CN203217248U - Exposure machine - Google Patents
Exposure machine Download PDFInfo
- Publication number
- CN203217248U CN203217248U CN201320209239.0U CN201320209239U CN203217248U CN 203217248 U CN203217248 U CN 203217248U CN 201320209239 U CN201320209239 U CN 201320209239U CN 203217248 U CN203217248 U CN 203217248U
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- Prior art keywords
- exposure
- catoptron
- governor motion
- support
- exposure machine
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Abstract
The utility model discloses an exposure machine. The exposure machine comprises a light source device, a support, and a reflector arranged on the support, wherein at least one regulating mechanism is arranged between the support and the reflector; the regulating mechanism is capable of forwards pushing or backwards pulling a local structure of the reflector so as to regulate the curvature of the corresponding part of the reflector. The exposure machine is not only capable of achieving highly accurate control on the exposure error of a coating layer, but also applicable to a condition that a panel requires multiple times of exposure and error directions are not identical; the exposure machine is convenient to operate, high in degree of automation and high in regulation accuracy.
Description
Technical field
The utility model relates to the exposure technique field, relates in particular to a kind of exposure machine.
Background technology
In color film product coating (Overlay) exposure process of available liquid crystal panel, as shown in Figure 1, the UV light that exposure machine light supply apparatus 1 produces is seeing through mask version 4(Mask) before the coating 7 of irradiation glass substrate 5, can utilize catoptron 2 that UV light is adjusted to correct position.The miniaturization of color film product needs the high precision int of coating 7 exposures, yet exposure machine can realize that coating 7 exposure accuracy errors have only ± 2.5um at present.
The principal element that influences coating 7 exposure accuracy is: catoptron 2 curvature, mask version 4(Mask) flexibility and glass substrate 5 flatnesses.In the prior art, by introducing mask version 4 clamping devices, can realize the improvement to mask version 4 flexibility; For glass substrate 5 flatnesses, also can realize by the quantity that increases support bar (Pin) improving.When coating 7 is defective, at first will consider and regulate mask version 4 flexibility and glass substrate 5 flatnesses, just consider to adjust catoptron 2 curvature at last.Under the prior art condition, mask version 4 flexibility and glass substrate 5 flatnesses are well controlled.
Yet the catoptron 2 of existing exposure machine is fixed on the support 9 by fixed screw 8, and there are following three defectives in aforesaid way:
One, the mode that adopts fixed screws 8 to fix owing to catoptron 2 when needing the curvature of accommodation reflex mirror 2, can only be carried out simple rough adjusting by the mode of manual adjustments fixed screw 8, but can't carry out the adjusting of precision control.
Two, for the coating that needs multiexposure, multiple exposure, existing exposure machine can only simply be adjusted at the situation of the coating of the direction of error unanimity of as shown in Figure 2 each exposure, then can't regulate automatically for the different coating of each exposure error direction as shown in Figure 3.In Fig. 2 and Fig. 3,1S, 2S, 3S, 4S represent the 1st exposure respectively, the 2nd exposure, the 3rd exposure and the 4th exposure.
Three, the method automaticity of manual adjustments fixed screw 8 is low, influences the equipment mobility.
The utility model content
(1) technical matters that will solve
The technical problems to be solved in the utility model is: provide a kind of mirror curvature of accommodation reflex automatically and accurately, to improve the exposure machine of coating precision.
(2) technical scheme
For addressing the above problem, the utility model provides a kind of exposure machine, comprise light supply apparatus, support and be arranged on catoptron on the support, between described support and described catoptron, be provided with at least one governor motion, governor motion can push away or pull back the partial structurtes of catoptron forward, with the curvature of accommodation reflex mirror appropriate section.
Preferably, described governor motion has one and corresponding to the catoptron medium position, and described catoptron has at least two places to be connected with support around described governor motion.
Preferably, described governor motion has a plurality of, and one of them is the middle part governor motion corresponding to the catoptron medium position, and other described governor motion correspondences are positioned at around this middle part governor motion.
Preferably, described governor motion is the linear motor with stator and mover, and stator wherein is fixed on the support, and mover can push away or pull back the partial structurtes of catoptron forward.
Preferably, also comprise inspection unit for detection of exposure error.
