CN100418146C - 超解析信息存储介质和使再现信号稳定的方法及在/从该信息存储介质记录/再现数据的设备 - Google Patents

超解析信息存储介质和使再现信号稳定的方法及在/从该信息存储介质记录/再现数据的设备 Download PDF

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CN100418146C
CN100418146C CNB2005800002646A CN200580000264A CN100418146C CN 100418146 C CN100418146 C CN 100418146C CN B2005800002646 A CNB2005800002646 A CN B2005800002646A CN 200580000264 A CN200580000264 A CN 200580000264A CN 100418146 C CN100418146 C CN 100418146C
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phase change
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CN1771545A (zh
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金铉基
黄仁吾
金朱镐
尹斗燮
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Samsung Electronics Co Ltd
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Abstract

本发明提供了一种超解析信息存储介质和使再现信号稳定的方法以及用于将数据记录在超解析信息存储介质上和/或从超解析信息存储介质再现数据的设备。在该信息存储介质上信息被记录为小于入射光束的分辨率的标记,该信息存储介质包括:基底;超解析层,形成在基底上并在入射光束聚焦的部分上产生热反应;相变层,形成在超解析层的上方或下方,并在再现记录标记前结晶。

Description

超解析信息存储介质和使再现信号稳定的方法及在/从该信息存储介质记录/再现数据的设备
技术领域
本发明涉及一种超解析信息存储介质和使再现信号稳定的方法以及用于将数据记录在超解析信息存储介质上和/或从该超解析信息存储介质再现数据的设备,更具体地讲,涉及一种用于再现被记录为小于再现光束的分辨率的记录标记的信息并用于提高信号再现的稳定性的信息存储介质、一种使再现信号稳定的方法、一种用于将数据记录在信息存储介质上和/或从该信息存储介质再现数据的设备。
背景技术
光学记录介质被用作信息存储介质,该信息存储介质用于以非接触方式记录和再现信息的光学拾取装置.由于信息存储工业持续发展,所以对于增大信息的记录密度是有利的。就此,通过采用超解析现象来再现具有小于激光束的分辨率的记录标记的信息的信息的存储介质正在发展.
通常,当用于从存储介质再现信息的光源的波长为λ而物镜的数值孔径为NA时,再现分辨率的极限为λ/4NA。换言之,从光源辐射的光束无法辨别小于λ/4NA的记录标记,从而不可能再现以小于λ/4NA的记录标记所记录的信息。
然而,出现了超解析现象,其再现尺寸小于分辨率极限的记录标记,对超解析现象的研究正在进行。根据超解析现象,可再现尺寸小于分辨率极限的记录标记,因此,超解析存储介质可增加存储介质的密度和容量。
为了将超解析信息存储介质投入商业运用,就必须满足作为记录介质所需的记录特性和再现特性。更具体地讲,超解析信息存储介质采用比在传统的信息存储介质中使用的记录光束和再现光束具有更高功率的记录光束和再现光束;因此,再现信号的稳定性是超解析信息存储介质的一个重要的必备条件.
理解超解析信息存储介质的各层的特性是重要的。超解析信息存储介质可包括相变层。包含在超解析信息存储介质中的相变层的记录特性和再现特性与传统的相变盘的相变层的记录特性和再现特性不同。
以下将描述相变记录技术。相变盘在相变记录层上将记录标记形成为非结晶部分,从而通过利用结晶部分和非结晶部分的反射率的差异来再现信息。这里,非结晶部分成为记录标记,结晶部分上不记录信息。
当将数据记录到相变记录层上时,记录层被加热至熔化并快速冷却,从而记录层成为非结晶的,非结晶部分成为记录标记。此外,当从相变记录层擦除数据时,非结晶部分被加热至熔化并缓慢冷却,从而非结晶部分成为稳定的晶体。换言之,非结晶部分的记录标记被加热至高于玻璃化转变温度,以成为热力学稳定的晶体。这里,相对高于记录功率的功率被用作擦除功率。
发明内容
技术问题
用于从传统的相变盘再现数据的再现光束的功率不改变记录标记的结晶状态,因此,即使在反复地辐射再现光束后,记录层的结晶状态也不改变,得到稳定的再现信号。然而,用于从超解析信息存储介质再现数据的再现光束的功率高于用于传统的相变盘的再现光束的功率。因此,当再现数据时相变层改变并且再现信号可变得不稳定.
