CN105093848B - A kind of exposure sources - Google Patents
A kind of exposure sources Download PDFInfo
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- CN105093848B CN105093848B CN201510475409.3A CN201510475409A CN105093848B CN 105093848 B CN105093848 B CN 105093848B CN 201510475409 A CN201510475409 A CN 201510475409A CN 105093848 B CN105093848 B CN 105093848B
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- light
- micro
- displacement
- spherical mirror
- exposure sources
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The present invention discloses a kind of exposure sources, and it includes：Illuminating system (10), for irradiating light；Light optimization system (20), equalizing light rays are carried out for receiving light, and to light；Light convergence yoke (30), for receiving the light after equalizing light rays, and line convergence is entered to the light after equalizing light rays；Micro-displacement adjustment system (40), for carrying out micro-displacement adjustment to the fringe region of light convergence yoke (30), so as to carry out light path adjustment to the light of the fringe region in light convergence yoke (30)；Reflective optical assembly (50), for receive it is concentrated after light, and will be concentrated after light reflex to plane of exposure (60).The exposure sources of the present invention, micro-displacement adjustment is carried out to the corner of condenser and edge using the piezoelectric micro-displacement actuator of each corner and Ge Bian center position setting in condenser, the light path of the light of the fringe region in condenser is conditioned, optimizes the part light path being irradiated on light shield.
Description
Technical field
The present invention relates to a kind of exposure sources, more particularly to a kind of proximity printing equipment.
Background technology
At present, for existing proximity printing equipment in exposure process, its exposure accuracy can be by environment temperature, light shield
(Mask) influence of the factor such as deformation and exposure carrying platform flatness.
And in the manufacturing process of existing liquid crystal panel, generally exposed on the glass substrate using proximity printing equipment
Form predetermined pattern.Because the exposure accuracy of existing proximity printing equipment is influenced by the above factor, so utilizing this
Irregular phenomenon occurs in the periphery that the proximity printing equipment of sample exposes the predetermined pattern of formation on the glass substrate.This
Sample, during liquid crystal panel is formed to box afterwards, on the thin film transistor (TFT) and colored filter substrate on array base palte
Pixel between deviation occurs, when this deviation reaches more than 3 μm, to box formed liquid crystal panel just occur light leak and
The bad phenomenons such as contrast decline, have a strong impact on the quality of product.
The content of the invention
In order to solve the above-mentioned problems of the prior art, it is an object of the invention to provide a kind of exposure sources, illumination
System is penetrated, for irradiating light；Light optimizes system, and equalizing light rays are carried out for receiving the light, and to the light；
Light convergence yoke, for receiving the light after equalizing light rays, and line convergence is entered to the light after equalizing light rays；Microbit
The whole system of transposition, for carrying out micro-displacement adjustment to the fringe region of the smooth convergence yoke, so as to being assembled in the light
The light of the fringe region of system carries out light path adjustment；Reflective optical assembly, for receive it is concentrated after light, and will be concentrated
Light afterwards reflexes to plane of exposure.
Further, the smooth convergence yoke is spherical mirror.
Further, the micro-displacement adjustment system is piezoelectric micro-displacement actuator；Wherein, in the sphere optically focused
Each corner of mirror and each side center position are respectively provided with piezoelectric micro-displacement actuator.
Further, the piezoelectric micro-displacement actuator of each corner of the spherical mirror drives the sphere to gather
Each corner of light microscopic micro-displacement in the border circular areas with predetermined radii moves.
Further, the predetermined radii is not more than 1.4 μm.
Further, described in the piezoelectric micro-displacement actuator driving of each side center position of the spherical mirror
Each side of spherical mirror micro-displacement in the linearity region with predetermined distance range moves.
Further, the predetermined distance range is not less than -1.4 μm and no more than 1.4 μm.
Further, the illuminating system includes：Snoot, its cross sectional shape parabolically shape；Light source, it is arranged at institute
State parabolical apex；Wherein, the snoot enters line convergence to light caused by the light source；First speculum, is used for
Light after snoot convergence is reflexed into the light optimization system.
Further, the light optimization system includes：Controlling switch, for being opened or closed according to control instruction；Light harvesting
Device, for when the controlling switch is opened, light to be carried out to the light passed through via the controlling switch in open mode
Line homogenizes.
