 is meshed with gear teeth arranged on the outer edge of the sample holder bottom plate 104, the driving gear 106 rotates to drive the sample holder bottom plate 104 to rotate, and finally the rotation of the conformal substrate is realized; the target head driving motor 208 rotates to drive the target head sliding seat 206 to move back and forth, the head sliding seat 206 drives the target head 201, the target head support 202, the corrugated pipe 203, the target head track 211 and the target head supporting pipe 205 to move back and forth, a traveling wheel arranged at the lower end of the target head support 202 is arranged in the target head track 211, the traveling wheel is driven by the target head support 202 to move back and forth along the groove bottom of the target head track 211, and the target head support 202 can swing up and down in the process of moving back and forth along the groove bottom of the target head track 211 due to a step that the groove bottom of the target head track 211 ascends from the left end to the right end, so the target head support 202 can drive the target head 201 to move back and forth and swing up and down at the same time;
this embodiment is applicable to the magnetron sputtering coating device relative motion mechanism of conformal basement surface coating film and can realize the even deposit coating film of conformal surface, only adjust activity sample platform and swing target head motion parameter in the coating film process, utilize the ladder bottom surface of target head track 211 to realize the luffing motion and the back-and-forth movement of target head 201, and then realize the adjustment of the orientation of target head 201, under the cooperation that activity sample platform rotates and goes up and down, and target head 201 back-and-forth movement and luffing motion, realize the distance of control target to the sample surface and the function that target head 201 aims at whole conformal basement surface in proper order, realize conformal basement surface coating film. The use of a mask plate is avoided in the film coating process, and the deposition rate is further improved. The error between the thickness of the film layer of the prepared film and the target value is within +/-3 percent, and the problem that the coating difficulty of the conventional magnetron sputtering device for uniformly depositing the film on the surface of the conformal structure is high is solved.
The second embodiment is as follows: the first difference between the present embodiment and the specific embodiment is: a mechanical seal is arranged between the lifting rod 110 and the lifting rod through hole; a mechanical seal is arranged between the driving gear shaft 107 and the driving gear shaft through hole; a mechanical seal is provided between the target support tube passage hole and the target support tube 205. Other steps and parameters are the same as in the first embodiment.
The third concrete implementation mode: the method for coating the conformal substrate surface by using the relative movement mechanism of the magnetron sputtering coating device suitable for coating the conformal substrate surface is carried out according to the following steps:
firstly, extending a target 201, a target bracket 202, a corrugated pipe 203 and a target track 211 into a target mounting pipe in a magnetron sputtering coating device, and connecting a side vacuum chamber flange 204 of a swinging target with a target mounting flange plate arranged at the end part of the target mounting pipe; extending a sample rack supporting plate 102, a sample rack and a driving gear 106 into a vacuum chamber in a magnetron sputtering coating device, wherein a lower vacuum chamber flange 101 of a movable sample platform is connected with a vacuum chamber sealing flange arranged at the open end part of the bottom of the vacuum chamber in the magnetron sputtering coating device;
secondly, preparation before film coating:
cleaning the target material and the conformal substrate to obtain a clean target material, then mounting the clean target material on a target head 201, simultaneously clamping the conformal substrate on a sample rack top plate 103 of a sample bracket, and vacuumizing a vacuum chamber in the magnetron sputtering coating device;
step setting of target head
The step number of the target heads 201 is adjusted to be 10-50 times through the target head driving motor 208, the step distance is 5-30 mm, and the residence time at each position is 20-500 s;
setting the rotating speed and the lifting speed of the sample rack
The rotating speed of the sample rack is adjusted to be 1-20 r/min by rotating the motor 108; adjusting the lifting speed of the sample rack to be 1-200 mm/min by a lifting motor 113;
fifthly, film coating:
heating the temperature of a vacuum chamber in a magnetron sputtering coating device to 100-600 ℃, and preserving the heat for 30-60 min; then introducing argon into the vacuum chamber, and then starting coating; and after the film coating is finished, closing the power supply of the magnetron sputtering film coating device, and finishing after the temperature in the vacuum chamber is reduced to 25-70 ℃.
