CN205665511U - Exposure base station and optical equipment that exposes to sun - Google Patents
Exposure base station and optical equipment that exposes to sun Download PDFInfo
- Publication number
- CN205665511U CN205665511U CN201620553224.XU CN201620553224U CN205665511U CN 205665511 U CN205665511 U CN 205665511U CN 201620553224 U CN201620553224 U CN 201620553224U CN 205665511 U CN205665511 U CN 205665511U
- Authority
- CN
- China
- Prior art keywords
- base station
- exposure
- stress
- exposed
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model discloses an exposure base station and optical equipment that exposes to sun belongs to and shows technical field. The exposure base station includes: base station body, air current control system and gas nozzle system, gas nozzle system configuration is on the base station body, and the gas nozzle system is connected with air current control system, and air current control system is used for control from the gaseous flow of gas nozzle system's spun, makes to be used for supporting from the gas nozzle spun gas formation of system to wait to expose the air cushion layer of device. The utility model provides a homogeneity relatively poor problem of exposure, reached the effect of the homogeneity that improves the exposure.
Description
Technical field
This utility model relates to Display Technique field, particularly to one exposure base station and exposure sources.
Background technology
In the manufacture process of display base plate, it usually needs form thin film on substrate, then coat photoetching on thin film
Glue, and use exposure sources, is exposed photoresist by having the mask plate of certain figure, use the most successively development,
Substrate is processed by etching and photoresist stripping process, obtains corresponding figure.
Exposure sources can include exposing base station, and the substrate that can be coated with photoresist is arranged on exposure base station light
Photoresist is exposed.In correlation technique, exposure base station includes: base station body and the vac sorb dress being arranged on base station body
Putting, this vacuum absorption device can be vacuum slot, sucker etc., can be coated with the base of photoresist by vacuum absorption device
Photoresist is exposed on base station body by plate absorption.
During realizing this utility model, inventor finds that correlation technique at least there is problems in that
Exposure base station in correlation technique uses vacuum absorption device to be arranged on by substrate on exposure body, owing to vacuum is inhaled
The adsorption of adsorption device, easily there is depression in region corresponding with vacuum absorption device on substrate, and the surface causing substrate is recessed
Convex injustice, the exposure intensity of the photoresist of substrate zones of different is different, and therefore, the homogeneity of exposure is poor.
Utility model content
The problem poor in order to solve the homogeneity of the exposure base station exposure in correlation technique, this utility model provides one
Exposure base station and exposure sources.Described technical scheme is as follows:
First aspect, it is provided that a kind of exposure base station, described exposure base station includes:
Base station body, jet system and gas nozzle system；
Described gas nozzle system is arranged on described base station body, and described gas nozzle system and described gas flow optimized
System connects, and described jet system, for controlling the flow of the gas from the ejection of described gas nozzle system, makes from described
The gas of gas nozzle system ejection forms the air cushion layer for supporting device to be exposed.
Alternatively, described gas nozzle system includes: multiple gas nozzle devices, and the loading end of described base station body sets
Being equipped with equally distributed multiple opening, each described gas nozzle device is arranged on described base station body by a described opening
On, each described gas nozzle device includes: gas nozzle and the nozzle controller being connected with described gas nozzle；
Wherein, each described gas nozzle is connected with gas source respectively, described jet system and each described nozzle
Controller electrically connects, and described jet system is for controlling with described arbitrary nozzle controller even by arbitrary nozzle controller
The aperture of the gas nozzle connect and opening direction.
Alternatively, described exposure base station also includes:
Flatness obtains system；
Described flatness obtains system and is arranged on the surrounding of described base station body, and is electrically connected with described jet system
Connect；
Described flatness obtains system for obtaining each location point on the surface to be exposed of described device to be exposed
Spatial data, and the spatial data of each location point described is sent to described jet system；
Described jet system, for the spatial data according to each location point described, determines described table to be exposed
The object space coordinate data of the rough location point on face, determines described concavo-convex according to described object space coordinate data
Uneven location point forward projection point on the loading end of described base station body, and by controlling with described forward projection point as circle
The heart, predeterminable range is the nozzle controller in the region of radius, opening of the gas nozzle that control is connected with described nozzle controller
The flatness on described surface to be exposed is adjusted by least one in degree and opening direction.