Further, the reflective optical assembly includes：Second speculum, for receiving after the smooth convergence yoke is assembled
Light, and will be concentrated after light reflex to plane of exposure；Illumination photometer, it is arranged under second speculum, for measuring
Survey the illumination for the light for exposing to second speculum.
Beneficial effects of the present invention：In the center position of each corner and Ge Bian of condenser, piezoelectric ceramics microbit is set
Driver is moved, micro-displacement adjustment is carried out to the corner of condenser and edge using the piezoelectric micro-displacement actuator so that place
The light path of light in the fringe region of condenser is finely adjusted section, optimizes the part light path being irradiated on light shield, real
Now to the correction of exposure accuracy.Expose to form predetermined figure on the glass substrate using exposure sources according to an embodiment of the invention
During case, the position of predetermined pattern can be suitably corrected, so that when forming liquid crystal panel to box, the film crystal on array base palte
The deviation occurred between pixel on pipe and colored filter substrate reduces or is not in deviation, and then makes what box was formed
Liquid crystal panel occurs without light leakage phenomena, to lift the quality of product.
Brief description of the drawings
The following description carried out in conjunction with the accompanying drawings, above and other aspect, feature and the advantage of embodiments of the invention
It will become clearer, in accompanying drawing：
Fig. 1 is the structural representation of exposure sources according to an embodiment of the invention；
Fig. 2 be it is according to an embodiment of the invention using piezoelectric micro-displacement actuator to spherical mirror carry out microbit
The whole schematic diagram of transposition；
Fig. 3 is that exposure light according to an embodiment of the invention is trimmed off the whole front and rear signal of the amendment to exposing patterns
Figure.
Embodiment
Hereinafter, with reference to the accompanying drawings to embodiments of the invention are described in detail.However, it is possible to come in many different forms real
Apply the present invention, and the specific embodiment of the invention that should not be construed as limited to illustrate here.Conversely, there is provided these implementations
Example is in order to explain the principle and its practical application of the present invention, so that others skilled in the art are it will be appreciated that the present invention
Various embodiments and be suitable for the various modifications of specific intended application.
In the accompanying drawings, identical label can be used to represent identical element in entire disclosure and accompanying drawing.
It will be appreciated that although can be used term " first ", " second " etc. to describe various elements herein, but these
Element should not be limited by these terms.These terms are only used for making a distinction an element with another element.
Fig. 1 is the structural representation of exposure sources according to an embodiment of the invention.
Reference picture 1, exposure sources according to an embodiment of the invention include：Illuminating system 10, light optimization system 20, light
Convergence yoke 30, micro-displacement adjustment system 40 and reflective optical assembly 50.
Illuminating system 10 irradiates light L.Further, in the present embodiment, the light that illuminating system 10 irradiates
Line L is ultraviolet light, but the present invention is not restricted to this.
Light optimization system 20 receives the light L that irradiates of illuminating system 10, and the light L is carried out uniform-illumination and
Light is homogeneous.Light L after uniform-illumination and light are homogeneous is emitted to light convergence yoke 30 by light optimization system 20.
Light convergence yoke 30 receives the light L after uniform-illumination and light are homogeneous that light optimization system 20 is emitted, and right
Light L after uniform-illumination and light are homogeneous enters line convergence.
When light convergence yoke 30 enters line convergence to the light L after uniform-illumination and light are homogeneous or afterwards, microbit
The whole system 40 of transposition carries out micro-displacement adjustment to the fringe region of light convergence yoke 30, so as to complete in light convergence yoke 30
Fringe region it is concentrated after light L be adjusted.It should be noted that during this adjustment, micro-displacement adjustment
System 40 will not produce the micro-displacement adjustment to the central area of light convergence yoke 30, so as to would not also produce in light meeting
The central area of poly- system 30 it is concentrated after light L adjustment, and then the center of light convergence yoke 30 can be guaranteed at
Region it is concentrated after light L light quantity, i.e., can ensure the light L of central optical path light quantity.Light convergence yoke 30 will be through
Light L after convergence is emitted to reflective optical assembly 50 (including the light L adjusted through micro-displacement adjustment system 40).
Reflective optical assembly 50 receive the outgoing of light convergence yoke 30 it is concentrated after light L, and will be concentrated after light L
Reflex to light shield (i.e. plane of exposure) 60.
