CN201156532Y - Storage apparatus for storing semi-conductor component - Google Patents

Abstract

The utility model discloses a storage device which is equipped with a filter part and is used to store semiconductor component or optical mask. The storage device is made up of combination of a first cover body and a second cover body for forming an internal space to contain the optical mask or the semiconductor component. The second cover body of the storage device comprises a body and a plate. The body is equipped with at least one hole for communicating the internal space of the storage device with the external space thereof; moreover, a corresponding part is positioned on the location of the plate, which corresponds to the hole of the body. The filter part is positioned between the body and the plate for covering the hole of the body. Air is filtered by the filter part when air passes through the hole of the body, thereby achieving the effect of removing impurities.

Description

In order to deposit the storing unit of semiconductor subassembly or light shield

Technical field

The utility model relates to a kind of in order to deposit the storing unit of semiconductor subassembly or light shield, particularly relevant for a kind of have filtration members in order to deposit the storing unit of semiconductor subassembly or light shield.

Background technology

Modern age, the semiconductor development in science and technology was rapid, and wherein photolithography techniques is played the part of important role, so long as about graphical definition, all need rely on photolithography techniques.Photolithography techniques is that the circuit that will design is made into the light shield with given shape light-permeable in semi-conductive application.Utilize the exposure principle, then light source is projected to the Silicon Wafer demonstration specific pattern that can expose by light shield.Owing to anyly be attached to the quality deterioration that dust granules on the light shield such as particulate, dust or organic substance all can cause projection imaging, the light shield that is used to produce figure must keep absolute cleaning, and the Silicon Wafer that is throwed or other semiconductor projectile also must keep absolute quietness, therefore in general silicon wafer process, the environment that dust free room all is provided is to avoid airborne particle contamination.Yet present dust free room also can't reach absolute dustless state.

Therefore, modern manufacture of semiconductor all utilizes resistant to pollution storing unit to carry out the preservation and the transportation of light shield, so that light shield remaining clean; Also utilize resistant to pollution semiconductor subassembly storing unit to carry out the preservation and the transportation of semiconductor subassembly, so that semiconductor subassembly keeps clean.Storing unit is to be used to deposit light shield in manufacture of semiconductor, in order to carrying and the transmission of light shield between board, and the contacting of isolated light shield and atmosphere, avoid light shield to be changed by contaminating impurity; And the semiconductor subassembly storing unit is to be used to deposit semiconductor subassembly in manufacture of semiconductor, in order to carrying and the transmission of semiconductor subassembly between board, and the contacting of isolated semiconductor subassembly and atmosphere, avoid semiconductor subassembly to be changed by contaminating impurity.Therefore, in advanced person's semiconductor factory, can require the cleanliness factor of these storing units will meet the machinery standard interface usually, that is to say to keep cleanliness factor at progression below 1.So charging into gas in these storing units is one of means that solve at present.

Yet,, except the standard-required that reaches cleanliness factor, also to overcome because of of the pollution of external gas for light shield for yield that further promotes product and the cost that reduces manufacturing.External gas like this is except atmosphere, also have two sources, the first stems from the gas that the made storing unit of macromolecular material itself is disengaged, and it two is to stem from the volatilization gas that the microchemistry solution that remains in light shield or semiconductor subassembly surface is produced.These non-expectation gases can produce atomizing to the surface of light shield or semiconductor subassembly, make light shield or semiconductor subassembly to re-use and beyond economic repair awkward situation, make manufacturing cost increase.Charging into gas in these storing units is one of means that solve at present light shield or semiconductor subassembly atomizing, wherein how to keep charging into the cleanliness factor of gas, is an important subject under discussion.

In view of this, provided by the utility model have filtration members in order to deposit the storing unit of semiconductor subassembly or light shield, improved at prior art.

The utility model content

Main purpose of the present utility model provide a kind of have filtration members in order to deposit the storing unit of semiconductor subassembly or light shield, can be used to the micronic dust in the filtered air, polluted to avoid light shield or semiconductor subassembly.

Storing unit of the present utility model is to be combined by first lid and second lid, form an inner space and can hold light shield or semiconductor subassembly, second lid of this storing unit is made up of body and plate, body is provided with at least one hole, in order to inner space and the space outerpace that is communicated with this storing unit, and plate corresponds to the hole place of body and is provided with counterpart, filtration members places between body and plate, cover the hole of body, when air passes the hole of body, can filter by filtration members, reach the effect of impurity screening.

