CN201163616Y - Storage device for storing semiconductor component or light shield and its filter - Google Patents
Storage device for storing semiconductor component or light shield and its filter Download PDFInfo
- Publication number
- CN201163616Y CN201163616Y CNU2007203117690U CN200720311769U CN201163616Y CN 201163616 Y CN201163616 Y CN 201163616Y CN U2007203117690 U CNU2007203117690 U CN U2007203117690U CN 200720311769 U CN200720311769 U CN 200720311769U CN 201163616 Y CN201163616 Y CN 201163616Y
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- China
- Prior art keywords
- hole
- filter
- lid
- storing unit
- fixture
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- Expired - Lifetime
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Abstract
The utility model provides a storage device provided with a filtering device for storing a semiconductor component or a light hood. The storage device comprises a first cover body, a second cover body and the filtering device, wherein, the first cover body and the second cover body are combined to form an inner space capable of accommodating the light hood or the semiconductor component; the second cover body of the storage device is provided with at least one hole used for communicating the inner space of the storage device and an outer space; and the filtering device covers the hole.
Description
Technical field
The utility model relates to a kind of in order to deposit the storing unit of semiconductor subassembly or light shield, particularly relevant for a kind of have filter in order to deposit the storing unit of semiconductor subassembly or light shield.
Background technology
Modern age, the semiconductor development in science and technology was rapid, and wherein photolithography techniques (Optical Lithography) is played the part of important role, so long as about figure pattern definition, all need rely on photolithography techniques.Photolithography techniques is that the circuit that will design is made into the light shield with given shape light-permeable in semi-conductive application.Utilize the exposure principle, then light source is projected to the Silicon Wafer siliconwafer demonstration specific pattern that can expose by light shield.Yet, owing to anyly be attached to the quality deterioration that dust granules on light shield or the semiconductor subassembly such as particulate, dust or organic substance all can cause projection imaging, the light shield that is used to produce figure must keep absolute cleaning, and the Silicon Wafer that is throwed or other semiconductor subassembly projectile also must keep absolute quietness, therefore in general silicon wafer process, the environment that dust free room clean room all is provided is to avoid airborne particle contamination.Yet present dust free room also can't reach absolute dustless state.
Therefore, modern manufacture of semiconductor all utilizes resistant to pollution photomask storage device to carry out the preservation and the transportation of light shield, so that light shield remaining clean; Also utilize resistant to pollution semiconductor subassembly storing unit to carry out the preservation and the transportation of semiconductor subassembly, so that semiconductor subassembly keeps clean.Photomask storage device is to be used to deposit light shield in manufacture of semiconductor, in order to carrying and the transmission of light shield between board, and the contacting of isolated light shield and atmosphere, avoid light shield to be changed by contaminating impurity; And the semiconductor subassembly storing unit is to be used to deposit semiconductor subassembly in manufacture of semiconductor, in order to carrying and the transmission of semiconductor subassembly between board, and the contacting of isolated semiconductor subassembly and atmosphere, avoid semiconductor subassembly to be changed by contaminating impurity.Therefore, in advanced person's semiconductor factory, can require this kind will meet machinery standard interface StandardMechanical Interface usually in order to the cleanliness factor of the storing unit of depositing semiconductor subassembly or light shield; SMIF that is to say to keep cleanliness factor at Class below 1.So charging into gas in order to the storing unit of depositing semiconductor subassembly or light shield is one of means that solve at present.
Yet,, except the standard-required that reaches cleanliness factor, also to overcome because of of the pollution of external gas for light shield for yield that further promotes product and the cost that reduces manufacturing.External gas like this is except atmosphere, also have two sources, the first stem from macromolecular material made put the gas outgasing that device itself is disengaged, it two is to stem from the volatilization gas that the microchemistry solution that remains in light shield or semiconductor subassembly surface is produced.These non-expectation gases can produce atomizing to the surface of light shield or semiconductor subassembly, make light shield or semiconductor subassembly to re-use and beyond economic repair awkward situation, make manufacturing cost increase.Charging into gas in storing unit is one of means that solve at present light shield or semiconductor atomizing, wherein how to keep charging into the cleanliness factor of gas, is an important subject under discussion.
In view of this, provided by the utility model have filter in order to deposit the storing unit of semiconductor subassembly or light shield, improved at existing.
The utility model content
Main purpose of the present utility model be to provide a kind of have filter in order to deposit the storing unit of semiconductor subassembly or light shield, can be used to the micronic dust in the filtered air, polluted to avoid light shield or semiconductor subassembly.
