CN201990728U - Low-pressure chemical vapor deposition reaction equipment - Google Patents
Low-pressure chemical vapor deposition reaction equipment Download PDFInfo
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- CN201990728U CN201990728U CN2010206858422U CN201020685842U CN201990728U CN 201990728 U CN201990728 U CN 201990728U CN 2010206858422 U CN2010206858422 U CN 2010206858422U CN 201020685842 U CN201020685842 U CN 201020685842U CN 201990728 U CN201990728 U CN 201990728U
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Abstract
The utility model discloses LPCVD (Low-Pressure Chemical Vapor Deposition) reaction equipment, which comprises a piece-inlet chamber, at least one deposition chamber and a piece-outlet chamber, wherein a valve which can be opened and closed is arranged between every two chambers; the deposition chamber comprises a deposition frame which can be loaded in and unloaded out of the deposition chamber from the lateral surface, a plurality of heating plates and spraying chambers are longitudinally and alternately installed at intervals on the deposition frame, and the lateral wall of each spraying chamber is provided with spraying holes; the equipment also comprises a transmitting part for driving a carrier plate with a baseplate to move; and when the carrier plate enters the piece-inlet chamber from one end of the equipment, the carrier plate is driven to move into a reaction space between each heating plate and each spraying chamber of the deposition chamber by the transmitting part and move out of the piece-outlet chamber after a film is deposited. Through the LPCVD reaction equipment disclosed by the utility model, the production efficiency can be further improved, and the production and maintenance cost is lowered.
Description
Technical field
The utility model relates to the photovoltaic solar cell technical field, particularly a kind of low-pressure chemical vapor deposition (LPCVD) conversion unit.
Background technology
Along with the worsening shortages of the energy, the development and use of renewable green energy resource more and more are subjected to people's attention, are subjected to common people's favor especially especially with the utilization of sun power.Sun power is as cleaning, safe, the sustainable and reliable energy, and photovoltaic (PV) system is enlarging its application aspect the energy and industrial technology exploitation rapidly.In recent years, caused common concern as photovoltaic (photovoltaic) battery of solar energy converting media and the development and application of big area photovoltaic module device.With silicon single crystal, polysilicon, amorphous silicon membrane etc. is that the widespread use of solar panel in facilities such as commerce and residential building of representative demonstrates great potential.Thin-film solar cell panel particularly is widely used in the solar electrical energy generation in fields such as civilian installation building just day by day with its big area, frivolous characteristics such as transparent.
Thin-film solar cells is a multilayer device, and different layers has different characteristics and effect in entire structure.A typical thin-film solar cells generally includes glass substrate, the preceding electrode of TCO (transparent conductive oxide), has the p-i-n structure of being made up of p, i and n N-type semiconductorN silicon film, back electrode and back of the body sheet glass.Doped layer p layer and n layer are set up an internal electric field between the i layer.I layer based on silicon directly converts incident optical energy to electric energy, is collected by preceding electrode and back electrode.
Electrode and back electrode adopt zinc oxide (ZnO) material usually before the electrically conducting transparent, utilize LPCVD at the glass surface formation of deposits.LPCVD makes gaseous compound form the stabilization of solid film in substrate surface reaction and deposit under the low pressure condition with the mode that heats.Because operating pressure is low, the mean free path and the spread coefficient of gas molecule are big, so can adopt intensive load mode to boost productivity.But present most of LPCVD conversion unit mostly is monolithic chamber conversion unit, and horizontal online load, and production efficiency is not high.And monolithic chamber equipment is unfavorable for cleaning or safeguards, needs to clean or must cut off equipment when safeguarding, is unfavorable for the raising of production efficiency and reduces cost.
The utility model content
Therefore, the purpose of this utility model is to provide a kind of LPCVD conversion unit, can further enhance productivity and reduce and produce and maintenance cost.
For achieving the above object, a kind of low-pressure chemical vapor deposition conversion unit that the utility model provides comprises into sheet chamber, at least one sediment chamber and slice chamber, but has the valve of open and close between the described chamber; Described sediment chamber comprises the deposition frame that can pack and draw off the sediment chamber from the side into, and a plurality of hot-plates and spray chamber are alternately installed in vertical on the described deposition frame, interval, and described spray chamber sidewall has spray apertures; Described equipment also comprises transfer member, is used to drive the support plate that substrate is housed and moves; When an end of described support plate slave unit enter described enter the sheet chamber after, described transfer member drives described support plate it is moved to the hot-plate of sediment chamber and the reaction compartment between the spray chamber, moves to the slice chamber behind the depositional coating.
Optionally, describedly enter the sheet chamber and have heating unit and can heat substrate.
Optionally, described transfer member comprises the transmitting gear and the transmission chain of driven by motor.
Optionally, described spray chamber links to each other with the reacting gas source of outside by pipeline.
Optionally, has refrigerating unit in the described spray chamber.
Optionally, described support plate is fixed on the transmission chain by retaining clip.