Preferably, also comprise control module, described inspection unit can be given control module with detected exposure error information feedback, and described control module can be controlled the partial structurtes that described governor motion pushed away or pulled back catoptron forward according to described exposure error information.
Preferably, described inspection unit is optical measuring device.
(3) beneficial effect
The exposure machine of the utility model embodiment, not only can realize the high precision int control of coating exposure, and be applicable to the situation that needs multiexposure, multiple exposure and the inconsistent coating of direction of error, it is easy to operate, the automaticity height, and have higher degree of regulation.
Description of drawings
Fig. 1 is the mirror reflects index path of the exposure machine of prior art;
Fig. 2 is the exposure synoptic diagram of the coating of each exposure error direction unanimity;
Fig. 3 is the exposure synoptic diagram of the different coating of each exposure error direction;
Fig. 4 is know-why synoptic diagram of the present utility model;
Fig. 5 is exposure machine structural representation of the present utility model;
Number in the figure: 1-light supply apparatus, 2-catoptron, 3-governor motion, 4-mask version, 5-glass substrate, 6-control module, 7-coating, 8-fixed screw, 9-support, 10-inspection unit.
Embodiment
The utility model is elaborated as follows below in conjunction with drawings and Examples.
Know-why of the present utility model as shown in Figure 4, reflected light path figure when solid line represents catoptron 2 for level crossing among the figure, reflected light path figure when the reflected light path figure when pecked line represents catoptron 2 for convex mirror among the figure, figure middle conductor dotted line represent catoptron 2 for concave mirror.Under the certain condition of mask version 4 and glass substrate 5 flatnesses, influencing coating 7 main error is catoptron 2 curvature, i.e. the raised or sunken degree of catoptron 2.As shown in Figure 4, when catoptron 2 was concave mirror, the pattern that coating 7 forms was littler than the pattern of mask version 4, namely dwindles revisal, and the curvature of depression is more big, and the pattern that coating 7 forms is more little; When catoptron 2 was convex mirror, the pattern that coating 7 forms was bigger than the pattern of mask version 4, namely enlarges revisal, and the curvature of projection is more big, and the pattern that coating 7 forms is more big; Therefore, can regulate the exposure error of coating 7 by the curvature of accommodation reflex mirror 2.
According to above-mentioned principle, the structure of the exposure machine that the utility model proposes as shown in Figure 5, described exposure machine comprises light supply apparatus 1, support 9 and is arranged on catoptron 2 on the support 9, between described support 9 and described catoptron 2, be provided with at least one governor motion 3, governor motion 3 can push away or pull back the partial structurtes of catoptron 2 forward, with the curvature of accommodation reflex mirror 2 appropriate sections.
Described light supply apparatus 1 is for generation of the needed UV light of exposure machine, and described catoptron 2 is adjusted the UV light that light supply apparatus 1 produces by reflection, makes the UV light that sees through mask version 4 irradiation coatings 7 be radiated at position suitable on the coating 7.
Described governor motion 3 can have only one and corresponding to the catoptron medium position, described catoptron 2 has at least two places to be connected with support 9 for stationary mirror around described governor motion 3, can pass through the curvature of governor motion 3 accommodation reflex mirrors 2 integral body of catoptron 2 medium positions thus.
Natch, described governor motion 3 also can have a plurality of, one of them is the middle part governor motion 3 corresponding to catoptron 2 medium positions, other described governor motion 3 correspondences are positioned at around this middle part governor motion 3, thus can by control section or or whole governor motions 3 come the curvature of accommodation reflex mirror 2 appropriate sections.
Described governor motion 3 can be for having the linear motor of stator and mover, and stator wherein is fixed on the support 9, and mover can push away or pull back the partial structurtes of catoptron 2 forward.
Described exposure machine can also comprise the inspection unit 10 for detection of exposure error, described inspection unit 10 can be optical measuring device, for example saturating reflective metals halogen light source and 5 times, 10 times, 20 times or 50 times of cameras etc., the photo of taking coating 7 by camera obtains the exposure area size of coating 7, and relatively obtains the exposure error of coating 7 with the standard exposure zone.