Specifically, in the present embodiment, irradiation photosystem 10 includes：Snoot 11, the speculum 13 of light source 12 and first.It is poly-
Parabolically shape, light source 12 are arranged at parabolical apex to the cross sectional shape of light shield 11.In this embodiment, it is preferred that light
Source 12 is steeped using extra-high-pressure mercury vapour lamp, but the present invention is not restricted to this.Light L caused by light source 12 is after the convergence of snoot 11
The first speculum 13 is emitted to, the first speculum 13 is emitted to light optimization system to the light L reflections after the convergence of snoot 11
20。
Light optimization system 20 includes：Controlling switch 21 and optical collector 22.In the present embodiment, controlling switch 21 can be according to control
System instruction (it can be sent by the control system of exposure sources) opens or closes；Wherein, when controlling switch 21 controls according to opening
During instruction unpack, light L passes through via controlling switch 21.Light L by rear, shines via the controlling switch 21 in open mode
It is mapped on optical collector 22, optical collector 22 carries out uniform-illumination to light L and light is homogeneous.Optical collector 22 will be through uniform-illumination and light
Light L after line is homogeneous is emitted to light convergence yoke 30.
In this embodiment, it is preferred that light convergence yoke 30 is made up of condenser, the condenser can be for example sphere optically focused
Mirror, but the present invention is not restricted to this；For example, light convergence yoke 30 can also be the member for being capable of converging light of other suitable types
Device is formed.Spherical mirror 30 receives the light L after uniform-illumination and light are homogeneous that optical collector 22 is emitted, and to through shining
Light L after the uniform light of degree is homogeneous enters line convergence.
In this embodiment, it is preferred that micro-displacement adjustment system 40 is made up of piezoelectric micro-displacement actuator, but this hair
It is bright to be not restricted to this；For example, micro-displacement adjustment system 40 can also be by other suitable types can be to spherical mirror 30
The local component for carrying out micro-displacement adjustment.
In this embodiment, it is preferred that reflecting system 50 includes the second speculum 51 and illumination photometer 52.Second speculum 51
Receive spherical mirror 30 be emitted it is concentrated after light L, and will be concentrated after light L reflex to light shield 60.Illumination photometer
52 are arranged under the second speculum 51, to measure the illumination of the light L after being emitted to concentrated on the second speculum 51.
Hereinafter, by arrangement of the piezoelectric micro-displacement actuator 40 on spherical mirror 30 and to spherical mirror
30 micro-displacement adjustment is described in detail.
Fig. 2 be it is according to an embodiment of the invention using piezoelectric micro-displacement actuator to condenser carry out microbit transposition
Whole schematic diagram.
Referring to Figures 1 and 2, the top view rectangular shaped of spherical mirror 30 according to an embodiment of the invention, it has
There are four corners and four edges, one is respectively set in the center position of each corner and Ge Bian of the second spherical mirror 30
Piezoelectric micro-displacement actuator 40, so, set on the back side of spherical mirror 30 (it is relative with the surface for receiving light L)
Put eight piezoelectric micro-displacement actuators 40 altogether.
It should be appreciated that the quantity and installation site of piezoelectric micro-displacement actuator 40 can be according to the second sphere optically focused
The actual conditions such as shape, size and the correction requirement to exposure accuracy of mirror 30 are adjusted, it is ensured that can gather the second sphere
The fringe region of light microscopic 30 realizes predetermined micro-displacement as needed, and the present invention is simultaneously not especially limited.
In the present embodiment, the piezoelectric micro-displacement actuator 40 of each corner of spherical mirror 30 drives it corresponding
Corner moved in the border circular areas (being represented in Fig. 2 with broken circle) with predetermined radii.In this embodiment, it is preferred that
The predetermined radii is not more than 1.4 μm, can so ensure not interfering with the light L of the central area of spherical mirror 30 light quantity,
But the invention is not limited in this.
When each piezoelectric micro-displacement actuator 40 in center position of spherical mirror 30 drives each corresponding to it
Moved in the linearity region (being represented in Fig. 2 with dotted rectangle) with predetermined distance range.In the present embodiment, preferably
Ground, the predetermined distance range are not less than -1.4 μm and no more than 1.4 μm, can so ensure not interfering with spherical mirror 30
The light L of central area light quantity, but the invention is not limited in this.