The embodiment has the following beneficial effects:
in the relative movement mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate, the lifting motor 113 rotates to drive the lifting block 111 to move up and down along the lifting threaded rod 112, and the lifting block 111 drives the driving gear 106, the driving gear shaft 107, the rotating motor 108, the sample rack supporting plate 102 and the sample rack to move up and down; the rotation motor 108 rotates to drive the driving gear 106 to rotate, the driving gear 106 is meshed with gear teeth arranged on the outer edge of the sample holder bottom plate 104, the driving gear 106 rotates to drive the sample holder bottom plate 104 to rotate, and finally the rotation of the conformal substrate is realized; the target head driving motor 208 rotates to drive the target head sliding seat 206 to move back and forth, the head sliding seat 206 drives the target head 201, the target head support 202, the corrugated pipe 203, the target head track 211 and the target head supporting pipe 205 to move back and forth, a traveling wheel arranged at the lower end of the target head support 202 is arranged in the target head track 211, the traveling wheel is driven by the target head support 202 to move back and forth along the groove bottom of the target head track 211, and the target head support 202 can swing up and down in the process of moving back and forth along the groove bottom of the target head track 211 due to a step that the groove bottom of the target head track 211 ascends from the left end to the right end, so the target head support 202 can drive the target head 201 to move back and forth and swing up and down at the same time;
this embodiment is applicable to the magnetron sputtering coating device relative motion mechanism of conformal basement surface coating film and can realize the even deposit coating film of conformal surface, only adjust activity sample platform and swing target head motion parameter in the coating film process, utilize the ladder bottom surface of target head track 211 to realize the luffing motion and the back-and-forth movement of target head 201, and then realize the adjustment of the orientation of target head 201, under the cooperation that activity sample platform rotates and goes up and down, and target head 201 back-and-forth movement and luffing motion, realize the distance of control target to the sample surface and the function that target head 201 aims at whole conformal basement surface in proper order, realize conformal basement surface coating film. The use of a mask plate is avoided in the film coating process, and the deposition rate is further improved. The error between the thickness of the film layer of the prepared film and the target value is within +/-3 percent, and the problem that the coating difficulty of the conventional magnetron sputtering device for uniformly depositing the film on the surface of the conformal structure is high is solved.
The fourth concrete implementation mode: the third difference between the present embodiment and the specific embodiment is that: step two, vacuum pumping is carried out on the vacuum chamber in the magnetron sputtering coating device to 5.0 multiplied by 10-5～8.0×10-4Pa. Other steps and parameters are the same as those in the third embodiment.
The fifth concrete implementation mode: this embodiment is different from the third or fourth embodiment in that: and step two, the process for cleaning the target and the conformal substrate comprises the following steps: and sequentially placing the target and the conformal substrate in acetone, alcohol and deionized water, and respectively cleaning for 10-15 min under the condition that the ultrasonic power is 300-600W. The other steps and parameters are the same as those of the third or fourth embodiment.
The sixth specific implementation mode: the difference between this embodiment and one of the third to fifth embodiments is: fifthly, in the coating process, the target power parameters are set as follows: the power is 100-300W, the pulse width is set to be 10-100 mus, and the frequency is set to be 100-3000 Hz. Other steps and parameters are the same as in one of the third to fifth embodiments.
The seventh embodiment: this embodiment differs from one of the third to sixth embodiments in that: fifthly, the pressure of the argon is 0.1-1.0 Pa. Other steps and parameters are the same as in one of the third to sixth embodiments.