For the robotization that realizes regulating, described exposure machine can also comprise control module 6, and described inspection unit 10 can be given control module 6 with detected exposure error information feedback.Described control module 6 can be controlled the curvature that partial structurtes that described governor motion 3 pushed away or pulled back catoptron 2 are forward controlled catoptron 2 appropriate sections according to described exposure error information.For example, if inspection unit 10 detects the overgauge exposure area, exposure area of coating 7, control module 6 accommodation reflex mirrors 2 realize dwindling revisal for concave mirror; If the exposure area of coating 7 is less than the standard exposure zone, control module 6 accommodation reflex mirrors 2 realize enlarging revisal for convex mirror.Described control module 6 can be common computer, industrial computer or microcontroller etc.For the coating 7 that needs multiexposure, multiple exposure, inspection unit 10 is at the exposure error of each exposure back self-verifying coating 7, and exposure error information is passed to control module 6, control module 6 is according to the curvature of the automatic accommodation reflex mirror 2 of exposure error information, until the exposure error standard that reaches regulation.
Above embodiment only is used for explanation the utility model; and be not to restriction of the present utility model; the those of ordinary skill in relevant technologies field; under the situation that does not break away from spirit and scope of the present utility model; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present utility model, and scope of patent protection of the present utility model should be defined by the claims.
Claims (7)
1. exposure machine, comprise light supply apparatus, support and be arranged on catoptron on the support, it is characterized in that, between described support and described catoptron, be provided with at least one governor motion, governor motion can push away or pull back the partial structurtes of catoptron forward, with the curvature of accommodation reflex mirror appropriate section.
2. exposure machine as claimed in claim 1 is characterized in that, described governor motion has one and corresponding to the catoptron medium position, and described catoptron has at least two places to be connected with support around described governor motion.
3. exposure machine as claimed in claim 1 is characterized in that, described governor motion has a plurality of, and one of them is the middle part governor motion corresponding to the catoptron medium position, and other described governor motion correspondences are positioned at around this middle part governor motion.
4. as claim 1,2 or 3 described exposure machines, it is characterized in that described governor motion is the linear motor with stator and mover, stator wherein is fixed on the support, and mover can push away or pull back the partial structurtes of catoptron forward.
5. as claim 1,2 or 3 described exposure machines, it is characterized in that, also comprise the inspection unit for detection of exposure error.
6. require described exposure machine as right 5, it is characterized in that, also comprise control module, described inspection unit can be given control module with detected exposure error information feedback, and described control module can be controlled the partial structurtes that described governor motion pushed away or pulled back catoptron forward according to described exposure error information.
7. exposure machine as claimed in claim 6 is characterized in that, described inspection unit is optical measuring device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320209239.0U CN203217248U (en) | 2013-04-23 | 2013-04-23 | Exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320209239.0U CN203217248U (en) | 2013-04-23 | 2013-04-23 | Exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203217248U true CN203217248U (en) | 2013-09-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320209239.0U Expired - Lifetime CN203217248U (en) | 2013-04-23 | 2013-04-23 | Exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203217248U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017020351A1 (en) * | 2015-08-06 | 2017-02-09 | 武汉华星光电技术有限公司 | Exposure device |
| CN106909031A (en) * | 2017-03-29 | 2017-06-30 | 合肥京东方显示技术有限公司 | Exposure sources and exposure system |
| CN108761747A (en) * | 2016-08-26 | 2018-11-06 | 常州爱上学教育科技有限公司 | Pick-up lens for shooting special efficacy video and its working method |
-
2013
- 2013-04-23 CN CN201320209239.0U patent/CN203217248U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017020351A1 (en) * | 2015-08-06 | 2017-02-09 | 武汉华星光电技术有限公司 | Exposure device |
| CN108761747A (en) * | 2016-08-26 | 2018-11-06 | 常州爱上学教育科技有限公司 | Pick-up lens for shooting special efficacy video and its working method |
| CN109031618A (en) * | 2016-08-26 | 2018-12-18 | 常州爱上学教育科技有限公司 | It can reduce the pick-up lens of later period special video effect production |
| CN108761747B (en) * | 2016-08-26 | 2022-10-14 | 常州爱上学教育科技有限公司 | Camera lens for shooting special-effect video and working method thereof |
| CN106909031A (en) * | 2017-03-29 | 2017-06-30 | 合肥京东方显示技术有限公司 | Exposure sources and exposure system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130925 |