Alternatively, described exposure base station also includes:
Stress obtains system；
Described stress obtains system and is arranged on the loading end of described base station body, and is electrically connected with described jet system
Connect,
Described stress obtains system and obtains generation when system contacts with described stress for obtaining described device to be exposed
The size of stress, and the size of described stress is sent to described jet system；
Described jet system, in the range of judging whether the size of described stress is positioned at default stress numerical, works as institute
The size stating stress is not positioned at the default range of stress, by controlling each described nozzle controller, controls and each described spray
The size of described stress is adjusted by least one in the aperture of the gas nozzle that mouth controller connects and opening direction.
Alternatively, described device to be exposed is provided with alignment mark, described jet system also with mask plate para-position
System electrically connects,
Described jet system is additionally operable to receive the para-position information that described mask plate alignment system sends, and described para-position is believed
Breath is described mask plate alignment system according to the alignment mark on mask plate and the alignment mark on described device to be exposed, to institute
After stating mask plate and described device para-position to be exposed, generate according to para-position result；
Described jet system is additionally operable to judge the alignment mark on described mask plate and institute according to described para-position information
State whether the alignment mark on device to be exposed is directed at, on the alignment mark on described mask plate and described device to be exposed
During alignment mark misalignment, by controlling each described nozzle controller, control the gas being connected with each described nozzle controller
At least one in the aperture of body nozzle and opening direction makes the alignment mark on described device to be exposed and described mask plate
On alignment mark alignment.
Alternatively, described base station body is the cube structure being provided with cavity, and described jet system includes: air-flow
Controller, described gas flow controller is arranged in described cavity；
Described flatness obtains system and includes: at least two flatness optical sensor, described at least two flatness light
Learn the side, place, two sides arbitrarily intersected that induction apparatus is evenly distributed in four sides of described base station body；
Described stress obtains system and includes: at least two stress induction device, described at least two stress induction device is near institute
Two limits arbitrarily intersected in the four edges of the loading end stating base station body are arranged, and are uniformly distributed.
Alternatively, described flatness acquisition system also includes: at least two induction apparatus support；
Described at least two flatness optical sensor is arranged on described base station by described at least two induction apparatus support
The side, place, two sides arbitrarily intersected in four sides of body.
Alternatively, in the side of each described flatness optical sensor and described base station body, near each described flat
The span of the distance between place, the side plane of smooth degree optical sensor is: 0.1 centimetre～10 centimetres；
Taking of distance between each described flatness optical sensor and the loading end place plane of described base station body
Value scope is 0.1 centimetre～10 centimetres.
Alternatively, each described gas nozzle is connected with described gas source respectively by pipeline；
Described gas flow controller respectively with each described nozzle controller, each described flatness optical sensor and every
Individual described stress induction device electrically connects.
Second aspect, it is provided that a kind of exposure sources, described exposure sources includes: the exposure base station described in first aspect.
The technical scheme that this utility model provides has the benefit that
The exposure base station of this utility model offer and exposure sources, exposure base station includes base station body, jet system
With gas nozzle system, gas nozzle system is arranged on base station body and is connected with jet system, jet system
For controlling the flow of the gas from the ejection of gas nozzle system, the gas from the ejection of gas nozzle system is made to be formed for supporting
The air cushion layer of device to be exposed.Device to be exposed is supported owing to exposure base station forms air cushion layer, compared to vacuum absorption device,
The exposure base station that this utility model provides, without absorption, can be avoided owing to absorption causes the concave-convex surface of device to be exposed not
Flat, that the exposure intensity of the photoresist of device zones of different to be exposed is different situation, therefore, the homogeneity solving exposure is poor
Problem, reached to improve the effect of homogeneity of exposure.
It should be appreciated that it is only exemplary that above general description and details hereinafter describe, can not be limited this
Utility model.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme in this utility model embodiment, required in embodiment being described below
Accompanying drawing to be used is briefly described, it should be apparent that, the accompanying drawing in describing below is only realities more of the present utility model
Execute example, for those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to according to these accompanying drawings
Obtain other accompanying drawing.
Fig. 1 is a kind of structural representation exposing base station that this utility model embodiment provides；
Fig. 2 is the profile of the exposure base station that embodiment illustrated in fig. 1 provides；
Fig. 3 is the structural representation of a kind of gas nozzle device that embodiment illustrated in fig. 1 provides；
Fig. 4 is a kind of use scene graph exposing base station that this utility model embodiment provides；
Fig. 5 is exposure base station and the profile of substrate of embodiment illustrated in fig. 4 offer.
Accompanying drawing herein is merged in description and constitutes the part of this specification, it is shown that meet of the present utility model
Embodiment, and be used for explaining principle of the present utility model together with description.
