CN109182991A - A kind of magnetic control sputtering film plating device relative movement mechanism and its film plating process suitable for conformal substrate surface plated film - Google Patents
A kind of magnetic control sputtering film plating device relative movement mechanism and its film plating process suitable for conformal substrate surface plated film Download PDFInfo
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- CN109182991A CN109182991A CN201811313451.5A CN201811313451A CN109182991A CN 109182991 A CN109182991 A CN 109182991A CN 201811313451 A CN201811313451 A CN 201811313451A CN 109182991 A CN109182991 A CN 109182991A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- Engineering & Computer Science (AREA)
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Abstract
Suitable for the magnetic control sputtering film plating device relative movement mechanism and its film plating process of conformal substrate surface plated film, it is related to a kind of magnetic control sputtering film plating device relative movement mechanism and film plating process.Purpose is to solve the problems, such as that magnetic control sputtering device is big in conformal structure surface uniform coated difficulty.Mechanism is made of movable sample stage and swing target head；The ladder that the trench bottom of target head track in target head rises from left end to right end is swung, adjacent steps are arc transiting surface；The traveling wheel of target head bracket is arranged in target head track.Target head bracket can be swung up and down during being moved forward and backward along the trench bottom of target head track in device, and target head bracket will drive target head simultaneously and be moved forward and backward and swing up and down, and the direction of target head is made to change；Realize conformal substrate surface plated film.Device eliminates the use of mask plate, and then improves deposition rate, solves the problems, such as the uniform coated of shaped surfaces.The present invention is suitable for conformal substrate surface plated film.
Description
Technical field
The present invention relates to a kind of magnetic control sputtering film plating device relative movement mechanism and its film plating process.
Background technique
Currently, (such as: conformal optical element is total to the extensive use with conformal structure functional component in national economy field
Corrosion-resistant component of shape etc.) so that shaped surfaces depositing homogeneous functional film layer becomes very urgent demand.More with current application
Mature plane is compared with hemisphere surface uniform coated technique, as the shaped surfaces of ellipsoid a part, existing conformal table
Face uniform coated technique is excessively complicated, it is difficult to realize the depositing operation with pervasive effect.
The deposition of conformal structure functional component surface functional membrane layer mostly uses magnetron sputtering apparatus to realize.Such technique needs
Mask plate is added as auxiliary, not only needs designed mask plate shape, but also its relative position put also is not easy to select, because
This virtually increases the variable of modulation process parameter again, causes uniform deposition process extremely complex.In addition, using mask plate side
When formula carries out magnetron sputtering plating, for a part of Coating Materials inherently by mask plate shielding, target waste is serious, reduces simultaneously
Film deposition efficiency.To sum up, existing magnetic control sputtering device is larger in conformal structure surface uniform coated difficulty.
Summary of the invention
The present invention mentions to solve the problems, such as that existing magnetic control sputtering device is big in conformal structure surface uniform coated difficulty
A kind of magnetic control sputtering film plating device relative movement mechanism and its film plating process suitable for conformal substrate surface plated film out.
The present invention is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film by movable sample
Platform and swing target head are constituted；
It is described activity sample stage by lower vacuum room flange, specimen holder supporting plate, specimen holder, driving gear, driving gear shaft,
Rotary electric machine, rotary electric machine bracket, elevating lever, elevator, elevating screw thread bar and lifting motor are constituted；The specimen holder is by sample
Frame top plate, specimen holder bottom plate and several support rods are constituted；Specimen holder bottom plate is disc, is provided in the outer rim of specimen holder bottom plate
The gear teeth；Specimen holder top plate and specimen holder bottom plate are arranged in parallel, and support rod is set between specimen holder top plate and specimen holder bottom plate, and
And post upper and specimen holder top plate are affixed, support rod lower end and specimen holder bottom plate are affixed；Lower vacuum room flange is disk
Shape, lower vacuum room flange center are provided with elevating lever through hole, driving gear shaft through hole are provided with by elevating lever through hole；
Lower vacuum room flange is horizontally disposed, and elevating lever is vertically arranged in elevating lever through hole；Elevator is cube shaped, elevator
On be provided with through-hole, be provided with internal screw thread in the through-hole on elevator；Elevating lever lower end is fixed in through-hole side on elevator, rises
The through-hole of drop block is internally provided with elevating screw thread bar, and elevating screw thread bar is external thread rod, the screw thread and elevator of elevating screw thread bar
The internal screw thread of upper through-hole matches；Elevating screw thread bar lower end is arranged with driven gear, is arranged on the power output shaft of lifting motor
Dynamic output gear, driven gear and power output gear are connected by crawler belt；Elevating lever upper end is connected with horizontally disposed
Specimen holder supporting plate, specimen holder supporting plate surface are provided with annular ditch groove, and specimen holder lower surface of base plate is provided with corresponding with annular ditch groove
The second annular ditch groove, specimen holder bottom plate is set to above specimen holder supporting plate, is arranged between annular ditch groove and the second annular ditch groove
There is ball；Rotary electric machine bracket is horizontally disposed, rotary electric machine bracket one end and affixed, table on rotary electric machine bracket in the middle part of elevating lever
Face is provided with rotary electric machine, and the power output shaft of rotary electric machine is connect with driving gear shaft lower end, and driving gear shaft upper end passes through
The setting of driving gear shaft through hole, driving gear shaft upper end is provided with driving gear, the outer rim of driving gear and specimen holder bottom plate
The gear teeth of upper setting are meshed；
The swing target head is sliding by target head, target head bracket, bellows, lateral vacuum room flange, target head support tube, target head
Seat, shaft coupling, target head driving motor, screw putter and target head track are constituted；Lateral vacuum room flange is vertically arranged, lateral vacuum
Target head support tube through hole is provided at the flange center of room, target head support tube is horizontally placed in target head support tube through hole；Target
Head slide is vertically arranged cuboid, and target head slide top and target head support tube right end are affixed, the setting of target head slide lower part
There is horizontal through hole, screw putter is set in the horizontal through hole of target head slide lower part, is set in the horizontal through hole of target head slide lower part
It is equipped with the internal screw thread to match with screw putter；Screw putter right end is connected with shaft coupling, and shaft coupling setting drives electricity in target head
On the power output shaft of machine；Target head support tube left end is connected with bellows, is provided with connecting tube between bellows left end and target head；
The target head pedestal upper end is provided with shroud ring, and shroud ring is set in the connecting tube between bellows left end and target head；Target head bracket
Lower end is provided with traveling wheel；Target head track is flute profile, the ladder that the trench bottom of target head track rises from left end to right end, adjacent rank
It is arc transiting surface between ladder；Traveling wheel is arranged in target head track；
The rotation centerline phase of the rotation centerline of screw putter and elevating lever in movable sample stage in the swing target head
Mutually vertical, target head is set to specimen holder top plate side.