A kind of storing unit in order to deposit semiconductor subassembly or light shield, includes: one first lid;

One second lid, in order to the combination of this first lid, but form an inner space holding semiconductor assembly or a light shield, wherein this second lid includes: a body has at least one hole; And a plate, be located at this above body to this inner space, have the hole of a corresponding part corresponding to this body; And

One filtration members places between this body and this plate, covers the hole of this body.

A purpose more of the present utility model be to provide a kind of have filtration members in order to deposit the storing unit of semiconductor subassembly or light shield, can be used to the micronic dust in the filtered air, to keep in order to the cleanliness factor in the storing unit of depositing semiconductor subassembly or light shield.

The beneficial effects of the utility model are can keep charging into the cleanliness factor of gas, in order to carrying and the transmission of semiconductor subassembly between board.

Description of drawings

Fig. 1 is the schematic diagram in order to the storing unit of depositing semiconductor subassembly or light shield of the present utility model;

Fig. 2 A and Fig. 2 B are the utility model in order to the storing unit of depositing semiconductor subassembly or light shield and the schematic diagram of filtration members;

Fig. 3 A to Fig. 3 E is the kenel schematic diagram of the counterpart of the plate of second lid in the utility model;

Fig. 4 A and Fig. 4 B are the graph of a relation of the utility model in order to fixture and filtration members configuration in the storing unit of depositing semiconductor subassembly or light shield;

Fig. 5 A to Fig. 5 I, be fixture in the utility model kenel be arranged in order to the fixing schematic diagram of filtration members in the storing unit of depositing semiconductor subassembly or light shield;

Fig. 6 A to Fig. 6 C, be in the utility model fixture and filtration members concern schematic diagram;

Fig. 7 A to Fig. 7 D is the schematic diagram of the configuration of gas check in the utility model.

[primary clustering symbol description]

Filtration members 4

Fixture 5

Hole 51

Outstanding top 53

First lid 6

Second lid 7

Body 71

Plate 72

First surface 721

Counterpart 73

Tongue piece 731

Slit 74

Gas check 8

Hole A

Embodiment

Because the utility model is to disclose a kind of structure in order to the storing unit of depositing semiconductor subassembly or light shield with filtration members, some light shields that wherein used or the detailed manufacturing or the processing procedure of semiconductor subassembly or storing unit, be to utilize prior art to reach, so in following explanation, do not do complete description.And graphic in the literary composition in following, also not according to the actual complete drafting of relative dimensions, its effect is only being expressed the schematic diagram relevant with the utility model feature.

Please consult Fig. 1 earlier, this is the schematic diagram in order to the storing unit of depositing semiconductor subassembly or light shield of the present utility model, in order to the storing unit of depositing semiconductor subassembly or light shield is to be combined by one first lid 6 and one second lid 7, form an inner space and can hold light shield or semiconductor subassembly, and on second lid 7, include at least one hole A, in order to inner space and the space outerpace that is communicated with this storing unit.

Then see also Fig. 2 A and Fig. 2 B, second lid 7 in order to the storing unit of depositing semiconductor subassembly or light shield is to be combined by body 71 and plate 72, at least one hole A is set on the body 71, and establish counterpart 73 with respect to the A place, hole of body 71 at plate 72, counterpart 73 has at least one slit 74 for circulation of air.Secondly, filtration members 4 is arranged between body 71 and the plate 72, the hole A of covering body 71, and when the hole A of body 71 is crossed in circulation of air, filtration members 4 will be filtered impurity wherein, with the cleanliness factor of the inner space air that keeps this storing unit.Fig. 2 A is the exploded view of each assembly, and Fig. 2 B is the profile after the combination of components.

The plate 72 of second lid 7 has the first surface 721 of general planar, and the counterpart 73 of aforementioned hole A with respect to body 71 can be convexly set in first surface 721, be arranged with in first surface 721 or with first surface 721 coplines, its schematic diagram is shown in Fig. 3 A, Fig. 3 B and Fig. 3 C.Counterpart 73 also can be arranged to the kenel of tongue piece 731, shown in Fig. 3 D, when tongue piece 731 is subjected to lifting, can produce the slit 74 for circulation of air; On this tongue piece 731 at least one slit 74 can be set again, shown in Fig. 3 E.

