CN1861725A - 抛光砖专用化学抛光剂 - Google Patents
抛光砖专用化学抛光剂 Download PDFInfo
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- CN1861725A CN1861725A CN 200610035936 CN200610035936A CN1861725A CN 1861725 A CN1861725 A CN 1861725A CN 200610035936 CN200610035936 CN 200610035936 CN 200610035936 A CN200610035936 A CN 200610035936A CN 1861725 A CN1861725 A CN 1861725A
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- 238000005498 polishing Methods 0.000 title claims abstract description 17
- 239000011449 brick Substances 0.000 title claims abstract description 10
- 239000000126 substance Substances 0.000 title claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims abstract description 14
- -1 polyoxyethylene Polymers 0.000 claims abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 239000003945 anionic surfactant Substances 0.000 claims abstract description 6
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims abstract description 6
- 239000004094 surface-active agent Substances 0.000 claims abstract description 6
- 239000008367 deionised water Substances 0.000 claims abstract description 5
- 239000004576 sand Substances 0.000 claims abstract description 5
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- UHWHLNBFTFKKHS-UHFFFAOYSA-N CCCCCCCCCC(OF)=O.N Chemical compound CCCCCCCCCC(OF)=O.N UHWHLNBFTFKKHS-UHFFFAOYSA-N 0.000 claims description 3
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 3
- 239000004141 Sodium laurylsulphate Substances 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 claims description 3
- 229920005862 polyol Polymers 0.000 claims description 3
- 150000003077 polyols Chemical class 0.000 claims description 3
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 3
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 claims description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 abstract 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 abstract 1
- 239000004721 Polyphenylene oxide Substances 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229920000570 polyether Polymers 0.000 abstract 1
- 150000005846 sugar alcohols Polymers 0.000 abstract 1
- 230000014759 maintenance of location Effects 0.000 description 3
- 239000013543 active substance Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- SAXCKUIOAKKRAS-UHFFFAOYSA-N cobalt;hydrate Chemical compound O.[Co] SAXCKUIOAKKRAS-UHFFFAOYSA-N 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000005002 finish coating Substances 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
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- 239000003999 initiator Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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Abstract
本发明公开了一种抛光砖专用化学抛光剂，该抛光剂是由如下组份构成：不同纳米级液体硅砂8－40％，非离子表面活性剂、阴离子表面活性剂、氟碳表面活性剂的一种或一种以上表面活性剂组合0.01－1％，一种或一种以上的有机溶机混合物0.1－5％，去离子水60－90％，其中，非离子表面活性剂可采用聚氧乙烯烷醚、聚氧乙烯多元醇醚；阴离子表面活性剂可采用十二烷基苯磺酸钠、十二烷基硫酸钠；氟碳表面活性剂采用全氟辛酸铵、全氟癸酸铵；机溶机混合物采用如甲醇、乙醇、丁酮；采用上述组份的抛光剂具有效提高抛光砖光泽，且耐久、保光性好的优点。