The following examples were used to demonstrate the beneficial effects of the present invention:
example 1:
the relative motion mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate comprises a movable sample platform and a swinging target head;
the movable sample stage is composed of a lower vacuum chamber flange 101, a sample frame supporting plate 102, a sample frame, a driving gear 106, a driving gear shaft 107, a rotating motor 108, a rotating motor bracket 109, a lifting rod 110, a lifting block 111, a lifting threaded rod 112 and a lifting motor 113; the sample holder is composed of a sample holder top plate 103, a sample holder bottom plate 104 and a plurality of supporting rods 105; the sample holder bottom plate 104 is disc-shaped, and gear teeth are arranged on the outer edge of the sample holder bottom plate 104; the sample rack top plate 103 and the sample rack bottom plate 104 are arranged in parallel, the support rod 105 is arranged between the sample rack top plate 103 and the sample rack bottom plate 104, the upper end of the support rod 105 is fixedly connected with the sample rack top plate 103, and the lower end of the support rod 105 is fixedly connected with the sample rack bottom plate 104; the lower vacuum chamber flange 101 is disc-shaped, the center of the lower vacuum chamber flange 101 is provided with a lifting rod through hole, and a driving gear shaft through hole is arranged beside the lifting rod through hole; the lower vacuum chamber flange 101 is horizontally arranged, and the lifting rod 110 is vertically arranged in the lifting rod through hole; the lifting block 111 is in a cube shape, a through hole is formed in the lifting block 111, and an internal thread is arranged in the through hole in the lifting block 111; the lower end of the lifting rod 110 is fixedly connected to the side part of the through hole in the lifting block 111, a lifting threaded rod 112 is arranged in the through hole in the lifting block 111, the lifting threaded rod 112 is an external threaded rod, and the thread of the lifting threaded rod 112 is matched with the internal thread of the through hole in the lifting block 111; a driven gear is sleeved at the lower end of the lifting threaded rod 112, a power output gear is sleeved on a power output shaft of the lifting motor 113, and the driven gear and the power output gear are connected through a crawler; the upper end of the lifting rod 110 is fixedly connected with a horizontally arranged sample frame supporting plate 102, the surface of the sample frame supporting plate 102 is provided with an annular groove 3, the lower surface of the sample frame bottom plate 104 is provided with a second annular groove corresponding to the annular groove 3, the sample frame bottom plate 104 is arranged above the sample frame supporting plate 102, and a ball is arranged between the annular groove 3 and the second annular groove; the rotating motor bracket 109 is horizontally arranged, one end of the rotating motor bracket 109 is fixedly connected with the middle part of the lifting rod 110, the rotating motor 108 is arranged on the upper surface of the rotating motor bracket 109, a power output shaft of the rotating motor 108 is connected with the lower end of the driving gear shaft 107, the upper end of the driving gear shaft 107 penetrates through a driving gear shaft through hole to be arranged, the driving gear 106 is arranged at the upper end of the driving gear shaft 107, and the driving gear 106 is meshed with gear teeth arranged on the outer edge of the sample rack bottom plate 104;
the swing target head is composed of a target head 201, a target head bracket 202, a corrugated pipe 203, a side vacuum chamber flange 204, a target head supporting pipe 205, a target head slide seat 206, a coupling 207, a target head driving motor 208, a threaded push rod 209 and a target head track 211; the side vacuum chamber flange 204 is vertically arranged, a target supporting tube through hole is arranged at the center of the side vacuum chamber flange 204, and the target supporting tube 205 is horizontally arranged in the target supporting tube through hole; the target head slide seat 206 is vertically arranged in a cuboid shape, the upper part of the target head slide seat 206 is fixedly connected with the right end of the target head support tube 205, the lower part of the target head slide seat 206 is provided with a horizontal through hole, the threaded push rod 209 is arranged in the horizontal through hole at the lower part of the target head slide seat 206, and the horizontal through hole at the lower part of the target head slide seat 206 is internally provided with an internal thread matched with the threaded push rod 209; the right end of the threaded push rod 209 is connected with a coupling 207, and the coupling 207 is arranged on the power output shaft of the target head driving motor 208; the left end of the target head supporting tube 205 is connected with a corrugated tube 203, and a connecting tube is arranged between the left end of the corrugated tube 203 and the target head 201; a hoop is arranged at the upper end of the target head support 202, and is sleeved on a connecting pipe between the left end of the corrugated pipe 203 and the target head 201; the lower end of the target head bracket 202 is provided with a travelling wheel; the target head track 211 is groove-shaped, the bottom of the groove of the target head track 211 is provided with steps which rise from the left end to the right end, and an arc transition surface is arranged between the adjacent steps; the traveling wheels are arranged in the target head track 211; the rotating center line of the threaded push rod 209 in the swinging target head is perpendicular to the rotating center line of the lifting rod 110 in the movable sample platform, and the target head 201 is arranged on one side of the sample rack top plate 103.