Detailed description of the invention
In order to make the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with accompanying drawing to this practicality
Novel be described in further detail, it is clear that described embodiment be only this utility model some embodiments rather than
Whole embodiments.Based on the embodiment in this utility model, those of ordinary skill in the art are not making creative work
The all other embodiments obtained under premise, broadly fall into the scope of this utility model protection.
Refer to Fig. 1, it illustrates a kind of structural representation exposing base station 00 that this utility model embodiment provides, ginseng
Seeing Fig. 1, this exposure base station 00 includes: base station body 001, jet system 002 and gas nozzle system 003.
Gas nozzle system 003 is arranged on base station body 001, and gas nozzle system 003 and jet system 002
Connecting (not shown in figure 1), jet system 002, for controlling the flow of the gas from gas nozzle system 003 ejection, makes
Formed for supporting the air cushion layer of device (not shown in figure 1) to be exposed (Fig. 1 from the gas of gas nozzle system 003 ejection
Not shown).
In sum, the exposure base station that this utility model embodiment provides, support owing to exposure base station forms air cushion layer
Device to be exposed, compared to vacuum absorption device, the exposure base station that this utility model embodiment provides, without absorption, can be avoided
Owing to absorption causes the surface irregularity of device to be exposed, the exposure intensity of the photoresist of device zones of different to be exposed is different
Situation, therefore, solve the problem that the homogeneity of exposure is poor, reached to improve the effect of homogeneity of exposure.
Further, refer to Fig. 2, it illustrates a kind of profile exposing base station 00 that embodiment illustrated in fig. 1 provides,
Seeing Fig. 2, form air cushion layer D from the gas of gas nozzle system 003 ejection, gas nozzle system 003 includes: multiple gases spray
Mouth device 0031, the loading end M of base station body 001 is provided with equally distributed multiple opening (not shown in Fig. 2), Mei Geqi
Body spray nozzle device 0031 is arranged on base station body 001 by an opening, and wherein, the shapes and sizes of opening can be according to reality
Border needs to arrange, and this is not construed as limiting by this utility model embodiment.Each gas nozzle device 0031 includes: gas nozzle (Fig. 2
Not shown in) and the nozzle controller (not shown in Fig. 2) that is connected with gas nozzle, each gas nozzle respectively with gas source
(not shown in Fig. 2) connects, and such as, each gas nozzle is connected with gas source respectively by pipeline, jet system 002 and
Each nozzle controller electrically connects, and jet system 002 is for controlling and arbitrary Jet control by arbitrary nozzle controller
The aperture of the gas nozzle that device connects and opening direction.Specifically, jet system 002 can be sent out to arbitrary nozzle controller
Sending aperture regulation signal and/or opening direction regulation signal, this arbitrary nozzle controller can be according to jet system 002
The aperture regulation signal sent and/or opening direction regulation signal, the gas nozzle that regulation is connected with this arbitrary nozzle controller
Aperture and/or opening direction.
Alternatively, refer to Fig. 3, it illustrates the knot of a kind of gas nozzle device 0031 that embodiment illustrated in fig. 1 provides
Structure schematic diagram, sees Fig. 3, and gas nozzle device 0031 includes: gas nozzle 00311 and the spray being connected with gas nozzle 00311
Mouth controller 00312, nozzle controller 00312 can control aperture size and the opening direction of gas nozzle 00311, this gas
Nozzle 00311 can be connected with gas source (not shown in Fig. 3), and this nozzle controller 00312 can be with the air-flow control shown in Fig. 2
System 002 processed electrically connects.
Further, please continue to refer to Fig. 1 or Fig. 2, this exposure base station 00 also includes: flatness obtains system 004.Smooth
Degree acquisition system 004 is arranged on the surrounding of base station body 001, and flatness obtains system 004 and is electrically connected with jet system 002
Connect (the most not shown in Fig. 1 and Fig. 2).
Flatness obtains system 004 and is used for obtaining the surface to be exposed of device to be exposed (the most not shown in Fig. 1 and Fig. 2)
The spatial data of each location point, and send the spatial data of each location point to jet system 002；Gas
Flow control system 002, for the spatial data according to each location point, determines the rough position on surface to be exposed
Put object space coordinate data a little, determine that rough location point is at base station body 001 according to object space coordinate data
Loading end M on forward projection point, and by control with this forward projection point as the center of circle, predeterminable range is the spray in the region of radius
Mouth controller, at least one in the aperture of the gas nozzle that control is connected with nozzle controller and opening direction is come to be exposed
The flatness on the surface to be exposed of device is adjusted.Wherein, flatness acquisition system 004 can include at least two flatness
Optical sensor 0041, at least two flatness optical sensor 0041 is evenly distributed in four sides of base station body 001
The side, place, two sides arbitrarily intersected, alternatively, flatness obtains system 004 and also includes: at least two induction apparatus support
(the most not shown in Fig. 1 and Fig. 2), at least two flatness optical sensor 0041 is arranged on by least two induction apparatus support
The side, place, two sides arbitrarily intersected in four sides of base station body 001, that is to say, each flatness optical sensor
0041 is supported by an induction apparatus support.