Optionally, described equipment top has groove, is used to fix support plate.
Optionally, described deposition frame has crossbeam, has the fixed groove that can connect with described groove on the described crossbeam, is used to fix support plate.
Optionally, described refrigerating unit is a water-chilling plant.
Optionally, described transfer member comprises a plurality of rollers of driven by motor.
Compared with prior art, the utlity model has following advantage:
The multi-cavity chamber equipment that LPCVD conversion unit of the present utility model is a pipeline system, the sediment chamber is at least one, can handle multi-piece substrate simultaneously, through advancing chambers such as sheet (preheating) chamber, reaction chamber, slice chamber, forms the streamline mode of production.Vertically load, many sediment chambers handle the quantity that can improve each treatment substrate, have improved production efficiency greatly.The sediment chamber has the deposition frame that can load and unload from the side, and hot-plate and spray chamber that deposition is installed on the frame can be dismantled easily, is convenient to clean and safeguards the easy gdna contamination of device interiors such as the spray header of spray chamber and hot-plate.
Description of drawings
By the more specifically explanation of the preferred embodiment of the present utility model shown in the accompanying drawing, above-mentioned and other purpose, feature and advantage of the present utility model will be more clear.Reference numeral identical in whole accompanying drawings is indicated identical part.Painstakingly do not draw accompanying drawing in proportion, focus on illustrating purport of the present utility model.
Fig. 1 is the LPCVD conversion unit structural representation according to the utility model embodiment;
Fig. 2 is deposition shelf structure synoptic diagram;
Fig. 3 is vertical load synoptic diagram;
Fig. 4 is a support plate mobile status synoptic diagram;
Fig. 5 substrate for the support plate band and enters sediment chamber's status architecture synoptic diagram;
Fig. 6 and Fig. 7 are the synoptic diagram of another support plate mobile status embodiment.
Described diagrammatic sketch is an illustrative and nonrestrictive, can not excessively limit protection domain of the present utility model at this.
Embodiment
For above-mentioned purpose of the present utility model, feature and advantage can be become apparent more, embodiment of the present utility model is described in detail below in conjunction with accompanying drawing.A lot of details have been set forth in the following description so that fully understand the utility model.But the utility model can be implemented much to be different from alternate manner described here, and those skilled in the art can do similar popularization under the situation of the utility model intension.Therefore the utility model is not subjected to the restriction of following public concrete enforcement.
Fig. 1 is the LPCVD conversion unit structural representation according to the utility model embodiment.As shown in Figure 1, the sediment chamber of LPCVD conversion unit of the present utility model is at least one, comprises into 22, two sediment chambers 23, sheet chamber and 25 according to the LPCVD conversion unit of the utility model embodiment, and slice chamber 26.But has the valve 21,29 of open and close etc. between each chamber.Have the transfer member that runs through each chamber in the bottom of equipment, comprise motor, transmission chain 28 and transmitting gear 27.The top has the draw-in groove that fixes glass substrate.Valve 21 by equipment one end after glass substrate 40 is installed on the support plate enters into sheet chamber 22.
The sediment chamber of the utility model LPCVD conversion unit also comprises the deposition frame 30 that can pack into from the side and draw off, Fig. 2 is deposition shelf structure synoptic diagram, as shown in Figure 2, deposition frame 30 has a crossbeam 32, is mounted alternately with a plurality of hot-plates 31 and spray chamber 33 on it vertically, at interval.Spray chamber 33 has a plurality of spray apertures 331.Crossbeam 32 bottoms have the groove 321 of a plurality of fixedly support plates.Have water cooling plant in the spray chamber 33, be used to control the temperature of spray header.Deposition frame 30 can be very easy to the cleaning and the maintenance of hot-plate 31 and spray chamber 33 (comprising spray header) from the side access of sediment chamber.
Fig. 3 is vertical load synoptic diagram; Fig. 4 is a support plate mobile status synoptic diagram; Fig. 5 substrate for the support plate band and enters sediment chamber's status architecture synoptic diagram.As shown in the figure, plural pieces substrate 40 (for example glass substrate) is installed in support plate 41 sides.The end that support plate 41 is carrying substrate 40 slave units enters into sheet chamber 22.After entering chamber, the bottom of support plate 41 is fixed on the transmission chain 28 by retaining clip.Transmission chain 28 is connected with transmitting gear 27 in the equipment.The top of equipment has groove, and the other end of support plate 41 fixes in this groove, and transmission chain 28 drives support plate 41 and is displaced between each chamber through each valve.
After advancing 22 preheatings of sheet chamber, described support plate 41 enters sediment chamber 23 and 25 successively under the drive of transmission chain 28, and support plate 41 tops enter the groove 321 that connects with the equipment top groove, and every sheet glass substrate 40 all enters between hot-plate 31 and the spray chamber 33.31 pairs of glass substrates 40 of hot-plate heat, and reactant gases flows out to the reaction compartment of glass substrate 40 1 sides 33 the spray apertures 331 along direction shown in the arrow from spray chamber, at glass substrate 40 surface deposition retes.In the embodiment of a plurality of sediment chambers, behind the deposition certain thickness, transmission chain 28 can drive support plate 41 and move to continuation deposition in the next sediment chamber, for example, after the certain thickness rete of sediment chamber's 23 depositions, moves to the remaining thickness of sediment chamber's 25 depositions again.