A mechanical seal is arranged between the lifting rod 110 and the lifting rod through hole; a mechanical seal is arranged between the driving gear shaft 107 and the driving gear shaft through hole; a mechanical seal is provided between the target support tube passage hole and the target support tube 205.
The method for coating the conformal substrate surface by utilizing the relative movement mechanism of the magnetron sputtering coating device suitable for coating the conformal substrate surface comprises the following steps:
firstly, extending a target 201, a target bracket 202, a corrugated pipe 203 and a target track 211 into a target mounting pipe in a magnetron sputtering coating device, and connecting a side vacuum chamber flange 204 of a swinging target with a target mounting flange plate arranged at the end part of the target mounting pipe; extending a sample rack supporting plate 102, a sample rack and a driving gear 106 into a vacuum chamber in a magnetron sputtering coating device, wherein a lower vacuum chamber flange 101 of a movable sample platform is connected with a vacuum chamber sealing flange arranged at the open end part of the bottom of the vacuum chamber in the magnetron sputtering coating device;
secondly, preparation before film coating:
cleaning the target material and the conformal substrate to obtain a clean target material, then mounting the clean target material on a target head 201, simultaneously clamping the conformal substrate on a sample rack top plate 103 of a sample bracket, and vacuumizing a vacuum chamber in the magnetron sputtering coating device;
the vacuum chamber in the magnetron sputtering coating device is vacuumized to 5.0 multiplied by 10-5Pa；
The cleaning process of the target and the conformal substrate comprises the following steps: sequentially placing the target material and the conformal substrate in acetone, alcohol and deionized water, and respectively cleaning for 10min under the condition that the ultrasonic power is 300W;
step setting of target head
The step number of the target heads 201 is adjusted to be 10-50 times through the target head driving motor 208, the step distance is 5-30 mm, and the residence time at each position is 20 s;
setting the rotating speed and the lifting speed of the sample rack
The rotating speed of the sample holder is adjusted to be 1r/min by rotating the motor 108; the lifting speed of the sample rack is adjusted to be 1mm/min through the lifting motor 113;
fifthly, film coating:
heating the temperature of a vacuum chamber in a magnetron sputtering coating device to 100 ℃, and preserving the temperature for 30 min; then introducing argon into the vacuum chamber, and then starting coating; and after the coating is finished, closing the power supply of the magnetron sputtering coating device, and finishing after the temperature in the vacuum chamber is reduced to 25 ℃.
In the coating process, the target power parameters are set as follows: power 100W, pulse width set to 10 mus, frequency set to 100 Hz;
the pressure of the argon is 0.1 Pa;
the target material adopted in the coating process in the embodiment 1 is a metal titanium target, and the error between the film thickness of the film prepared in the embodiment 1 and the target value is within +/-3%, so that the problem that the conventional magnetron sputtering device is difficult to uniformly deposit and coat on the surface of the conformal structure is solved.