Then, 72 of body 71 and plates, fixture 5 can be set again with fixing filtration members 4, fixture 5 can be arranged between body 71 and 4 of filtration members or plate 72 and the filtration members 4, shown in Fig. 4 A and Fig. 4 B, certainly, fixture 5 has the hole 51 for circulation of air.

The kenel of fixture 5 can be different along with user's selection, and shown in Fig. 5 A to Fig. 5 I, the kenel that fixture 5 can breather valve is controlled the turnover amount of this breather valve may command air, and its schematic diagram is shown in Fig. 5 A, and its combination section is shown in Fig. 5 B.Fixture 5 also can be circulus, so that air discrepancy, shown in Fig. 5 C and Fig. 5 D.Fixture 5 can have outstanding top 53, shown in Fig. 5 E and Fig. 5 F, when fixture 5 has outstanding top, the counterpart 73 of plate 72 can be set to tongue piece 731 kenels, shown in Fig. 5 G, but the top 53 lifting tongue pieces 731 that fixture 5 is given prominence to, therefore counterpart 73 has slit 74 and can ventilate.Fixture 5 also can be with filtration members 4 full wafers parcel, to reach the fixedly effect of filtration members 4, shown in Fig. 5 H; And the fixture 5 of this kind full wafer parcel mode, also outstanding top 53 must be set, shown in Fig. 5 I, this outstanding top is held the counterpart 73 that is set to tongue piece 731 kenels on the plate 72, and therefore counterpart 73 has slit 74 and can ventilate.

Fixture 5 can roughly cover filtration members 4, as shown in Figure 6A; Or only frame is lived filtration members 4, shown in Fig. 6 B; Also filtration members 4 full wafers parcel shown in Fig. 6 C, all can be looked the needs that the user uses.

For there is better effect the inner space that fills with air is gone in order to the storing unit of depositing semiconductor subassembly or light shield, can set up gas check 8 again, gas check 8 shown in Fig. 7 A to Fig. 7 B, can be located on fixture 5 around; Gas check 8 can be located on the hole A of second lid, 7 bodies 71 shown in Fig. 7 C and Fig. 7 D, look closely the needs of use and must change the position of its setting.At this, gas check is a flexible plastics part.

The above is preferred embodiment of the present utility model only, is not in order to limit the right of applying for a patent of the present utility model; Simultaneously above description should be understood and be implemented for the special personage who knows the present technique field, so other does not break away from the equivalence of being finished under the disclosed spirit and change or modification, all should be included in the following claim.

Claims (16)

1. storing unit in order to deposit semiconductor subassembly or light shield, is characterized in that including:

One first lid;

One second lid, in order to the combination of this first lid, but form an inner space holding semiconductor assembly or a light shield, wherein this second lid includes:

One body has at least one hole; And

One plate, be located at this above body to this inner space, have the hole of a corresponding part corresponding to this body; And

One filtration members places between this body and this plate, covers the hole of this body.

2. storing unit as claimed in claim 1 is characterized in that, also includes a fixture, in order to fix this filtration members between this body and this plate.

3. storing unit as claimed in claim 2 is characterized in that, this fixture has at least one hole can supply circulation of air.

4. storing unit as claimed in claim 2 is characterized in that this fixture covers this filtration members.

5. storing unit as claimed in claim 2 is characterized in that, this fixture frame is lived this filtration members.

6. storing unit as claimed in claim 2 is characterized in that, this fixture full wafer wraps up this filtration members.

7. storing unit as claimed in claim 2 is characterized in that this fixture includes a gas check in addition.

8. storing unit as claimed in claim 7 is characterized in that this gas check is located on this fixture.

9. storing unit as claimed in claim 7 is characterized in that this gas check is located on this hole.

10. storing unit as claimed in claim 7 is characterized in that, this gas check is the flexible plastics part.

11. storing unit as claimed in claim 2 is characterized in that, this fixture has outstanding top.

12. the storing unit as claim 11 is characterized in that, the counterpart of this plate is to be a tongue piece, but outstanding this tongue piece of top lifting of this fixture wherein.

13. storing unit as claimed in claim 2 is characterized in that, this fixture is a breather valve.

14. storing unit as claimed in claim 2 is characterized in that, this fixture is a circulus.

15. storing unit as claimed in claim 1 is characterized in that, this plate has a smooth first surface, the counterpart of this plate be convexly equipped with or be arranged with in this first surface or with this first surface copline.

16. storing unit as claimed in claim 1 is characterized in that, the counterpart of this plate has at least one slit.

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