CN1873373A - Basal lamina determination device - Google Patents
Basal lamina determination device Download PDFInfo
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- CN1873373A CN1873373A CNA2006100772445A CN200610077244A CN1873373A CN 1873373 A CN1873373 A CN 1873373A CN A2006100772445 A CNA2006100772445 A CN A2006100772445A CN 200610077244 A CN200610077244 A CN 200610077244A CN 1873373 A CN1873373 A CN 1873373A
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- 210000002469 basement membrane Anatomy 0.000 title claims description 31
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims description 78
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 230000000881 depressing effect Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
Abstract
The invention provides a base plate measuring device. Which can rightlt measure enlarged base plate. The metroscope comprise: pedestal (10); objective table (14), which is not stressed by pedestal but is supported by pedestal with its surface inclined a minute angle in relative to vertical direction; guide roller (42) and depressing roll (43), which supports lower part of measured base plate (100); platform (15), which is guided by rail (45) installed on upper and lower of objective table, and moves right and left along objective table surface; camera (18), guided by rail (53) set on platform and move up and down along platform.
Description
Technical field
The present invention relates to a kind of to being used to make the basal lamina determination device that the mask substrate of printed circuit board (PCB) or substrates such as glass substrate that LCD panel is used are measured.
Background technology
A kind of as such basal lamina determination device, the horizontal metroscope that is used to measure the distance between two points on the substrate surface come into operation (please refer to patent documentation 1).In this horizontal metroscope, adopt such structure is arranged, that is,, be provided with to X, Y direction shoot part movably along the stage surface of having loaded substrate, and the amount of movement of the shoot part when using this shoot part to take 2 of substrate surface, measure the distance of this point-to-point transmission.
Yet, being accompanied by the maximization of substrate in recent years, above-mentioned horizontal metroscope has produced such problem, that is and, the substrate that is positioned on the objective table bends with objective table, does and can't carry out correct survey farm labourer.In addition, utilize the printed circuit board (PCB) of this substrate made or glass substrate normally to be used under the state of vertical being in, cause under the situation that substrate is loaded with horizontal direction and substrate is under the situation of vertical, the mode difference that deforms on the substrate.
On the other hand, in patent documentation 2, disclose liquid crystal indicator is under the state of vertical direction its testing fixture of checking.
Patent documentation 1:JP spy opens the 2005-30879 communique.
Patent documentation 2:JP spy opens the 2004-294271 communique.
In the testing fixture of in patent documentation 2, being put down in writing, dispose the worktable and the photographic unit that support liquid crystal indicator respectively.In this testing fixture, when liquid crystal indicator (substrate) does not have problems when small-sized relatively, but when liquid crystal indicator was large scale, liquid crystal indicator and worktable can deform, thereby had the problem that must adjust the relative position of photographic unit.Particularly, have along the stage surface of having loaded substrate and can in the basal lamina determination device of the shoot part that X, Y direction move, be necessary to consider the distortion of worktable and the relation of shoot part position.
Summary of the invention
The present invention proposes in order to solve above-mentioned problem, even the basal lamina determination device of substrate also can correctly be provided under the situation that its purpose is to provide a kind of substrate to maximize.
(1). the present invention is a kind of basal lamina determination device, it is characterized in that, has: pedestal; Objective table portion, it can not be subjected to the stress that applies from said base, and is being supported by said base with respect to the tilted state of minute angle of vertical with its surface; Substrate support member, it is used to support the bottom of the substrate that should measure, and is arranged on the below of above-mentioned objective table portion; Pallet, it is by the guiding elements guiding by top that is arranged on above-mentioned objective table portion and bottom, thereby can be along the surface of above-mentioned objective table portion to the left and right direction move; Shoot part, it is by by the guiding elements guiding that is arranged on the above-mentioned pallet, thereby can along above-mentioned pallet up and down direction move.