Example 2:
the relative motion mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate comprises a movable sample platform and a swinging target head;
the movable sample stage is composed of a lower vacuum chamber flange 101, a sample frame supporting plate 102, a sample frame, a driving gear 106, a driving gear shaft 107, a rotating motor 108, a rotating motor bracket 109, a lifting rod 110, a lifting block 111, a lifting threaded rod 112 and a lifting motor 113; the sample holder is composed of a sample holder top plate 103, a sample holder bottom plate 104 and a plurality of supporting rods 105; the sample holder bottom plate 104 is disc-shaped, and gear teeth are arranged on the outer edge of the sample holder bottom plate 104; the sample rack top plate 103 and the sample rack bottom plate 104 are arranged in parallel, the support rod 105 is arranged between the sample rack top plate 103 and the sample rack bottom plate 104, the upper end of the support rod 105 is fixedly connected with the sample rack top plate 103, and the lower end of the support rod 105 is fixedly connected with the sample rack bottom plate 104; the lower vacuum chamber flange 101 is disc-shaped, the center of the lower vacuum chamber flange 101 is provided with a lifting rod through hole, and a driving gear shaft through hole is arranged beside the lifting rod through hole; the lower vacuum chamber flange 101 is horizontally arranged, and the lifting rod 110 is vertically arranged in the lifting rod through hole; the lifting block 111 is in a cube shape, a through hole is formed in the lifting block 111, and an internal thread is arranged in the through hole in the lifting block 111; the lower end of the lifting rod 110 is fixedly connected to the side part of the through hole in the lifting block 111, a lifting threaded rod 112 is arranged in the through hole in the lifting block 111, the lifting threaded rod 112 is an external threaded rod, and the thread of the lifting threaded rod 112 is matched with the internal thread of the through hole in the lifting block 111; a driven gear is sleeved at the lower end of the lifting threaded rod 112, a power output gear is sleeved on a power output shaft of the lifting motor 113, and the driven gear and the power output gear are connected through a crawler; the upper end of the lifting rod 110 is fixedly connected with a horizontally arranged sample frame supporting plate 102, the surface of the sample frame supporting plate 102 is provided with an annular groove 3, the lower surface of the sample frame bottom plate 104 is provided with a second annular groove corresponding to the annular groove 3, the sample frame bottom plate 104 is arranged above the sample frame supporting plate 102, and a ball is arranged between the annular groove 3 and the second annular groove; the rotating motor bracket 109 is horizontally arranged, one end of the rotating motor bracket 109 is fixedly connected with the middle part of the lifting rod 110, the rotating motor 108 is arranged on the upper surface of the rotating motor bracket 109, a power output shaft of the rotating motor 108 is connected with the lower end of the driving gear shaft 107, the upper end of the driving gear shaft 107 penetrates through a driving gear shaft through hole to be arranged, the driving gear 106 is arranged at the upper end of the driving gear shaft 107, and the driving gear 106 is meshed with gear teeth arranged on the outer edge of the sample rack bottom plate 104;
the swing target head is composed of a target head 201, a target head bracket 202, a corrugated pipe 203, a side vacuum chamber flange 204, a target head supporting pipe 205, a target head slide seat 206, a coupling 207, a target head driving motor 208, a threaded push rod 209 and a target head track 211; the side vacuum chamber flange 204 is vertically arranged, a target supporting tube through hole is arranged at the center of the side vacuum chamber flange 204, and the target supporting tube 205 is horizontally arranged in the target supporting tube through hole; the target head slide seat 206 is vertically arranged in a cuboid shape, the upper part of the target head slide seat 206 is fixedly connected with the right end of the target head support tube 205, the lower part of the target head slide seat 206 is provided with a horizontal through hole, the threaded push rod 209 is arranged in the horizontal through hole at the lower part of the target head slide seat 206, and the horizontal through hole at the lower part of the target head slide seat 206 is internally provided with an internal thread matched with the threaded push rod 209; the right end of the threaded push rod 209 is connected with a coupling 207, and the coupling 207 is arranged on the power output shaft of the target head driving motor 208; the left end of the target head supporting tube 205 is connected with a corrugated tube 203, and a connecting tube is arranged between the left end of the corrugated tube 203 and the target head 201; a hoop is arranged at the upper end of the target head support 202, and is sleeved on a connecting pipe between the left end of the corrugated pipe 203 and the target head 201; the lower end of the target head bracket 202 is provided with a travelling wheel; the target head track 211 is groove-shaped, the bottom of the groove of the target head track 211 is provided with steps which rise from the left end to the right end, and an arc transition surface is arranged between the adjacent steps; the traveling wheels are arranged in the target head track 211; the rotating center line of the threaded push rod 209 in the swinging target head is perpendicular to the rotating center line of the lifting rod 110 in the movable sample platform, and the target head 201 is arranged on one side of the sample rack top plate 103.