It should be noted that in the present embodiment, any position and any number of pressure can be driven according to the actual requirements
Electroceramics micro-displacement driver 40, the present invention are simultaneously not especially limited.
So, the corner of spherical mirror 30 and edge are carried out by using multiple piezoelectric micro-displacement actuators 40
Micro-displacement adjusts, and so as to be finely adjusted section to the light path of the light L in the fringe region in spherical mirror 30, optimizes photograph
The part light path being mapped on light shield, realizes the correction to exposure accuracy；Do not influence the center in spherical mirror 30 again simultaneously
The light path of light L in region, to ensure the normal light quantity of the light L in the central area in spherical mirror 30 not by shadow
Ring, i.e., the light L in central area in spherical mirror 30 is to unaffected by the light exposure for the object being exposed.
Fig. 3 is that exposure light according to an embodiment of the invention is trimmed off the whole front and rear signal of the amendment to exposing patterns
Figure.
Reference picture 3, it is assumed that (i.e. light shield 60 is to being exposed by the exposure interval D of exposure sources according to an embodiment of the invention
The distance between object 100) be 200 μm, exposure light caused by exposure sources is irradiated to pair being exposed by light shield 60
As on (glass substrate etc.) 100, piezoelectric micro-displacement actuator 40 carries out micro-displacement adjustment, example to spherical mirror 30
Such as, the micro-displacement of piezoelectric micro-displacement actuator 40 adjustment spherical mirror 30, changes the curvature angles θ of spherical mirror 30
0.4 degree, the distance that the exposing patterns on the object 200 being exposed are corrected is sin0.4=1.4 μm of Δ x=200 μ ms, i.e.,
1.4 μm have been corrected equivalent to the exposing patterns on the object 200 being exposed.
In summary, exposure sources according to an embodiment of the invention, at the center of each corner and Ge Bian of condenser
Opening position sets piezoelectric micro-displacement actuator, corner and edge using the piezoelectric micro-displacement actuator to condenser
Carry out micro-displacement adjustment so that the light path of the light in the fringe region in condenser is finely adjusted section, optimizes irradiation
Part light path on to light shield, realizes the correction to exposure accuracy.Using exposure sources according to an embodiment of the invention in glass
When exposure forms predetermined pattern on glass substrate, the position of predetermined pattern can be suitably corrected, so as to form liquid crystal panel to box
When, the deviation occurred between the pixel on thin film transistor (TFT) and colored filter substrate on array base palte reduces or will not gone out
Existing deviation, and then make to occur without light leakage phenomena to the liquid crystal panel that box is formed, to lift the quality of product.
Although the present invention has shown and described with reference to specific embodiment, it should be appreciated by those skilled in the art that：
In the case where not departing from the spirit and scope of the present invention limited by claim and its equivalent, can carry out herein form and
Various change in details.
Claims (9)
- A kind of 1. exposure sources, it is characterised in that by illuminating system (10), light optimize system (20), spherical mirror (30), Micro-displacement adjustment system (40), reflective optical assembly (50) composition；The illuminating system (10) is used to irradiate light；The light optimization system (20) is used to receive the light, and carries out equalizing light rays to the light；The spherical mirror (30) is used to receive the light after equalizing light rays, and the light after equalizing light rays is entered Line convergence, and the light after convergence is reflexed into the reflective optical assembly (50)；The micro-displacement adjustment system (40) is used to carry out the fringe region of the spherical mirror (30) in presumptive area Micro-displacement adjusts, so as to carry out light path adjustment to the light of the fringe region in the spherical mirror (30)；The reflective optical assembly (50) be used for receive it is concentrated after light, and will be concentrated after light reflex to plane of exposure (60)。
- 2. exposure sources according to claim 1, it is characterised in that the micro-displacement adjustment system (40) is piezoelectric ceramics Micro-displacement driver；Wherein, it is respectively provided with piezoelectricity pottery in each corner of the spherical mirror (30) and each side center position Porcelain micro-displacement driver (40).
- 3. exposure sources according to claim 2, it is characterised in that the pressure of each corner of the spherical mirror (30) Electroceramics micro-displacement driver (40) drives each corner of the spherical mirror (30) in the border circular areas with predetermined radii Interior micro-displacement movement.
