CN1845302A - 阳极接合装置、阳极接合方法和加速度传感器的制造方法 - Google Patents
阳极接合装置、阳极接合方法和加速度传感器的制造方法 Download PDFInfo
- Publication number
- CN1845302A CN1845302A CNA2006100086440A CN200610008644A CN1845302A CN 1845302 A CN1845302 A CN 1845302A CN A2006100086440 A CNA2006100086440 A CN A2006100086440A CN 200610008644 A CN200610008644 A CN 200610008644A CN 1845302 A CN1845302 A CN 1845302A
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000001133 acceleration Effects 0.000 title claims description 35
- 238000000034 method Methods 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000758 substrate Substances 0.000 claims abstract description 289
- 230000002093 peripheral effect Effects 0.000 claims description 62
- 239000011521 glass Substances 0.000 claims description 54
- 239000004065 semiconductor Substances 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 24
- 229910052710 silicon Inorganic materials 0.000 description 22
- 239000010703 silicon Substances 0.000 description 22
- 230000035882 stress Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003313 weakening effect Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C3/00—Assembling of devices or systems from individually processed components
- B81C3/001—Bonding of two components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/031—Anodic bondings
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Pressure Sensors (AREA)
- Joining Of Glass To Other Materials (AREA)
- Primary Cells (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005112307A JP4777681B2 (ja) | 2005-04-08 | 2005-04-08 | 陽極接合装置、陽極接合方法及び加速度センサの製造方法 |
JP2005112307 | 2005-04-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1845302A true CN1845302A (zh) | 2006-10-11 |
CN100539015C CN100539015C (zh) | 2009-09-09 |
Family
ID=37064229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100086440A Expired - Fee Related CN100539015C (zh) | 2005-04-08 | 2006-02-20 | 阳极接合装置、阳极接合方法和加速度传感器的制造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7595545B2 (zh) |
JP (1) | JP4777681B2 (zh) |
KR (1) | KR101196693B1 (zh) |
CN (1) | CN100539015C (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103081094A (zh) * | 2011-01-27 | 2013-05-01 | 松下电器产业株式会社 | 附带贯通电极的基板及其制造方法 |
CN105865669A (zh) * | 2015-02-09 | 2016-08-17 | 阿自倍尔株式会社 | 三层基板的接合方法 |
CN115315805A (zh) * | 2020-03-26 | 2022-11-08 | 三菱电机株式会社 | 半导体装置及其制造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5281739B2 (ja) * | 2006-07-18 | 2013-09-04 | 新光電気工業株式会社 | 陽極接合装置 |
RU2530484C2 (ru) * | 2009-07-06 | 2014-10-10 | Аркема Инк. | Подложка органического светоизлучающего диода, состоящая из прозрачного проводящего оксида (тсо) и антирадужного промежуточного слоя |
DE102013019434A1 (de) * | 2013-11-20 | 2015-05-21 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Festkörperfügen eines Trägerkörpers und einer Deckschicht, insbesondere durch anodisches Bonden |
KR102194145B1 (ko) * | 2014-06-05 | 2020-12-23 | 삼성디스플레이 주식회사 | 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
US11056356B1 (en) * | 2017-09-01 | 2021-07-06 | Intel Corporation | Fluid viscosity control during wafer bonding |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4752180A (en) * | 1985-02-14 | 1988-06-21 | Kabushiki Kaisha Toshiba | Method and apparatus for handling semiconductor wafers |
US5273553A (en) * | 1989-08-28 | 1993-12-28 | Kabushiki Kaisha Toshiba | Apparatus for bonding semiconductor substrates |
JPH0744135B2 (ja) * | 1989-08-28 | 1995-05-15 | 株式会社東芝 | 半導体基板の接着方法及び接着装置 |
KR100289348B1 (ko) * | 1992-05-25 | 2001-12-28 | 이데이 노부유끼 | 절연기판실리콘반도체장치와그제조방법 |
US5578159A (en) * | 1993-06-29 | 1996-11-26 | Hitachi Techno Engineering Co., Ltd. | Hot press for producing multilayer circuit board |