A mechanical seal is arranged between the lifting rod 110 and the lifting rod through hole; a mechanical seal is arranged between the driving gear shaft 107 and the driving gear shaft through hole; a mechanical seal is provided between the target support tube passage hole and the target support tube 205.
The method for coating the conformal substrate surface by utilizing the relative movement mechanism of the magnetron sputtering coating device suitable for coating the conformal substrate surface comprises the following steps:
firstly, extending a target 201, a target bracket 202, a corrugated pipe 203 and a target track 211 into a target mounting pipe in a magnetron sputtering coating device, and connecting a side vacuum chamber flange 204 of a swinging target with a target mounting flange plate arranged at the end part of the target mounting pipe; extending a sample rack supporting plate 102, a sample rack and a driving gear 106 into a vacuum chamber in a magnetron sputtering coating device, wherein a lower vacuum chamber flange 101 of a movable sample platform is connected with a vacuum chamber sealing flange arranged at the open end part of the bottom of the vacuum chamber in the magnetron sputtering coating device;
secondly, preparation before film coating:
cleaning the target material and the conformal substrate to obtain a clean target material, then mounting the clean target material on a target head 201, simultaneously clamping the conformal substrate on a sample rack top plate 103 of a sample bracket, and vacuumizing a vacuum chamber in the magnetron sputtering coating device;
the vacuum chamber in the magnetron sputtering coating device is vacuumized to 8.0 multiplied by 10-4Pa；
The cleaning process of the target and the conformal substrate comprises the following steps: sequentially placing the target material and the conformal substrate in acetone, alcohol and deionized water, and respectively cleaning for 15min under the condition that the ultrasonic power is 600W;
step setting of target head
The step number of the target head 201 is adjusted to be 50 times by the target head driving motor 208, the step distance is 30mm, and the stay time at each position is 500 s;
setting the rotating speed and the lifting speed of the sample rack
The rotating speed of the sample holder is adjusted to be 20r/min by rotating the motor 108; the lifting speed of the sample rack is adjusted to be 200mm/min through the lifting motor 113;
fifthly, film coating:
heating the temperature of a vacuum chamber in a magnetron sputtering coating device to 600 ℃, and preserving the temperature for 60 min; then introducing argon into the vacuum chamber, and then starting coating; and after the coating is finished, closing the power supply of the magnetron sputtering coating device, and finishing after the temperature in the vacuum chamber is reduced to 70 ℃.
In the coating process, the target power parameters are set as follows: power 300W, pulse width set to 100 mus, frequency set to 3000 Hz; the pressure of the argon is 1.0 Pa;
in the embodiment 2, the target material used in the film coating is a metallic titanium target, and the error between the film thickness of the film prepared in the embodiment 1 and the target value is within ± 3%, so that the problem of high difficulty in uniform deposition and film coating on the surface of the conformal structure by the conventional magnetron sputtering device is solved.