(2). the present invention is as (1) described basal lamina determination device, it is characterized in that, when having set the surface that makes above-mentioned objective table portion and be the three-dimensional system of coordinate of X, Y direction, said base has: first support portion, and it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on X, Y, Z direction; Second support portion, it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on Y, Z direction; The 3rd support portion, it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on the Z direction.
(3). the present invention is as (1) or (2) described basal lamina determination device, it is characterized in that having: be provided in the above-mentioned objective table portion and measure the linear scale of the position of above-mentioned pallet; Be provided on the above-mentioned pallet and measure the linear scale of the position of above-mentioned shoot part.
(4). the present invention is a kind of basal lamina determination device, and its shooting is formed on the pattern on the substrate, and carries out the mensuration of above-mentioned pattern based on captured image, it is characterized in that having: pedestal; Objective table portion, it is with respect to said base, and is supported with respect to the tilted state of minute angle of vertical with its surface; Supporting mechanism, it is arranged in the above-mentioned objective table portion, and supports aforesaid substrate with respect to above-mentioned objective table portion; Shoot part, it is arranged in the above-mentioned objective table portion, and carrying out parallel moving with respect to the substrate surface that remains in the above-mentioned objective table portion, above-mentioned objective table portion is supported carrying out the state of minute movement with respect to said base, thereby allows the change of this objective table portion.
(5). the present invention is as (4) described basal lamina determination device, it is characterized in that, above-mentioned supporting member is a deflector roll, and this deflector roll can be provided in the lower end side of above-mentioned objective table portion rotationally for the bottom of supporting substrate, and has the recess that is used to guide substrate on its periphery.
(6). the present invention is as (5) described basal lamina determination device, it is characterized in that, also has dance roller, this dance roller lifting is between position of readiness and Support Position, this position of readiness is the position that the upper end of dance roller is configured in the below of above-mentioned deflector roll upper end, and the position of to be the upper end of dance roller be configured in this Support Position top of above-mentioned deflector roll upper end, this dance roller can rise to the substrate by above-mentioned guide rolls support the top with the position of above-mentioned deflector roll butt.
(7). the present invention is as (4) described basal lamina determination device, it is characterized in that above-mentioned supporting mechanism also comprises a plurality of deflector rolls, in the face that aforesaid substrate is supported of these a plurality of deflector rolls in above-mentioned objective table portion, supports the rear side of aforesaid substrate.
(8). the present invention is as (7) described basal lamina determination device, it is characterized in that, above-mentioned supporting mechanism also has by absorption and keeps aforesaid substrate and this substrate absorption is remained on absorption maintaining body in the above-mentioned objective table portion, and, when adsorbing action by above-mentioned absorption maintaining body, support the deflector roll of the rear side of aforesaid substrate and keep out of the way in the objective table portion.
(9). the present invention is as (4) described basal lamina determination device, it is characterized in that, said base has the support portion, bottom of the bottom of the above-mentioned objective table of support portion, and support upward support portion, top away from the upper portion of this bottom, support portion, above-mentioned bottom is so that above-mentioned objective table portion can support above-mentioned objective table portion to the mode that horizontal direction is carried out minute movement in the face on above-mentioned objective table portion surface, support portion, above-mentioned top not be so that above-mentioned supported objective table portion can tilt to the above mode of above-mentioned minute angle supports, and supports in the mode that can carry out minute movement in the face on above-mentioned objective table portion surface simultaneously.
(10). the present invention is as (9) described basal lamina determination device, it is characterized in that, above above-mentioned, also be provided with bindiny mechanism in the support portion, this bindiny mechanism connects said base and above-mentioned objective table portion in the mode that does not hinder above-mentioned minute movement, thereby above-mentioned objective table portion is not toppled over to the direction opposite with above-mentioned vergence direction.
According to above-mentioned (1), (2) and (4) described invention, can not be subjected to stress and guiding elements in the supported objective table portion guides pallet by being arranged on, and shoot part moves along this pallet, thus, even under the situation that substrate maximizes, also can correctly measure substrate.