- 4. exposure sources according to claim 3, it is characterised in that the predetermined radii is not more than 1.4 μm.
- 5. exposure sources according to claim 2, it is characterised in that each side center of the spherical mirror (30) The piezoelectric micro-displacement actuator (40) at place drives each side of the spherical mirror (30) with predetermined distance range Micro-displacement moves in linearity region.
- 6. exposure sources according to claim 5, it is characterised in that the predetermined distance range is not less than -1.4 μm and not More than 1.4 μm.
- 7. exposure sources according to claim 1, it is characterised in that the illuminating system (10) includes：Snoot (11), its cross sectional shape parabolically shape；Light source (12), it is arranged at the parabolical apex；Wherein, the snoot (11) is to caused by the light source (12) Light enters line convergence；First speculum (13), optimize system for the light after the snoot (11) convergence to be reflexed into the light (20)。
- 8. exposure sources according to claim 1, it is characterised in that the light optimization system (20) includes：Controlling switch (21), for being opened or closed according to control instruction；Optical collector (22), for when the controlling switch (21) is opened, to via the controlling switch in open mode (21) light passed through carries out equalizing light rays.
- 9. exposure sources according to claim 1, it is characterised in that the reflective optical assembly (50) includes：Second speculum (51), for receive through the spherical mirror (30) convergence after light, and will be concentrated after light Line reflection is to plane of exposure (60)；Illumination photometer (52), it is arranged under second speculum (51), second speculum (51) is exposed to for measuring Light illumination.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510475409.3A CN105093848B (en) | 2015-08-06 | 2015-08-06 | A kind of exposure sources |
| PCT/CN2015/087631 WO2017020351A1 (en) | 2015-08-06 | 2015-08-20 | Exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510475409.3A CN105093848B (en) | 2015-08-06 | 2015-08-06 | A kind of exposure sources |
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| Publication Number | Publication Date |
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| CN105093848A CN105093848A (en) | 2015-11-25 |
| CN105093848B true CN105093848B (en) | 2018-01-16 |
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| CN201510475409.3A Active CN105093848B (en) | 2015-08-06 | 2015-08-06 | A kind of exposure sources |
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| CN (1) | CN105093848B (en) |
| WO (1) | WO2017020351A1 (en) |
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| JP6598827B2 (en) | 2017-08-01 | 2019-10-30 | キヤノン株式会社 | Optical apparatus, exposure apparatus using the same, and article manufacturing method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102135731A (en) * | 2011-01-06 | 2011-07-27 | 中国电子科技集团公司第四十五研究所 | Leveling mechanism for aligning proximity contact photoetching machine with workbench |
| CN103092006A (en) * | 2013-01-25 | 2013-05-08 | 中国科学院上海光学精密机械研究所 | Lithography illumination system |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62134650A (en) * | 1985-12-06 | 1987-06-17 | Canon Inc | Illuminating optical system |
| US6411426B1 (en) * | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
| DE10045265A1 (en) * | 2000-09-13 | 2002-03-21 | Zeiss Carl | Device for focusing the radiation from a light source |
| CN1743960A (en) * | 2004-09-03 | 2006-03-08 | 三荣技研株式会社 | Exposure light source |
| JP4817702B2 (en) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | Optical apparatus and exposure apparatus provided with the same |
| CN203217248U (en) * | 2013-04-23 | 2013-09-25 | 合肥京东方光电科技有限公司 | Exposure machine |
| JP6336274B2 (en) * | 2013-12-25 | 2018-06-06 | キヤノン株式会社 | Optical apparatus, projection optical system, exposure apparatus, and article manufacturing method |
-
2015
- 2015-08-06 CN CN201510475409.3A patent/CN105093848B/en active Active
- 2015-08-20 WO PCT/CN2015/087631 patent/WO2017020351A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102135731A (en) * | 2011-01-06 | 2011-07-27 | 中国电子科技集团公司第四十五研究所 | Leveling mechanism for aligning proximity contact photoetching machine with workbench |
| CN103092006A (en) * | 2013-01-25 | 2013-05-08 | 中国科学院上海光学精密机械研究所 | Lithography illumination system |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017020351A1 (en) | 2017-02-09 |
| CN105093848A (en) | 2015-11-25 |
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