CN201549466U - Thin film deposition device - Google Patents
Thin film deposition device Download PDFInfo
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- CN201549466U CN201549466U CN2009202207561U CN200920220756U CN201549466U CN 201549466 U CN201549466 U CN 201549466U CN 2009202207561 U CN2009202207561 U CN 2009202207561U CN 200920220756 U CN200920220756 U CN 200920220756U CN 201549466 U CN201549466 U CN 201549466U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a thin film deposition device comprising a reaction chamber and an exciting electrode plate and a grounding electrode plate which are alternatively arranged in the reaction chamber at interval; and the bottom part between the exciting electrode plate and the grounding electrode plate is provided with an isolating part. The thin film deposition device can eliminate radio frequency interference between the electrode plates, thus obviously improving the uniformity of the thin film deposition.
Description
Technical field
The utility model relates to the photovoltaic solar cell technical field, particularly a kind of film deposition apparatus.
Background technology
Along with the worsening shortages of the energy, people pay attention to day by day to the development and utilization of solar energy.Market is to more large tracts of land, the demand lighter and thinner and novel solar battery that production cost is lower increase day by day.In these novel solar batteries, be subjected to worldwide extensive concern based on the exploitation of the thin-film solar cells of silicon materials, particularly large area film solar cell.Thin-film solar cells is few with the silicon amount, easier reducing cost, and under the situation of silicon material constant tension, thin film solar cell has become the new trend and the new focus of solar cell development.
Thin-film solar cells is a multilayer device, and typical thin-film solar cells generally includes the p-i-n laminated construction.Each layer of p-i-n laminated construction is to utilize plasma enhanced chemical vapor deposition (PECVD) technology, deposition forms in large-scale PECVD depositing device, be described in 200820008274.5 the Chinese patent application for example at application number, can be on the large-area substrates surface, the large-scale PECVD depositing device of batch deposition film.Fig. 1 is this simplified equipment structural representation, as shown in Figure 1, alternately places large tracts of land exciting electrode plate 104 and grounding electrode plate 106 at interval in reative cell 100, and the battery lead plate both side surface all can be placed large-area glass substrate 121.Reacting gas enters reative cell 100 by air inlet 114, reacting gas flows along the direction of arrow, and RF excited power supply 117 provides radio-frequency (RF) energy to exciting electrode plate 104, is plasma with reacting gas ionization, at substrate 121 surface deposition films, remaining gas is discharged by gas outlet 118.
In the above-mentioned film deposition apparatus, RF excited power supply 117 provides radio-frequency (RF) energy to exciting electrode plate 104.The frequency of radio-frequency (RF) energy is generally 13.56MHz even higher, when the size of the wavelength of this rf frequency and exciting electrode plate 104 near the time, then can produce the standing wave reflection at the edge of exciting electrode plate 104, as shown in Figure 2, between adjacent two battery lead plates, just can produce serious radio frequency between exciting electrode plate 104 and the grounding electrode plate 106 crosstalks, make the reaction compartment internal electric field Energy distribution between the battery lead plate inhomogeneous, the plasma density of reacting gas is inhomogeneous, the heterogeneity that causes the glass baseplate surface thin film deposition influences the performance of thin-film solar cells.
The utility model content
The purpose of this utility model is to provide a kind of film deposition apparatus, and the radio frequency that can eliminate between the battery lead plate is crosstalked, and significantly improves uniformity of thin film deposition.
On the one hand, the utility model provides a kind of film deposition apparatus, comprises reative cell and the exciting electrode plate and the grounding electrode plate of alternately placing at the reaction partition, and the bottom between described exciting electrode plate and the grounding electrode plate has isolated part.
Preferably, described isolated part is bonding jumper or nonmetal.
Preferably, described bonding jumper is an aluminum strip.
Preferably, described isolated part is a glass bar.
Preferably, described bonding jumper ground connection.
On the other hand, the utility model provides a kind of film deposition apparatus, comprise reative cell and the exciting electrode plate and the grounding electrode plate of alternately placing at the reaction partition, bottom and top between described exciting electrode plate and the grounding electrode plate have isolated part.
Preferably, described isolated part is bonding jumper or nonmetal.
Preferably, described bonding jumper is an aluminum strip.