Claims (7)

1. A relative movement mechanism of a magnetron sputtering coating device suitable for coating the surface of a conformal substrate is characterized in that: the relative movement mechanism suitable for coating the surface of the conformal substrate in the magnetron sputtering coating device consists of a movable sample platform and a swinging target head;
the movable sample table is composed of a lower vacuum chamber flange (101), a sample frame supporting plate (102), a sample frame, a driving gear (106), a driving gear shaft (107), a rotating motor (108), a rotating motor bracket (109), a lifting rod (110), a lifting block (111), a lifting threaded rod (112) and a lifting motor (113); the sample rack is composed of a sample rack top plate (103), a sample rack bottom plate (104) and a plurality of supporting rods (105); the sample rack bottom plate (104) is disc-shaped, and gear teeth are arranged on the outer edge of the sample rack bottom plate (104); the sample rack top plate (103) and the sample rack bottom plate (104) are arranged in parallel, the support rod (105) is arranged between the sample rack top plate (103) and the sample rack bottom plate (104), the upper end of the support rod (105) is fixedly connected with the sample rack top plate (103), and the lower end of the support rod (105) is fixedly connected with the sample rack bottom plate (104); the lower vacuum chamber flange (101) is disc-shaped, the center of the lower vacuum chamber flange (101) is provided with a lifting rod through hole, and a driving gear shaft through hole is formed beside the lifting rod through hole; the lower vacuum chamber flange (101) is horizontally arranged, and the lifting rod (110) is vertically arranged in the lifting rod through hole; the lifting block (111) is in a cube shape, a through hole is formed in the lifting block (111), and an internal thread is arranged in the through hole in the lifting block (111); the lower end of the lifting rod (110) is fixedly connected to the side part of the through hole in the lifting block (111), a lifting threaded rod (112) is arranged in the through hole in the lifting block (111), the lifting threaded rod (112) is an external threaded rod, and the thread of the lifting threaded rod (112) is matched with the internal thread of the through hole in the lifting block (111); the lower end of the lifting threaded rod (112) is sleeved with a driven gear, a power output gear is sleeved on a power output shaft of the lifting motor (113), and the driven gear is connected with the power output gear through a crawler; the upper end of the lifting rod (110) is fixedly connected with a horizontally arranged sample frame supporting plate (102), the surface of the sample frame supporting plate (102) is provided with an annular groove (3), the lower surface of the sample frame bottom plate (104) is provided with a second annular groove corresponding to the annular groove (3), the sample frame bottom plate (104) is arranged above the sample frame supporting plate (102), and a ball is arranged between the annular groove (3) and the second annular groove; the sample rack is characterized in that a rotating motor bracket (109) is horizontally arranged, one end of the rotating motor bracket (109) is fixedly connected with the middle part of a lifting rod (110), a rotating motor (108) is arranged on the upper surface of the rotating motor bracket (109), a power output shaft of the rotating motor (108) is connected with the lower end of a driving gear shaft (107), the upper end of the driving gear shaft (107) penetrates through a driving gear shaft through hole to be arranged, a driving gear (106) is arranged at the upper end of the driving gear shaft (107), and the driving gear (106) is meshed with gear teeth arranged on the outer edge of a sample rack bottom plate (104;
the swing target head is composed of a target head (201), a target head bracket (202), a corrugated pipe (203), a side vacuum chamber flange (204), a target head supporting pipe (205), a target head sliding seat (206), a coupling (207), a target head driving motor (208), a threaded push rod (209) and a target head track (211); the side vacuum chamber flange (204) is vertically arranged, a target supporting tube through hole is formed in the center of the side vacuum chamber flange (204), and the target supporting tube (205) is horizontally arranged in the target supporting tube through hole; the target head sliding seat (206) is vertically arranged in a cuboid shape, the upper part of the target head sliding seat (206) is fixedly connected with the right end of the target head supporting tube (205), a horizontal through hole is formed in the lower part of the target head sliding seat (206), a threaded push rod (209) is arranged in the horizontal through hole in the lower part of the target head sliding seat (206), and an internal thread matched with the threaded push rod (209) is arranged in the horizontal through hole in the lower part of the target head sliding seat (206); the right end of the threaded push rod (209) is connected with a coupler (207), and the coupler (207) is arranged on a power output shaft of the target head driving motor (208); the left end of the target head supporting tube (205) is connected with a corrugated tube (203), and a connecting tube is arranged between the left end of the corrugated tube (203) and the target head (201); a hoop is arranged at the upper end of the target head support (202), and the hoop is sleeved on a connecting pipe between the left end of the corrugated pipe (203) and the target head (201); the lower end of the target head bracket (202) is provided with a travelling wheel; the target head track (211) is groove-shaped, the bottom of the groove of the target head track (211) is provided with steps which rise from the left end to the right end, and an arc transition surface is arranged between the adjacent steps; the traveling wheels are arranged in the target head track (211);
the rotating center line of the threaded push rod (209) in the swinging target head is perpendicular to the rotating center line of the lifting rod (110) in the movable sample table, and the target head (201) is arranged on one side of the sample rack top plate (103).