Mechanical seal is provided between the elevating lever and elevating lever through hole；Driving gear shaft and driving gear shaft pass through
Mechanical seal is provided between hole；Mechanical seal is provided between target head support tube through hole and target head support tube.
It is carried out using the above-mentioned magnetic control sputtering film plating device relative movement mechanism suitable for conformal substrate surface plated film conformal
The method of substrate surface plated film follows the steps below:
One, target head, target head bracket, bellows and target head track are stretched into target head installing pipe in magnetic control sputtering film plating device
It is interior, the lateral vacuum room flange for swinging target head is connect with the target head mounting flange of target head installation tube end setting；By sample
Frame torr plate, specimen holder and driving gear stretch to the internal vacuum chamber in magnetic control sputtering film plating device, the lower part of movable sample stage
Vacuum chamber flange is connect with the vacuum chamber sealing flange that vacuum chamber bottom open end in magnetic control sputtering film plating device is arranged；
Two, the preparation before plated film:
Target and the cleaning of conformal substrate, obtain clean target, then install clean target in target head, while by conformal base
Bottom clamping is on the specimen holder top plate of sample carrier, by vacuum chamber in magnetic control sputtering film plating device；
It is described by vacuum chamber in magnetic control sputtering film plating device to 5.0 × 10-5~8.0 × 10-4Pa；
The technique of the target and the cleaning of conformal substrate are as follows: target and conformal substrate are successively placed on acetone, alcohol and gone
In ionized water, 10~15min is cleaned under conditions of ultrasonic power is 300~600W respectively；
Three, target head stepping is arranged
It is 10~50 times by the step number that target head driving motor adjusts target head, step distance is 5~30mm, each
The residence time of position is 20~500s；
Four, specimen holder revolving speed and lifting speed setting
It is 1~20r/min by the revolving speed that rotary electric machine adjusts specimen holder；The lifting of specimen holder is adjusted by lifting motor
Speed is 1~200mm/min；
Five, plated film:
Vacuum room temperature in magnetic control sputtering film plating device is warming up to 100~600 DEG C, and keeps the temperature 30~60min；Then to
It is passed through argon gas in vacuum chamber, then starts to carry out plated film；Magnetic control sputtering film plating device power supply is closed after the completion of plated film, to vacuum chamber
After interior temperature is down to 25 DEG C~70 DEG C, that is, complete.
In the carry out coating process, the setting of target power parameter are as follows: 100~300W of power, pulse width are set as
10~100 μ s, set of frequency are 100~3000Hz；
The air pressure of the argon gas is 0.1~1.0Pa；
It the principle of the invention and has the beneficial effect that
The present invention is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film, lifting motor
Rotation drive elevator moved up and down along elevating screw thread bar, elevator drive driving gear, driving gear shaft, rotary electric machine,
Specimen holder supporting plate and specimen holder move up and down；Driving gear rotation, driving gear and specimen holder bottom are driven after rotary electric machine rotation
The gear teeth being arranged in the outer rim of plate are meshed, and driving gear rotates and then drive the rotation of specimen holder bottom plate, finally realize conformal base
The rotation at bottom；Target head driving motor rotation drive target head slide be moved forward and backward, head slide drive target head, target head bracket, bellows,
Target head track and target head support tube are moved forward and backward, and the traveling wheel of target head pedestal lower end setting is arranged in target head track, traveling wheel
Under the drive of target head bracket along target head track trench bottom be moved forward and backward, due to target head track trench bottom by left end to the right
The ladder risen is held, so target head bracket can be swung up and down during being moved forward and backward along the trench bottom of target head track, target head branch
Frame will drive target head simultaneously and be moved forward and backward and swing up and down, and the swing of target head can make the direction of target head change；
The magnetic control sputtering film plating device relative movement mechanism that the present invention is suitable for conformal substrate surface plated film can be realized altogether
The uniform deposition plated film on shape surface only adjustment activity sample stage and swings target head kinematic parameter in coating process, utilizes target head rail
Swinging up and down and being moved forward and backward for target head is realized in the ladder bottom surface in road, and then realizes the adjustment of the direction of target head, in movable sample
Under the cooperation that platform rotation and lifting and target head are moved forward and backward and swing up and down, the distance for controlling target to sample surfaces is realized
It is successively directed at the function of whole conformal substrate surfaces with target head, realizes conformal substrate surface plated film.It is avoided in coating process
The use of mask plate, and then improve deposition rate.The thicknesses of layers of the film of preparation and the error of target value within ± 3%,
Solve the problems, such as that existing magnetic control sputtering device is big in the difficulty of conformal structure surface uniform deposition plated film.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of movable sample stage, and d is conformal substrate in figure；
Fig. 2 is the structural schematic diagram for swinging target head；
Fig. 3 is the structural schematic diagram of specimen holder supporting plate 102；
Fig. 4 is the structural schematic diagram of vacuum chamber in magnetic control sputtering film plating device, and a is vacuum chamber main body in figure, and b is target head peace
Tubulature.
Specific embodiment:
The technical solution of the present invention is not limited to the following list, further includes between each specific embodiment
Any reasonable combination.