For solving existing problem, the utility model provide a kind of have filter in order to deposit the storing unit of semiconductor subassembly or light shield.This kind storing unit is to be combined by first lid and second lid, form an inner space and can hold light shield or semiconductor subassembly, second lid of this kind storing unit is provided with at least one hole, in order to inner space and the space outerpace of connection with this storing unit, and a filter places this hole.This filter is made of filtration members and fixture.According to a preferred embodiment of the present invention, this filter can comprise first, second portion, fixture and filtration members again, wherein this first has through hole and blocking mechanism, second portion has through hole and engaging mechanism, filtration members places on first or the second portion, and by the fixing filtration members of fixture.
A purpose more of the present utility model be to provide a kind of have filter in order to deposit the storing unit of semiconductor subassembly or light shield, can be used to the micronic dust in the filtered air, to keep this in order to the cleanliness factor in the storing unit of depositing semiconductor subassembly or light shield.
The beneficial effects of the utility model are that storing unit and the filter thereof in order to deposit semiconductor subassembly or light shield that are provided can be used to the micronic dust in the filtered air, are polluted to avoid light shield or semiconductor subassembly.
Description of drawings
Fig. 1: the utility model is in order to the schematic diagram of the storing unit of depositing semiconductor subassembly or light shield;
Fig. 2 A to Fig. 2 D: the utility model is provided with the schematic diagram of filtration members and fixture in order to the storing unit of depositing semiconductor subassembly or light shield;
Fig. 3 A to Fig. 3 D: the utility model is in order to the schematic diagram that is provided with of the storing unit of depositing semiconductor subassembly or light shield and filtration members and fixture;
Fig. 4 A to Fig. 4 C: the utility model is a schematic diagram in order to the pass of fixture and filtration members in the storing unit of depositing semiconductor subassembly or light shield;
Fig. 5 A to Fig. 5 D: storing unit and the filter configuration schematic diagram of the utility model in order to deposit semiconductor subassembly or light shield;
Fig. 6: the exploded view of the utility model filter;
Fig. 7 A to Fig. 7 F: the schematic diagram of fixture and filtration members in the utility model filter;
Fig. 8 A to Fig. 8 C: the schematic diagram of filtration members, fixture and first in the utility model filter;
Fig. 9 A to Fig. 9 F: the schematic diagram of the support portion of first and second portion in the utility model filter.
[primary clustering symbol description]
1 filter
2 firsts
21 blocking mechanisms
22 support portions
3 second portions
31 engaging mechanisms
32 support portions
4 filtration members
5 fixtures
51 holes
52 ㄇ font angles
53T font angle
6 first lids
7 second lids
71 bodies
72 plates
A, A ' hole
H, H ' through hole
Embodiment
Because the utility model discloses a kind of structure in order to the storing unit of depositing semiconductor subassembly or light shield with filter, some light shields that wherein used or the detailed manufacturing or the processing procedure of semiconductor subassembly or storing unit, be to utilize prior art to reach, so in following explanation, do not do complete description.And graphic in the literary composition in following, also not according to the actual complete drafting of relative dimensions, its effect is only being expressed the schematic diagram relevant with the utility model feature.
Please consult Fig. 1 earlier, this is the schematic diagram in order to the storing unit of depositing semiconductor subassembly or light shield of the present utility model, this storing unit is to be combined by one first lid 6 and one second lid 7, form an inner space and can hold light shield or semiconductor subassembly, and on second lid 7, include at least one hole A, in order to inner space and the space outerpace that is communicated with this storing unit.
Then see also Fig. 2 A to Fig. 2 D, second lid 7 at this storing unit includes body 71 and plate 72, body 71 is provided with a hole A, plate 72 with respect to body 71 locate also be provided with a hole A ', the hole A of body 71 is connected with the hole A ' of plate 72, for circulation of air, filtration members 4 is set on plate 72, covers this hole A ', to filter the impurity of ventilating air, then, establish fixture 5 again on filtration members 4, and be connected, to reach the fixedly effect of filtration members 4 with plate 72, certainly this fixture 5 need be provided with at least one hole 51, to ventilate.Fig. 2 A is the schematic diagram of each assembly, and Fig. 2 B is the schematic diagram after the combination of components, wherein, fixture 5 is arranged on the plate 72 to extend " ㄇ " font angle 52, yet shown in Fig. 2 C and Fig. 2 D, fixture 5 also is able to " T " font angle 53 and is arranged on the plate 72.
In addition, see also Fig. 3 A to Fig. 3 D, plate 72 also must extend among the hole A of body 71, to form a hole that ventilates.Wherein, the execution mode shown in Fig. 3 A, Fig. 3 B figure, fixture 5 are to be arranged on the plate 72 with " ㄇ " font angle 52; And for example shown in Fig. 3 C, Fig. 3 D, plate 72 extends among the hole A of body 71, and fixture 5 is to be arranged on the plate 72 with " T " font angle 53.