技术解决
根据本发明的一个方面,本发明提供了一种用于通过在再现数据前使相变层结晶来提高再现信号的稳定性的超解析信息存储介质、一种使再现信号稳定的方法,以及一种用于将数据记录在超解析信息存储介质上和/或从该超解析信息存储介质再现数据的设备.
根据本发明的一个方面,提供了一种用于再现信息的信息存储介质,该信息被记录为小于入射光束的分辨率的标记.信息存储介质包括基底;超解析层,形成在基底上,并在入射光束聚焦的部分上发生热反应;相变层,形成在超解析层的上方或下方,在再现记录标记前结晶。
超解析层可由从金属氧化物PtOx、AuOx、PbOx、AgOx中选择的任一种材料或聚合物化合物形成.第一介电层可形成在基底和超解析层之间,第二介电层可形成在超解析层和相变层之间,第三介电层可形成在相变层上.
当使相变层结晶时,可将功率高于超解析再现功率并低于超解析再现功率的150%的光束至少辐射一次。记录标记可以以凹坑型形成在基底上,或者通过辐射记录光束可将记录标记形成在信息存储介质上。
根据本发明的另一方面,提供了一种使超解析信息存储介质的再现信号稳定的方法,该超解析信息存储介质包括:基底;超解析层,形成在基底上并在入射光聚焦的部分产生热反应;相变层,形成在超解析层的上方或下方,以再现被记录为小于入射光束的分辨率的记录标记的信息,所述方法包括:在信息存储介质上记录标记;在再现记录标记前将相变层结晶。
根据本发明的又一方面,提供了一种将数据记录在超解析信息存储介质上和/或从该超解析信息存储介质上再现数据的装置,该装置包括:基底;超解析层,形成在基底上,并在入射光聚焦的部分产生热反应;相变层,形成在超解析层的上方或下方,以再现被记录为小于入射光束的分辨率的记录标记的信息,所述设备包括:拾取单元,将光束辐射向信息存储介质;记录和/或再现信号处理单元,通过拾取单元接收在信息存储介质上反射的光束,执行信号处理;控制单元,控制拾取单元,以在再现记录在信息存储介质上的数据前,通过拾取单元将用于使相变层结晶的光束辐射至少一次。
本发明另外的方面和优点将在以下的描述中部分地被提出,并且另外的部分通过描述将是清楚的,或者可以通过本发明的实施而得知。
有益的效果
当再现被记录为小于分辨率的标记的数据时,根据本发明的信息存储介质和使得再现信号稳定的方法防止了由于具有相对高功率的再现光束辐射而导致的相变层晶体状态的改变。因此,可增加信息存储介质的密度和容量.
附图说明
通过参照附图对示例性实施例的详细描述,本发明的上述和/或其他特点和优点将会变得更加清楚,其中:
图1是示出超解析信息存储介质的剖视图;
图2是示出根据本发明的第一实施例的可记录的信息存储介质的剖视图;
图3A至图3D是示出在包含在超解析信息存储介质中的相变层结晶前后的RF信号电平;
图4是示出根据本发明的第二实施例的只读超解析信息存储介质的剖视图;
图5是根据本发明的用于将数据记录在超解析信息存储介质上和/或从该超解析信息存储介质再现数据的系统。
具体实施方式
现在将详细描述本发明的实施例,其示例在附图中示出,其中,相同的标号始终指相同的元件。为了通过参照附图来解释本发明,以下描述这些实施例。
形成根据本发明的超解析信息存储介质,以再现被作为记录标记来记录的信息,该记录标记的大小小于入射光束的分辨率极限。
现在将参照图1来描述通用的超解析信息存储介质。参照图1,超解析信息存储介质包括基底10和顺序形成在基底10上的第一介电层12、相变层14、第二介电层16、超解析层18、第三介电层24。这里,超解析层18与记录光束或再现光束发生热反应。
基底10由从聚碳酸酯、聚甲基丙烯酸甲酯(PMMA)、无定形聚烯烃(APO)和玻璃中选择的任意一种材料形成。超解析层18可由金属氧化物或聚合物化合物形成。例如,超解析层18可由从PtOx、PdOx、AuOx和AgOx中选择的至少一种金属氧化物形成,其中x为整数。聚合物化合物可为例如C32H18N8和H2PC(酞菁)。
相变层14可由Ge-Sb-Te基或Ag-In-Te基相变材料形成。如图1中所示,相变层14形成在基底10和超解析层18之间。可选地,相变层14可形成在超解析层18上。
现在将描述将数据记录在这种超解析层上或从这种超解析层再现数据的过程。当将记录光束辐射到信息存储介质以记录数据时,记录光束辐射到的超解析层18的部分与记录光束发生热反应.随后,金属和氧被分离,产生了氧气泡,从而记录光束辐射到的部分鼓起。鼓起的部分成为记录标记m.这里,相变层14由于记录光束而发生热转换,随后,热转换影响超解析层18。相变层14根据超解析层18的鼓起而转换。