Specific embodiment 1: illustrating that present embodiment, present embodiment are suitable for conformal substrate surface in conjunction with Fig. 1~4
The magnetic control sputtering film plating device relative movement mechanism of plated film is made of movable sample stage and swing target head；
The activity sample stage is by lower vacuum room flange 101, specimen holder supporting plate 102, specimen holder, driving gear 106, master
Movable gear shaft 107, rotary electric machine 108, rotary electric machine bracket 109, elevating lever 110, elevator 111, elevating screw thread bar 112 and liter
Motor 113 is dropped to constitute；The specimen holder is made of specimen holder top plate 103, specimen holder bottom plate 104 and several support rods 105；Sample
Frame bottom plate 104 is disc, is provided with the gear teeth in the outer rim of specimen holder bottom plate 104；Specimen holder top plate 103 and specimen holder bottom plate
104 are arranged in parallel, and support rod 105 is set between specimen holder top plate 103 and specimen holder bottom plate 104, and 105 upper end of support rod
Affixed with specimen holder top plate 103,105 lower end of support rod and specimen holder bottom plate 104 are affixed；Lower vacuum room flange 101 is disk
Shape, lower vacuum room flange 101 are provided centrally with elevating lever through hole, are provided with driving gear shaft by elevating lever through hole and pass through
Hole；Lower vacuum room flange 101 is horizontally disposed, and elevating lever 110 is vertically arranged in elevating lever through hole；Elevator 111 is vertical
Cube shape is provided with through-hole on elevator 111, is provided with internal screw thread in the through-hole on elevator 111；110 lower end of elevating lever is solid
It is connected to through-hole side on elevator 111, the through-hole of elevator 111 is internally provided with elevating screw thread bar 112, elevating screw thread bar 112
Internal screw thread for external thread rod, the screw thread and through-hole on elevator 111 of elevating screw thread bar 112 matches；Under elevating screw thread bar 112
End cap is equipped with driven gear, is arranged with power output gear on the power output shaft of lifting motor 113, driven gear and power are defeated
Gear is connected by crawler belt out；110 upper end of elevating lever is connected with horizontally disposed specimen holder supporting plate 102,102 table of specimen holder supporting plate
Face is provided with annular ditch groove 3, and 104 lower surface of specimen holder bottom plate is provided with second annular ditch groove corresponding with annular ditch groove 3, sample
Frame bottom plate 104 is set to 102 top of specimen holder supporting plate, is provided with ball between annular ditch groove 3 and the second annular ditch groove；Rotation electricity
Machine bracket 109 is horizontally disposed, 109 one end of rotary electric machine bracket and 110 affixed, the table on rotary electric machine bracket 109 in middle part of elevating lever
Face is provided with rotary electric machine 108, and the power output shaft of rotary electric machine 108 is connect with 107 lower end of driving gear shaft, driving gear shaft
107 upper ends are arranged across driving gear shaft through hole, and 107 upper end of driving gear shaft is provided with driving gear 106, driving gear
106 are meshed with the gear teeth being arranged in the outer rim of specimen holder bottom plate 104；
The swing target head is by target head 201, target head bracket 202, bellows 203, lateral vacuum room flange 204, target head branch
Stay tube 205, target head slide 206, shaft coupling 207, target head driving motor 208, screw putter 209 and target head track 211 are constituted；Side
Portion's vacuum chamber flange 204 is vertically arranged, and lateral vacuum room flange is provided with target head support tube through hole, target head branch at 204 center
Stay tube 205 is horizontally placed in target head support tube through hole；Target head slide 206 is vertically arranged cuboid, target head slide
206 tops and 205 right end of target head support tube are affixed, and 206 lower part of target head slide is provided with horizontal through hole, and screw putter 209 is arranged
In in the horizontal through hole of 206 lower part of target head slide, it is provided in the horizontal through hole of 206 lower part of target head slide and screw putter 209
The internal screw thread to match；209 right end of screw putter is connected with shaft coupling 207, and shaft coupling 207 is arranged in target head driving motor 208
Power output shaft on；205 left end of target head support tube is connected with bellows 203, sets between 203 left end of bellows and target head 201
It is equipped with connecting tube；202 upper end of target head bracket is provided with shroud ring, and shroud ring is set between 203 left end of bellows and target head 201
Connecting tube on；202 lower end of target head bracket is provided with traveling wheel；Target head track 211 is flute profile, the trench bottom of target head track 211
The ladder risen from left end to right end is arc transiting surface between adjacent steps；Traveling wheel is arranged in target head track 211；
In the swing target head in the rotation centerline of screw putter 209 and movable sample stage in the rotation of elevating lever 110
Heart line is mutually perpendicular to, and target head 201 is set to 103 side of specimen holder top plate.
Present embodiment have it is following the utility model has the advantages that
Present embodiment is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film, lifting
The rotation of motor 113 drives elevator 111 to move up and down along elevating screw thread bar 112, and elevator 111 drives driving gear 106, master
Movable gear shaft 107, rotary electric machine 108, specimen holder supporting plate 102 and specimen holder move up and down；Rotary electric machine 108 drives master after rotating
Moving gear 106 rotates, and the gear teeth being arranged on driving gear 106 and the outer rim of specimen holder bottom plate 104 are meshed, driving gear 106
It rotates and then specimen holder bottom plate 104 is driven to rotate, finally realize the rotation of conformal substrate；The rotation of target head driving motor 208 drives
Target head slide 206 is moved forward and backward, and head slide 206 drives target head 201, target head bracket 202, bellows 203,211 and of target head track
Target head support tube 205 is moved forward and backward, and the traveling wheel of 202 lower end of target head bracket setting is arranged in target head track 211, and traveling wheel exists
Under the drive of target head bracket 202 along target head track 211 trench bottom be moved forward and backward, due to target head track 211 trench bottom by
The ladder that left end rises to right end, so target head bracket 202 is along in meeting during the trench bottom back-and-forth motion of target head track 211
Lower swing, target head bracket 202 will drive target head 201 simultaneously and be moved forward and backward and swing up and down, and the swing of target head 201 can make target head
201 direction changes；
The magnetic control sputtering film plating device relative movement mechanism that present embodiment is suitable for conformal substrate surface plated film can be real
The uniform deposition plated film of existing shaped surfaces only adjustment activity sample stage and swings target head kinematic parameter in coating process, utilizes target
Swinging up and down and being moved forward and backward for target head 201 is realized in the ladder bottom surface in head rail road 211, and then realizes the tune of the direction of target head 201
It is whole, under the cooperation that movable sample stage is rotated and gone up and down and target head 201 is moved forward and backward and swings up and down, realize control target
It is successively directed at the function of whole conformal substrate surfaces to the distance and target head 201 of sample surfaces, realizes conformal substrate surface plating
Film.The use of mask plate is avoided in coating process, and then improves deposition rate.The thicknesses of layers and target value of the film of preparation
Error within ± 3%, the difficulty for solving existing magnetic control sputtering device in conformal structure surface uniform deposition plated film is big
The problem of.