No matter whether plate 72 extends to body 71, or fixture 5 is to be arranged in which way on the plate 72, fixture 5 is that numerous embodiments is arranged with the relative pass of plate 72 and filtration members 4, shown in Fig. 4 A to Fig. 4 C: fixture 5 can be coated on the plate 72, reach the fixedly effect of filtration members 4, shown in Fig. 4 A; Maybe can be arranged in plate 72, shown in Fig. 4 B and Fig. 4 C; And fixture 5 can roughly cover this filtration members 4, shown in Fig. 4 A and Fig. 4 B, perhaps also only frame live this filtration members 4, shown in Fig. 4 C, look closely the needs of use.
Then please consult Fig. 5 A to Fig. 5 D again, this is other execution mode in order to the storing unit of depositing semiconductor subassembly or light shield with filter.Wherein, second lid 7 has at least one hole A, and filter 1 combines with the hole A of second lid 7, and filter 1 is combined with fixture 5 by first 2, second portion 3, filtration members 4.In the execution mode shown in Fig. 5 A, fixture 5 is independent assemblies, is arranged on first 2 or the second portion 3 (this figure does not show the enforcement aspect that is arranged at second portion 3), and in order to fixing filtration members 4, the profile of its setting is shown in Fig. 5 B; Yet in the execution mode shown in Fig. 5 C, fixture 5 is a plate, roughly covers on the surface in second lid, 7 face inside spaces, and the position that corresponds to filtration members 4 is provided with at least one hole 51, for circulation of air, Fig. 5 D is the profile of this kind execution mode.
Then see also Fig. 6, this is in the execution mode shown in Fig. 5 A or Fig. 5 B, the exploded view of filter 1.This kind filter 1 is combined with fixture 5 by first 2, second portion 3, filtration members 4, in first 2, has a through hole H, and second portion 3 also has a through hole H ', when first 2 combines with second portion 3, this two through hole HH ' will be combined into a through hole, and gas is passed through; Wherein first 2 has blocking mechanism 21, fixes mutually with the engaging mechanism 31 of second portion 3, and its kenel is shown in Fig. 7 A to Fig. 7 D; Blocking mechanism 21 can be at least one pair of trip, shown in Fig. 7 A, shown in Fig. 7 B, is the ring-type trip perhaps; Engaging mechanism 31 can be at least one pair of cell body shown in Fig. 7 C, or shown in Fig. 7 D, is the cell body of ring-type.
No matter blocking mechanism 21 is a pair of trip or ring-type trip, engaging mechanism 31 is at least one pair of cell body or ring-type cell body, blocking mechanism 21 and engaging mechanism 31 all fixing mutually, the mode of its fixing can be shown in Fig. 7 E, blocking mechanism 21 is fastened in second portion 3 in the face of enclosing in the through hole H, perhaps shown in Fig. 7 F, blocking mechanism 21 is fastened in second portion 3 with respect to interior periphery of enclosing, as long as blocking mechanism 21 fixes mutually with engaging mechanism 31.
When first 2 with after second portion 3 combines, filtration members 4 can be covered on the through hole H of first 2 or second portion 3, when air during by through hole H, but the micronic dust in filtration members 4 filtered airs; Then fixedly filtration members 4 is on first 2 or second portion 3 with fixture 5 again, and fixture 5 can be coated on first 2 or the second portion 3, reaches the fixedly effect of filtration members 4, shown in Fig. 8 A; Maybe can be arranged on first 2 or the second portion 3, shown in Fig. 8 B; And fixture 5 can roughly cover this filtration members 4, shown in Fig. 8 A or Fig. 8 B; Perhaps also only frame live this filtration members 4, shown in the 8th C figure, look closely the needs of use, certainly, this fixture 5 has at least one hole 51, so that air is passed through.
Again, this filter 1 is to place in order to deposit the storing unit of semiconductor subassembly or light shield, so in order to reach better storing effect, the first 2 of filter 1 and second portion 3 all can be provided with support portion 22,32 again in order to being supported in this storing unit, and the support portion 22 of first 2 can be designed to ring-type bead (shown in Fig. 9 A), at least one prominent pin (shown in Fig. 9 B) or at least one colludes angle (shown in Fig. 9 C); The support portion 32 of second portion 3 can be designed to ring-type bead (shown in Fig. 9 D), at least one prominent pin (shown in Fig. 9 E) or at least one colludes angle (shown in Fig. 9 F); The diameter of these support portions can be greater than the diameter in the hole of second lid; No matter having when all being to make filter 1 to be arranged at this storing unit, which kind of design, its purpose better set firmly effect.
