CN1573995A - 超高分辨率近场结构光盘 - Google Patents

超高分辨率近场结构光盘 Download PDF

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CN1573995A
CN1573995A CNA2004100496412A CN200410049641A CN1573995A CN 1573995 A CN1573995 A CN 1573995A CN A2004100496412 A CNA2004100496412 A CN A2004100496412A CN 200410049641 A CN200410049641 A CN 200410049641A CN 1573995 A CN1573995 A CN 1573995A
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金铉基
黄仁吾
安龙津
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Samsung Electronics Co Ltd
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Abstract

一种在其上用波束写入信息的具有超高分辨率近场结构(Super-RENS)的高密度光盘,其基底上面具有多个层。该光盘包括一个或多个Super-RENS掩膜层和一个或多个相变记录辅助层,每个辅助层都包含一种高度晶化的物质。上述的Super-RENS光盘通过消除在数据记录后的再现过程中可能产生的信号不稳定和不均匀允许高质量信号再生,同时实现低制造成本和高产量。

Description

超高分辨率近场结构光盘
本申请要求于2003年6月23日在韩国知识产权局提交的2003-40687号申请专利的优先权,该申请公开于此以资参考。
                         技术领域
本发明涉及一种光盘,特别是涉及一种具有超高分辨率近场结构(Super-RENS)的光盘,用于记录和重放其尺寸小于激光光束分辨率极限的标志。
                         背景技术
光盘是目前应用最为广泛的高密度记录介质,因为它的每个记录单元所需的记录空间远小于磁记录介质。光盘可根据其功能分为三种基本类型:只读存储器(ROM),只能用于读取所记录的信息;一次写入多次读出型(WORM),可写入一次信息;和可重写型(RW),可以完全地记录、擦除和再记录数据。
可记录光盘(CD-R)就是WORM光盘的一个例子。在CD-R中,当波长为780纳米的记录激光加热由花青或酞菁有机染料制成的记录层时,受热导致染料层分解以及基底和反射层表面的变形。CD-R光盘读取记录信号的功率通常都低于1毫瓦。容量为650MB的CD-R光盘被广泛应用于读写各种类型的信息,如数据、音乐和视频。
但是,采用780纳米(nm)记录波长的CD-R或CD-RW介质的容量不足以存储运动图像和复杂的多媒体应用软件大量数据。解决这个问题的方案之一是多用途数字光盘(DVD),它采用630至680纳米的短波长激光,光盘单面的存储容量可达2.7至4.7GB。DVD可分为三种基本类型:只读型(DVD-ROM)、可写一次型(DVD-R)、和可重写型(DVD-RAM、DVD+RW、DVD-RW)。DVD-R光盘的记录过程是通过从记录激光器发射出来的激光射线使记录层变形和分解来完成的;而DVD-RAM和DVD-RW介质的记录过程则是通过由记录层相位的变化改变其光学性质来完成的。特别是,采用有机染料的DVD-R介质,由于其在兼容性、价格和容量方面相对于DVD-RAM的优越性而受到众多关注。
对于各种新兴的可记录介质(可写一次和可重写),容量是受到巨大关注的一个问题。已提出了各种方法来增加容量。光盘的记录容量很大程度上取决于在给定区域内所能容纳的可读取小凹坑的密度和精度,以及能够读出这些凹坑的激光束的特性。
从激光二极管发射出来并通过物镜聚焦的光束由于衍射的影响而不能无限小。相反,它有一个限定的宽度,叫做衍射极限。在典型光盘中光源的波长为λ和物镜的数值孔径(NA)为NA时,读取分辨率极限是λ/4NA。如此关系所示,采用波长较短的光源或数值孔径较大的物镜可以增加光盘的记录容量。
但是,目前的激光技术在提供短波长激光方面具有局限性。同时,制造大NA物镜的生产成本也非常高。此外,由于拾波器和光盘之间的工作距离随着NA的增大而迅速减小,由于拾波器和光盘碰撞损坏光盘表面和数据的风险很大。