Specific embodiment 2: the present embodiment is different from the first embodiment in that: the elevating lever 110 and lifting
Mechanical seal is provided between bar through hole；Mechanical seal is provided between driving gear shaft 107 and driving gear shaft through hole；
Mechanical seal is provided between target head support tube through hole and target head support tube 205.Other steps and parameter and specific embodiment party
Formula one is identical.
Specific embodiment 3: present embodiment utilizes the magnetic control sputtering film plating device suitable for conformal substrate surface plated film
The method that relative movement mechanism carries out conformal substrate surface plated film follows the steps below:
One, target head 201, target head bracket 202, bellows 203 and target head track 211 are stretched into magnetic control sputtering film plating device
In middle target head installing pipe, the target head Method for Installation of the lateral vacuum room flange 204 and target head installation tube end setting of target head will be swung
Blue disk connection；Specimen holder supporting plate 102, specimen holder and driving gear 106 are stretched into the vacuum chamber in magnetic control sputtering film plating device
Inside, lower vacuum room flange 101 and the vacuum chamber bottom open end in magnetic control sputtering film plating device of movable sample stage are arranged
Vacuum chamber sealing flange connection；
Two, the preparation before plated film:
Target and the cleaning of conformal substrate, obtain clean target, then install clean target in target head 201, while will be total to
Shape substrate clamping is on the specimen holder top plate 103 of sample carrier, by vacuum chamber in magnetic control sputtering film plating device；
Three, target head stepping is arranged
It is 10~50 times by the step number that target head driving motor 208 adjusts target head 201, step distance is 5~30mm,
Residence time in each position is 20~500s；
Four, specimen holder revolving speed and lifting speed setting
It is 1~20r/min by the revolving speed that rotary electric machine 108 adjusts specimen holder；Specimen holder is adjusted by lifting motor 113
Lifting speed be 1~200mm/min；
Five, plated film:
Vacuum room temperature in magnetic control sputtering film plating device is warming up to 100~600 DEG C, and keeps the temperature 30~60min；Then to
It is passed through argon gas in vacuum chamber, then starts to carry out plated film；Magnetic control sputtering film plating device power supply is closed after the completion of plated film, to vacuum chamber
After interior temperature is down to 25 DEG C~70 DEG C, that is, complete.
Present embodiment have it is following the utility model has the advantages that
Present embodiment is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film, lifting
The rotation of motor 113 drives elevator 111 to move up and down along elevating screw thread bar 112, and elevator 111 drives driving gear 106, master
Movable gear shaft 107, rotary electric machine 108, specimen holder supporting plate 102 and specimen holder move up and down；Rotary electric machine 108 drives master after rotating
Moving gear 106 rotates, and the gear teeth being arranged on driving gear 106 and the outer rim of specimen holder bottom plate 104 are meshed, driving gear 106
It rotates and then specimen holder bottom plate 104 is driven to rotate, finally realize the rotation of conformal substrate；The rotation of target head driving motor 208 drives
Target head slide 206 is moved forward and backward, and head slide 206 drives target head 201, target head bracket 202, bellows 203,211 and of target head track
Target head support tube 205 is moved forward and backward, and the traveling wheel of 202 lower end of target head bracket setting is arranged in target head track 211, and traveling wheel exists
Under the drive of target head bracket 202 along target head track 211 trench bottom be moved forward and backward, due to target head track 211 trench bottom by
The ladder that left end rises to right end, so target head bracket 202 is along in meeting during the trench bottom back-and-forth motion of target head track 211
Lower swing, target head bracket 202 will drive target head 201 simultaneously and be moved forward and backward and swing up and down, and the swing of target head 201 can make target head
201 direction changes；
The magnetic control sputtering film plating device relative movement mechanism that present embodiment is suitable for conformal substrate surface plated film can be real
The uniform deposition plated film of existing shaped surfaces only adjustment activity sample stage and swings target head kinematic parameter in coating process, utilizes target
Swinging up and down and being moved forward and backward for target head 201 is realized in the ladder bottom surface in head rail road 211, and then realizes the tune of the direction of target head 201
It is whole, under the cooperation that movable sample stage is rotated and gone up and down and target head 201 is moved forward and backward and swings up and down, realize control target
It is successively directed at the function of whole conformal substrate surfaces to the distance and target head 201 of sample surfaces, realizes conformal substrate surface plating
Film.The use of mask plate is avoided in coating process, and then improves deposition rate.The thicknesses of layers and target value of the film of preparation
Error within ± 3%, the difficulty for solving existing magnetic control sputtering device in conformal structure surface uniform deposition plated film is big
The problem of.
Specific embodiment 4: present embodiment is unlike specific embodiment three: splashing magnetic control described in step 2
Vacuum chamber is penetrated in coating apparatus to 5.0 × 10-5~8.0 × 10-4Pa.Other steps and parameter and specific embodiment
Three is identical.
Specific embodiment 5: present embodiment is unlike specific embodiment three or four: target described in step 2
With the technique of conformal substrate cleaning are as follows: target and conformal substrate are successively placed in acetone, alcohol and deionized water, respectively super
Acoustical power cleans 10~15min under conditions of being 300~600W.Other steps and parameter and specific embodiment three or four phases
Together.