In this utility model embodiment, flatness optical sensor 0041 can launch Infrared, can pass through
The Infrared that flatness optical sensor 0041 sends, determines each location point on the surface to be exposed of device to be exposed
Spatial data, this determines that the process that implements of spatial data of each location point is referred to correlation technique,
This utility model embodiment does not repeats them here.
Alternatively, in order to ensure that flatness optical sensor 0041 treats each position on the surface to be exposed of exposure device
Putting the effective of spatial data a little to obtain, each flatness optical sensor 0041, with the side of base station body 001, is leaned on
The span of the distance between place, the side plane of nearly each flatness optical sensor 0041 is: 0.1 centimetre～10 lis
Rice, the span of the distance between the loading end M place plane of each flatness optical sensor 0041 and base station body 001
It it is 0.1 centimetre～10 centimetres.
It should be noted that this utility model embodiment is with arbitrarily intersecting in four sides of base station body 001
Two sides sides, place flatness optical sensor 0041 is set as a example by illustrate, in actual application, it is also possible at base
The side, place, each side of playscript with stage directions body 001 arranges flatness optical sensor 0041, and this is not made by this utility model embodiment
Limit.
Further, please continue to refer to Fig. 1, this exposure base station also includes: stress obtains system 005.Stress obtains system
005 is arranged on the loading end M of base station body 001, and stress obtains system 005 and electrically connects (Fig. 1 with jet system 002
Not shown in).
Stress obtains system 005 and obtains the stress of generation when system 005 contacts with stress for obtaining device to be exposed
Size, and the size of stress is sent to jet system 002；Whether jet system 002 for judging the size of stress
In the range of being positioned at default stress numerical, when the size of stress is not positioned at the default range of stress, by controlling each Jet control
Device, at least one in the aperture of the gas nozzle that control is connected with each nozzle controller and opening direction carrys out the big of counter stress
Little it is adjusted.Wherein, stress acquisition system 005 can include at least two stress induction device 0051, at least two stress sense
Answer the device 0,051 two limits arbitrarily intersected in the four edges of the loading end M of base station body 001 to arrange, and be uniformly distributed.
Preset stress numerical scope can be configured according to actual needs, in the range of the size of stress is positioned at this default stress numerical
Time, the stress between device to be exposed and stress induction device 0051 is less, so can ensure that the deformation of device to be exposed is less,
Device to be exposed is avoided to occur uneven.
It should be noted that this utility model embodiment is with appointing in the four edges of the loading end of base station body 001
The side, place, two limits that meaning intersects illustrates as a example by arranging stress induction device 0051, in actual application, it is also possible at base station
The side, each edge place of the loading end of body 001 all arranges stress induction device 0051, and this is not limited by this utility model embodiment
Fixed.
Alternatively, device to be exposed can be substrate, and this substrate can be transparency carrier or be formed with certain figure
Substrate.When device to be exposed is the substrate being formed with certain figure, this device to be exposed (the most not shown in Fig. 1 and Fig. 2)
On be provided with alignment mark, this alignment mark is for mask plate and this device pair to be exposed to exposure of mask plate alignment system
Position.Mask plate alignment system can be according to the alignment mark on mask plate and the alignment mark on device to be exposed, to mask plate
Carry out para-position with device to be exposed, and generate para-position information according to para-position result.Wherein, mask plate alignment system and mask plate
Alignment system carries out the process of para-position and is referred to correlation technique mask plate and device to be exposed, and this utility model embodiment exists
This repeats no more.
In this utility model embodiment, jet system 002 is also with mask plate alignment system (in Fig. 1 and Fig. 2 the most not
Illustrate) electrical connection.Jet system 002 is additionally operable to receive the para-position information that mask plate alignment system sends, and para-position information is
Mask plate alignment system is according to the alignment mark on the alignment mark on mask plate and device to be exposed, to mask plate and to be exposed
After device para-position, generate according to para-position result；Jet system 002 is additionally operable to judge on mask plate according to para-position information
Whether alignment mark is directed at the alignment mark on device to be exposed, on the alignment mark on mask plate and device to be exposed
During alignment mark misalignment, by controlling each nozzle controller, the gas nozzle that control is connected with each nozzle controller
At least one in aperture and opening direction makes the alignment mark on device to be exposed be directed at the alignment mark on mask plate.