为克服读出分辨率的限制,近几年已对Super-RENS光盘进行了研究。特别是对散射型Super-RENS的研究尤为活跃。图1表示了传统的Super-RENS光盘10的示意性结构。如图1所示,传统的Super-RENS光盘10主要使用由金属氧化物如氧化银(AgOx)和氧化钯(PdOx)制成的掩膜层13。
最近对Super-RENS光盘横截面所做的电子显微分析表明,作为掩膜层的金属氧化物薄膜在记录过程中分解,从而在金属粒子内产生等离子体振子的同时使薄膜变形并在其上生成记录记号,这样就可以成功地再现出尺寸小于分辨率极限的标志。(Kikukawa,Applied Physics Letters,81(25),pp4697~4699)(Dec.16,2002)。
同时,传统的Super-RENS光盘10中使用的相变记录辅助层15是由锗-锑-碲或银-铟-锑-碲基合金制成的,这些合金在合金薄膜成型后变为非晶态。由于当相变记录辅助层15在处于非晶态时的反射率太低,因此无法获得稳定的聚焦或跟踪伺服系统。如果通过调整多层薄膜的厚度以增大反射率来获得稳定的伺服系统,则由于记录过程中会反射大量的入射波束,其在晶态下的反射率又变得太高而难以获得预期的记录灵敏度。因此,当由锗-锑-碲或银-铟-锑-碲制成的相变记录辅助层15处于非晶态时,必须在记录之前将光盘初始化到晶态。
作为光盘生产中最耗时的操作之一,初始化过程可能导致光盘价格的上涨和产量的减少。另外,初始化不充分可能会记录不稳定或不均匀的信号。
当在经过初始化处理的光盘上进行记录时,金属氧化物掩膜层13分解形成标记,同时相变记录辅助层15融解并迅速冷却至非晶态。在这种情况下,为了获得超高分辨率,高功率读出光束加热相变记录辅助层15,使它从非晶态转变到晶态。
相变记录辅助层15的不完善结晶也可能造成信号的不均匀或不稳定。图2A和2B表示在结晶不充分的情况下,当没有数据被记录时所再现的射频(RF)信号的恶化。具体地讲,图2A和2B分别显示了在不带记录的初始化之后,功率分别为2和3毫瓦的激光所再现的RF信号。这表明了相变记录辅助层15因其低结晶率导致初始化不完整的事实。
同样地,当在数据已被记录后用大的读出功率再现RF信号以获得最佳载波噪声比(C/N)时,相变记录辅助层15的不完全晶化导致RF信号随时间推移而恶化,这恶化了C/N比和抖动特性。
图3A和3B表示在不充分晶化的情况下,当数据已被记录后所再现的RF信号的恶化。图3A显示刚好在数据被记录后以2.5毫瓦的激光功率再现的RF信号,而图3B显示的是在数据被记录后过了预定的时间段比如10分钟时,以2.5毫瓦的激光功率再现的RF信号。
图4A和4B表示由于噪声增加C/N比的降低。图4A中,噪声电平为-59.3分贝;如图4B所示,在再现时间过后,虽然载波电平保持不变但噪声电平却增加到-56.3分贝(dB)。因此,噪声电平的增加降低了C/N比,这是通过从载波中减去噪声电平得到的。
                          发明内容
本发明的一方面在于提供一种具有超高分辨率近场结构(Super-RENS)的光盘,其通过消除在记录数据后的再现过程中由于不充分晶化引起的再现信号的不稳定性和不均匀性允许高质量的信号的再现,并且实现低生产成本和高产量。
根据本发明的一方面,提供了一种用波束写入信息的在其基底上面构造有多个层的光盘。该光盘可包括一个或多个具有超高分辨率近场结构的掩膜层和一个或多个相变记录辅助层,每个辅助层都包含一种高度晶化的物质。相变记录辅助层在成型之后处于晶态。所述高度晶化的物质可以是碲化锑(Sb2Te3)或锑(Sb)。
本发明的其他方面和/或优点将在下文的描述中提出提出一部分,还有一部分通过描述将是清楚的,或可通过实施本发明体现出来。
                         附图说明
通过下面结合附图对实施例进行的描述,本发明的这些和/或其他方面和优点将会变得清楚和更易于理解,其中:
图1是传统的具有超高分辨率和近场结构(Super-RENS)光盘的示意图;
图2A和2B表示在传统的相变记录辅助层不充分晶化的情况下,当没有数据被记录时所再现的RF信号的恶化;
图3A和3B表示在传统的相变记录辅助层不充分晶化的情况下,当数据被记录后所再现的RF信号的恶化;
图4A和4B表示在再现时间过后由于噪声的增加载波噪声比的(C/N)下降;
图5是本发明实施例的Super-RENS光盘的示意图;
图6A和6B表示根据本发明方面的以不同的线速度从初始化的Super-RENS光盘再现的RF信号;和
图7A和7B表示根据本发明方面的具有不同记录辅助层的两个Super-RENS光盘的C/N特性。
                     具体实施方式
以下,将参照附图来详细说明本发明的实施例。其例子列举在附图中,其中相同的标号始终表示相同的部件。下面结合附图描述的实施例是为了解释本发明。