The above is preferred embodiment of the present utility model only, is not in order to limit the right of applying for a patent of the present utility model; Simultaneously above description should be understood and be implemented for the special personage who knows the present technique field, so other does not break away from the equivalence of being finished under the disclosed spirit and change or modification, all should be included in the following claim.
Claims (21)
1. a filter is characterized in that, includes:
One first has a through hole and a blocking mechanism;
One second portion has a through hole and aligns with the through hole of this first, and an engaging mechanism combines with the blocking mechanism of this first;
One filtration members places on this first or the second portion, covers this through hole; And
One fixture is in order to fix this filtration members.
2. the described filter of claim 1 is characterized in that, this fixture is arranged in or coats this first or second portion.
3. the described filter of claim 1 is characterized in that, this fixture covers or frame is lived this filtration members.
4. the described filter of claim 1 is characterized in that, this fixture has at least one hole.
5. the described filter of claim 1 is characterized in that, this blocking mechanism is at least one trip.
6. filter as claimed in claim 5 is characterized in that, this mate is that a cell body or ring-type cell body combine with this trip, and first and second portion are fixed.
7. filter as claimed in claim 5 is characterized in that, this trip is at least one pair of or ring-type.
8. filter as claimed in claim 5 is characterized in that, this trip is fastened in the periphery of this second portion in the face of enclosing or be fastened in this second portion in this through hole.
9. the described filter of claim 1 is characterized in that, this first includes a support portion in addition.
10. the described filter of claim 1 is characterized in that, this second portion includes a support portion in addition.
11. filter as claimed in claim 9 is characterized in that, the support portion of this first is ring-type bead, at least one prominent pin or at least one angle of colluding.
12. the filter as claim 10 is characterized in that, the support portion of this second portion is ring-type bead, at least one prominent pin or at least one angle of colluding.
13. a storing unit in order to deposit semiconductor subassembly or light shield, is characterized in that including:
One first lid;
One second lid, in order to the combination of this first lid, but form an inner space holding semiconductor assembly or a light shield, wherein this second lid has at least one hole; And
One filter is arranged at this second lid, combines with the hole of this second lid, and this filter includes: a first has a through hole and a blocking mechanism;
One second portion has a through hole and aligns with the through hole of this first, and an engaging mechanism combines with the blocking mechanism of this first;
One filtration members places on this first or the second portion, covers this through hole; And
One fixture is in order to fix this filtration members.
14. storing unit as claimed in claim 13 is characterized in that, this fixture is a plate, is covered in this second lid in the face of on the surface of this inner space.
15. storing unit as claimed in claim 13 is characterized in that, the first of this filter includes a support portion in addition, with so that this first can be arranged in this second lid.
16. storing unit as claimed in claim 13 is characterized in that, the second portion of this filter includes a support portion in addition, with so that this second portion can be arranged in this second lid.
17. storing unit as claimed in claim 13 is characterized in that, the first of this filter includes a support portion in addition, and the diameter of its support portion is greater than the diameter in the hole of this second lid.
18. storing unit as claimed in claim 13 is characterized in that, the second portion of this filter includes a support portion in addition, and the diameter of its support portion is greater than the diameter in the hole of this second lid.
19. a storing unit in order to deposit semiconductor subassembly or light shield, is characterized in that including:
One first lid;
One second lid, in order to the combination of this first lid, but form an inner space holding semiconductor assembly or a light shield, wherein this second lid includes:
One body has at least one hole; And
One plate, be located at this above body to this inner space, have the hole of a hole corresponding to this body;
One filtration members is located on this plate, covers the hole of this plate; And
One fixture is in order to fix this filtration members on this plate.
20. storing unit as claimed in claim 19 is characterized in that, this plate is the hole that extends to this body.
21. storing unit as claimed in claim 19 is characterized in that, this fixture is arranged in or coats this plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007203117690U CN201163616Y (en) | 2007-12-24 | 2007-12-24 | Storage device for storing semiconductor component or light shield and its filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007203117690U CN201163616Y (en) | 2007-12-24 | 2007-12-24 | Storage device for storing semiconductor component or light shield and its filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201163616Y true CN201163616Y (en) | 2008-12-10 |
Family
ID=40184545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007203117690U Expired - Lifetime CN201163616Y (en) | 2007-12-24 | 2007-12-24 | Storage device for storing semiconductor component or light shield and its filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201163616Y (en) |
-
2007
- 2007-12-24 CN CNU2007203117690U patent/CN201163616Y/en not_active Expired - Lifetime
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20081210 |