Preferably, described nonmetal is glass bar.
Preferably, described bonding jumper ground connection.
Compared with prior art, the utlity model has following advantage:
Bottom and the top of film deposition apparatus of the present utility model between the bottom between adjacent two battery lead plates or adjacent two battery lead plates is provided with isolated part, and the height that makes this isolated part is near the base plate bottom zone, this isolated part can play the effect of isolating and offsetting to the standing wave that zone, battery lead plate both ends produces, can effectively reduce or eliminate the influence of standing wave phenomena to the electric field uniformity, the radio frequency that has reduced between the battery lead plate is crosstalked, and the uniformity of plasma density is improved; Simultaneously because the buffer action of isolated part, reduced the generation of dust, avoided the deposition defective, not only can improve uniformity of thin film deposition effectively, improve the opto-electronic conversion performance of thin-film solar cells, and reduced pollutant sources, thus reduced wash number to reative cell, improved production efficiency.
Description of drawings
By the more specifically explanation of the preferred embodiment of the present utility model shown in the accompanying drawing, above-mentioned and other purpose, feature and advantage of the present utility model will be more clear.Reference numeral identical in whole accompanying drawings is indicated identical part.Painstakingly do not draw accompanying drawing in proportion, focus on illustrating purport of the present utility model.In the accompanying drawings, for clarity sake, amplified the thickness of layer.
Fig. 1 is large-scale PECVD depositing device simplified structure schematic diagram;
Fig. 2 is an exciting electrode plate surface field distribution schematic diagram;
Fig. 3 is the structural representation of the utility model first embodiment;
Fig. 4 is the structural representation of the utility model second embodiment.
Described diagrammatic sketch is illustrative, and nonrestrictive, can not excessively limit protection range of the present utility model at this.
Embodiment
For above-mentioned purpose of the present utility model, feature and advantage can be become apparent more, embodiment of the present utility model is described in detail below in conjunction with accompanying drawing.A lot of details have been set forth in the following description so that fully understand the utility model.But the utility model can be implemented much to be different from alternate manner described here, and those skilled in the art can do similar popularization under the situation of the utility model intension.Therefore the utility model is not subjected to the restriction of following public concrete enforcement.
Fig. 3 is the structural representation of the utility model first embodiment.As shown in Figure 3, in reative cell 100, alternately place large tracts of land exciting electrode plate 104 and grounding electrode plate 106 at interval, the battery lead plate both side surface all can be placed large-area glass substrate 121, reacting gas enters reative cell 100 by air inlet 114, reacting gas flows along the direction of arrow, and RF excited power supply 117 provides radio-frequency (RF) energy to exciting electrode plate 104, is plasma with reacting gas ionization, at substrate 121 surface deposition films, remaining gas is discharged by gas outlet 118.In first embodiment of the present utility model, bottom between exciting electrode plate 104 and the grounding electrode plate 106 has isolated part 200, described isolated part 200 is bonding jumper or nonmetal, specifically, can select aluminum strip as isolated part 200, also can select glass bar as isolated part 200.
Fig. 4 is the structural representation of the utility model second embodiment.As shown in Figure 4, and please refer to Fig. 3, in reative cell 100, alternately place large tracts of land exciting electrode plate 104 and grounding electrode plate 106 at interval, the battery lead plate both side surface all can be placed large-area glass substrate 121, reacting gas enters reative cell 100 by air inlet 114, reacting gas flows along the direction of arrow, RF excited power supply 117 provides radio-frequency (RF) energy to exciting electrode plate 104, with reacting gas ionization is plasma, at substrate 121 surface deposition films, remaining gas is discharged by gas outlet 118, and in the present embodiment, bottom and top between exciting electrode plate 104 and the grounding electrode plate 106 all have isolated part 200, described isolated part 200 is bonding jumper or nonmetal, specifically, can select aluminum strip, also can select glass bar as isolated part 200 as isolated part 200.
In other embodiment of the present utility model, the isolated part between exciting electrode plate and the grounding electrode plate can be one, also can be a plurality of, and quantity does not limit.