当再现光束辐射到信息存储介质以再现数据时,波长短于再现光束波长的等离子体激元由再现光束辐射到的超解析层18的金属微粒产生,等离子体激元被激发以再现小于再现光束分辨率的标记。
为了引发在超解析层18和相变层14中的热反应以记录和再现小于分辨率的标记,采用了比用于将数据记录在传统信息存储介质上和/或从传统信息存储介质再现数据的光束具有更高功率的记录光束和再现光束。这里,传统信息存储介质表示将数据以传统的方法而不是超解析现象从其再现的信息存储介质。
当超解析层18由铂氧化物形成时,通过照射激光束,超解析层18被分离为铂和氧。分离的铂产生表面等离子体激元。由于表面等离子体激元的存在,近场再现成为可能,从而,用于记录小于激光束分辨率的标记的信号的再现成为可能,该激光束通过物镜聚焦到信息存储介质上。
现在将描述由照射记录光束和再现光束而引起的相变层14中的状态改变。相变层14被形成后就处于非晶态。这里,对相变层14的状态变化的描述将分为两种情形,一种情形是相变层被初始化,换言之就是使相变层结晶;另一种情形是相变层不被初始化。
当相变层14不被初始化时,相变层14保持非晶态.因此,通过将记录光束辐射到这种信息存储介质,超解析层18被热转换,以形成记录标记m,相变层14也被转换。相变层14的温度由于记录光束的温度分布而升高并快速降低,从而相变层14的与记录标记m对应的部分变成非晶态.
当辐射再现光束以再现被记录为记录标记m的信息时,相变层14的与非晶态记录标记m对应的部分结晶。相变层14的结晶速度取决于再现光束的功率;然而,通过反复地辐射再现光束,与记录标记m对应的相变层14的部分逐渐结晶,以使得与记录标记m对应的部分完全地结晶.
当在记录数据前相变层14被初始化时,通过辐射记录光束,相变层14和超解析18被热转换以形成记录标记m。这里,记录光束辐射到的相变层14的部分被熔化并快速冷却,从而变成非晶态。
其后,通过辐射再现光束,与记录标记m对应的相变层14的非结晶部分结晶,以再现记录标记m。通过反复地辐射再现光束,非结晶部分逐渐地结晶。此外,由于反射率的变化而导致再现信号不稳定,其中,反射率根据相变层14的结晶状态而变化。
如上所述,无论相变层14是否初始化,由于反射率的变化而导致超解析信息存储介质具有产生不稳定的再现信号的问题,其中,反射率根据相变层的结晶状态而变化。这样的问题是由在超解析信息存储介质中使用的再现光束的功率引起的,该再现光束的功率高于在传统的相变盘中使用的再现光束的功率。
因此,在本发明中,为了得到稳定的反射率,在记录数据后和再现数据前,使相变层结晶以使得相变层的结晶状态均一。
图2是示出根据本发明的第一实施例的信息存储介质的剖视图。参照图2,根据本发明的第一实施例的信息存储介质包括:基底10;超解析层18,形成在基底10上以在入射光束聚焦的部分上发生热反应;相变层14-1,在再现数据前结晶。这里,相变层14-1可形成在超解析层18的上方或下方。
此外,第一介电层12可形成在基底10和相变层14-1之间,第二介电层16可形成在相变层14-1和超解析层18之间,第三介电层24可形成在超解析层18上。
使相变层14-1结晶的光束的功率取决于相变层14-1的材料。这里,光束的功率限定在从使得相变层14′结晶开始的功率到使得相变层14-1的非晶态开始的功率的范围内。优选地,为了使相变层14-1结晶,在记录数据后,至少辐射一次功率高于超解析再现功率并低于超解析再现功率的150%的光束。当辐射超解析再现功率的光束以使相变层14-1结晶时,优选地,光束被反复地辐射多次。另一方面,当辐射超解析再现功率的150%的相对强的光束时,可通过辐射一次来执行相变层14-1的结晶。
更具体地讲,通过将线速度控制为5m/sec、记录功率控制为12mW、记录长度控制为75nm来记录数据.当在记录后检验相变层14-1的状态时,记录光束辐射到的部分处于非晶态。图3A示出了通过在记录数据前将盘安装在驱动器中之后采用0.5mW的光束再现而得到的RF信号电平,图3B示出了将数据记录到数据存储介质上后采用0.5mW的光束再现而得到的RF信号电平。因为在数据被记录后,相变层的结晶状态改变,所以如图3B中所示,RF信号电平改变.