According to above-mentioned (3) described invention, can correctly measure the amount of movement of shoot part.
According to from the described invention in above-mentioned (5) to (7), easily supporting substrate.
According to above-mentioned (8) described invention, substrate can be adsorbed reliably and remain on the objective table.
According to above-mentioned (9) described invention, can stably support objective table portion.
According to above-mentioned (10) described invention, can prevent toppling over of objective table portion.
Description of drawings
Fig. 1 is the front view as the horizontal metroscope of the basal lamina determination device that the present invention relates to.
Fig. 2 is the side view as the horizontal metroscope of the basal lamina determination device that the present invention relates to.
Fig. 3 is the vertical view as the horizontal metroscope of the basal lamina determination device that the present invention relates to.
Fig. 4 A, Fig. 4 B, Fig. 4 C are the key diagrams of expression first support portion 91, second support portion 92 and the 3rd support portion 93.
Fig. 5 is the key diagram of the relation between expression substrate 100 and the deflector roll 41,42.
Fig. 6 is a synoptic diagram of taking unit 16.
Embodiment
Below, based on accompanying drawing embodiments of the present invention are described.Fig. 1 is that Fig. 2 is its side view as the front view of the horizontal metroscope of the basal lamina determination device that the present invention relates to, and Fig. 3 is its vertical view.In addition, in Fig. 3, only represented the major part of first supporting member 11 and objective table portion 15, and omitted other members.
This horizontal metroscope has: the pedestal 10 that is made of first supporting member 11, second supporting member 12 and substructure member 13; Objective table portion 14 by these pedestal 10 supports; The pallet 15 that moves of direction to the left and right along the surface of objective table portion 14; Together shooting unit 16 and mobile member 17 constitutes by being connected to each other, and the shoot part 18 that can move up at upper and lower along pallet 15.
In addition, in this instructions, as extremely shown in Figure 3 from Fig. 1, setting is with the surface of objective table portion 14 three-dimensional system of coordinate as X, Y direction, and will be along the left and right directions on objective table portion 14 surfaces as directions X, will be along the above-below direction on objective table portion 14 surfaces as the Y direction, will be perpendicular to the direction on objective table portion 14 surfaces as the Z direction.And, in instructions, as required, directions X is called left and right directions, in addition, the Y direction is called above-below direction.
Said base 10 has: first support portion 91, and it supports objective table portion 14 with X, the Y that limits objective table portion 14 with respect to pedestal 10, the state that moves of Z direction; Second support portion 92, it supports objective table portion 14 with the Y that limits objective table portion 14 with respect to pedestal 10, the state that moves of Z direction; The 3rd support portion 93, it supports objective table portion 14 with the state that moves that limits the Z direction of objective table portion 14 with respect to pedestal 10.Objective table portion 14 is being supported by pedestal 10 with the state of its surface with respect to vertical inclination minute angle.
Fig. 4 A～Fig. 4 C is the key diagram of expression first support portion 91, second support portion 92 and the 3rd support portion 93.With reference to Fig. 1 and Fig. 4 A, be equipped with butt metal parts 21 in the right upper portion of second supporting member 12 of pedestal 10.Being formed with its cross section on this butt metal parts 21 is the coniform recess 24 of V-shape.In addition, the lower right side in objective table portion 14 is equipped with butt metal parts 22.Also being formed with its cross section on this butt metal parts 22 is the coniform recess 25 of V-shape.And, between these recesses 24,25, be equipped with steel ball 23.Therefore, because of deadweight is loaded in objective table portion 14 on the pedestal 10, supported with the state that moves of the X, the Y that limit objective table portion 14 with respect to pedestal 10, Z direction by this support portion 91.
