CN1847117B - 叠层基板输送装置 - Google Patents

叠层基板输送装置 Download PDF

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CN1847117B
CN1847117B CN2006100730300A CN200610073030A CN1847117B CN 1847117 B CN1847117 B CN 1847117B CN 2006100730300 A CN2006100730300 A CN 2006100730300A CN 200610073030 A CN200610073030 A CN 200610073030A CN 1847117 B CN1847117 B CN 1847117B
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CN1847117A (zh
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朴庸硕
李硕周
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Weihai Dms Optical Electromechanical Co ltd
DMS Co Ltd
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Abstract

本发明涉及一种叠层基板输送装置，包括：架子；设置于所述架子，用于通过直径大于一定值的辊子输送基板，在所述辊子的轴和所设置的基板间形成一定空间的上部输送机构；设置于所述架子的高端，用于输送基板的至少两个可旋转的第一输送辊；设置于所述架子的低端并可旋转，其直径大于所述第一输送辊的直径，用于从所述第一输送辊接收基板的至少两个第二输送辊；用于使所述第二输送辊同时在所述架子的低端进行前后移动，并可使所述基板沿水平方向移动的移动板；设置于所述架子的一侧，其前端进入所述上部输送机构的所述空间，用于接收/供应基板的缓冲装置；通过所述缓冲装置接收/供应所述基板，以此输送基板的下部输送机构及基板处理装置。