图3C示出通过将超解析再现功率,换言之,就是将1.7mW的光束辐射到其上记录有数据的部分而结晶后得到的RF信号。图3D示出通过辐射1.7mW的光束十次而执行结晶后,采用0.5mW的再现光束再现而获得的RF信号。这里,图3A和图3B被作为图3C和图3D的对比例。
参照图3C和图3D,当在记录数据后和再现数据前相变层结晶时,反射率变得均一并得到稳定的RF信号。
图4是示出根据本发明的第二实施例的只读超解析信息存储介质的剖视图。根据本发明的第二实施例的超解析信息存储介质包括基底30和形成在基底30上的超解析层34、第一介电层36、相变层38和第二介电层40。这里,还可包括在基底30和超解析层34之间的介电层(未示出)。
在只读存储介质的情形中,记录标记以凹坑型P形成在基底30上。当再现具有小于再现光束的分辨率极限的凹坑的只读信息存储介质时,超解析层34和相变层38通过再现光束被热转化,以产生超解析现象,从而再现数据。
根据本发明的第二实施例的超解析存储介质的特性为,在形成记录标记后和再现数据前执行相变层38的结晶。当在辐射再现光束前使相变层38结晶时,即使当辐射高功率的再现光束时,相变层38的结晶状态也不改变,从而可得到稳定的再现信号。
根据本发明的使再现信号稳定的方法包括在形成记录标记后和再现数据前使相变层结晶的过程。在这个过程中,光束的功率是基于相变层的材料来确定的。这里,优选地,至少辐射一次高于超解析再现功率并低于超解析再现功率的150%的光束。
在使相变层结晶的过程中,可通过采用一束光束使相变层在记录数据后结晶.在另一种情形中,可通过采用跟随着记录光束但不同于记录光束的结晶光束(crystallizing beam)使相变层结晶。
图5是示出用于将数据记录在超解析信息存储介质上和/或从该超解析信息存储介质再现数据的系统的框图.该记录和/或再现系统包括拾取单元50、记录和/或再现信号处理单元60和控制单元70。更具体地讲,该记录和/或再现系统包括:激光二极管51,用于辐射入射光束;准直透镜52,用于准直从激光二极管51辐射的光束;分束器54,用于转换入射光束的路径;物镜56,用于将通过分束器54的入射光聚焦到信息存储介质D上.
从信息存储介质D反射的光束被分束器54反射并被光学探测装置例如quad-optical探测装置5 7接收。quad-optical探测装置57将光束转换为RF信号,运算电路58探测和信号Ch1与差动信号Ch2,该差动信号Ch2为推挽信号.
为了再现小于分辨率的标记,控制单元70通过拾取单元50辐射高于预定功率的再现光束,该预定的功率是基于信息存储介质的材料来确定的.因此,通过记录光束,数据被记录在信息存储介质D上。这里,记录标记以凹坑型形成在其上的只读信息存储介质的情形中,记录过程不是必须的。
再现记录在信息存储介质D上的数据之前,控制单元70将通过拾取单元50将用于使相变层14-1或34结晶的光束辐射至少一次。这里,通过采用记录光束和结晶光束或者通过在完成记录后采用用于执行结晶的一束光束来执行结晶。当采用两束光束时,结晶光束跟随着记录光束,以在记录数据后执行结晶。
其后,功率低于记录光束的功率的再现光束通过拾取单元50被辐射到信息存储介质D上。随后,在信息存储介质D上发生超解析现象。这里,由于相变层14-1或34结晶,相变层14-1或34的结晶状态不改变。因此,可得到稳定的再现信号。信息存储介质D的超解析现象与上面描述的相同,从而将省略对其的描述。
将从信息存储介质D反射的光束通过物镜56和分束器54输入到光学探测装置57。输入到光学探测器57的信号被运算电路单元58转换为电信号,并作为RF信号输出。
当再现被记录为小于分辨率的标记的数据时,根据本发明的信息存储介质和使再现信号稳定的方法防止了由于具有相对高功率的再现光束存在而导致的相变层晶体状态的改变。因此,信息存储介质的密度和容量可增加.