With reference to Fig. 1 and Fig. 4 B, be equipped with butt metal parts 26 in the left upper portion of second supporting member 12 of pedestal 10.Being formed with its cross section on this butt metal parts 26 is the coniform recess 29 of V-shape.In addition, be equipped with butt metal parts 27 in the bottom, left side of objective table portion 14.On this butt metal parts 27, be formed with its cross section and be the roughly half-terete recess 31 of コ font roughly.And, between these recesses 29,31, be equipped with steel ball 28.Therefore, because of deadweight is loaded in objective table portion 14 on the pedestal 10, can move but the limit state that moves of Y, Z direction is supported at directions X relative to pedestal 10 with objective table portion 14 by this support portion 92.
Shown in Fig. 2, Fig. 3 and Fig. 4 C, be equipped with butt metal parts 32 in the central upper of first supporting member 11 of pedestal 10.The surface towards objective table portion 14 1 sides of this butt metal parts 32 is a tabular surface.In addition, the rear side central upper in objective table portion 14 is formed with the cone shape recess 34 that its cross section is a V-shape.And, between the tabular surface of butt metal parts 32 and recess 34, be equipped with steel ball 33.Therefore, because of deadweight leans against the objective table portion 14 of first supporting member, 11 sides, can move but to limit the state that moves of Z direction supported in X, Y direction relative to pedestal 10 with objective table portion 14 by this support portion 93.
In addition, as shown in Figure 3, be equipped with on the top of objective table portion 14 and be used to prevent to make for a certain reason that objective table portion 14 falls forward prevents to topple over bolt 47.In addition, equally also be equipped with and prevent from bolt (not shown), thus make objective table portion 14 not from first support portion 91 and second support portion 92 come off.
That is, above-mentionedly prevent to topple over bolt 47 and allow objective table portions 14 to carry out minute movement, as long as objective table portion 14 does not get final product so that steel ball 33 does not break away from recess 24 not leave the state of the above distance of regulation and be restricted from pedestal 10 to X, Y direction.In addition, replace this and prevent from bolt, for example can utilize chain or steel wire to wait and connect objective table portion 14 and pedestal 10.
Support objective table portion 14 by first support portion 91, second support portion 92 and the 3rd support portion 93 with this structure, thus, objective table portion 14 can not be subjected to the stress from pedestal 10, and is supported by pedestal 10 with respect to the tilted state of minute angle of vertical with its surface.At this, so-called " can not be subjected to the stress from pedestal " is meant: owing to have said structure, even thereby under the situation that does not cause on an equal basis deforming in pedestal 10 or the objective table portion 14 at the expansion and contraction that is for example caused by temperature variation, objective table portion 14 can not be subjected to from pedestal 10, based on the stress that is out of shape yet.In other words, only the state of removable slight distance is supported with relative pedestal 10 in objective table portion 14, even thereby, also can allow this change (can absorb the change part) because temperature or gravity etc. cause having taken place in objective table portion 14 change of distortion or size.
In addition, consider the stability of support, the position of above-mentioned support portion 93 from the support portion 91,92 of supporting substrate 100 lower ends upward away from the position of the above distance of regulation just can, and ideal position is near the central portion of the upper end side of objective table portion 14.But also support portion 93 for example can be separated into the left and right sides of objective table portion 14 and dispose more than 2, and utilize 2 with on support objective table portion 14.But, consider when adopting a plurality of support portion 93, the deviation of the Z direction position of each support portion 93 can take place, therefore the adjusting mechanism of Z direction position preferably is set on support portion 93, the position adjusting mechanism of butt metal parts 32 etc. for example is set.
In addition, the mode that moves of restriction XYZ direction has been adopted in support portion 91, still, also can have such structure, and is promptly same with support portion 92 on the degree that objective table portion 14 does not break away from from pedestal 10, supporting at directions X with can carrying out minute movement.In addition, plural support portion 92 can be set also, and with 3 with on support the lower end of objective table portion 14.As such variation, for example, also can be on the pedestal 10 that is formed on the guide rail, loading objective table portion 14 in the mode that directions X carries out minute movement.Certainly, because it is relatively more difficult on mechanical precision to support objective table portion 14 lower ends with the state with respect to the guide rail uniform contact, therefore, become in the distortion that causes because of mechanical precision under the situation of problem, as above-mentioned embodiment, as long as support portion 91,92, use a plurality of points that limited to support the lower end of objective table portion 14.
