CN1714314A - 用于制造可光成像黑色电极的可水显影光成像厚膜组合物 - Google Patents

用于制造可光成像黑色电极的可水显影光成像厚膜组合物 Download PDF

Info

Publication number
CN1714314A
CN1714314A CNA028202260A CN02820226A CN1714314A CN 1714314 A CN1714314 A CN 1714314A CN A028202260 A CNA028202260 A CN A028202260A CN 02820226 A CN02820226 A CN 02820226A CN 1714314 A CN1714314 A CN 1714314A
Authority
CN
China
Prior art keywords
composition
weight
acid
mixtures
photoimageable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA028202260A
Other languages
English (en)
Chinese (zh)
Inventor
T·R·苏斯
J·D·史密斯
H·杨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1714314A publication Critical patent/CN1714314A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00—Gas-filled discharge tubes
    • H01J2217/38—Cold-cathode tubes
    • H01J2217/49—Display panels, e.g. not making use of alternating current
    • H01J2217/492—Details
    • H01J2217/49207—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Conductive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
CNA028202260A 2001-10-12 2002-10-09 用于制造可光成像黑色电极的可水显影光成像厚膜组合物 Pending CN1714314A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32873401P 2001-10-12 2001-10-12
US60/328,734 2001-10-12

Publications (1)

Publication Number Publication Date
CN1714314A true CN1714314A (zh) 2005-12-28

Family

ID=23282190

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA028202260A Pending CN1714314A (zh) 2001-10-12 2002-10-09 用于制造可光成像黑色电极的可水显影光成像厚膜组合物

Country Status (9)

Country Link
US (1) US20030124461A1 (enExample)
EP (1) EP1435021B1 (enExample)
JP (1) JP4142579B2 (enExample)
KR (1) KR100540967B1 (enExample)
CN (1) CN1714314A (enExample)
AT (1) ATE298100T1 (enExample)
DE (1) DE60204711T2 (enExample)
TW (1) TWI275906B (enExample)
WO (1) WO2003032088A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101030038B (zh) * 2006-03-03 2012-07-04 E.I.内穆尔杜邦公司 聚合物溶液、可水性显影的厚膜组合物、其制法及由其形成的电极
CN103395311A (zh) * 2013-08-15 2013-11-20 中国科学院新疆理化技术研究所 一种微珠结晶核的制备方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060027307A1 (en) * 2004-08-03 2006-02-09 Bidwell Larry A Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein
US7135267B2 (en) * 2004-08-06 2006-11-14 E. I. Du Pont De Nemours And Company Aqueous developable photoimageable compositions for use in photo-patterning methods
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
KR100927610B1 (ko) * 2005-01-05 2009-11-23 삼성에스디아이 주식회사 감광성 페이스트 조성물, 및 이를 이용하여 제조된플라즈마 디스플레이 패널
US7569165B2 (en) * 2005-03-09 2009-08-04 E. I. Du Pont De Nemours And Company Black conductive compositions, black electrodes, and methods of forming thereof
JP5108239B2 (ja) * 2005-03-09 2012-12-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 黒色導電性組成物、黒色電極、およびその形成方法
US7384577B2 (en) * 2005-03-09 2008-06-10 E.I. Du Pont De Nemours And Company Black conductive thick film compositions, black electrodes, and methods of forming thereof
JP4667969B2 (ja) * 2005-06-14 2011-04-13 富士フイルム株式会社 黒色組成物、感光性転写材料、遮光画像付き基板、カラーフィルタ、液晶表示素子及び遮光画像の製造方法
US20070059459A1 (en) * 2005-09-12 2007-03-15 Haixin Yang Ink jet printable hydrogel for sensor electrode applications
US7214466B1 (en) * 2005-12-14 2007-05-08 E. I. Du Pont De Nemours And Company Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof
ZA201208302B (en) * 2011-11-09 2014-10-29 Heraeus Precious Metals Gmbh Thick film conductive composition and use thereof