Wherein, the alignment mark on device to be exposed can be arranged on the surface to be exposed of device to be exposed, and para-position information can be
Orthographic projection on the alignment mark on mask plate surface to be exposed on device to be exposed, with the register guide on device to be exposed
Distance between note, this is not construed as limiting by this utility model embodiment.
Alternatively, as in figure 2 it is shown, base station body 001 is the cube structure being provided with cavity (not marking in Fig. 2), gas
Flow control system 002 can include gas flow controller (not shown in Fig. 2), and gas flow controller is arranged on the sky of base station body 001
Intracavity, and gas flow controller respectively with each nozzle controller, each flatness optical sensor and each stress induction device
Electrical connection.
Along with thin film transistor liquid crystal display screen is (English: Thin Film Transistor Liquid Crystal
Display；Being called for short: TFT-LCD) Display Technique constantly improves, and production equipment develops towards the direction of precise treatment, people are for aobvious
Show that the image quality of panel there has also been higher pursuit.In the production process of display floater, the exposure accuracy of exposure sources determines
The resolution of the display floater produced, wherein, in exposure process, the flatness for substrate has high requirement, and traditional
The exposure base station of exposure sources use vacuum slot, fix between substrate, and vacuum slot logical by the way of vac sorb
Set up and be equipped with the groove for the gas between vacuum valve is guided, so, with vacuum slot and groove on substrate
Easily there is depression in corresponding region, causes the surface irregularity of substrate, and the homogeneity of exposure is poor, ultimately results in substrate
Display brightness or the Show Color of viewing area are uneven, cause display bad.
Chinese patent (publication number: CN105045048A) discloses a kind of exposure base station device, this exposure base station device bag
Include base and the multiple base station bodies being arranged on base and multiple lift portion, compared to traditional exposure base station, being incident to
Base station body and the exposure light of interval region lifted between portion occur the optical path difference of reflection to reduce, so that the exposure of substrate
More uniform.But it still needs vacuum absorption device, can not fundamentally solve the display caused because of vac sorb
Bad, so still there is the problem of the surface irregularity of substrate, the homogeneity of exposure is poor.
The exposure base station that this utility model embodiment provides, supports substrate by forming air cushion layer, inhales compared to vacuum
Adsorption device, it is not necessary to absorption, can avoid owing to absorption causes the surface irregularity of substrate, the photoresist of substrate zones of different
The situation that exposure intensity is different, it is thus possible to improve the homogeneity of exposure, and then improve the yield of product.
In sum, the exposure base station that this utility model embodiment provides, support owing to exposure base station forms air cushion layer
Device to be exposed, compared to vacuum absorption device, the exposure base station that this utility model embodiment provides, without absorption, can be avoided
Owing to absorption causes the surface irregularity of device to be exposed, the exposure intensity of the photoresist of device zones of different to be exposed is different
Situation, therefore, solve the problem that the homogeneity of exposure is poor, reached to improve the effect of homogeneity of exposure.
Refer to Fig. 4 and Fig. 5, it illustrates the use scene graph of the exposure base station that this utility model embodiment provides, ginseng
Seeing Fig. 4 or Fig. 5, this use scene for illustrating as a example by substrate 01, can pass through mechanical arm (Fig. 4 and Fig. 5 by device to be exposed
In the most not shown) substrate 01 is carried, this mechanical arm can with exposure base station jet system 002 electrically connect.Should
Exposure base station in use, can include several under several stages:
Substrate is loaded into the stage: after substrate 01 is carried to expose above base station by mechanical arm, mechanical arm is to gas flow optimized system
System 002 transmission is for indicating the loading signal being loaded into substrate 01, and jet system 002 is according to this loading signal, to each gas
The nozzle controller of body spray nozzle device 0031 sends aperture and tunes up signal, and each nozzle controller controls corresponding gas nozzle
Aperture increases, and makes the flow increase of the gas sprayed from each gas nozzle.
Substrate unloading phase: mechanical arm drives substrate 01 to decline, makes substrate move, along with mechanical arm near 01 exposure base station
Decline, the gas sprayed from each gas nozzle forms the air cushion layer D (as shown in Figure 5) for supporting substrate 01, substrate 01
Effect of lifting low suspension at this air cushion layer D.Afterwards, mechanical arm exits exposure base station, and mechanical arm is to jet system simultaneously
002 sends the unloader signal unloading carried base board 01 for instruction.