Also have,, on the surface of objective table portion 14, be equipped with referring to figs. 1 through Fig. 3: 7 deflector rolls 41, the back side butt of itself and substrate 100 also guides substrate 100; A plurality of deflector rolls 42, the bottom butt of itself and substrate 100 also guides substrate 100.
Fig. 5 is the key diagram of the relation between expression substrate 100 and the deflector roll 41,42.
Deflector roll 41 is configured in and makes its outer peripheral face from only outstanding a part of position, the surface of objective table portion 14.In addition, but deflector roll 42 is provided in the position of the bottom of support substrate 100.On deflector roll 42, be formed with and be used for the recess 44 of the bottom of supporting substrate 100 reliably.By not shown driving mechanism, move between the retreating position that is represented by dotted lines among the guide position of the substrate 100 that these deflector rolls 41 can be represented with solid line in Fig. 5 and Fig. 5.
Also have,, be equipped with and the bottom butt of substrate 100 and four dance rollers 43 of elevation base plate 100 on the surface of objective table portion 14 with reference to Fig. 1.This dance roller 43 has the structure of lifting between position of readiness and Support Position, above-mentioned position of readiness is the position that the upper end of this dance roller 43 is configured in the below of deflector roll 42 upper ends, and above-mentioned Support Position is configured in the position of the top of deflector roll 42 upper ends for the upper end of this dance roller 43.In addition, on the surface of objective table portion 14, be formed with not shown a plurality of adsorption holes.
When mounting substrate 100 in objective table portion 14, dance roller 43 is being configured under the state of position of readiness, deflector roll 41,42 is configured in the guide position of the substrate of representing with solid line among Fig. 5 100, and passes through these deflector rolls 41,42 guiding substrates 100.Then, make dance roller 43 rise to the Support Position.Thus, reason deflector roll 42 substrate supported 100 become by dance roller 43 and support.Under this state, when deflector roll 41 is configured in the guide position of the substrate 100 that is represented by dotted lines among Fig. 5, undertaken air-breathing by being formed on objective table portion 14 lip-deep adsorption holes.Thus, under the state that substrate 100 is supported by dance roller 43 in its bottom, absorption remains on objective table portion 14.
Above-mentioned deflector roll 42 and dance roller 43 are configured for the bottom, the substrate support member of the present invention of supporting substrate 100.
Be equipped with the pair of guide rails 45 of extending to directions X on the surface of objective table portion 14.Pallet 15 is guided by this guide rail 45, and it can be moved back and forth on directions X.In addition, on the surface of objective table portion 14, be equipped with a pair of linear scale 46 abreast with pair of guide rails 45.By a pair of linear scale 46, measure the position of pallet 15 at directions X.In addition, the reason that is equipped with a pair of linear scale 46 is in order to revise the Run-out error of pallet 15.
As Fig. 1 and shown in Figure 2, be equipped with the stator 51 of linear electric motors at the both ends up and down of objective table portion 14.In addition, as shown in Figure 2, be equipped with a pair of mover 52 at the back side of pallet 15.Pallet 52 is accepted the driving of the linear electric motors that are made of these stators 51 and mover 52, and moves back and forth at directions X.
As shown in Figure 1, be equipped with the pair of guide rails 53 of extending on the surface of pallet 15 to the Y direction.The mobile member 17 of shoot part 18 can be moved back and forth in the Y direction by these guide rail 53 guiding with taking unit 16.In addition, on pallet 15, be equipped with the illustrated linear scale of omission abreast with pair of guide rails 53.Measure the position of shoot part 18 by this linear scale in the Y direction.