根据本发明的实施例,具有超高分辨率近场结构(Super-RENS)的光盘使用在薄膜成型后立即处于晶态的相变记录辅助层。
图5表示根据本发明的实施例的Super-RENS光盘30。参照图5,Super-RENS光盘30包括基底31、依次构造在基底31之上的金属氧化物掩膜层33和相变记录辅助层35。Super-RENS光盘30还具有分别位于基底31和金属氧化物掩膜层33之间、金属氧化物掩膜层33和相变辅助层35之间和相变辅助层35之上的介电层32、34和36。
基底31由在记录激光的波长下呈现出良好的透明度、抗冲击和耐热性、和刚性的物质构成。该物质是从可以用普通的制造方法如注模法来制造基底31的物质中选择的。这些物质的例子是聚碳酸酯、聚甲基丙烯酸甲酯、环氧树酯、聚酯和非晶态聚烯烃。金属氧化物掩膜层33可以用传统光盘所用的氧化银(AgOx)或氧化铂(PtOx),或是其他金属氧化物制成。相变记录辅助层35是由高度晶化的物质制成的。所述高度晶化的物质是指可以被加热到高于结晶温度而达到非晶态,然后迅速变回到晶态的物质。该高度晶化的物质可以是碲化锑(Sb2Te3)或锑(Sb)。由Sb2Te3或Sb制成的相变记录辅助层35在成型之后立即处于晶态。
由于Sb2Te3或Sb的结晶温度非常低,因此在薄膜形成的喷射过程中利用从阳极向Sb2Te3或Sb薄膜快速移动的离子的动能使Sb2Te3或Sb薄膜迅速结晶,从而可以使薄膜在成型后立即结晶。随着Sb含量的增加,结晶率提高。因此,在相变记录辅助层35中采用Sb2Te3或Sb后就不需要单独进行初始化。
此外,在数据被记录后,当读出光束入射用于再现时,相变记录辅助层35从非晶态转变到晶态的过程比非晶态物质制成的传统的辅助层15要快得多和完整得多。因此,Super-RENS光盘30可以使再现过程中RF信号的波动最小化,从而可以获得均匀稳定的信号再现。与本发明的一个方面的光盘30相反,图1所示的传统的Super-RENS光盘10则由于从非晶态到晶态的转变过程缓慢且不完全而导致波动。本发明的高度晶化物质不限于Sb2Te3或Sb,可以包括各种能够快速结晶的物质。
对于传统的Super-RENS记录层15,由于类似沉积的非晶形膜的反射率低导致跟踪伺服系统不起作用,因此需要进行初始化。由于相变记录辅助层15在光盘10的结晶初始化过程中的结晶率低,在光盘10的线速度较高时转变到晶化状态不完全,从而使再现的RF信号产生很大波动。因此,根据本发明的一方面,在较低的线速度下进行初始化可以使RF信号再现更稳定。
图6A和6B分别表示在6m/s和3m/s的线速度从初始化的Super RENS光盘上再现的RF信号。从图6A和6B中可以看出,从初始化的光盘30上以3m/s的线速度再现的RF信号要比以6m/s的线速度再现的RF信号更稳定。
相同的问题可能在数据被记录后的再现过程中出现。即,相变记录层在数据被记录后转变到非晶态。当由于Super-RENS光盘的特性在再现过程中使用相对较大的读出激光功率时,这种非晶态变回到结晶状,这使再现信号变得更加不稳定。
图7A和7B表示用频谱分析仪测量的两个具有带不同结晶率的记录辅助层的Super-RENS光盘得到的C/N特性。更具体地说,图7A表示的是使用其相变记录辅助层所含Sb的原子百分数为60的光盘的C/N特性,而图7B表示的是其相变记录辅助层所含Sb的原子百分数为70的光盘的C/N特性。由于Sb的含量越高,在相同线速度下的结晶率越高,因此Sb的原子百分数为70的辅助层显示出比原子百分数为60的辅助层更好的C/N特性。
从而,由图7A和7B中两幅图之间的对比可见,图7B所示的光盘的C/N特性比图7A中所显示的变化更剧烈。这说明较高的Sb含量比提高了相变记录的反应速率,从而提高了数据传输速率。
与此同时,相变记录辅助层35也可以用在例如可重写、一次写入和只读光盘中。此外,层35可以用在其他类型的光盘中,如蓝光光盘(Bluray)或是先进光盘(AOD)中。辅助层35还可以用在单面双层、双面单层和双面双层的光盘中。而且,Super-RENS光盘30可以包含多个金属氧化物掩膜层33或多个相变记录辅助层35。
如前所述,本发明的Super-RENS光盘还具有以下其它特征。第一,通过消除在数据再现过程中由于相变记录辅助层的不完全晶化可能引起的信号的不稳定和不均匀,改善了再现信号的质量。第二,通过将数据再现过程中因相变记录辅助层的相变引起的C/N反应速率的下降减少到最低,允许高数据传输速率。第三,由于相变记录辅助层在成型之后即处于晶态,因此不再需要进行初始化,从而可以实现较低的制造成本和较高的生产率。
虽然已参照示例性的实施例详细说明和描述了本发明,但是本领域的技术人员应该理解,在不脱离权利要求及其等同物所限定的本发明的精神和范围的情况下,可以进行各种形式和细节的变动。