The para-position stage: jet system 002 according to unloader signal to the Jet control of each gas nozzle device 0031
Device sends aperture and turns signal down, and each nozzle controller controls the aperture of corresponding gas nozzle and reduces, and makes to spray from each gas
The flow of the gas of mouth ejection reduces, and during the flow of gas reduces, substrate 01 is gradually lowered, when substrate 01 is reduced to
And when the distance between the loading end M of base station body 001 is in the range of predeterminable range, substrate 01 and at least one para-position stress sense
Answering device contact to produce stress, this at least one para-position stress induction device can obtain this stress and to jet system 002
Give this stress, when jet system 002 receives this stress, by the nozzle controller control of each gas nozzle device 0031
The aperture making corresponding gas nozzle keeps current aperture, and meanwhile, jet system 002 is to each gas nozzle device 0031
Nozzle controller sending direction regulation signal, each nozzle controller by control corresponding gas nozzle opening direction pair
Airflow direction is adjusted, and makes air cushion layer D move and lift substrate 01 and moves and contact to each para-position stress induction device, substrate
01 produces stress with the extruding of each para-position stress induction device, and each para-position stress induction device can obtain the big of corresponding stress
Little, and the size of this stress is sent to jet system 002, jet system 002 judges that the size of each stress is
No be positioned at default stress numerical in the range of, when exist at least one stress size be not positioned in the range of default stress numerical time,
The size of this stress is adjusted by jet system 002 by controlling corresponding gas nozzle device 0031, makes this stress
Size be positioned at this default stress numerical in the range of.When the size of the stress of all of para-position stress induction device transmission is all located at pre-
If time in the range of stress numerical, the para-position of substrate 01 completes.
In the flatness regulation stage, flatness obtains system 004 and obtains substrate by each flatness optical sensor 0041
The spatial data of each location point on the surface to be exposed of 01, and send each location point to jet system 002
Spatial data, jet system 002, by contrasting the spatial data of each location point, determines substrate
The object space coordinate data of the rough location point on the surface to be exposed of 01, then according to this object space number of coordinates
According to determining this rough location point forward projection point on the loading end of base station body 001, according to the seat of this forward projection point
Mark data, to centered by this forward projection point, predeterminable range is the spray of each gas nozzle device 0031 in the region of radius
Mouth controller sends aperture regulation signal, carrys out the object space number of coordinates to the rough location point on this surface to be exposed
According to being adjusted, the z-axis data making the spatial data of each location point on surface to be exposed are equal, thus ensure substrate
The flatness on the surface to be exposed of 01.
Exposure stage: after the flatness on the surface to be exposed of substrate 01 has been regulated, it is possible to be exposed operation.
It should be noted that be above by substrate 01 be illustrate as a example by the transparency carrier not including figure work as substrate
01 when including figure, and substrate 01 is additionally provided with alignment mark (the most not shown in Fig. 4 and Fig. 5), can be in conjunction with para-position stress induction
Device and mask plate alignment system (the most not shown in Fig. 4 and Fig. 5) carry out para-position to substrate 01, specifically:
Can first with para-position stress induction device jet system 002 substrate 01 is carried out para-position, it is all of right to make
In the range of the size of the stress that position stress induction device obtains is all located at presetting stress numerical, afterwards by flatness optical sensor
0041 and jet system 002 coordinate and flatness be adjusted, then by mask plate alignment system according on mask plate
Alignment mark and the alignment mark on substrate 01, carry out para-position to mask plate and substrate 01, and mask plate alignment system can basis
Para-position result generates para-position information, and para-position information is sent to jet system 002, and jet system 002 can root
According to para-position information, control the openings of corresponding gas nozzle always by the nozzle controller of each gas nozzle device 0031
Air cushion layer D is moved so that air cushion layer D drives substrate 01 to move, so that the alignment mark on substrate 01 and mask plate
On alignment mark alignment, the para-position of substrate 01 completes.
In sum, the exposure base station that this utility model embodiment provides, support owing to exposure base station forms air cushion layer
Device to be exposed, compared to vacuum absorption device, the exposure base station that this utility model embodiment provides, without absorption, can be avoided
Owing to absorption causes the surface irregularity of device to be exposed, the exposure intensity of the photoresist of device zones of different to be exposed is different
Situation, therefore, solve the problem that the homogeneity of exposure is poor, reached to improve the effect of homogeneity of exposure.
This utility model embodiment additionally provides a kind of exposure sources, and this exposure sources includes the exposure shown in Fig. 1 or Fig. 2
Base station.