这里,在本发明中,五个层或七个层形成在基底上并确定了超解析层的材料;然而,这些只是本发明的示例性实施例。
虽然已经显示和描述了本发明的一些实施例,本领域的技术人员应该理解,在不脱离由权利要求及它们的等同物限定其范围的本发明的精神和原则的情况下,可对本实施例进行改变。

Claims (14)

1. 一种用于再现信息的信息存储介质,所述信息被记录为小于入射光束的分辨率的记录标记,所述信息存储介质包括:
基底;
超解析层,形成在所述基底上,并在所述入射光束聚焦的部分上发生热反应;
相变层,形成在所述超解析层的上方或下方,并在再现所述记录标记前结晶,
其中,通过将记录光束辐射到所述信息存储介质上来形成记录标记,在辐射所述记录光束后和再现所述记录标记前,使所述相变层结晶。
2. 如权利要求1所述的信息存储介质,其中,所述超解析层由从金属氧化物PtOx、AuOx、PbOx、AgOx中选择的任一种材料或聚合物化合物形成。
3. 如权利要求1或2所述的信息存储介质,还包括:
第一介电层,形成在所述基底和所述超解析层之间;
第二介电层,形成在所述超解析层和所述相变层之间;
第三介电层,形成在所述相变层上。
4. 如权利要求1或2所述的信息存储介质,其中,当使所述相变层结晶时,将高于超解析再现功率并低于所述超解析再现功率的150%的光束辐射至少一次。
5. 如权利要求1或2所述的信息存储介质,其中,记录标记以凹坑型形成在基底上。
6. 如权利要求1或2所述的信息存储介质,其中:
所述相变层形成在所述超解析层上;
所述记录标记预形成在所述基底上。
7. 如权利要求1或2所述的信息存储介质,其中:
所述相变层形成在所述超解析层上;
小于所述入射光束的分辨率的所述记录标记预形成在所述基底上;
在使所述相变层结晶前,其它记录标记形成在所述相变层上。
8. 一种使超解析信息存储介质的再现信号稳定的方法,所述超解析信息存储介质包括:基底;超解析层,形成在所述基底上,并在入射光束聚焦的部分产生热反应;相变层,形成在所述超解析层的上方或下方,以再现被记录为小于所述入射光束的分辨率的记录标记的信息,所述方法包括:
在再现所述记录标记前,使所述相变层结晶,其中,通过将记录光束辐射到所述信息存储介质上来形成所述记录标记,且在辐射所述记录光束后和再现所述记录标记前使所述相变层结晶。
9. 如权利要求8所述的方法,其中,所述超解析层由从金属氧化物PtOx、AuOx、PbOx、AgOx中选择的任一种材料或聚合物化合物形成。
10. 如权利要求8或9所述的方法,其中,在所述基底和所述超解析层之间形成第一介电层,在所述超解析层和所述相变层之间形成第二介电层,在所述相变层上形成第三介电层。
11. 如权利要求8或9所述的方法,其中,当使所述相变层结晶时,将高于超解析再现功率并低于所述超解析再现功率的150%的光束辐射至少一次。
12. 如权利要求8或9所述的方法,其中:
所述相变层形成在所述超解析层上;
所述记录标记以凹坑型形成在所述基底上。
13. 如权利要求8或9所述的方法,还包括:
以第一光束形成所述记录标记,
以第二光束使所述相变层结晶。
14. 如权利要求8或9所述的方法,其中:
所述相变层形成在所述超解析层上;
小于所述入射光束的分辨率的所述记录标记预形成在所述基底上;
所述方法还包括在使所述相变层结晶前,将其它记录标记记录在所述相变层上。
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