Specific embodiment 6: unlike one of present embodiment and specific embodiment three to five: described in step 5
It carries out in coating process, the setting of target power parameter are as follows: 100~300W of power, pulse width are set as 10~100 μ s, frequency
Rate is set as 100~3000Hz.Other steps and parameter are identical as one of specific embodiment three to five.
Specific embodiment 7: unlike one of present embodiment and specific embodiment three to six: described in step 5
The air pressure of argon gas is 0.1~1.0Pa.Other steps and parameter are identical as one of specific embodiment three to six.
Beneficial effects of the present invention are verified using following embodiment:
Embodiment 1:
The present embodiment is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film by movable sample
Sample platform and swing target head are constituted；
The activity sample stage is by lower vacuum room flange 101, specimen holder supporting plate 102, specimen holder, driving gear 106, master
Movable gear shaft 107, rotary electric machine 108, rotary electric machine bracket 109, elevating lever 110, elevator 111, elevating screw thread bar 112 and liter
Motor 113 is dropped to constitute；The specimen holder is made of specimen holder top plate 103, specimen holder bottom plate 104 and several support rods 105；Sample
Frame bottom plate 104 is disc, is provided with the gear teeth in the outer rim of specimen holder bottom plate 104；Specimen holder top plate 103 and specimen holder bottom plate
104 are arranged in parallel, and support rod 105 is set between specimen holder top plate 103 and specimen holder bottom plate 104, and 105 upper end of support rod
Affixed with specimen holder top plate 103,105 lower end of support rod and specimen holder bottom plate 104 are affixed；Lower vacuum room flange 101 is disk
Shape, lower vacuum room flange 101 are provided centrally with elevating lever through hole, are provided with driving gear shaft by elevating lever through hole and pass through
Hole；Lower vacuum room flange 101 is horizontally disposed, and elevating lever 110 is vertically arranged in elevating lever through hole；Elevator 111 is vertical
Cube shape is provided with through-hole on elevator 111, is provided with internal screw thread in the through-hole on elevator 111；110 lower end of elevating lever is solid
It is connected to through-hole side on elevator 111, the through-hole of elevator 111 is internally provided with elevating screw thread bar 112, elevating screw thread bar 112
Internal screw thread for external thread rod, the screw thread and through-hole on elevator 111 of elevating screw thread bar 112 matches；Under elevating screw thread bar 112
End cap is equipped with driven gear, is arranged with power output gear on the power output shaft of lifting motor 113, driven gear and power are defeated
Gear is connected by crawler belt out；110 upper end of elevating lever is connected with horizontally disposed specimen holder supporting plate 102,102 table of specimen holder supporting plate
Face is provided with annular ditch groove 3, and 104 lower surface of specimen holder bottom plate is provided with second annular ditch groove corresponding with annular ditch groove 3, sample
Frame bottom plate 104 is set to 102 top of specimen holder supporting plate, is provided with ball between annular ditch groove 3 and the second annular ditch groove；Rotation electricity
Machine bracket 109 is horizontally disposed, 109 one end of rotary electric machine bracket and 110 affixed, the table on rotary electric machine bracket 109 in middle part of elevating lever
Face is provided with rotary electric machine 108, and the power output shaft of rotary electric machine 108 is connect with 107 lower end of driving gear shaft, driving gear shaft
107 upper ends are arranged across driving gear shaft through hole, and 107 upper end of driving gear shaft is provided with driving gear 106, driving gear
106 are meshed with the gear teeth being arranged in the outer rim of specimen holder bottom plate 104；
The swing target head is by target head 201, target head bracket 202, bellows 203, lateral vacuum room flange 204, target head branch
Stay tube 205, target head slide 206, shaft coupling 207, target head driving motor 208, screw putter 209 and target head track 211 are constituted；Side
Portion's vacuum chamber flange 204 is vertically arranged, and lateral vacuum room flange is provided with target head support tube through hole, target head branch at 204 center
Stay tube 205 is horizontally placed in target head support tube through hole；Target head slide 206 is vertically arranged cuboid, target head slide
206 tops and 205 right end of target head support tube are affixed, and 206 lower part of target head slide is provided with horizontal through hole, and screw putter 209 is arranged
In in the horizontal through hole of 206 lower part of target head slide, it is provided in the horizontal through hole of 206 lower part of target head slide and screw putter 209
The internal screw thread to match；209 right end of screw putter is connected with shaft coupling 207, and shaft coupling 207 is arranged in target head driving motor 208
Power output shaft on；205 left end of target head support tube is connected with bellows 203, sets between 203 left end of bellows and target head 201
It is equipped with connecting tube；202 upper end of target head bracket is provided with shroud ring, and shroud ring is set between 203 left end of bellows and target head 201
Connecting tube on；202 lower end of target head bracket is provided with traveling wheel；Target head track 211 is flute profile, the trench bottom of target head track 211
The ladder risen from left end to right end is arc transiting surface between adjacent steps；Traveling wheel is arranged in target head track 211；Institute
The rotation centerline of screw putter 209 and the rotation centerline of elevating lever 110 in movable sample stage in swing target head is stated mutually to hang down
Directly, target head 201 is set to 103 side of specimen holder top plate.
Mechanical seal is provided between the elevating lever 110 and elevating lever through hole；Driving gear shaft 107 and driving gear
Mechanical seal is provided between axis through hole；Mechanical seal is provided between target head support tube through hole and target head support tube 205.