Description

叠层基板输送装置
技术领域
本发明涉及一种叠层基板的输送装置，特别涉及一种把通过上部输送机构输送的基板很容易地输送到下部输送机构的叠层基板输送装置。
背景技术
一般情况下，应用于平板显示器(FPD：Flat Panel Display)、半导体基板、LCD、光掩模用玻璃等领域的基板，要经过一系列的处理流程，进行蚀刻、剥离、清洗等工序后，进行清洗。
对上述的基板进行处理和清洗时，为了向各道工序传送基板，必须使用输送装置。
上述基板输送装置的结构有多种多样，但目前通常采用的是水平接收/供应基板的输送装置。即，为了对基板进行处理，这种输送装置以水平状态输送基板，供给加工线入口处的装载机，或从卸载机一侧接收经处理的基板，而后输送到其他处理工序。
叠层基板输送装置通过上部输送机构输送基板，并通过可上下反复移动的缓冲装置(buffer hand)接收/供应所述基板，然后通过缓冲装置向下部输送机构接收/供应基板。
但是，这种结构的叠层基板输送装置因基板的大面积趋势，从而使现有的上部输逆机构不适用。
发明内容
本发明的目的在于提供一种通过改善上部输送机构的结构，可简便地上下输送所述基板的叠层基板输送装置。
本发明的另一目的在于通过加大输送辊直径，提高基板的输送速度。通过使用上述的大直径辊子，可顺利实现基板的接收或供应。
本发明是以如下方式实现的。本发明的叠层基板输送装置，包括：架子；设置于所述架子上，并带有可在原地旋转和前后移动、用于输送基板的辊子的上部输送机构；第一输送部，设置在所述架子的指定位置，包括设置于所述架子的高端，用于输送基板的至少两个可旋转的第一输送辊；第二输送部，设置在所述第一输送部的前方，包括设置于所述架子的低端并可旋转，用于从所述第一输送辊接收基板的至少两个第二输送辊；用于使至少两个所述第二输送辊同时在所述架子的低端进行前后移动，并可使所述基板沿水平方向移动的移动板；设置于所述上部输送机构的附近，可上下移动，当所述输送机构向其靠近时，其前端可进入由设置于所述上部输送机构内、且其直径大于一定数值的辊子所形成的空间，用于接收/供应所述基板的缓冲装置；通过从所述缓冲装置接收、或向缓冲装置供应所述基板，并向基板处理装置输送基板的下部输送机构，所述至少两个第二输送辊的直径大于所述第一输送辊的直径，并满足：当基板设置于第二输送辊上时，在基板和用于支持所述第二输送辊的第二旋转轴之间形成一足以使缓冲装置的前端进入的空间；即使第二输送辊的直径变大，所述第二输送部的位置还是低于所述第一输送部的位置，从而适于在水平方向上输送基板。
如上所述，本发明的叠层基板输送装置，把两个输送部设置成一列，把其中一侧输送部设置于低端，并加大该输送部的辊子直径，使该大直径辊子在自转的同时前后做直线运动，以此让用于接收所述基板的缓冲装置可进入基板和辊子之间，从而减少了在叠层基板输送装置上，上下输送基板所需的时间。
附图说明
图1是本发明的叠层基板输送装置优选实施例一的立体图；
图2是本发明的叠层基板输送装置实施例的主要部分放大图；
图3是本发明的叠层基板输送装置实施例的侧视图；
图4是本发明的叠层基板输送装置实施例的主视图；
图5是本发明的叠层基板输送装置优选实施例二的主视图。
具体实施方式
下面结合附图和实施例对本发明叠层基板输送装置进行更为详细地说明。
如图1至图4所示，本发明优选实施例中叠层基板输送装置，包括：沿垂直及水平方向排列，并形成框架的多个架子1；设置于所述架子1的上部，并可在其上滑移，用于接收/供应所述基板G的上部输送机构3；从所述上部输送机构3的下侧设置于架子1，用于接收/供应所述基板的下部输送机构40。
在基板处理单元10的前后，所述下部输送机构40分别形成单独的输送机构8、12。
本发明还包括，可从所述上部输送机构3接收，或向所述上部输送机构3供应基板G的缓冲装置5、7。所述的缓冲装置5、7可垂直移动，以此实现升降。
从/向所述缓冲装置5、7接收/供应基板G的第一输送部9和第二输送部11构成所述上部输送机构3。所述的下部输送机构40从所述缓冲装置5、7接收所述基板G，而后把该基板G输送到用于清洗、干燥该基板G的基板处理单元10。所述基板处理单元10可采用该领域的通用设备，因此省略其详细说明。
所述的第一输送部9可在所述架子1的指定位置旋转，所述第二输送部11设置于所述第一输送部9的前方，可自转，并可前后移动。特别是，所述的第二输送部11的设置位置低于所述第一输送部9的设置位置。
为此，所述的第一输送部9包括：排列于两侧架子1上的至少一个支架13；设置于所述支架13上并可旋转的第一旋转轴16；设置于所述第一旋转轴16，用于支持基板的至少一个第一输送辊15；用于连接所述的多个第一输送辊15的连接轴17；用于驱动所述多个第一旋转轴16的第一电动机组19。
并且，所述的多个第一旋转轴16的一端通过连接轴17相互连接，该连接轴17通过蜗杆及蜗轮等动力传递结构，把所述第一电动机组19的旋转力传递给所述第一旋转轴16。
因此，当所述电动机组19驱动时，旋转轴17随之旋转，并带动多个第一旋转轴16旋转，而多个第一输送辊15随之旋转的同时，带动基板G移动。
在如上所述的作用下，通过所述第一输送部9而输送的基板G，供给到第二输送部11。
所述的第二输送部11包括：一对架子20；设置于所述架子20上面的轨道21；设置于所述轨道21上，并可做前后直线运动的移动板23；设置于所述移动板23上，并可旋转，且可设置基板G的第二输送辊25；用于旋转所述第二输送辊25的电动机组26。
所述第二输送部11的架子20的安装位置低于所述第一输送部9的架子1的位置。
所述轨道21包括LM式轨道，在所述的LM式轨道21上设置移动板23，使该移动板23沿轨道21前后移动。
在所述移动板23的上部，向上突设有支撑架31，在所述支撑架31上设置有可旋转的第二旋转轴27。并且，所述第二旋转轴27通过电动机组26和皮带28传递动力。所述电动机组26的旋转轴30和第二旋转轴27通过皮带28连接。
所述的多个第二输送辊25设置于所述第二旋转轴27。
并且，所述第二旋转轴27带动第二输送辊25旋转，从而输送基板G。
此时，所述的第二输送棍25采用大直径r大辊子。所述大辊子的直径大于所述第一输送辊15的直径。
即，如图3所示，如果所述第二输送辊25的直径大于一定值，那么当基板G设置于所述第二输送辊25时，在第二旋转轴27和基板G之间可形成一定大小的空间S。该空间S的大小应当足以使所述缓冲装置5的前端进入。这是确定所述第二输送辊25的直径的条件。
即使所述第二输送辊25的直径变大，所述的第二输送部11的位置还是低于第一输送部9的位置，因此可在水平方向上输送基板。
所述缓冲装置5的前端为了接收、供应所述基板而进入所述第二旋转轴27和基板G之间时，进入该空间S，因此可使缓冲装置5易于进入。所述缓冲装置5进入所述空间的状态下，利用常规方法将所述缓冲装置5稍微向上移动，使设置于所述第二输送辊25的基板G移向所述缓冲装置5一侧。
如上所述，在所述第一输送部9的作用下，所述基板G向前方输送时，所述的第二输送部11向所述第一输送部9方向移动，并接收所述基板G，所述的第二输送部11接收所述基板G后，移动板23沿轨道21向前方移动，从而把所述基板G输送到所述缓冲装置5。
如此，把原地旋转的所述第一输送部9和可前后移动的所述第二输送部11设置成一列，并使所述第二输送部11的位置低于所述第一输送部9的位置，并采用大直径辊子，以此可加快基板的输送速度。
图5所示的是本发明的另一实施例。如图5所示，本实施例中第二输送辊25未采用大直径辊子，而采用了分离的旋转轴42、44。
即，将所述第二输送部11的旋转轴27分成两个旋转轴42、44。所述的两个旋转轴42、44分别设置于支撑架46，48，并可旋转。此时，在所述两个旋转轴42、44上设置常规直径的输送辊50。以此相分离的两个旋转轴42、44之间，形成一定大小的空间D。
缓冲装置49为接收所述基板而进入所述辊子50之间时，在该一定大小的空间D可上下移动，由此可接收和供应基板。
上述说明中，通过基板的清洗及干燥工序对基板的输送装置及方法进行了说明，但并不限于上述内容，本发明也可适用于基板的蚀刻(Etching)及剥离(Strip)工序。
上述的说明是对本发明实施例的详细描述，但本发明并不限定于上述实施方式。在权利要求书和说明书及其附图所示的范围之内通过一些修改，可实现不同的实施方式，而这种修改应属于本发明的保护范围。