Claims (27)

1、一种用波束写入信息的在其基底上面构造有多个层的光盘,包括:
一个或多个具有超高分辨率近场结构的掩膜层;和
一个或多个相变记录辅助层,每个记录辅助层都包含一种高度晶化的物质。
2、如权利要求1所述的光盘,其中,相变记录辅助层处于晶态。
3、如权利要求1所述的光盘,其中,高度晶化的物质是碲化锑(Sb2Te3)或锑(Sb)。
4、如权利要求1所述的光盘,其中,相变记录辅助层是从非晶态转变到晶态的。
5、如权利要求3所述的光盘,其中,Sb2Te3或Sb是通过利用在薄膜成型过程中从阳极向Sb2Te3或Sb运动的离子的动能完成结晶过程的。
6、如权利要求3所述的光盘,其中,高度晶化的物质消除了光盘的初始化。
7、如权利要求1所述的光盘,其中,数据再现过程中的RF信号波动被最小化。
8、如权利要求1所述的光盘,其中,相变辅助层是可重写的。
9、如权利要求1所述的光盘,其中,相变辅助层适用于单面双层、双面单层和双面双层的光盘。
10、一种光盘,包括:
基底;
在基底上形成的金属氧化物掩膜层;
在上述金属氧化物掩膜层上形成的相变记录辅助层;和
位于基底、金属氧化物掩膜层和相变辅助层之间的介电层,其中的相变记录辅助层是高度晶化的物质。
11、如权利要求10所述的光盘,其中,高度晶化的物质是碲化锑(Sb2Te3)或锑(Sb)。
12、如权利要求10所述的光盘,其中,相变记录辅助层是在被加热到高于结晶温度后达到非晶态,然后再变回晶态的。
13、如权利要求11所述的光盘,其中,Sb2Te3或Sb是通过利用在薄膜成型过程中从阳极向Sb2Te3或Sb运动的离子的动能完成晶化过程的。
14、如权利要求11所述的光盘,其中,高度晶化的物质使光盘无需再进行初始化。
15、如权利要求10所述的光盘,其中,数据再现过程中的RF信号波动被最小化。
16、如权利要求10所述的光盘,其中,该盘是一种可重写的盘。
17、如权利要求10所述的光盘,其中,该光盘是单面双层盘、双面单层盘和双面双层光盘中的一种。
18、一种制造光盘的方法,包括:
在基底上形成一个金属氧化物掩膜层;
在金属氧化物掩膜层上构造一个相变记录辅助层;和
在基底和金属氧化物掩膜层之间、金属氧化物掩膜层和相变辅助层之间和相变辅助层上构造介电层,其中的相变记录辅助层是由高度晶化的物质制成的。
19、如权利要求18所述的方法,其中,相变记录辅助层在成型之后处于晶态。
20、如权利要求18所述的方法,其中,高度晶化的物质是碲化锑(Sb2Te3)或锑(Sb)。
21、如权利要求18所述的方法,其中,相变记录辅助层是在被加热到高于结晶温度后成为非晶态,然后再变回晶态的。
22、如权利要求20所述的方法,其中,Sb2Te3或Sb是通过利用在薄膜成型过程中从阳极向Sb2Te3或Sb运动的离子的动能完成晶化过程的。
23、如权利要求20所述的方法,其中,在相变记录辅助层的构造过程中高度晶化物质的使用使光盘无需再进行初始化。
24、如权利要求18所述的方法,其中,数据再现过程中的RF信号波动被减到最少。
25、如权利要求1所述的光盘,其中,高度晶化的物质包含原子百分数大于60的Sb原子。
26、如权利要求10所述的光盘,其中高度晶化的物质包含原子百分数大于60的Sb原子。
27、如权利要求18所述的光盘,其中高度晶化的物质包含原子百分数大于60的Sb原子。
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