It is carried out using the above-mentioned magnetic control sputtering film plating device relative movement mechanism suitable for conformal substrate surface plated film conformal
The method of substrate surface plated film follows the steps below:
One, target head 201, target head bracket 202, bellows 203 and target head track 211 are stretched into magnetic control sputtering film plating device
In middle target head installing pipe, the target head Method for Installation of the lateral vacuum room flange 204 and target head installation tube end setting of target head will be swung
Blue disk connection；Specimen holder supporting plate 102, specimen holder and driving gear 106 are stretched into the vacuum chamber in magnetic control sputtering film plating device
Inside, lower vacuum room flange 101 and the vacuum chamber bottom open end in magnetic control sputtering film plating device of movable sample stage are arranged
Vacuum chamber sealing flange connection；
Two, the preparation before plated film:
Target and the cleaning of conformal substrate, obtain clean target, then install clean target in target head 201, while will be total to
Shape substrate clamping is on the specimen holder top plate 103 of sample carrier, by vacuum chamber in magnetic control sputtering film plating device；
It is described by vacuum chamber in magnetic control sputtering film plating device to 5.0 × 10-5Pa；
The technique of the target and the cleaning of conformal substrate are as follows: target and conformal substrate are successively placed on acetone, alcohol and gone
In ionized water, 10min is cleaned under conditions of ultrasonic power is 300W respectively；
Three, target head stepping is arranged
It is 10~50 times by the step number that target head driving motor 208 adjusts target head 201, step distance is 5~30mm,
Residence time in each position is 20s；
Four, specimen holder revolving speed and lifting speed setting
It is 1r/min by the revolving speed that rotary electric machine 108 adjusts specimen holder；The liter of specimen holder is adjusted by lifting motor 113
Reduction of speed degree is 1mm/min；
Five, plated film:
Vacuum room temperature in magnetic control sputtering film plating device is warming up to 100 DEG C, and keeps the temperature 30min；Then into vacuum chamber
It is passed through argon gas, then starts to carry out plated film；Magnetic control sputtering film plating device power supply is closed after the completion of plated film, is dropped to vacuum room temperature
To after 25 DEG C, that is, complete.
In the carry out coating process, the setting of target power parameter are as follows: power 100W, pulse width are set as 10 μ s,
Set of frequency is 100Hz；
The air pressure of the argon gas is 0.1Pa；
The target used when plated film in embodiment 1 is metal titanium targets, the thicknesses of layers and target value of film prepared by embodiment 1
Error within ± 3%, the difficulty for solving existing magnetic control sputtering device in conformal structure surface uniform deposition plated film is big
The problem of.
Embodiment 2:
The present embodiment is suitable for the magnetic control sputtering film plating device relative movement mechanism of conformal substrate surface plated film by movable sample
Sample platform and swing target head are constituted；
The activity sample stage is by lower vacuum room flange 101, specimen holder supporting plate 102, specimen holder, driving gear 106, master
Movable gear shaft 107, rotary electric machine 108, rotary electric machine bracket 109, elevating lever 110, elevator 111, elevating screw thread bar 112 and liter
Motor 113 is dropped to constitute；The specimen holder is made of specimen holder top plate 103, specimen holder bottom plate 104 and several support rods 105；Sample
Frame bottom plate 104 is disc, is provided with the gear teeth in the outer rim of specimen holder bottom plate 104；Specimen holder top plate 103 and specimen holder bottom plate
104 are arranged in parallel, and support rod 105 is set between specimen holder top plate 103 and specimen holder bottom plate 104, and 105 upper end of support rod
Affixed with specimen holder top plate 103,105 lower end of support rod and specimen holder bottom plate 104 are affixed；Lower vacuum room flange 101 is disk
Shape, lower vacuum room flange 101 are provided centrally with elevating lever through hole, are provided with driving gear shaft by elevating lever through hole and pass through
Hole；Lower vacuum room flange 101 is horizontally disposed, and elevating lever 110 is vertically arranged in elevating lever through hole；Elevator 111 is vertical
Cube shape is provided with through-hole on elevator 111, is provided with internal screw thread in the through-hole on elevator 111；110 lower end of elevating lever is solid
It is connected to through-hole side on elevator 111, the through-hole of elevator 111 is internally provided with elevating screw thread bar 112, elevating screw thread bar 112
Internal screw thread for external thread rod, the screw thread and through-hole on elevator 111 of elevating screw thread bar 112 matches；Under elevating screw thread bar 112
End cap is equipped with driven gear, is arranged with power output gear on the power output shaft of lifting motor 113, driven gear and power are defeated
Gear is connected by crawler belt out；110 upper end of elevating lever is connected with horizontally disposed specimen holder supporting plate 102,102 table of specimen holder supporting plate
Face is provided with annular ditch groove 3, and 104 lower surface of specimen holder bottom plate is provided with second annular ditch groove corresponding with annular ditch groove 3, sample
Frame bottom plate 104 is set to 102 top of specimen holder supporting plate, is provided with ball between annular ditch groove 3 and the second annular ditch groove；Rotation electricity
Machine bracket 109 is horizontally disposed, 109 one end of rotary electric machine bracket and 110 affixed, the table on rotary electric machine bracket 109 in middle part of elevating lever
Face is provided with rotary electric machine 108, and the power output shaft of rotary electric machine 108 is connect with 107 lower end of driving gear shaft, driving gear shaft
107 upper ends are arranged across driving gear shaft through hole, and 107 upper end of driving gear shaft is provided with driving gear 106, driving gear
106 are meshed with the gear teeth being arranged in the outer rim of specimen holder bottom plate 104；
The swing target head is by target head 201, target head bracket 202, bellows 203, lateral vacuum room flange 204, target head branch
Stay tube 205, target head slide 206, shaft coupling 207, target head driving motor 208, screw putter 209 and target head track 211 are constituted；Side
Portion's vacuum chamber flange 204 is vertically arranged, and lateral vacuum room flange is provided with target head support tube through hole, target head branch at 204 center
Stay tube 205 is horizontally placed in target head support tube through hole；Target head slide 206 is vertically arranged cuboid, target head slide
206 tops and 205 right end of target head support tube are affixed, and 206 lower part of target head slide is provided with horizontal through hole, and screw putter 209 is arranged
In in the horizontal through hole of 206 lower part of target head slide, it is provided in the horizontal through hole of 206 lower part of target head slide and screw putter 209
The internal screw thread to match；209 right end of screw putter is connected with shaft coupling 207, and shaft coupling 207 is arranged in target head driving motor 208
Power output shaft on；205 left end of target head support tube is connected with bellows 203, sets between 203 left end of bellows and target head 201
It is equipped with connecting tube；202 upper end of target head bracket is provided with shroud ring, and shroud ring is set between 203 left end of bellows and target head 201
Connecting tube on；202 lower end of target head bracket is provided with traveling wheel；Target head track 211 is flute profile, the trench bottom of target head track 211
The ladder risen from left end to right end is arc transiting surface between adjacent steps；Traveling wheel is arranged in target head track 211；Institute
The rotation centerline of screw putter 209 and the rotation centerline of elevating lever 110 in movable sample stage in swing target head is stated mutually to hang down
Directly, target head 201 is set to 103 side of specimen holder top plate.