Be equipped with the stator 54 of linear electric motors on the surface of pallet 15.In addition, be equipped with mover at the back side of the mobile member 17 of shoot part 18.Shoot part 18 is subjected to the driving of the linear electric motors that are made of these stators 54 and mover, and moves back and forth in the Y direction.
Fig. 6 is a synoptic diagram of taking unit 16.
This take unit 16 by high magnification with ccd video camera 61 or low range with ccd video camera 62, the image that utilizes the substrate 100 that coaxial indirect illumination shines is taken.
That is, the light that penetrates from light source 63 passes through a pair of lens 64, and by after semi-permeable mirror 65 reflections, shines absorption via object lens 66 and remain on the objective table portion 14 lip-deep substrates 100.Then, by after object lens 66 and the semi-permeable mirror 65,, and incide semi-permeable mirror 68 by the light of the surface reflection of substrate 100 by catoptron 67 reflections.Incide half light in the light of semi-permeable mirror 68 by semi-permeable mirror 68, and, incide in the ccd video camera 61 by after the magnifying optics 69.On the other hand, incide remaining half light in the light of semi-permeable mirror 68 by semi-permeable mirror 68 reflections, and then after mirror 71 reflections that are reflected, incide in the ccd video camera 62.
When the horizontal metroscope by having this structure the pattern of substrate 100 is surveyed when long, under the state that substrate absorption is remained in the objective table portion 14, taken by 2 of taking on the 16 pairs of substrates 100 in unit.Then, measure the amount of movement of shoot part 18, measure the amount of movement of shoot part 18 by the linear scale that is arranged on the pallet 15 in addition, calculate the distance of point-to-point transmission thus in the Y direction at directions X by linear scale 46.
At this moment, objective table portion 14 can not be subjected to stress from pedestal 10, and with its surface relatively vertical tilted minute angle state and supported by pedestal 10, and pallet 15 is by the objective table portion 14 that is not subjected to stress direction guiding to the left and right, and then shoot part 18 moves on pallet 15 along the vertical direction, thus, even under the situation of large-scale substrate 100, also can when diminishing, the floor area that makes device correctly carry out mensuration to substrate 100.
In addition, adopt such structure in the above-described embodiment, that is, come illuminating board 100, and take the reflected light on substrate 100 surfaces by the light source 63 of taking unit 16.Yet also can adopt such structure, that is, constitute objective table portion 14 by the material by light transmission, perhaps the central authorities in objective table portion 14 form peristome, thereby take the light through substrate 100.
Also have, in the above-described embodiment, the present invention is applicable to the horizontal metroscope of the distance between two points measured on the substrate 100 etc., but the present invention is also applicable to other basal lamina determination device of the testing fixture of substrate etc.
Claims (10)
1. basal lamina determination device is characterized in that having:
Pedestal;
Objective table portion, it can not be subjected to the stress from said base, and is being supported by said base with respect to the tilted state of minute angle of vertical with its surface;
Substrate support member, it is used to support the bottom of the substrate that should measure, and is arranged on the below of above-mentioned objective table portion;
Pallet, it is by the guiding elements guiding of top that is arranged on above-mentioned objective table portion and bottom, thereby can be along the surface of above-mentioned objective table portion to the left and right direction move;
Shoot part, it is by the guiding elements guiding that is arranged on the above-mentioned pallet, thereby can along above-mentioned pallet up and down direction move.
2. basal lamina determination device as claimed in claim 1 is characterized in that, when having set the surface that makes above-mentioned objective table portion and be the three-dimensional system of coordinate of X, Y direction, said base has:
First support portion, it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on X, Y, Z direction;
Second support portion, it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on Y, Z direction;
The 3rd support portion, it supports above-mentioned objective table portion with the state that limits above-mentioned objective table portion with respect to said base and move on the Z direction.
3. basal lamina determination device as claimed in claim 1 or 2 is characterized in that having:
Be provided in the above-mentioned objective table portion and measure the linear scale of the position of above-mentioned pallet;
Be provided on the above-mentioned pallet and measure the linear scale of the position of above-mentioned shoot part.