In sum, the exposure sources that this utility model embodiment provides includes exposing base station, owing to exposure base station is formed
Air cushion layer supports device to be exposed, compared to vacuum absorption device, the exposure base station that this utility model embodiment provides without
Absorption, can avoid owing to absorption causes the surface irregularity of device to be exposed, the photoresist of device zones of different to be exposed
The different situation of exposure intensity, therefore, solve the problem that the homogeneity of exposure is poor, reached to improve the homogeneity of exposure
Effect.
Term "and/or" in this utility model, a kind of incidence relation describing affiliated partner, expression can exist
Three kinds of relations, such as, A and/or B, can represent: individualism A, there is A and B, individualism B these three situation simultaneously.Separately
Outward, character "/" herein, typically represent the forward-backward correlation relation to liking a kind of "or".
Term " at least one of A and B " in this utility model, a kind of incidence relation describing affiliated partner, table
Show and can there are three kinds of relations, such as, at least one of A and B, can represent: individualism A, there is A and B simultaneously, individually deposit
In B these three situation.
The foregoing is only preferred embodiment of the present utility model, not in order to limit this utility model, all in this practicality
Within novel spirit and principle, any modification, equivalent substitution and improvement etc. made, should be included in guarantor of the present utility model
Within the scope of protecting.
Claims (10)
1. an exposure base station, it is characterised in that described exposure base station includes:
Base station body, jet system and gas nozzle system；
Described gas nozzle system is arranged on described base station body, and described gas nozzle system and described jet system
Connecting, described jet system, for controlling the flow of the gas from the ejection of described gas nozzle system, makes from described gas
The gas of nozzle system ejection forms the air cushion layer for supporting device to be exposed.
Exposure base station the most according to claim 1, it is characterised in that
Described gas nozzle system includes: multiple gas nozzle devices, the loading end of described base station body is provided with and uniformly divides
Multiple openings of cloth, each described gas nozzle device is arranged on described base station body by a described opening, Mei Gesuo
State gas nozzle device to include: gas nozzle and the nozzle controller being connected with described gas nozzle；
Wherein, each described gas nozzle is connected with gas source respectively, described jet system and each described Jet control
Device electrically connects, and described jet system is for controlling to be connected with described arbitrary nozzle controller by arbitrary nozzle controller
The aperture of gas nozzle and opening direction.
Exposure base station the most according to claim 2, it is characterised in that described exposure base station also includes:
Flatness obtains system；
Described flatness obtains system and is arranged on the surrounding of described base station body, and electrically connects with described jet system；
Described flatness obtains system for obtaining the space of each location point on the surface to be exposed of described device to be exposed
Coordinate data, and the spatial data of each location point described is sent to described jet system；
Described jet system, for the spatial data according to each location point described, determines on described surface to be exposed
The object space coordinate data of rough location point, determine described uneven according to described object space coordinate data
Location point forward projection point on the loading end of described base station body, and by controlling with described forward projection point as the center of circle, in advance
If distance is the nozzle controller in the region of radius, controls the aperture of gas nozzle that is connected with described nozzle controller and open
The flatness on described surface to be exposed is adjusted by least one in mouth direction.
Exposure base station the most according to claim 3, it is characterised in that described exposure base station also includes:
Stress obtains system；
Described stress obtains system and is arranged on the loading end of described base station body, and electrically connects with described jet system,
Described stress obtains the stress that system produces when system contacts for obtaining described device to be exposed to obtain with described stress
Size, and to described jet system send described stress size；
Described jet system, in the range of judging whether the size of described stress is positioned at default stress numerical, is answered when described
The size of power is not positioned at the default range of stress, by controlling each described nozzle controller, controls and each described nozzle control
The size of described stress is adjusted by least one in the aperture of the gas nozzle that device processed connects and opening direction.
Exposure base station the most according to claim 4, it is characterised in that be provided with alignment mark on described device to be exposed,
Described jet system also electrically connects with mask plate alignment system,
Described jet system is additionally operable to receive the para-position information that described mask plate alignment system sends, and described para-position information is
Described mask plate alignment system, according to the alignment mark on mask plate and the alignment mark on described device to be exposed, is covered described
After film version and described device para-position to be exposed, generate according to para-position result；
The alignment mark that described jet system is additionally operable to according to described para-position information judges on described mask plate is treated with described
Whether the alignment mark on exposure device is directed at, the alignment mark on described mask plate and the para-position on described device to be exposed
During labelling misalignment, by controlling each described nozzle controller, control the gas spray being connected with each described nozzle controller
At least one in the aperture of mouth and opening direction makes on the alignment mark on described device to be exposed and described mask plate
Alignment mark is directed at.