Mechanical seal is provided between the elevating lever 110 and elevating lever through hole；Driving gear shaft 107 and driving gear
Mechanical seal is provided between axis through hole；Mechanical seal is provided between target head support tube through hole and target head support tube 205.
It is carried out using the above-mentioned magnetic control sputtering film plating device relative movement mechanism suitable for conformal substrate surface plated film conformal
The method of substrate surface plated film follows the steps below:
One, target head 201, target head bracket 202, bellows 203 and target head track 211 are stretched into magnetic control sputtering film plating device
In middle target head installing pipe, the target head Method for Installation of the lateral vacuum room flange 204 and target head installation tube end setting of target head will be swung
Blue disk connection；Specimen holder supporting plate 102, specimen holder and driving gear 106 are stretched into the vacuum chamber in magnetic control sputtering film plating device
Inside, lower vacuum room flange 101 and the vacuum chamber bottom open end in magnetic control sputtering film plating device of movable sample stage are arranged
Vacuum chamber sealing flange connection；
Two, the preparation before plated film:
Target and the cleaning of conformal substrate, obtain clean target, then install clean target in target head 201, while will be total to
Shape substrate clamping is on the specimen holder top plate 103 of sample carrier, by vacuum chamber in magnetic control sputtering film plating device；
It is described by vacuum chamber in magnetic control sputtering film plating device to 8.0 × 10-4Pa；
The technique of the target and the cleaning of conformal substrate are as follows: target and conformal substrate are successively placed on acetone, alcohol and gone
In ionized water, 15min is cleaned under conditions of ultrasonic power is 600W respectively；
Three, target head stepping is arranged
It is 50 times by the step number that target head driving motor 208 adjusts target head 201, step distance 30mm, each
The residence time of position is 500s；
Four, specimen holder revolving speed and lifting speed setting
It is 20r/min by the revolving speed that rotary electric machine 108 adjusts specimen holder；Specimen holder is adjusted by lifting motor 113
Lifting speed is 200mm/min；
Five, plated film:
Vacuum room temperature in magnetic control sputtering film plating device is warming up to 600 DEG C, and keeps the temperature 60min；Then into vacuum chamber
It is passed through argon gas, then starts to carry out plated film；Magnetic control sputtering film plating device power supply is closed after the completion of plated film, is dropped to vacuum room temperature
To after 70 DEG C, that is, complete.
In the carry out coating process, the setting of target power parameter are as follows: power 300W, pulse width are set as 100 μ s,
Set of frequency is 3000Hz；The air pressure of the argon gas is 1.0Pa；
The target used when plated film in embodiment 2 is metal titanium targets, the thicknesses of layers and target value of film prepared by embodiment 1
Error within ± 3%, the difficulty for solving existing magnetic control sputtering device in conformal structure surface uniform deposition plated film is big
The problem of.
Claims (7)
1. a kind of magnetic control sputtering film plating device relative movement mechanism suitable for conformal substrate surface plated film, it is characterised in that: magnetic
The relative movement mechanism for being suitable for conformal substrate surface plated film in Sputting film-plating apparatus is controlled by movable sample stage and swings target head structure
At；
It is described activity sample stage by lower vacuum room flange (101), specimen holder supporting plate (102), specimen holder, driving gear (106),
Driving gear shaft (107), rotary electric machine (108), rotary electric machine bracket (109), elevating lever (110), elevator (111), lifting
Threaded rod (112) and lifting motor (113) are constituted；The specimen holder by specimen holder top plate (103), specimen holder bottom plate (104) and
Several support rods (105) are constituted；Specimen holder bottom plate (104) is disc, is provided with wheel in the outer rim of specimen holder bottom plate (104)
Tooth；Specimen holder top plate (103) and specimen holder bottom plate (104) are arranged in parallel, and support rod (105) is set to specimen holder top plate (103)
Between specimen holder bottom plate (104), and support rod (105) upper end and specimen holder top plate (103) are affixed, under support rod (105)
It holds affixed with specimen holder bottom plate (104)；Lower vacuum room flange (101) is disc, and lower vacuum room flange (101) center is set
It is equipped with elevating lever through hole, driving gear shaft through hole is provided with by elevating lever through hole；Lower vacuum room flange (101) is horizontal
Setting, elevating lever (110) are vertically arranged in elevating lever through hole；Elevator (111) be it is cube shaped, on elevator (111)
It is provided with through-hole, is provided with internal screw thread in the through-hole on elevator (111)；Elevating lever (110) lower end is fixed in elevator (111)
Upper through-hole side, the through-hole of elevator (111) are internally provided with elevating screw thread bar (112), and elevating screw thread bar (112) is external screw thread
The internal screw thread of bar, the screw thread and through-hole on elevator (111) of elevating screw thread bar (112) matches；Elevating screw thread bar (112) lower end
It is arranged with driven gear, power output gear is arranged on the power output shaft of lifting motor (113), driven gear and power are defeated
Gear is connected by crawler belt out；Elevating lever (110) upper end is connected with horizontally disposed specimen holder supporting plate (102), specimen holder supporting plate
(102) surface is provided with annular ditch groove (3), and specimen holder bottom plate (104) lower surface is provided with corresponding with annular ditch groove (3) second
Annular ditch groove, specimen holder bottom plate (104) are set to above specimen holder supporting plate (102), annular ditch groove (3) and the second annular ditch groove it
Between be provided with ball；Rotary electric machine bracket (109) is horizontally disposed, in the middle part of rotary electric machine bracket (109) one end and elevating lever (110)
Affixed, rotary electric machine bracket (109) upper surface is provided with rotary electric machine (108), the power output shaft of rotary electric machine (108) and master
The connection of movable gear shaft (107) lower end, driving gear shaft (107) upper end are arranged across driving gear shaft through hole, driving gear shaft
(107) upper end is provided with driving gear (106), the gear teeth being arranged in the outer rim of driving gear (106) and specimen holder bottom plate (104)
It is meshed；