4. basal lamina determination device, its shooting is formed on the pattern on the substrate, and carries out the mensuration of above-mentioned pattern based on captured image, it is characterized in that having:
Pedestal;
Objective table portion, it is with respect to said base, and is supported with respect to the tilted state of minute angle of vertical with its surface;
Supporting mechanism, it is arranged in the above-mentioned objective table portion, and supports aforesaid substrate with respect to above-mentioned objective table portion;
Shoot part, it is arranged in the above-mentioned objective table portion, and carries out parallel moving with respect to the substrate surface that remains in the above-mentioned objective table portion,
Above-mentioned objective table portion is supported carrying out the state of minute movement with respect to said base, thereby allows the change of this objective table portion.
5. basal lamina determination device as claimed in claim 4 is characterized in that,
Above-mentioned supporting member is a deflector roll, and this deflector roll can be provided in the lower end side of above-mentioned objective table portion rotationally for the bottom of supporting substrate, and has the recess that is used to guide substrate on its periphery.
6. basal lamina determination device as claimed in claim 5 is characterized in that,
Also has dance roller, this dance roller lifting is between position of readiness and Support Position, this position of readiness is the position that the upper end of dance roller is configured in the below of above-mentioned deflector roll upper end, and the position of to be the upper end of dance roller be configured in this Support Position top of above-mentioned deflector roll upper end, this dance roller can rise to the substrate by above-mentioned guide rolls support the top with the position of above-mentioned deflector roll butt.
7. basal lamina determination device as claimed in claim 4 is characterized in that,
Above-mentioned supporting mechanism also comprises a plurality of deflector rolls, in the face that aforesaid substrate is supported of these a plurality of deflector rolls in above-mentioned objective table portion, supports the rear side of aforesaid substrate.
8. basal lamina determination device as claimed in claim 7 is characterized in that,
Above-mentioned supporting mechanism also has by absorption and keeps aforesaid substrate and this substrate absorption is remained on absorption maintaining body in the above-mentioned objective table portion, and, when adsorbing action by above-mentioned absorption maintaining body, support the deflector roll of the rear side of aforesaid substrate and keep out of the way in the objective table portion.
9. basal lamina determination device as claimed in claim 4 is characterized in that,
Said base has the support portion, bottom of the bottom of supporting above-mentioned objective table portion and supports upward support portion, top away from the upper portion of this bottom,
Support portion, above-mentioned bottom be so that above-mentioned objective table portion can support above-mentioned objective table portion to the mode that horizontal direction is carried out minute movement in the face on above-mentioned objective table portion surface,
Support portion, above-mentioned top not be so that above-mentioned supported objective table portion can tilt to the above mode of above-mentioned minute angle supports, and supports in the mode that can carry out minute movement in the face on above-mentioned objective table portion surface simultaneously.