Claims (6)

1.一种叠层基板输送装置，其特征在于：它包括：
其两端的高度不同、并设置成一列的架子；
第一输送部，设置在所述架子的指定位置，包括设置于所述架子的高端，用于输送基板的至少两个可旋转的第一输送辊；
第二输送部，设置在所述第一输送部的前方，包括设置于所述架子的低端并可旋转，用于从所述第一输送辊接收基板的至少两个第二输送辊；
用于使至少两个所述第二输送辊同时在所述架子的低端进行前后移动，并可使所述基板沿水平方向移动的移动板；
设置于所述架子的低端，且进入至少两个所述的第二输送辊之间，用于接收/供应基板，并可使该基板沿垂直方向上下移动的缓冲装置；
通过所述缓冲装置接收/供应所述基板，并向基板处理单元输送基板的下部输送机构，
所述至少两个第二输送辊的直径大于所述第一输送辊的直径，并满足：当基板设置于第二输送辊上时，在基板和用于支持所述第二输送辊的第二旋转轴之间形成一足以使缓冲装置的前端进入的空间；即使第二输送辊的直径变大，所述第二输送部的位置还是低于所述第一输送部的位置，从而适于在水平方向上输送基板。
2.根据权利要求1所述的叠层基板输送装置，其特征在于：所述的至少两个第一输送辊和至少两个第二输送辊构成上部输送机构，第一输送辊和第二输送辊分别设置于第一旋转轴和所述第二旋转轴上，并通过电动机组实现旋转。
3.根据权利要求1所述的叠层基板输送装置，其特征在于：所述的至少两个第一输送辊设置于排列在所述架子两侧上的至少两个支架，并与用于连接至少两个所述的第一输送辊的连接轴相连，以此传递动力。
4.根据权利要求1所述的叠层基板输送装置，其特征在于：所述的至少两个第二输送辊设置于可在所述架子上面的轨道上滑动的移动板。
5.一种叠层基板输送装置，其特征在于：它包括：
架子；
设置于所述架子的一侧，通过在原地旋转的辊子输送基板的第一输送部；
设置于所述架子的另一侧，并可前后移动，带有堆积基板用辊子，用于从所述第一输送部接收基板，分离设置用于连接所述堆积基板用辊子的旋转轴，以形成一定大小的空间，从而使缓冲装置进入的第二输送部；
从所述缓冲装置接收所述基板，向基板处理装置输送基板的下部输送机构。
6.根据权利要求5所述的叠层基板输送装置，其特征在于所述的第二输送部包括：
轨道，设置于所述架子上面；
移动板，设置于所述轨道，并可在所述轨道上滑动；
支撑架，设置在所述移动板上，并向上突出；
所述旋转轴，分别设置于所述支撑架上，并可旋转；
所述堆积基板用辊子，分别设置于所述旋转轴上；
电动机组，用于旋转所述旋转轴。
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CN102602654A (zh) * 2012-02-03 2012-07-25 安徽昊锐光伏新能源科技有限公司 一种固定辊架装置
CN105173619A (zh) * 2014-06-06 2015-12-23 日东电工株式会社 输送装置及输送方法
CN108357929A (zh) * 2018-04-18 2018-08-03 昆山精讯电子技术有限公司 一种面板移载装置
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