The swing target head is by target head (201), target head bracket (202), bellows (203), lateral vacuum room flange (204), target
Head support tube (205), target head slide (206), shaft coupling (207), target head driving motor (208), screw putter (209) and target head
Track (211) is constituted；Lateral vacuum room flange (204) is vertically arranged, is provided with target head at lateral vacuum room flange (204) center
Support tube through hole, target head support tube (205) are horizontally placed in target head support tube through hole；Target head slide (206) is vertical
The cuboid of setting, target head slide (206) top and target head support tube (205) right end are affixed, and target head slide (206) lower part is set
It is equipped with horizontal through hole, screw putter (209) is set in the horizontal through hole of target head slide (206) lower part, under target head slide (206)
The internal screw thread to match with screw putter (209) is provided in the horizontal through hole in portion；Screw putter (209) right end is connected with shaft coupling
Device (207), shaft coupling (207) are arranged on the power output shaft of target head driving motor (208)；Target head support tube (205) left end
It is connected with bellows (203), is provided with connecting tube between bellows (203) left end and target head (201)；The target head bracket
(202) upper end is provided with shroud ring, and shroud ring is set in the connecting tube between bellows (203) left end and target head (201)；Target head branch
Frame (202) lower end is provided with traveling wheel；Target head track (211) is flute profile, and the trench bottom of target head track (211) is from left end to right end
The ladder of rising is arc transiting surface between adjacent steps；Traveling wheel setting is in target head track (211)；
In the swing target head in the rotation centerline of screw putter (209) and movable sample stage in the rotation of elevating lever (110)
Heart line is mutually perpendicular to, and target head (201) is set to specimen holder top plate (103) side.
2. the magnetic control sputtering film plating device relative motion machine according to claim 1 suitable for conformal substrate surface plated film
Structure, it is characterised in that: be provided with mechanical seal between the elevating lever (110) and elevating lever through hole；Driving gear shaft (107)
Mechanical seal is provided between driving gear shaft through hole；It is set between target head support tube through hole and target head support tube (205)
It is equipped with mechanical seal.
3. utilizing the magnetic control sputtering film plating device relative motion machine for being suitable for conformal substrate surface plated film as described in claim 1
The method that structure carries out conformal substrate surface plated film, it is characterised in that: this method follows the steps below:
One, target head (201), target head bracket (202), bellows (203) and target head track (211) are stretched into magnetron sputtering plating
In device in target head installing pipe, the target head of the lateral vacuum room flange (204) and target head installation tube end setting of target head will be swung
Mounting flange connection；Specimen holder supporting plate (102), specimen holder and driving gear (106) are stretched into magnetic control sputtering film plating device
In internal vacuum chamber, vacuum chamber bottom in the lower vacuum room flange (101) of movable sample stage and magnetic control sputtering film plating device
The vacuum chamber sealing flange connection of open end setting；
Two, the preparation before plated film:
Target and the cleaning of conformal substrate, obtain clean target, then install clean target on target head (201), while will be conformal
Substrate clamping is on the specimen holder top plate (103) of sample carrier, by vacuum chamber in magnetic control sputtering film plating device；
Three, target head stepping is arranged
Step number by target head driving motor (208) adjustment target head (201) is 10~50 times, and step distance is 5~30mm,
Residence time in each position is 20~500s；
Four, specimen holder revolving speed and lifting speed setting
It is 1~20r/min by the revolving speed that rotary electric machine (108) adjust specimen holder；Specimen holder is adjusted by lifting motor (113)
Lifting speed be 1~200mm/min；
Five, plated film:
Vacuum room temperature in magnetic control sputtering film plating device is warming up to 100~600 DEG C, and keeps the temperature 30~60min；Then to vacuum
Interior is passed through argon gas, then starts to carry out plated film；Magnetic control sputtering film plating device power supply is closed after the completion of plated film, to vacuum Indoor Temperature
After degree is down to 25 DEG C~70 DEG C, that is, complete.
4. according to claim 3 utilize the opposite fortune for being suitable for conformal substrate surface plated film in magnetic control sputtering film plating device
The method that motivation structure carries out conformal substrate surface plated film, it is characterised in that: will be true in magnetic control sputtering film plating device described in step 2
Empty room is evacuated to 5.0 × 10-5~8.0 × 10-4Pa。
5. according to claim 3 utilize the opposite fortune for being suitable for conformal substrate surface plated film in magnetic control sputtering film plating device
The method that motivation structure carries out conformal substrate surface plated film, it is characterised in that: the work of target described in step 2 and the cleaning of conformal substrate
Skill are as follows: target and conformal substrate are successively placed in acetone, alcohol and deionized water, are respectively 300~600W in ultrasonic power
Under conditions of clean 10~15min.
6. according to claim 3 utilize the opposite fortune for being suitable for conformal substrate surface plated film in magnetic control sputtering film plating device
The method that motivation structure carries out conformal substrate surface plated film, it is characterised in that: in progress coating process described in step 5, target power
The setting of parameter are as follows: 100~300W of power, pulse width are set as 10~100 μ s, and set of frequency is 100~3000Hz.
7. according to claim 3 utilize the opposite fortune for being suitable for conformal substrate surface plated film in magnetic control sputtering film plating device
The method that motivation structure carries out conformal substrate surface plated film, it is characterised in that: the air pressure of argon gas described in step 5 is 0.1~1.0Pa.
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| CN201811313451.5A CN109182991B (en) | 2018-11-06 | 2018-11-06 | Relative movement mechanism of magnetron sputtering coating device suitable for coating film on conformal substrate surface and coating method thereof |
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| CN110904423A (en) * | 2019-12-31 | 2020-03-24 | 昆山吉纳尔车料有限公司 | A frame hanger for vacuum coating |
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