10. basal lamina determination device as claimed in claim 9 is characterized in that,
Also be provided with bindiny mechanism above above-mentioned in the support portion, this bindiny mechanism connects said base and above-mentioned objective table portion in the mode that does not hinder above-mentioned minute movement, thereby above-mentioned objective table portion is not toppled over to the direction opposite with above-mentioned vergence direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005156507A JP2006329895A (en) | 2005-05-30 | 2005-05-30 | Substrate measuring apparatus |
| JP2005156507 | 2005-05-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1873373A true CN1873373A (en) | 2006-12-06 |
| CN100535590C CN100535590C (en) | 2009-09-02 |
Family
ID=37483910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100772445A Expired - Fee Related CN100535590C (en) | 2005-05-30 | 2006-04-28 | Basal lamina determination device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2006329895A (en) |
| KR (1) | KR100730450B1 (en) |
| CN (1) | CN100535590C (en) |
| TW (1) | TWI285728B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105717154A (en) * | 2016-05-05 | 2016-06-29 | 东旭科技集团有限公司 | Device and method for measuring shrinking percentage of panels |
| CN109313014A (en) * | 2016-06-23 | 2019-02-05 | 日本电气硝子株式会社 | Glass substrate strain measurement method and glass substrate device for measurement of strain |
| CN109813237A (en) * | 2019-01-28 | 2019-05-28 | 广东拓斯达科技股份有限公司 | Thickness of glass detection device |
| CN113167574A (en) * | 2018-12-21 | 2021-07-23 | 日本电气硝子株式会社 | Glass plate deflection measuring device and glass plate manufacturing method |
| CN114641827A (en) * | 2019-11-12 | 2022-06-17 | 松下知识产权经营株式会社 | Positioning device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102997795B (en) * | 2012-12-03 | 2015-10-21 | 京东方科技集团股份有限公司 | A kind of rubbing device and whole set equipment |
| JP6889216B2 (en) * | 2017-10-16 | 2021-06-18 | ファナック株式会社 | Work system |
| KR102262532B1 (en) * | 2021-02-05 | 2021-06-07 | 박덕식 | Device for inspection of lower equipment of railway vehicles |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS58187710U (en) * | 1982-06-08 | 1983-12-13 | 東芝機械株式会社 | Printing plate pattern area ratio measuring device |
| JP3221823B2 (en) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | Projection exposure apparatus, exposure method using the same, and semiconductor manufacturing method |
| JPH11211615A (en) * | 1998-01-21 | 1999-08-06 | Micronics Japan Co Ltd | Inspection apparatus of substrate for display panel |
| JP2001358204A (en) * | 2000-06-15 | 2001-12-26 | Tokyo Electron Ltd | Inspecting stage |
| JP2003014649A (en) * | 2001-06-27 | 2003-01-15 | Hitachi Kokusai Electric Inc | Plate-shaped matter inspection device |
| KR100479904B1 (en) * | 2002-06-29 | 2005-03-30 | 삼성테크윈 주식회사 | Apparatus for inspecting parts |
| KR100538003B1 (en) * | 2003-04-30 | 2005-12-20 | 주식회사 이오테크닉스 | Method of calibrating X-Y stage of laser system and an apparatus thereof |
-
2005
- 2005-05-30 JP JP2005156507A patent/JP2006329895A/en not_active Abandoned
-
2006
- 2006-04-10 TW TW095112661A patent/TWI285728B/en not_active IP Right Cessation
- 2006-04-28 CN CNB2006100772445A patent/CN100535590C/en not_active Expired - Fee Related
- 2006-05-01 KR KR1020060039305A patent/KR100730450B1/en not_active IP Right Cessation
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105717154A (en) * | 2016-05-05 | 2016-06-29 | 东旭科技集团有限公司 | Device and method for measuring shrinking percentage of panels |
| CN109313014A (en) * | 2016-06-23 | 2019-02-05 | 日本电气硝子株式会社 | Glass substrate strain measurement method and glass substrate device for measurement of strain |
| CN113167574A (en) * | 2018-12-21 | 2021-07-23 | 日本电气硝子株式会社 | Glass plate deflection measuring device and glass plate manufacturing method |
| CN109813237A (en) * | 2019-01-28 | 2019-05-28 | 广东拓斯达科技股份有限公司 | Thickness of glass detection device |
| CN114641827A (en) * | 2019-11-12 | 2022-06-17 | 松下知识产权经营株式会社 | Positioning device |
| CN114641827B (en) * | 2019-11-12 | 2023-03-07 | 松下知识产权经营株式会社 | Positioning device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI285728B (en) | 2007-08-21 |
| CN100535590C (en) | 2009-09-02 |
| KR20060124563A (en) | 2006-12-05 |
| TW200702628A (en) | 2007-01-16 |
| KR100730450B1 (en) | 2007-06-19 |
| JP2006329895A (en) | 2006-12-07 |
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