CN207799123U - 具高深宽比光导孔阵列的光导板 - Google Patents
具高深宽比光导孔阵列的光导板 Download PDFInfo
- Publication number
- CN207799123U CN207799123U CN201820065455.5U CN201820065455U CN207799123U CN 207799123 U CN207799123 U CN 207799123U CN 201820065455 U CN201820065455 U CN 201820065455U CN 207799123 U CN207799123 U CN 207799123U
- Authority
- CN
- China
- Prior art keywords
- groove
- light guide
- guide hole
- metal sheet
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 42
- 229910052751 metal Inorganic materials 0.000 claims abstract description 58
- 239000002184 metal Substances 0.000 claims abstract description 58
- 238000000034 method Methods 0.000 claims abstract description 29
- 238000005530 etching Methods 0.000 claims abstract description 21
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 abstract description 2
- 235000013399 edible fruits Nutrition 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000012407 engineering method Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 238000005314 correlation function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Landscapes
- Light Guides In General And Applications Therefor (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201820065455.5U CN207799123U (zh) | 2018-01-15 | 2018-01-15 | 具高深宽比光导孔阵列的光导板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201820065455.5U CN207799123U (zh) | 2018-01-15 | 2018-01-15 | 具高深宽比光导孔阵列的光导板 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN207799123U true CN207799123U (zh) | 2018-08-31 |
Family
ID=63271074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201820065455.5U Active CN207799123U (zh) | 2018-01-15 | 2018-01-15 | 具高深宽比光导孔阵列的光导板 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN207799123U (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110045445A (zh) * | 2018-01-15 | 2019-07-23 | 茂邦电子有限公司 | 具高深宽比光导孔阵列的光导板及其制造方法 |
-
2018
- 2018-01-15 CN CN201820065455.5U patent/CN207799123U/zh active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110045445A (zh) * | 2018-01-15 | 2019-07-23 | 茂邦电子有限公司 | 具高深宽比光导孔阵列的光导板及其制造方法 |
CN110045445B (zh) * | 2018-01-15 | 2021-06-29 | 茂邦电子有限公司 | 具高深宽比光导孔阵列的光导板及其制造方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101668389B (zh) | 高对准度印制线路板的制作方法 | |
KR102474454B1 (ko) | 증착 마스크의 제조 방법 및 증착 마스크 | |
DE69033135T2 (de) | Verfahren zum Schneiden eines Substrates aus Silizium mittels einer preferentiellen Ätzung | |
JPH0529638B2 (zh) | ||
JP2014148745A (ja) | 蒸着マスクの製造方法および蒸着マスク | |
JP6468480B2 (ja) | 蒸着マスクの製造方法および蒸着マスク | |
CN207799123U (zh) | 具高深宽比光导孔阵列的光导板 | |
EP1707648B1 (en) | Deposition mask. | |
US20230192535A1 (en) | Method for introducing a recess into a substrate | |
CN110045445A (zh) | 具高深宽比光导孔阵列的光导板及其制造方法 | |
US7972198B2 (en) | Groove machining method by means of water jet, heat exchanger member, and heat exchanger | |
JP2015067885A (ja) | 蒸着マスクおよび蒸着マスクの製造方法 | |
JPWO2020098645A5 (zh) | ||
US8329047B2 (en) | Method for producing liquid discharge head | |
CN105353592B (zh) | 一种光刻工艺对准方法 | |
DE1275699B (de) | Verfahren zur Herstellung einer magnetischen Duennschichtanordnung | |
KR960042532A (ko) | 박막 자기 헤드의 제조 방법 | |
JP2017057494A (ja) | 蒸着マスク、蒸着マスクの製造方法及び有機半導体素子の製造方法 | |
WO2019136572A1 (zh) | 具高深宽比光导孔阵列的光导板及其制造方法 | |
TW201933620A (zh) | 具高深寬比光導孔陣列之光導板及其製造方法 | |
TWI847145B (zh) | 金屬遮罩及其製造方法 | |
CN218202720U (zh) | 试剂孔板 | |
US20230170139A1 (en) | Method and Apparatus for The Vertical Plating of Magnetic Cores | |
CN101686599A (zh) | 线路板的线路结构及其制作方法 | |
CN1979176A (zh) | 可批次制造垂直式探针卡微孔导板的方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210712 Address after: Room e502b, Taiwan Science and technology enterprise cultivation center, Xiamen Torch hi tech Zone (Xiang'an) Industrial Zone, Fujian Province Patentee after: XIAMEN MSSB TECHNOLOGY Co.,Ltd. Address before: 2nd floor, building B, snpf Plaza, savoraro, Apia, Samoa Patentee before: Aflash Technology, Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
CP01 | Change in the name or title of a patent holder |
Address after: 361101 room e502b, Taiwan Science and technology enterprise cultivation center, Xiamen Torch hi tech Zone (Xiang'an) Industrial Zone, Fujian Province Patentee after: Jingwang Semiconductor (Xiamen) Co.,Ltd. Address before: 361101 room e502b, Taiwan Science and technology enterprise cultivation center, Xiamen Torch hi tech Zone (Xiang'an) Industrial Zone, Fujian Province Patentee before: XIAMEN MSSB TECHNOLOGY CO.,LTD. |
|
CP01 | Change in the name or title of a patent holder |