CN1982507A - 沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法 - Google Patents

沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法 Download PDF

Info

Publication number
CN1982507A
CN1982507A CNA2006100735893A CN200610073589A CN1982507A CN 1982507 A CN1982507 A CN 1982507A CN A2006100735893 A CNA2006100735893 A CN A2006100735893A CN 200610073589 A CN200610073589 A CN 200610073589A CN 1982507 A CN1982507 A CN 1982507A
Authority
CN
China
Prior art keywords
electrolyte composition
chromium
salt
sulpho
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2006100735893A
Other languages
English (en)
Chinese (zh)
Inventor
赫尔穆特·赫斯特姆克
马蒂亚斯·本特勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Enthone Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone Inc filed Critical Enthone Inc
Publication of CN1982507A publication Critical patent/CN1982507A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)
CNA2006100735893A 2005-12-13 2006-04-13 沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法 Pending CN1982507A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005059367.4A DE102005059367B4 (de) 2005-12-13 2005-12-13 Elektrolytzusammensetzung und Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten
DE102005059367.4 2005-12-13

Publications (1)

Publication Number Publication Date
CN1982507A true CN1982507A (zh) 2007-06-20

Family

ID=37847008

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2006100735893A Pending CN1982507A (zh) 2005-12-13 2006-04-13 沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法

Country Status (6)

Country Link
US (1) US20070131558A1 (fr)
EP (1) EP1798313B1 (fr)
JP (1) JP2007162123A (fr)
KR (1) KR20070062898A (fr)
CN (1) CN1982507A (fr)
DE (1) DE102005059367B4 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104476939A (zh) * 2014-12-25 2015-04-01 东莞运城制版有限公司 一种版辊的镀铬方法及保管方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10255853A1 (de) 2002-11-29 2004-06-17 Federal-Mogul Burscheid Gmbh Herstellung strukturierter Hartchromschichten
DE102004019370B3 (de) 2004-04-21 2005-09-01 Federal-Mogul Burscheid Gmbh Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung
DE102006022722B4 (de) * 2006-05-12 2010-06-17 Hueck Engraving Gmbh & Co. Kg Verfahren und Vorrichtung zur Oberflächenstrukturierung eines Pressbleches oder eines Endlosbandes
DE102008017270B3 (de) 2008-04-04 2009-06-04 Federal-Mogul Burscheid Gmbh Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement
ES2766775T3 (es) * 2013-09-05 2020-06-15 Macdermid Enthone Inc Composición acuosa de electrolito que tiene una emisión aérea reducida
DE102014116717A1 (de) * 2014-11-14 2016-05-19 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Elektrolyt und Verfahren zur Herstellung von Chromschichten
KR101646160B1 (ko) 2015-11-13 2016-08-08 (주)에스에이치팩 내식성이 우수한 크롬도금액
DE102018133532A1 (de) * 2018-12-21 2020-06-25 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Elektrolyt und Verfahren zur Herstellung von Chromschichten

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758390A (en) * 1971-06-18 1973-09-11 M & T Chemicals Inc Novel cromium plating compositions
US4472249A (en) * 1981-08-24 1984-09-18 M&T Chemicals Inc. Bright chromium plating baths and process
US4588481A (en) * 1985-03-26 1986-05-13 M&T Chemicals Inc. Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching
US4828656A (en) * 1987-02-09 1989-05-09 M&T Chemicals Inc. High performance electrodeposited chromium layers
US4810336A (en) * 1988-06-21 1989-03-07 M&T Chemicals Inc. Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth
JPH0379786A (ja) * 1989-09-01 1991-04-04 M & T Chem Inc クロムメツキ浴
DE4011201C1 (en) * 1990-04-06 1991-08-22 Lpw-Chemie Gmbh, 4040 Neuss, De Coating workpiece with chromium for improved corrosion resistance - comprises using aq. electrolyte soln. contg. chromic acid sulphate ions, and fluoro:complexes to increase deposition
DE4302564C2 (de) * 1993-01-29 2003-05-15 Hans Hoellmueller Maschb Gmbh Vorrichtung zum Ätzen, Beizen oder Entwickeln plattenförmiger Gegenstände, insbesondere von elektrischen Leiterplatten
US6251253B1 (en) * 1999-03-19 2001-06-26 Technic, Inc. Metal alloy sulfate electroplating baths

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104476939A (zh) * 2014-12-25 2015-04-01 东莞运城制版有限公司 一种版辊的镀铬方法及保管方法
CN104476939B (zh) * 2014-12-25 2017-07-14 东莞运城制版有限公司 一种版辊的镀铬方法及保管方法

Also Published As

Publication number Publication date
DE102005059367A1 (de) 2007-06-14
EP1798313B1 (fr) 2017-12-13
JP2007162123A (ja) 2007-06-28
US20070131558A1 (en) 2007-06-14
EP1798313A2 (fr) 2007-06-20
KR20070062898A (ko) 2007-06-18
DE102005059367B4 (de) 2014-04-03
EP1798313A3 (fr) 2008-06-18

Similar Documents

Publication Publication Date Title
CN1982507A (zh) 沉积无裂缝、耐腐蚀和硬的铬层及铬合金层的方法
JP6788506B2 (ja) 三価電解液から析出される微小不連続クロムの不動態化
US20170342582A1 (en) Chromium Alloy Coating with Enhanced Resistance to Corrosion in Calcium Chloride Environments
KR101332887B1 (ko) 크롬 도금 부품 및 이의 제조 방법
CN103339296B (zh) 具有抗腐蚀覆层的基材及其生产方法
EP3502316B1 (fr) Procédé de traitement anticorrosion de surface de type cts pour pièce en acier inoxydable
US20090223829A1 (en) Micro-Arc Assisted Electroless Plating Methods
JP5379426B2 (ja) クロムめっき部品およびその製造方法
US20010054557A1 (en) Electroplating of metals using pulsed reverse current for control of hydrogen evolution
EP3147389B1 (fr) Système de protection mulitcorrosion pour pièces décoratives de finition avec du chrome
EP2287365A1 (fr) Bain galvanoplastique d'alliage cuivre-zinc et procédé de placage l'utilisant
JP4862445B2 (ja) 電気亜鉛めっき鋼板の製造方法
EP2096193B1 (fr) Procédé de préparation de pièces linéaires ou complexes, résistantes à la corrosion plaquées en zinc et en zinc-nickel
JP5515506B2 (ja) 電気亜鉛めっき鋼板の製造方法
KR101974066B1 (ko) 고장력 자동차용 강판의 표면이 미려한 기가스틸을 제조하기 위한 전처리 하지도금용 철도금 용액
CN205115644U (zh) 一种高耐腐蚀性的三价铬镀铬层结构
JP4862484B2 (ja) 電気亜鉛めっき鋼板の製造方法
EP2218804A1 (fr) Bain d'électrodéposition d'alliage cuivre-zinc et procédé de déposition utilisant le bain d'électrodéposition d'alliage cuivre-zinc
KR100645226B1 (ko) 표면 외관이 우수한 전기 아연 도금 크롬-프리 내지문강판의 제조 방법
KR20070065468A (ko) 내식성이 우수한 아연-텅스텐 합금전기도금강판 제조용도금용액, 이를 이용하여 제조된 합금전기도금강판 및 그제조방법
JPH05179481A (ja) 高耐食性亜鉛−コバルトめっき鋼材の製造方法
JP6197772B2 (ja) 耐指紋性および白色度に優れた亜鉛系電気めっき鋼板の製造方法
WO2020239932A1 (fr) Produit électrodéposé avec revêtement résistant à la corrosion
KR20050050174A (ko) 인산염처리성과 도장성이 우수한 고강도 고장력 강판의 제조방법
JP5915294B2 (ja) 電気亜鉛めっき鋼板の製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20070620