JPH07183181A (ja) | 1993-12-21 | 1995-07-21 | Mitsubishi Materials Corp | 陽極接合装置および陽極接合方法 |
US5494546A (en) * | 1994-02-18 | 1996-02-27 | Horvath; Steven J. | Apparatus and method for applying anti-lacerative film to glass |
JPH09246127A (ja) | 1996-03-04 | 1997-09-19 | Toyota Motor Corp | 陽極接合方法 |
JP3858405B2 (ja) | 1998-01-05 | 2006-12-13 | セイコーエプソン株式会社 | 基板の陽極接合方法及び基板の接合装置 |
US6082140A (en) * | 1999-06-16 | 2000-07-04 | The Regents Of The University Of California | Fusion bonding and alignment fixture |
US6168963B1 (en) * | 1999-06-21 | 2001-01-02 | Lucent Technologies, Inc. | System for adhering parts |
JP3762157B2 (ja) * | 1999-09-02 | 2006-04-05 | 旭テクノグラス株式会社 | 陽極接合用ガラス |
JP4125889B2 (ja) * | 2000-12-04 | 2008-07-30 | 日本板硝子株式会社 | 光学素子、成形型及びそれらの製造方法 |
US20040112528A1 (en) * | 2002-12-17 | 2004-06-17 | Xerox Corporation | Bonding flexible film circuit and electronic circuit board |
WO2005054147A1 (ja) * | 2003-12-02 | 2005-06-16 | Bondtech Inc. | 接合方法及びこの方法により作成されるデバイス並びに接合装置 |
US7180179B2 (en) * | 2004-06-18 | 2007-02-20 | International Business Machines Corporation | Thermal interposer for thermal management of semiconductor devices |
US7358740B2 (en) * | 2005-03-18 | 2008-04-15 | Honeywell International Inc. | Thermal switch with self-test feature |
-
2005
- 2005-04-08 JP JP2005112307A patent/JP4777681B2/ja not_active Expired - Fee Related
-
2006
- 2006-02-20 CN CNB2006100086440A patent/CN100539015C/zh not_active Expired - Fee Related
- 2006-02-20 KR KR1020060016342A patent/KR101196693B1/ko active Active
- 2006-03-15 US US11/375,053 patent/US7595545B2/en not_active Expired - Fee Related
-
2009
- 2009-08-20 US US12/544,480 patent/US8785292B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103081094A (zh) * | 2011-01-27 | 2013-05-01 | 松下电器产业株式会社 | 附带贯通电极的基板及其制造方法 |
CN105865669A (zh) * | 2015-02-09 | 2016-08-17 | 阿自倍尔株式会社 | 三层基板的接合方法 |
CN105865669B (zh) * | 2015-02-09 | 2018-11-09 | 阿自倍尔株式会社 | 三层基板的接合方法 |
CN115315805A (zh) * | 2020-03-26 | 2022-11-08 | 三菱电机株式会社 | 半导体装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20060107287A (ko) | 2006-10-13 |
US20090311818A1 (en) | 2009-12-17 |
JP4777681B2 (ja) | 2011-09-21 |
US8785292B2 (en) | 2014-07-22 |
US7595545B2 (en) | 2009-09-29 |
KR101196693B1 (ko) | 2012-11-08 |
CN100539015C (zh) | 2009-09-09 |
JP2006290668A (ja) | 2006-10-26 |
US20060228824A1 (en) | 2006-10-12 |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
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ASS | Succession or assignment of patent right |
Owner name: OKI SEMICONDUCTOR CO., LTD. Free format text: FORMER OWNER: OKI ELECTRIC INDUSTRY CO., LTD. Effective date: 20131210 |
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C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: LAPIS SEMICONDUCTOR Co.,Ltd. Address before: Tokyo, Japan Patentee before: Oki Semiconductor Co.,Ltd. |
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CP02 | Change in the address of a patent holder |
Address after: yokohama Patentee after: LAPIS SEMICONDUCTOR Co.,Ltd. Address before: Tokyo, Japan Patentee before: LAPIS SEMICONDUCTOR Co.,Ltd. |
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TR01 | Transfer of patent right |
Effective date of registration: 20131210 Address after: Tokyo, Japan Patentee after: Oki Semiconductor Co.,Ltd. Address before: Tokyo, Japan Patentee before: Oki Electric Industry Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090909 Termination date: 20170220 |
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CF01 | Termination of patent right due to non-payment of annual fee |