CN1875528A - 单纵模激光二极管 - Google Patents
单纵模激光二极管 Download PDFInfo
- Publication number
- CN1875528A CN1875528A CNA2004800318108A CN200480031810A CN1875528A CN 1875528 A CN1875528 A CN 1875528A CN A2004800318108 A CNA2004800318108 A CN A2004800318108A CN 200480031810 A CN200480031810 A CN 200480031810A CN 1875528 A CN1875528 A CN 1875528A
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- laser
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- perot
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- 238000001259 photo etching Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 5
- 238000000034 method Methods 0.000 abstract description 7
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- 238000001459 lithography Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
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- 238000005516 engineering process Methods 0.000 description 5
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- 238000000576 coating method Methods 0.000 description 4
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- 230000003595 spectral effect Effects 0.000 description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
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- 238000005452 bending Methods 0.000 description 2
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1021—Coupled cavities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0262—Photo-diodes, e.g. transceiver devices, bidirectional devices
- H01S5/0264—Photo-diodes, e.g. transceiver devices, bidirectional devices for monitoring the laser-output
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0651—Mode control
- H01S5/0653—Mode suppression, e.g. specific multimode
- H01S5/0655—Single transverse or lateral mode emission
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1003—Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
- H01S5/1017—Waveguide having a void for insertion of materials to change optical properties
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1039—Details on the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Geometry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49934003P | 2003-09-03 | 2003-09-03 | |
US60/499,340 | 2003-09-03 | ||
PCT/US2004/025601 WO2005025017A2 (en) | 2003-09-03 | 2004-08-31 | Single longitudinal mode laser diode |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1875528A true CN1875528A (zh) | 2006-12-06 |
CN1875528B CN1875528B (zh) | 2010-09-29 |
Family
ID=34272803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004800318108A Expired - Fee Related CN1875528B (zh) | 2003-09-03 | 2004-08-31 | 单纵模激光二极管 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7835415B2 (zh) |
EP (1) | EP1668749A4 (zh) |
CN (1) | CN1875528B (zh) |
WO (1) | WO2005025017A2 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102097745A (zh) * | 2011-01-14 | 2011-06-15 | 浙江大学 | 对称刻蚀槽反射形成布拉格光栅的波长可调谐激光器 |
CN102545045A (zh) * | 2012-02-15 | 2012-07-04 | 浙江大学 | 一种基于深刻蚀槽的多段式fp腔单波长激光器 |
CN102931581A (zh) * | 2012-11-16 | 2013-02-13 | 浙江大学 | 一种基于长周期深刻蚀槽光栅的波长可调谐激光器 |
CN105552714A (zh) * | 2016-01-15 | 2016-05-04 | 北京工业大学 | 一种带有DBR光栅结构的852nm窄线宽边发射激光器及其制备方法 |
CN113906640A (zh) * | 2019-06-11 | 2022-01-07 | 三菱电机株式会社 | 半导体光集成元件及半导体光集成元件的制造方法 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005025017A2 (en) * | 2003-09-03 | 2005-03-17 | Binoptics Corporation | Single longitudinal mode laser diode |
JP2007534154A (ja) * | 2003-10-20 | 2007-11-22 | ビノプティクス・コーポレイション | 表面放射入射光子デバイス |
EP1706894B1 (en) * | 2004-01-20 | 2012-05-23 | Binoptics Corporation | Integrated photonic devices |
JP5133052B2 (ja) * | 2004-04-15 | 2013-01-30 | ビノプティクス・コーポレイション | 多段一体型の光デバイス |
US9425917B1 (en) * | 2006-03-15 | 2016-08-23 | Neophotonics Corporation | High data rate long reach transceiver using wavelength multiplexed architecture |
JP4983791B2 (ja) * | 2006-03-22 | 2012-07-25 | 富士通株式会社 | 光半導体素子 |
US8064493B2 (en) * | 2009-06-12 | 2011-11-22 | Binoptics Corporation | Surface emitting photonic device |
CN105514800A (zh) * | 2010-10-25 | 2016-04-20 | 宾奥普迪克斯股份有限公司 | 紧凑芯片中的长半导体激光腔 |
CN104380545B (zh) | 2012-05-08 | 2017-09-15 | 镁可微波技术有限公司 | 具有光束形状修改的激光器 |
EP3066727A4 (en) | 2013-11-07 | 2017-05-17 | MACOM Technology Solutions Holdings, Inc. | Lasers with beam shape and beam direction modification |