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5134175A (en) * 1987-12-16 1992-07-28 Michael Lucey Curable composition for electrical and electronic components
US5180757A (en) * 1987-12-16 1993-01-19 Michael Lucey Photopolymerizable compositions used in electronics
US4925771A (en) * 1988-05-31 1990-05-15 E. I. Dupont De Nemours And Company Process of making photosensitive aqueous developable ceramic coating composition including freeze drying the ceramic solid particles
US4912019A (en) * 1988-05-31 1990-03-27 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable ceramic coating composition
US5049480A (en) * 1990-02-20 1991-09-17 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable silver conductor composition
US6156433A (en) * 1996-01-26 2000-12-05 Dai Nippon Printing Co., Ltd. Electrode for plasma display panel and process for producing the same
US5851732A (en) * 1997-03-06 1998-12-22 E. I. Du Pont De Nemours And Company Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode
JP3510761B2 (ja) * 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
TW396365B (en) * 1997-08-27 2000-07-01 Toray Industries Plasma display decive and its method of manufacture
JP3686749B2 (ja) * 1997-11-04 2005-08-24 太陽インキ製造株式会社 パターン状無機質焼成被膜及びプラズマディスプレイパネルの製造方法
JPH11246638A (ja) * 1998-03-02 1999-09-14 Taiyo Ink Mfg Ltd 感光性組成物及びそれを用いて得られる焼成物パターン
JP3953625B2 (ja) * 1998-03-02 2007-08-08 太陽インキ製造株式会社 感光性組成物
JP4090103B2 (ja) * 1998-03-02 2008-05-28 太陽インキ製造株式会社 感光性組成物及びそれを用いて得られる焼成物パターン
JP3479463B2 (ja) * 1999-01-29 2003-12-15 太陽インキ製造株式会社 光硬化型導電性組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3394938B2 (ja) * 1999-03-25 2003-04-07 株式会社村田製作所 感光性導体ペースト
US6194124B1 (en) * 1999-08-12 2001-02-27 E. I. Du Pont De Nemours And Company Photosensitive ceramic compositions containing polycarbonate polymers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101030038B (zh) * 2006-03-03 2012-07-04 E.I.内穆尔杜邦公司 聚合物溶液、可水性显影的厚膜组合物、其制法及由其形成的电极
CN103395311A (zh) * 2013-08-15 2013-11-20 中国科学院新疆理化技术研究所 一种微珠结晶核的制备方法

Also Published As

Publication number Publication date
WO2003032088A1 (en) 2003-04-17
DE60204711D1 (de) 2005-07-21
KR20050034592A (ko) 2005-04-14
EP1435021B1 (en) 2005-06-15
US20030124461A1 (en) 2003-07-03
ATE298100T1 (de) 2005-07-15
JP2005505790A (ja) 2005-02-24
TWI275906B (en) 2007-03-11
KR100540967B1 (ko) 2006-01-10
EP1435021A1 (en) 2004-07-07
JP4142579B2 (ja) 2008-09-03
DE60204711T2 (de) 2006-05-18

Similar Documents

Publication Publication Date Title
JP3779297B2 (ja) 光形成性黒色電極および黒色電極組成物
CN101031845B (zh) 用在光图案化方法中的可水溶液显影的可光成像的组合物前体
CN1295564C (zh) 含有感光速度促进剂的可水显影光成像厚膜组合物
CN1809787B (zh) 可水显影光成像厚膜组合物
CN1050447A (zh) 可水溶液显影的光敏铜导体组合物
KR101100490B1 (ko) 플라즈마 디스플레이 패널용 전극 페이스트 및 플라즈마 디스플레이 패널용 블랙 버스 전극
CN1714314A (zh) 用于制造可光成像黑色电极的可水显影光成像厚膜组合物
JP2005173551A (ja) 光透過性電磁シールドを形成するための感光性厚膜ペースト材料、および同材料を使用して形成した光透過性電磁シールド、およびその製造方法
CN1050268A (zh) 光敏半水液可显影的铜导体组合物
CN1848303B (zh) 黑导电组合物、黑电极及利用它们的制品
EP1701212A2 (en) Black conductive compositions, black electrodes, and methods of forming thereof
CN101030038B (zh) 聚合物溶液、可水性显影的厚膜组合物、其制法及由其形成的电极
CN1841191A (zh) 光敏厚膜介电糊料组合物及使用该物质制造绝缘层的方法
CN1179557A (zh) 采用乙烯吡咯烷酮聚合物的可水显影光敏厚膜组合物
US20050014091A1 (en) Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20051228