In other embodiment of the present utility model; promptly can be as shown in above-mentioned embodiment; between each exciting electrode plate and the grounding electrode plate isolated part is arranged all; also can be only between individual other one or several exciting electrode plate and grounding electrode plate, isolated part to be set; in other words; as long as there is isolated part just passable between exciting electrode plate and the grounding electrode plate, all in protection range of the present utility model, the quantity of isolated part does not limit.
In other embodiment of the present utility model, the distance between isolated part and the battery lead plate promptly can be even setting, also can be anisotropically to be provided with.
In the above-described embodiments, when the material of isolated part 200 is metal, can ground connection, also can be that electricity suspends, mode is a ground connection preferably.
In the above-described embodiments, when the material of isolated part 200 was metal, the distance between itself and the exciting electrode 104 was smaller or equal to 5mm; When the material of isolated part 200 was nonmetal, the distance between itself and the exciting electrode 104 was unrestricted, as long as suitably, those skilled in the art can regulate according to actual conditions.
In addition, in the above-described embodiments, the height of isolated part 200 will be limited in the zone near base plate bottom, can not enter the deposition region, and in other words, the height of isolated part 200 can not exceed substrate edges, as shown in Figure 3 and Figure 4.
The above only is preferred embodiment of the present utility model, is not the utility model is done any pro forma restriction.Any those of ordinary skill in the art, do not breaking away under the technical solutions of the utility model scope situation, all can utilize the technology contents of above-mentioned announcement that technical solutions of the utility model are made many possible changes and modification, or be revised as the equivalent embodiment of equivalent variations.Therefore, every content that does not break away from technical solutions of the utility model, all still belongs in the protection range of technical solutions of the utility model any simple modification, equivalent variations and modification that above embodiment did according to technical spirit of the present utility model.
Claims (10)
1. a film deposition apparatus comprises reative cell and the exciting electrode plate and the grounding electrode plate of alternately placing at the reaction partition, it is characterized in that:
Bottom between described exciting electrode plate and the grounding electrode plate has isolated part.
2. device as claimed in claim 1 is characterized in that: described isolated part is bonding jumper or nonmetal.
3. device as claimed in claim 2 is characterized in that: described bonding jumper is an aluminum strip.
4. device as claimed in claim 2 is characterized in that: described isolated part is a glass bar.
5. device as claimed in claim 2 is characterized in that: described bonding jumper ground connection.
6. a film deposition apparatus comprises reative cell and the exciting electrode plate and the grounding electrode plate of alternately placing at the reaction partition, it is characterized in that:
Bottom and top between described exciting electrode plate and the grounding electrode plate have isolated part.
7. device as claimed in claim 6 is characterized in that: described isolated part is bonding jumper or nonmetal.
8. device as claimed in claim 7 is characterized in that: described bonding jumper is an aluminum strip.
9. device as claimed in claim 7 is characterized in that: described nonmetal is glass bar.
10. device as claimed in claim 7 is characterized in that: described bonding jumper ground connection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202207561U CN201549466U (en) | 2009-11-03 | 2009-11-03 | Thin film deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202207561U CN201549466U (en) | 2009-11-03 | 2009-11-03 | Thin film deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201549466U true CN201549466U (en) | 2010-08-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009202207561U Expired - Fee Related CN201549466U (en) | 2009-11-03 | 2009-11-03 | Thin film deposition device |
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| Country | Link |
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| CN (1) | CN201549466U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103167716A (en) * | 2011-12-19 | 2013-06-19 | 亚树科技股份有限公司 | Vertical type plasma generating device |
-
2009
- 2009-11-03 CN CN2009202207561U patent/CN201549466U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103167716A (en) * | 2011-12-19 | 2013-06-19 | 亚树科技股份有限公司 | Vertical type plasma generating device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: BEIJING JINGCHENG APOLLO OPTOELECTRONICS EQUIPMENT |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20110727 Address after: 362000 Jiangnan hi tech Zone, South Ring Road, Licheng District, Fujian, Quanzhou Co-patentee after: Beijing Jingcheng Boyang Optoelectronic Equipment Co.,Ltd. Patentee after: Fujian Golden Sun Solar Technic Co., Ltd. Address before: 362000 Jiangnan hi tech Zone, No. 1303 South Ring Road, Licheng District, Quanzhou, Fujian Patentee before: Fujian Golden Sun Solar Technic Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100811 Termination date: 20161103 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |