CN1592729A - 并五苯衍生物的制备方法 - Google Patents
并五苯衍生物的制备方法 Download PDFInfo
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- CN1592729A CN1592729A CNA028233573A CN02823357A CN1592729A CN 1592729 A CN1592729 A CN 1592729A CN A028233573 A CNA028233573 A CN A028233573A CN 02823357 A CN02823357 A CN 02823357A CN 1592729 A CN1592729 A CN 1592729A
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- 150000002964 pentacenes Chemical class 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title abstract description 3
- 239000000203 mixture Substances 0.000 claims abstract description 195
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 45
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000002253 acid Substances 0.000 claims abstract description 22
- 125000005843 halogen group Chemical group 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims description 70
- -1 2-ethylhexyl Chemical group 0.000 claims description 55
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 55
- 238000006243 chemical reaction Methods 0.000 claims description 35
- 125000000217 alkyl group Chemical group 0.000 claims description 32
- KFALJTKYGZDSFZ-UHFFFAOYSA-N 3-benzylphthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C=CC=CC=2)=C1C(O)=O KFALJTKYGZDSFZ-UHFFFAOYSA-N 0.000 claims description 21
- KTFJPMPXSYUEIP-UHFFFAOYSA-N 3-benzoylphthalic acid Chemical class OC(=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1C(O)=O KTFJPMPXSYUEIP-UHFFFAOYSA-N 0.000 claims description 20
- 239000001257 hydrogen Substances 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 18
- 125000003545 alkoxy group Chemical group 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 17
- 230000009467 reduction Effects 0.000 claims description 15
- 125000003118 aryl group Chemical group 0.000 claims description 14
- 239000004411 aluminium Substances 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 150000001555 benzenes Chemical class 0.000 claims description 9
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 9
- 125000005309 thioalkoxy group Chemical group 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- OGMNYPZMHXKULM-UHFFFAOYSA-N 2,5-dibenzylterephthalic acid Chemical compound OC(=O)C=1C=C(CC=2C=CC=CC=2)C(C(=O)O)=CC=1CC1=CC=CC=C1 OGMNYPZMHXKULM-UHFFFAOYSA-N 0.000 claims description 5
- 229920003026 Acene Polymers 0.000 claims description 5
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 5
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 5
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- 238000007363 ring formation reaction Methods 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 230000018044 dehydration Effects 0.000 claims description 3
- 238000006297 dehydration reaction Methods 0.000 claims description 3
- 238000007336 electrophilic substitution reaction Methods 0.000 claims description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 3
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 claims 1
- 108010065027 Propanediol Dehydratase Proteins 0.000 claims 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- BTWKHYAGORSWDU-UHFFFAOYSA-N 3,4-dibenzylphthalic acid Chemical class C=1C=CC=CC=1CC1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=CC=C1 BTWKHYAGORSWDU-UHFFFAOYSA-N 0.000 abstract description 3
- 239000007787 solid Substances 0.000 description 109
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 100
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 75
- 238000002360 preparation method Methods 0.000 description 75
- 238000003756 stirring Methods 0.000 description 66
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 43
- 238000001914 filtration Methods 0.000 description 41
- 238000005406 washing Methods 0.000 description 41
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 39
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 150000003504 terephthalic acids Chemical class 0.000 description 34
- 238000010438 heat treatment Methods 0.000 description 33
- 239000000706 filtrate Substances 0.000 description 32
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 31
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 30
- 239000011541 reaction mixture Substances 0.000 description 30
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 22
- 239000000243 solution Substances 0.000 description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 20
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 20
- 238000001035 drying Methods 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 235000011167 hydrochloric acid Nutrition 0.000 description 19
- 238000012360 testing method Methods 0.000 description 19
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 17
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 239000012752 auxiliary agent Substances 0.000 description 14
- 239000012074 organic phase Substances 0.000 description 14
- 229910000033 sodium borohydride Inorganic materials 0.000 description 14
- 239000012279 sodium borohydride Substances 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 12
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 12
- 125000005594 diketone group Chemical group 0.000 description 12
- CFHIDWOYWUOIHU-UHFFFAOYSA-N oxomethyl Chemical compound O=[CH] CFHIDWOYWUOIHU-UHFFFAOYSA-N 0.000 description 12
- 238000006722 reduction reaction Methods 0.000 description 12
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000002585 base Substances 0.000 description 10
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 10
- 229910052763 palladium Inorganic materials 0.000 description 10
- KMTZBDBBJYGXLD-UHFFFAOYSA-N 2-[(4-methylphenyl)methyl]terephthalic acid Chemical class C1=CC(C)=CC=C1CC1=CC(C(O)=O)=CC=C1C(O)=O KMTZBDBBJYGXLD-UHFFFAOYSA-N 0.000 description 9
- QPWPGTPJKLLPGE-UHFFFAOYSA-N 2-benzoylterephthalic acid Chemical class OC(=O)C1=CC=C(C(O)=O)C(C(=O)C=2C=CC=CC=2)=C1 QPWPGTPJKLLPGE-UHFFFAOYSA-N 0.000 description 9
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 9
- 239000012071 phase Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 8
- 238000005119 centrifugation Methods 0.000 description 8
- 230000007935 neutral effect Effects 0.000 description 8
- 229910052708 sodium Inorganic materials 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 238000010917 Friedel-Crafts cyclization Methods 0.000 description 7
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 7
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000003810 ethyl acetate extraction Methods 0.000 description 6
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 6
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 5
- 229960000583 acetic acid Drugs 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- CUIFMTWQFFCFCH-UHFFFAOYSA-N 2-ethylhexylbenzene Chemical compound CCCCC(CC)CC1=CC=CC=C1 CUIFMTWQFFCFCH-UHFFFAOYSA-N 0.000 description 4
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 4
- 150000003997 cyclic ketones Chemical class 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- LIXVMPBOGDCSRM-UHFFFAOYSA-N nonylbenzene Chemical compound CCCCCCCCCC1=CC=CC=C1 LIXVMPBOGDCSRM-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 4
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 3
- LDTPFVJWZYITJE-UHFFFAOYSA-N 1-(2-ethylhexyl)pentacene Chemical compound C(C)C(CC1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C12)CCCC LDTPFVJWZYITJE-UHFFFAOYSA-N 0.000 description 3
- RULVTSKZGQBWCA-UHFFFAOYSA-N 2,9-dihexylpentacene Chemical compound C1=C(CCCCCC)C=CC2=CC3=CC4=CC5=CC(CCCCCC)=CC=C5C=C4C=C3C=C21 RULVTSKZGQBWCA-UHFFFAOYSA-N 0.000 description 3
- MYHFJGLPMJZXFR-UHFFFAOYSA-N 2-[4-(2-ethylhexyl)benzoyl]terephthalic acid Chemical class C1=CC(CC(CC)CCCC)=CC=C1C(=O)C1=CC(C(O)=O)=CC=C1C(O)=O MYHFJGLPMJZXFR-UHFFFAOYSA-N 0.000 description 3
- HSGFCTLTEBYYFZ-UHFFFAOYSA-N 2-benzylterephthalic acid Chemical class OC(=O)C1=CC=C(C(O)=O)C(CC=2C=CC=CC=2)=C1 HSGFCTLTEBYYFZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 3
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- SBWJPLDBDXHBDD-UHFFFAOYSA-N 1-hexylpentacene Chemical compound C(CCCCC)C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C12 SBWJPLDBDXHBDD-UHFFFAOYSA-N 0.000 description 2
- DOMZJLXGHYKACV-UHFFFAOYSA-N 2,5-dibenzoylterephthalic acid Chemical compound OC(=O)C=1C=C(C(=O)C=2C=CC=CC=2)C(C(=O)O)=CC=1C(=O)C1=CC=CC=C1 DOMZJLXGHYKACV-UHFFFAOYSA-N 0.000 description 2
- RJFAQKFYZBVTSH-UHFFFAOYSA-N 2,9-dimethylpentacene Chemical compound C1=C(C)C=CC2=CC3=CC4=CC5=CC(C)=CC=C5C=C4C=C3C=C21 RJFAQKFYZBVTSH-UHFFFAOYSA-N 0.000 description 2
- FYRUFWBEEWAMLE-UHFFFAOYSA-N 2-(4-methylbenzoyl)terephthalic acid Chemical class C1=CC(C)=CC=C1C(=O)C1=CC(C(O)=O)=CC=C1C(O)=O FYRUFWBEEWAMLE-UHFFFAOYSA-N 0.000 description 2
- OMPKSLZBMOAFJU-UHFFFAOYSA-N 2-[(4-nonylphenyl)methyl]terephthalic acid Chemical class C1=CC(CCCCCCCCC)=CC=C1CC1=CC(C(O)=O)=CC=C1C(O)=O OMPKSLZBMOAFJU-UHFFFAOYSA-N 0.000 description 2
- CXOWIUJQCYITGB-UHFFFAOYSA-N 2-[[4-(2-ethylhexyl)phenyl]methyl]terephthalic acid Chemical class C1=CC(CC(CC)CCCC)=CC=C1CC1=CC(C(O)=O)=CC=C1C(O)=O CXOWIUJQCYITGB-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical compound CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- 229940011051 isopropyl acetate Drugs 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- 125000003933 pentacenyl group Chemical group C1(=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C12)* 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000002061 vacuum sublimation Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- KPUAQTQBZIBXMQ-UHFFFAOYSA-N 1,2,3,4,10,11,12,13-octahydroheptacene Chemical compound C1CCCC2=C1C=C1C=C3C=C4C=C5C=C6CCCCC6=CC5=CC4=CC3=CC1=C2 KPUAQTQBZIBXMQ-UHFFFAOYSA-N 0.000 description 1
- XTIRKVIJDRWXBL-UHFFFAOYSA-N 1,2-dihydropentacene Chemical compound C1=CC=C2C=C(C=C3C(C=C4CCC=CC4=C3)=C3)C3=CC2=C1 XTIRKVIJDRWXBL-UHFFFAOYSA-N 0.000 description 1
- UQGIHLOMHASOOL-UHFFFAOYSA-N 1,4,8,11-tetramethylpentacene Chemical compound C1=CC(C)=C2C=C(C=C3C(C=C4C(C)=CC=C(C4=C3)C)=C3)C3=CC2=C1C UQGIHLOMHASOOL-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- MAHPVQDVMLWUAG-UHFFFAOYSA-N 1-phenylhexan-1-one Chemical compound CCCCCC(=O)C1=CC=CC=C1 MAHPVQDVMLWUAG-UHFFFAOYSA-N 0.000 description 1
- BEAYRDZNRZTOJT-UHFFFAOYSA-N 2,10-dimethylpentacene Chemical compound C1=CC(C)=CC2=CC3=CC4=CC5=CC(C)=CC=C5C=C4C=C3C=C21 BEAYRDZNRZTOJT-UHFFFAOYSA-N 0.000 description 1
- VWNWJONOGVHTAJ-UHFFFAOYSA-N 2,9-di(nonyl)pentacene Chemical compound C1=C(CCCCCCCCC)C=CC2=CC3=CC4=CC5=CC(CCCCCCCCC)=CC=C5C=C4C=C3C=C21 VWNWJONOGVHTAJ-UHFFFAOYSA-N 0.000 description 1
- PCHPDWZMKJAGBA-UHFFFAOYSA-N 2,9-difluoropentacene Chemical compound C1=C(F)C=CC2=CC3=CC4=CC5=CC(F)=CC=C5C=C4C=C3C=C21 PCHPDWZMKJAGBA-UHFFFAOYSA-N 0.000 description 1
- WWZJMOZRODUAMN-UHFFFAOYSA-N 2-(2-ethylhexyl)terephthalic acid Chemical class CCCCC(CC)CC1=CC(C(O)=O)=CC=C1C(O)=O WWZJMOZRODUAMN-UHFFFAOYSA-N 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical class OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
- HFBWRXYHSALEAU-UHFFFAOYSA-N 4-carbonochloridoyloxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=C(C(=O)OC(Cl)=O)C=C1 HFBWRXYHSALEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021630 Antimony pentafluoride Inorganic materials 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- VBVBHWZYQGJZLR-UHFFFAOYSA-I antimony pentafluoride Chemical compound F[Sb](F)(F)(F)F VBVBHWZYQGJZLR-UHFFFAOYSA-I 0.000 description 1
- 150000004792 aryl magnesium halides Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 239000012973 diazabicyclooctane Substances 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 125000006575 electron-withdrawing group Chemical group 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- KDEZIUOWTXJEJK-UHFFFAOYSA-N heptacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC6=CC7=CC=CC=C7C=C6C=C5C=C4C=C3C=C21 KDEZIUOWTXJEJK-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 150000001261 hydroxy acids Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- CBBVHSHLSCZIHD-UHFFFAOYSA-N mercury silver Chemical compound [Ag].[Hg] CBBVHSHLSCZIHD-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- IGKLGCQYPZTEPK-UHFFFAOYSA-N pentacene-1,2-dione Chemical compound C1=CC=C2C=C(C=C3C(C=C4C=CC(C(C4=C3)=O)=O)=C3)C3=CC2=C1 IGKLGCQYPZTEPK-UHFFFAOYSA-N 0.000 description 1
- SGDMQXAOPGGMAH-UHFFFAOYSA-N phenol;thiophene Chemical compound C=1C=CSC=1.OC1=CC=CC=C1 SGDMQXAOPGGMAH-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- ZJMWRROPUADPEA-UHFFFAOYSA-N sec-butylbenzene Chemical compound CCC(C)C1=CC=CC=C1 ZJMWRROPUADPEA-UHFFFAOYSA-N 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical class FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
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- C07D337/02—Seven-membered rings
- C07D337/06—Seven-membered rings condensed with carbocyclic rings or ring systems
- C07D337/10—Seven-membered rings condensed with carbocyclic rings or ring systems condensed with two six-membered rings
- C07D337/12—[b,e]-condensed
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- C07C1/207—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon starting from organic compounds containing only oxygen atoms as heteroatoms from carbonyl compounds
- C07C1/2078—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon starting from organic compounds containing only oxygen atoms as heteroatoms from carbonyl compounds by a transformation in which at least one -C(=O)-O- moiety is eliminated
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- C07C45/46—Friedel-Crafts reactions
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- C07C49/587—Unsaturated compounds containing a keto groups being part of a ring
- C07C49/657—Unsaturated compounds containing a keto groups being part of a ring containing six-membered aromatic rings
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- C07C49/657—Unsaturated compounds containing a keto groups being part of a ring containing six-membered aromatic rings
- C07C49/665—Unsaturated compounds containing a keto groups being part of a ring containing six-membered aromatic rings a keto group being part of a condensed ring system
- C07C49/675—Unsaturated compounds containing a keto groups being part of a ring containing six-membered aromatic rings a keto group being part of a condensed ring system having three rings
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- C07C65/32—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing keto groups
- C07C65/34—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing keto groups polycyclic
- C07C65/36—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing keto groups polycyclic containing rings other than six-membered aromatic rings
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- C07C65/40—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing keto groups containing singly bound oxygen-containing groups
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- C07D337/10—Seven-membered rings condensed with carbocyclic rings or ring systems condensed with two six-membered rings
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- Manufacturing & Machinery (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/966,954 | 2001-09-27 | ||
| US09/966,954 US20030097010A1 (en) | 2001-09-27 | 2001-09-27 | Process for preparing pentacene derivatives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1592729A true CN1592729A (zh) | 2005-03-09 |
Family
ID=25512110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA028233573A Pending CN1592729A (zh) | 2001-09-27 | 2002-09-27 | 并五苯衍生物的制备方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US20030097010A1 (enExample) |
| EP (1) | EP1430008A2 (enExample) |
| JP (1) | JP2005504096A (enExample) |
| KR (1) | KR20040037140A (enExample) |
| CN (1) | CN1592729A (enExample) |
| AU (1) | AU2002337722A1 (enExample) |
| WO (1) | WO2003027050A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114621455A (zh) * | 2022-03-13 | 2022-06-14 | 湖北大学 | 一种并五苯衍生物的金属有机框架材料及应用 |
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| US20030097010A1 (en) * | 2001-09-27 | 2003-05-22 | Vogel Dennis E. | Process for preparing pentacene derivatives |
| US6946676B2 (en) * | 2001-11-05 | 2005-09-20 | 3M Innovative Properties Company | Organic thin film transistor with polymeric interface |
| US6768132B2 (en) * | 2002-03-07 | 2004-07-27 | 3M Innovative Properties Company | Surface modified organic thin film transistors |
| US6667215B2 (en) | 2002-05-02 | 2003-12-23 | 3M Innovative Properties | Method of making transistors |
| US7098525B2 (en) * | 2003-05-08 | 2006-08-29 | 3M Innovative Properties Company | Organic polymers, electronic devices, and methods |
| US7279777B2 (en) * | 2003-05-08 | 2007-10-09 | 3M Innovative Properties Company | Organic polymers, laminates, and capacitors |
| US20070178710A1 (en) * | 2003-08-18 | 2007-08-02 | 3M Innovative Properties Company | Method for sealing thin film transistors |
| JP4647496B2 (ja) * | 2003-11-04 | 2011-03-09 | 関東電化工業株式会社 | フッ素化されたペンタセン誘導体及びそれらの製造方法 |
| US20050130422A1 (en) * | 2003-12-12 | 2005-06-16 | 3M Innovative Properties Company | Method for patterning films |
| US7935836B2 (en) * | 2004-05-18 | 2011-05-03 | Alexander Graham Fallis | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| US7655809B2 (en) * | 2004-05-18 | 2010-02-02 | University Of Ottawa | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| US7399668B2 (en) * | 2004-09-30 | 2008-07-15 | 3M Innovative Properties Company | Method for making electronic devices having a dielectric layer surface treatment |
| US20060128165A1 (en) * | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
| US20060267004A1 (en) * | 2005-05-27 | 2006-11-30 | Fallis Alexander G | Compounds comprising a linear series of five fused carbon rings, and preparation thereof |
| JP2007013097A (ja) * | 2005-06-01 | 2007-01-18 | Sony Corp | 有機半導体材料、有機半導体薄膜及び有機半導体素子 |
| DE102005029574A1 (de) * | 2005-06-25 | 2006-12-28 | Technische Universität Darmstadt | Oligo-Tetracene, ihre Herstellung und ihre Anwendung |
| US20070154624A1 (en) | 2005-12-30 | 2007-07-05 | Lucent Technologies Inc. | Synthesis of acenes and hydroxy-acenes |
| US7667230B2 (en) * | 2006-03-31 | 2010-02-23 | 3M Innovative Properties Company | Electronic devices containing acene-thiophene copolymers |
| US7608679B2 (en) * | 2006-03-31 | 2009-10-27 | 3M Innovative Properties Company | Acene-thiophene copolymers |
| US7495251B2 (en) * | 2006-04-21 | 2009-02-24 | 3M Innovative Properties Company | Electronic devices containing acene-thiophene copolymers with silylethynyl groups |
| US7666968B2 (en) * | 2006-04-21 | 2010-02-23 | 3M Innovative Properties Company | Acene-thiophene copolymers with silethynly groups |
| US20080121902A1 (en) * | 2006-09-07 | 2008-05-29 | Gelcore Llc | Small footprint high power light emitting package with plurality of light emitting diode chips |
| KR20100045438A (ko) * | 2007-06-22 | 2010-05-03 | 바스프 에스이 | N,n'-비스(1,1-디하이드로퍼플루오로-c3-c5-알킬)퍼릴렌-3,4:9,10-테트라카르복실산 디이미드의 용도 |
| US7879688B2 (en) * | 2007-06-29 | 2011-02-01 | 3M Innovative Properties Company | Methods for making electronic devices with a solution deposited gate dielectric |
| US20090001356A1 (en) * | 2007-06-29 | 2009-01-01 | 3M Innovative Properties Company | Electronic devices having a solution deposited gate dielectric |
| JP5039479B2 (ja) * | 2007-08-20 | 2012-10-03 | キヤノン株式会社 | データ通信装置、その制御方法、及びプログラム |
| WO2009030887A2 (en) * | 2007-09-04 | 2009-03-12 | Biolipox Ab | Bis-aromatic compounds useful in the treatment of inflammation |
| US20110112193A1 (en) * | 2008-05-14 | 2011-05-12 | Peter Nilsson | Bis-aryl compounds for use as medicaments |
| CN102057015B (zh) | 2008-06-06 | 2015-07-22 | 巴斯夫欧洲公司 | 氯化萘四甲酸衍生物、其制备及其在有机电子部件中的用途 |
| US20110168248A1 (en) * | 2008-09-19 | 2011-07-14 | Basf Se | Use of dibenzotetraphenylperiflanthene in organic solar cells |
| EP2401254B1 (de) | 2009-02-26 | 2013-06-19 | Novaled AG | Chinonverbindungen als dotierstoff in der organischen elektronik |
| WO2010111822A1 (en) | 2009-03-30 | 2010-10-07 | Basf Se | Oligocondensed perylene bisimides |
| WO2011000939A1 (de) | 2009-07-03 | 2011-01-06 | Basf Se | Verwendung von substituierten periflanthenen in organischen solarzellen |
| EP2488093A4 (en) | 2009-10-15 | 2013-04-03 | Inventio Llc | DISPOSABLE AND REUSABLE COMPLEX MOLDED FLOW DOCUMENT |
| US20110203649A1 (en) * | 2010-02-19 | 2011-08-25 | Basf Se | Use of indanthrene compounds in organic photovoltaics |
| EP2643864A2 (en) | 2010-11-22 | 2013-10-02 | 3M Innovative Properties Company | Assembly and electronic devices including the same |
| WO2016027218A1 (en) | 2014-08-18 | 2016-02-25 | Basf Se | Process for preparing crystalline organic semiconductor material |
| CN106187890B (zh) * | 2016-07-11 | 2018-09-21 | 武汉大学 | 一种利用钯-铜共催化合成吖啶酮衍生物的方法 |
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| EP1163372A4 (en) | 1999-03-24 | 2002-10-02 | Princeton Separations | CHEMICALLY REACTIVE CYANINE DYES AND DERIVATIVES IN A LEVEL |
| JP2001102172A (ja) * | 1999-09-30 | 2001-04-13 | Idemitsu Kosan Co Ltd | 有機エレクトロルミネッセンス素子 |
| USH2084H1 (en) | 1999-12-16 | 2003-10-07 | The United States Of America As Represented By The Secretary Of The Navy | Pentacene derivatives as red emitters in organic light emitting devices |
| US6490093B2 (en) * | 2000-12-22 | 2002-12-03 | Digital Replay, Inc. | Method of protecting ink and providing enhanced bonding during molding of lenticular lens sheets in plastic objects |
| EP1416069B1 (en) | 2001-08-09 | 2010-10-27 | Asahi Kasei Kabushiki Kaisha | Organic semiconductor film and method for manufacture thereof |
| DE60212668T2 (de) * | 2001-09-27 | 2007-06-21 | 3M Innovative Properties Co., St. Paul | Halbleiter auf basis von substituiertem pentacen |
| US20030097010A1 (en) * | 2001-09-27 | 2003-05-22 | Vogel Dennis E. | Process for preparing pentacene derivatives |
| US6998068B2 (en) * | 2003-08-15 | 2006-02-14 | 3M Innovative Properties Company | Acene-thiophene semiconductors |
| US6781761B2 (en) * | 2002-08-29 | 2004-08-24 | Mark A. Raymond | Lenticular lens system and method for use in producing images with clear-walled containers |
-
2001
- 2001-09-27 US US09/966,954 patent/US20030097010A1/en not_active Abandoned
-
2002
- 2002-09-27 CN CNA028233573A patent/CN1592729A/zh active Pending
- 2002-09-27 WO PCT/US2002/030722 patent/WO2003027050A2/en not_active Ceased
- 2002-09-27 EP EP02773612A patent/EP1430008A2/en not_active Withdrawn
- 2002-09-27 AU AU2002337722A patent/AU2002337722A1/en not_active Abandoned
- 2002-09-27 JP JP2003530642A patent/JP2005504096A/ja active Pending
- 2002-09-27 US US10/256,489 patent/US6974877B2/en not_active Expired - Fee Related
- 2002-09-27 KR KR10-2004-7004425A patent/KR20040037140A/ko not_active Withdrawn
-
2005
- 2005-08-17 US US11/205,602 patent/US20050288522A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114621455A (zh) * | 2022-03-13 | 2022-06-14 | 湖北大学 | 一种并五苯衍生物的金属有机框架材料及应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20050288522A1 (en) | 2005-12-29 |
| WO2003027050A3 (en) | 2004-03-04 |
| JP2005504096A (ja) | 2005-02-10 |
| US20030100779A1 (en) | 2003-05-29 |
| KR20040037140A (ko) | 2004-05-04 |
| EP1430008A2 (en) | 2004-06-23 |
| AU2002337722A1 (en) | 2003-04-07 |
| WO2003027050A2 (en) | 2003-04-03 |
| US20030097010A1 (en) | 2003-05-22 |
| US6974877B2 (en) | 2005-12-13 |
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