6. according to the exposure base station described in claim 4 or 5, it is characterised in that
Described base station body is the cube structure being provided with cavity, and described jet system includes: gas flow controller, described
Gas flow controller is arranged in described cavity；
Described flatness obtains system and includes: at least two flatness optical sensor, described at least two flatness optics sense
Answer the side, place, two sides arbitrarily intersected that device is evenly distributed in four sides of described base station body；
Described stress obtains system and includes: at least two stress induction device, described at least two stress induction device is near described base
Two limits arbitrarily intersected in the four edges of the loading end of playscript with stage directions body are arranged, and are uniformly distributed.
Exposure base station the most according to claim 6, it is characterised in that described flatness obtains system and also includes:
At least two induction apparatus support；
Described at least two flatness optical sensor is arranged on described base station body by described at least two induction apparatus support
Four sides in the side, place, two sides arbitrarily intersected.
Exposure base station the most according to claim 6, it is characterised in that
In the side of each described flatness optical sensor and described base station body, near each described flatness optical sensor
The span of the distance between place, the side plane of device is: 0.1 centimetre～10 centimetres；
The value model of the distance between each described flatness optical sensor and the loading end place plane of described base station body
Enclose is 0.1 centimetre～10 centimetres.
Exposure base station the most according to claim 6, it is characterised in that
Each described gas nozzle is connected with described gas source respectively by pipeline；
Described gas flow controller respectively with each described nozzle controller, each described flatness optical sensor and each institute
State the electrical connection of stress induction device.
10. an exposure sources, it is characterised in that described exposure sources includes: the arbitrary described exposure base of claim 1 to 9
Platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620553224.XU CN205665511U (en) | 2016-06-01 | 2016-06-01 | Exposure base station and optical equipment that exposes to sun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620553224.XU CN205665511U (en) | 2016-06-01 | 2016-06-01 | Exposure base station and optical equipment that exposes to sun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205665511U true CN205665511U (en) | 2016-10-26 |
Family
ID=57155939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620553224.XU Expired - Fee Related CN205665511U (en) | 2016-06-01 | 2016-06-01 | Exposure base station and optical equipment that exposes to sun |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205665511U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109158782A (en) * | 2018-08-31 | 2019-01-08 | 京东方科技集团股份有限公司 | Air bearing control system, system of throwing the net, air bearing control method and storage medium |
-
2016
- 2016-06-01 CN CN201620553224.XU patent/CN205665511U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109158782A (en) * | 2018-08-31 | 2019-01-08 | 京东方科技集团股份有限公司 | Air bearing control system, system of throwing the net, air bearing control method and storage medium |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2004069414A (en) | Method for measuring gap between mask and substrate of plasma display panel | |
| CN105388707A (en) | Drawing apparatus | |
| CN205665511U (en) | Exposure base station and optical equipment that exposes to sun | |
| CN108110035A (en) | A kind of Organic Light Emitting Diode substrate and preparation method thereof, display panel | |
| US9417536B2 (en) | Exposure apparatus and exposure system | |
| JP4812422B2 (en) | Exposure apparatus, exposure method, and manufacturing method of display panel substrate | |
| CN101996918B (en) | Method for aligning substrate | |
| CN103257530A (en) | Proximity exposure apparatus, method of forming exposure light in the proximity exposure apparatus and method of manufacturing a display panel substrate | |
| CN106019434A (en) | Optical film and manufacturing method thereof and display device | |
| CN109991819B (en) | Exposure system and method for manufacturing display panel | |
| JP6096515B2 (en) | ITO pattern exposure equipment | |
| JP5184808B2 (en) | Exposure method and exposure apparatus | |
| CN102648518B (en) | Substrate supporting, conveyance, exposure device, supporting member and manufacturing method | |
| CN105182692B (en) | Base plate exposure platform and exposure machine | |
| WO2014190676A1 (en) | Exposure device and exposure method | |
| CN105242495B (en) | Photoetching exposure device | |
| CN102629078A (en) | Exposure technology and device | |
| JP6036958B2 (en) | Exposure equipment | |
| CN206357257U (en) | A kind of nozzle structure | |
| CN105093848B (en) | A kind of exposure sources | |
| CN105425495B (en) | Array substrate and preparation method thereof, display panel and display device | |
| JP2020046681A (en) | Exposure apparatus | |
| CN108732747A (en) | In two generations of one kind, are without Polaroid in the air without media imaging imaging system and method | |
| KR101783731B1 (en) | Mask shaping device and method and exposure device using same | |
| CN210605357U (en) | Lower light source exposure device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161026 |