Description
技术领域
本发明涉及一种抛光剂，具体是涉及抛光砖用的纳米化学抛光剂。
背景技术
抛光砖的表面处理是关系到抛光砖抗污能力的一个重要因素，现有技术的抛光砖抛光剂一般是通过表面成膜或填充的方式来抛光，如专利申请号为CN200310112065.7、名称为一种瓷质砖表面抛光涂料的专利申请，它公开了一种瓷质砖表面抛光涂料，由下述体积配比的原料组成：市售6688聚酯树脂∶甲乙酮∶钴水∶蜡液＝100∶0.5～4∶0.4～3∶0～3，其中市售6688聚酯树脂为连接料，甲乙酮作为引发剂，钴水作为促进剂。上述抛光涂料是以表面成膜或靠填充来抛光为主，但其表面光泽的耐久、保光性尚有待进一步提高。
发明内容
本发明的目的在于提供一种抛光砖不同表面处理机理、可有效提高抛光砖光泽，且耐久、保光性的抛光砖专用化学抛光剂。
本发明是通过如下技术方案来实现上述目的：该抛光剂是由如下组份构成：不同纳米级液体硅砂8-40％，非离子表面活性剂、阴离子表面活性剂、氟碳表面活性剂的一种或一种以上0.01-1％，一种或一种以上的有机溶机混合物0.1-5％，去离子水60-90％
其中，非离子表面活性剂可采用聚氧乙烯烷醚、聚氧乙烯多元醇醚；阴离子表面活性剂可采用十二烷基苯磺酸钠、十二烷基硫酸钠；氟碳表面活性剂采用全氟辛酸铵、全氟癸酸铵；机溶机混合物采用如甲醇、乙醇、丁酮；
采用上述配方组份的纳米化学抛光剂优点在于，它与一般抛光剂不同，不是以表面成膜或靠填充来抛光为主，而是通过专用抛光设施，把瓷砖表面肉眼看不见的突起部分磨平.因此使用本品抛光的瓷砖，可大大提高其光泽，且耐久性、保光性都得到显著改善。
具体实施方式
实施例1
本发明的抛光砖专用化学抛光剂其组份如下(重量份)：纳米级液体硅砂20％，表面活性剂为聚氧乙烯烷醚、全氟辛酸铵的组合0.5％，丁酮0.5％，去离子水79％，将上述组份混合搅拌即可；
实施例2
按重量份，纳米级液体硅砂25％，表面活性剂为聚氧乙烯多元醇醚、十二烷基硫酸钠、全氟癸酸铵的组合0.8％，乙醇0.2％，去离子水74％，将上述组份混合搅拌即可。
Claims (2)
1、抛光砖专用化学抛光剂，其特征在于，抛光剂是由如下组份构成(重量份)：纳米级液体硅砂8-40％，非离子表面活性剂、阴离子表面活性剂、氟碳表面活性剂的一种或一种以上0.01-1％，一种或一种以上的有机溶机混合物0.1-5％，去离子水60-90％。
2、根据权利要求1所述的抛光砖专用化学抛光剂，其特征在于，非离子表面活性剂采用聚氧乙烯烷醚或聚氧乙烯多元醇醚；阴离子表面活性剂采用十二烷基苯磺酸钠或十二烷基硫酸钠；氟碳表面活性剂采用全氟辛酸铵或全氟癸酸铵；机溶机混合物采用甲醇、乙醇或丁酮。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100359363A CN100516158C (zh) | 2006-06-14 | 2006-06-14 | 抛光砖专用化学抛光剂 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100359363A CN100516158C (zh) | 2006-06-14 | 2006-06-14 | 抛光砖专用化学抛光剂 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1861725A true CN1861725A (zh) | 2006-11-15 |
| CN100516158C CN100516158C (zh) | 2009-07-22 |
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| CNB2006100359363A Expired - Fee Related CN100516158C (zh) | 2006-06-14 | 2006-06-14 | 抛光砖专用化学抛光剂 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101838503A (zh) * | 2010-02-26 | 2010-09-22 | 佛山市柯林瓷砖护理用品有限公司 | 抛光砖、石材、人造石翻新用抛光剂 |
| CN104962201A (zh) * | 2015-06-09 | 2015-10-07 | 济南汇川硅溶胶厂 | 一种纳米瓷砖填孔剂 |
-
2006
- 2006-06-14 CN CNB2006100359363A patent/CN100516158C/zh not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101838503A (zh) * | 2010-02-26 | 2010-09-22 | 佛山市柯林瓷砖护理用品有限公司 | 抛光砖、石材、人造石翻新用抛光剂 |
| CN104962201A (zh) * | 2015-06-09 | 2015-10-07 | 济南汇川硅溶胶厂 | 一种纳米瓷砖填孔剂 |
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| Publication number | Publication date |
|---|---|
| CN100516158C (zh) | 2009-07-22 |
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Effective date of registration: 20160323 Address after: 528100 No. (F4), No. 17-6, No. A, Datang Park, central science and Technology Industrial Zone, Sanshui District, Guangdong, China, 1 Patentee after: Foshan Cripps Technology Co., Ltd. Address before: 528000 building, 18 South Road, Chancheng District, Foshan, Guangdong, Fenjiang Patentee before: Zhou Wenpeng |
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Granted publication date: 20090722 Termination date: 20200614 |
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