2. The relative motion mechanism of a magnetron sputtering coating device suitable for coating conformal substrate surfaces according to claim 1, wherein: a mechanical seal is arranged between the lifting rod (110) and the lifting rod through hole; a mechanical seal is arranged between the driving gear shaft (107) and the driving gear shaft through hole; a mechanical seal is arranged between the target supporting tube passing hole and the target supporting tube (205).
3. The method for coating the surface of the conformal substrate by using the relative movement mechanism of the magnetron sputtering coating device suitable for coating the surface of the conformal substrate according to claim 1, wherein the relative movement mechanism comprises: the method comprises the following steps:
firstly, a target head (201), a target head bracket (202), a corrugated pipe (203) and a target head track (211) extend into a target head mounting pipe in a magnetron sputtering coating device, and a side vacuum chamber flange (204) of a swinging target head is connected with a target head mounting flange plate arranged at the end part of the target head mounting pipe; a sample frame supporting plate (102), a sample frame and a driving gear (106) extend into a vacuum chamber in the magnetron sputtering coating device, and a lower vacuum chamber flange (101) of a movable sample table is connected with a vacuum chamber sealing flange arranged at the bottom open end of the vacuum chamber in the magnetron sputtering coating device;
secondly, preparation before film coating:
cleaning the target material and the conformal substrate to obtain a clean target material, then mounting the clean target material on a target head (201), simultaneously clamping the conformal substrate on a sample rack top plate (103) of a sample bracket, and vacuumizing a vacuum chamber in the magnetron sputtering coating device;
step setting of target head
The step number of the target heads (201) is adjusted to be 10-50 times through a target head driving motor (208), the step distance is 5-30 mm, and the residence time at each position is 20-500 s;
setting the rotating speed and the lifting speed of the sample rack
Adjusting the rotating speed of the sample holder to be 1-20 r/min by rotating a motor (108); adjusting the lifting speed of the sample rack to be 1-200 mm/min by a lifting motor (113);
fifthly, film coating:
heating the temperature of a vacuum chamber in a magnetron sputtering coating device to 100-600 ℃, and preserving the heat for 30-60 min; then introducing argon into the vacuum chamber, and then starting coating; and after the film coating is finished, closing the power supply of the magnetron sputtering film coating device, and finishing after the temperature in the vacuum chamber is reduced to 25-70 ℃.
4. According to the claimsThe method for coating the surface of the conformal substrate by using the relative movement mechanism suitable for coating the surface of the conformal substrate in the magnetron sputtering coating device is characterized by comprising the following steps of: step two, vacuum pumping is carried out on the vacuum chamber in the magnetron sputtering coating device to 5.0 multiplied by 10-5～8.0×10-4Pa。
5. The method according to claim 3, wherein the relative motion mechanism is adapted for conformal substrate surface coating, and the method further comprises: and step two, the process for cleaning the target and the conformal substrate comprises the following steps: and sequentially placing the target and the conformal substrate in acetone, alcohol and deionized water, and respectively cleaning for 10-15 min under the condition that the ultrasonic power is 300-600W.
6. The method according to claim 3, wherein the relative motion mechanism is adapted for conformal substrate surface coating, and the method further comprises: fifthly, in the coating process, the target power parameters are set as follows: the power is 100-300W, the pulse width is set to be 10-100 mus, and the frequency is set to be 100-3000 Hz.
7. The method according to claim 3, wherein the relative motion mechanism is adapted for conformal substrate surface coating, and the method further comprises: fifthly, the pressure of the argon is 0.1-1.0 Pa.
CN201811313451.5A 2018-11-06 2018-11-06 Relative movement mechanism of magnetron sputtering coating device suitable for coating film on conformal substrate surface and coating method thereof Active CN109182991B (en)

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