Fig. 6 and Fig. 7 are the synoptic diagram of another support plate mobile status embodiment.In another embodiment, as shown in Figure 6 and Figure 7, motor M drives transmitting gear 27, drives a series of rollers 29 by chain 28 and rotates, and just can drive support plate 41 and move on roller 29.
The above only is preferred embodiment of the present utility model, is not the utility model is done any pro forma restriction.Any those of ordinary skill in the art, do not breaking away under the technical solutions of the utility model scope situation, all can utilize the method and the technology contents of above-mentioned announcement that technical solutions of the utility model are made many possible changes and modification, or be revised as the equivalent embodiment of equivalent variations.Therefore, every content that does not break away from technical solutions of the utility model, all still belongs in the protection domain of technical solutions of the utility model any simple modification, equivalent variations and modification that above embodiment did according to technical spirit of the present utility model.
Claims (10)
1. a low-pressure chemical vapor deposition conversion unit is characterized in that: comprise into sheet chamber, at least one sediment chamber and slice chamber, but have the valve of open and close between the described chamber;
Described sediment chamber comprises the deposition frame that can pack and draw off the sediment chamber from the side into, and a plurality of hot-plates and spray chamber are alternately installed in vertical on the described deposition frame, interval, and described spray chamber sidewall has spray apertures; Described equipment also comprises transfer member, is used to drive the support plate that substrate is housed and moves; When an end of described support plate slave unit enter described enter the sheet chamber after, described transfer member drives described support plate it is moved to the hot-plate of sediment chamber and the reaction compartment between the spray chamber, moves to the slice chamber behind the depositional coating.
2. conversion unit according to claim 1 is characterized in that: describedly enter the sheet chamber and have heating unit and can heat substrate.
3. conversion unit according to claim 1 is characterized in that: described transfer member comprises the transmitting gear and the transmission chain of driven by motor.
4. conversion unit according to claim 1 is characterized in that: described spray chamber links to each other with the reacting gas source of outside by pipeline.
5. conversion unit according to claim 1 is characterized in that: have refrigerating unit in the described spray chamber.
6. according to claim 1 or 3 described conversion units, it is characterized in that: described support plate is fixed on the transmission chain by retaining clip.
7. conversion unit according to claim 6 is characterized in that: described equipment top has groove, is used to fix support plate.
8. conversion unit according to claim 7 is characterized in that: described deposition frame has crossbeam, has the fixed groove that can connect with described groove on the described crossbeam, is used to fix support plate.
9. conversion unit according to claim 5 is characterized in that: described refrigerating unit is a water-chilling plant.
10. conversion unit according to claim 1 is characterized in that: described transfer member comprises a plurality of rollers of driven by motor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206858422U CN201990728U (en) | 2010-12-29 | 2010-12-29 | Low-pressure chemical vapor deposition reaction equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206858422U CN201990728U (en) | 2010-12-29 | 2010-12-29 | Low-pressure chemical vapor deposition reaction equipment |
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| Publication Number | Publication Date |
|---|---|
| CN201990728U true CN201990728U (en) | 2011-09-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2010206858422U Expired - Lifetime CN201990728U (en) | 2010-12-29 | 2010-12-29 | Low-pressure chemical vapor deposition reaction equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103774118A (en) * | 2012-10-17 | 2014-05-07 | 理想能源设备(上海)有限公司 | Substrate bearing device and metal organic chemical vapor deposition device |
| CN103975093A (en) * | 2011-10-28 | 2014-08-06 | 株式会社桥本商会 | Catalytic CVD and device therefor |
| CN111020527A (en) * | 2020-01-10 | 2020-04-17 | 晶澳（扬州）太阳能科技有限公司 | Film coating equipment |
-
2010
- 2010-12-29 CN CN2010206858422U patent/CN201990728U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103975093A (en) * | 2011-10-28 | 2014-08-06 | 株式会社桥本商会 | Catalytic CVD and device therefor |
| CN103975093B (en) * | 2011-10-28 | 2016-09-07 | 株式会社桥本商会 | Catalyst cvd method and device thereof |
| CN103774118A (en) * | 2012-10-17 | 2014-05-07 | 理想能源设备(上海)有限公司 | Substrate bearing device and metal organic chemical vapor deposition device |
| CN103774118B (en) * | 2012-10-17 | 2016-03-02 | 理想能源设备(上海)有限公司 | Substrate bearing device and metal organic chemical vapor deposition device |
| CN111020527A (en) * | 2020-01-10 | 2020-04-17 | 晶澳（扬州）太阳能科技有限公司 | Film coating equipment |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110928 |