JP2017022234A (ja) * | 2015-07-09 | 2017-01-26 | 住友電気工業株式会社 | 量子カスケードレーザ |
JP6485340B2 (ja) * | 2015-12-09 | 2019-03-20 | 住友電気工業株式会社 | 量子カスケード半導体レーザを作製する方法、量子カスケード半導体レーザ |
ITUB20160994A1 (it) * | 2016-02-23 | 2017-08-23 | Prima Electro S P A | Diodo laser a semiconduttore e procedimento per la sua realizzazione |
FR3052562B1 (fr) * | 2016-06-10 | 2019-06-14 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optique |
DE102018111319A1 (de) * | 2018-05-11 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
US11456577B2 (en) * | 2020-07-28 | 2022-09-27 | Raytheon Company | Monolithic quantum cascade laser (QCL)/avalanche photodiode (APD) infrared transceiver |
US11909175B2 (en) * | 2021-01-13 | 2024-02-20 | Apple Inc. | Horizontal cavity surface-emitting laser (HCSEL) monolithically integrated with a photodetector |
Family Cites Families (18)
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US5150236A (en) * | 1990-08-31 | 1992-09-22 | Bell Communications Research, Inc. | Tunable liquid crystal etalon filter |
JPH04145414A (ja) * | 1990-10-08 | 1992-05-19 | Fujitsu Ltd | 光導波路型波長フィルタ |
US6324192B1 (en) * | 1995-09-29 | 2001-11-27 | Coretek, Inc. | Electrically tunable fabry-perot structure utilizing a deformable multi-layer mirror and method of making the same |
US6215592B1 (en) | 1998-03-19 | 2001-04-10 | Ciena Corporation | Fabry-perot optical filter and method of making the same |
GB2385713B (en) * | 1999-03-05 | 2003-10-15 | Nanovis Llc | Aperiodic electronic bandgap structure |
US6879619B1 (en) * | 1999-07-27 | 2005-04-12 | Intel Corporation | Method and apparatus for filtering an optical beam |
US6519065B1 (en) * | 1999-11-05 | 2003-02-11 | Jds Fitel Inc. | Chromatic dispersion compensation device |
US7209498B1 (en) * | 2000-05-04 | 2007-04-24 | Intel Corporation | Method and apparatus for tuning a laser |
US20020054614A1 (en) * | 2000-11-07 | 2002-05-09 | Hong Jin | Wavelength discretely tunable semiconductor laser |
KR100388499B1 (ko) * | 2000-12-22 | 2003-06-25 | 한국전자통신연구원 | 가변광필터 및 그 가변광필터를 이용한 광통신 소자 |
US20020175334A1 (en) | 2001-05-22 | 2002-11-28 | Motorola, Inc. | Optical data converter |
CA2389937A1 (en) * | 2001-06-11 | 2002-12-11 | Jds Uniphase Inc. | Multi-pass configurations |
US7268927B2 (en) * | 2002-03-15 | 2007-09-11 | Corning Incorporated | Tunable optical filter array and method of use |
US6850366B2 (en) * | 2002-10-09 | 2005-02-01 | Jds Uniphase Corporation | Multi-cavity optical filter |
US7061946B2 (en) * | 2002-11-13 | 2006-06-13 | Intel Corporation | Intra-cavity etalon with asymmetric power transfer function |
CN100437020C (zh) * | 2003-07-18 | 2008-11-26 | 凯米映像公司 | 多波长成像光谱仪的方法和装置 |
WO2005025017A2 (en) * | 2003-09-03 | 2005-03-17 | Binoptics Corporation | Single longitudinal mode laser diode |
US8064493B2 (en) * | 2009-06-12 | 2011-11-22 | Binoptics Corporation | Surface emitting photonic device |
-
2004
- 2004-08-31 WO PCT/US2004/025601 patent/WO2005025017A2/en active Application Filing
- 2004-08-31 CN CN2004800318108A patent/CN1875528B/zh not_active Expired - Fee Related
- 2004-08-31 US US10/929,718 patent/US7835415B2/en active Active
- 2004-08-31 EP EP04780438A patent/EP1668749A4/en not_active Withdrawn
-
2010
- 2010-10-20 US US12/908,592 patent/US8160114B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102097745A (zh) * | 2011-01-14 | 2011-06-15 | 浙江大学 | 对称刻蚀槽反射形成布拉格光栅的波长可调谐激光器 |
CN102097745B (zh) * | 2011-01-14 | 2012-05-30 | 浙江大学 | 对称刻蚀槽反射形成布拉格光栅的波长可调谐激光器 |
CN102545045A (zh) * | 2012-02-15 | 2012-07-04 | 浙江大学 | 一种基于深刻蚀槽的多段式fp腔单波长激光器 |
CN102931581A (zh) * | 2012-11-16 | 2013-02-13 | 浙江大学 | 一种基于长周期深刻蚀槽光栅的波长可调谐激光器 |
CN105552714A (zh) * | 2016-01-15 | 2016-05-04 | 北京工业大学 | 一种带有DBR光栅结构的852nm窄线宽边发射激光器及其制备方法 |
CN113906640A (zh) * | 2019-06-11 | 2022-01-07 | 三菱电机株式会社 | 半导体光集成元件及半导体光集成元件的制造方法 |
CN113906640B (zh) * | 2019-06-11 | 2023-10-10 | 三菱电机株式会社 | 半导体光集成元件及半导体光集成元件的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1875528B (zh) | 2010-09-29 |
US7835415B2 (en) | 2010-11-16 |
EP1668749A4 (en) | 2007-11-28 |
US8160114B2 (en) | 2012-04-17 |
US20110032967A1 (en) | 2011-02-10 |
EP1668749A2 (en) | 2006-06-14 |
WO2005025017A2 (en) | 2005-03-17 |
US20050147145A1 (en) | 2005-07-07 |
WO2005025017A3 (en) | 2005-07-07 |
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