CN1533589A - 用于安装衬底操作系统的基准板 - Google Patents
用于安装衬底操作系统的基准板 Download PDFInfo
- Publication number
- CN1533589A CN1533589A CNA028146468A CN02814646A CN1533589A CN 1533589 A CN1533589 A CN 1533589A CN A028146468 A CNA028146468 A CN A028146468A CN 02814646 A CN02814646 A CN 02814646A CN 1533589 A CN1533589 A CN 1533589A
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- 239000000758 substrate Substances 0.000 title claims abstract description 105
- 238000009434 installation Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000012545 processing Methods 0.000 claims description 24
- 239000000969 carrier Substances 0.000 abstract 1
- 230000033001 locomotion Effects 0.000 description 23
- 230000008569 process Effects 0.000 description 9
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- 238000007373 indentation Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Power-Operated Mechanisms For Wings (AREA)
Abstract
Description
Claims (28)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30211401P | 2001-06-30 | 2001-06-30 | |
US60/302,114 | 2001-06-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1533589A true CN1533589A (zh) | 2004-09-29 |
CN1319118C CN1319118C (zh) | 2007-05-30 |
Family
ID=23166316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028146468A Expired - Lifetime CN1319118C (zh) | 2001-06-30 | 2002-06-29 | 一种基准板及衬底操作系统和安装衬底处理装置的方法 |
Country Status (6)
Country | Link |
---|---|
US (3) | US20030031538A1 (zh) |
EP (1) | EP1405335A2 (zh) |
KR (1) | KR100939597B1 (zh) |
CN (1) | CN1319118C (zh) |
TW (1) | TW557476B (zh) |
WO (1) | WO2003005422A2 (zh) |
Families Citing this family (39)
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US6283692B1 (en) | 1998-12-01 | 2001-09-04 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
US20020090282A1 (en) * | 2001-01-05 | 2002-07-11 | Applied Materials, Inc. | Actuatable loadport system |
US20030031538A1 (en) * | 2001-06-30 | 2003-02-13 | Applied Materials, Inc. | Datum plate for use in installations of substrate handling systems |
US7066707B1 (en) * | 2001-08-31 | 2006-06-27 | Asyst Technologies, Inc. | Wafer engine |
US7930061B2 (en) * | 2002-08-31 | 2011-04-19 | Applied Materials, Inc. | Methods and apparatus for loading and unloading substrate carriers on moving conveyors using feedback |
US20040081546A1 (en) * | 2002-08-31 | 2004-04-29 | Applied Materials, Inc. | Method and apparatus for supplying substrates to a processing tool |
US7684895B2 (en) | 2002-08-31 | 2010-03-23 | Applied Materials, Inc. | Wafer loading station that automatically retracts from a moving conveyor in response to an unscheduled event |
US7243003B2 (en) * | 2002-08-31 | 2007-07-10 | Applied Materials, Inc. | Substrate carrier handler that unloads substrate carriers directly from a moving conveyor |
TW200524073A (en) * | 2003-11-13 | 2005-07-16 | Applied Materials Inc | Kinematic pin with shear member and substrate carrier for use therewith |
TWI367192B (en) * | 2003-11-13 | 2012-07-01 | Applied Materials Inc | Calibration of high speed loader to substrate transport system |
US7607879B2 (en) * | 2004-06-15 | 2009-10-27 | Brooks Automation, Inc. | Substrate processing apparatus with removable component module |
US7409263B2 (en) * | 2004-07-14 | 2008-08-05 | Applied Materials, Inc. | Methods and apparatus for repositioning support for a substrate carrier |
US7410340B2 (en) * | 2005-02-24 | 2008-08-12 | Asyst Technologies, Inc. | Direct tool loading |
US9339900B2 (en) * | 2005-08-18 | 2016-05-17 | Futrfab, Inc. | Apparatus to support a cleanspace fabricator |
US9457442B2 (en) * | 2005-06-18 | 2016-10-04 | Futrfab, Inc. | Method and apparatus to support process tool modules in a cleanspace fabricator |
KR100711875B1 (ko) | 2005-07-29 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 발광표시장치 제조용 석영 플레이트 지지장치 |
US20070258796A1 (en) * | 2006-04-26 | 2007-11-08 | Englhardt Eric A | Methods and apparatus for transporting substrate carriers |
DE102006029003A1 (de) * | 2006-06-24 | 2008-01-03 | Vistec Semiconductor Systems Gmbh | Waferhandhabungsvorrichtung |
US20080240892A1 (en) * | 2007-03-28 | 2008-10-02 | International Business Machines Corporation | Storage buffer device for automated material handling systems |
US8041450B2 (en) * | 2007-10-04 | 2011-10-18 | Asm Japan K.K. | Position sensor system for substrate transfer robot |
WO2009055612A1 (en) | 2007-10-27 | 2009-04-30 | Applied Materials, Inc. | Sealed substrate carriers and systems and methods for transporting substrates |
US7984543B2 (en) * | 2008-01-25 | 2011-07-26 | Applied Materials, Inc. | Methods for moving a substrate carrier |
US7963736B2 (en) * | 2008-04-03 | 2011-06-21 | Asm Japan K.K. | Wafer processing apparatus with wafer alignment device |
US8666551B2 (en) * | 2008-12-22 | 2014-03-04 | Asm Japan K.K. | Semiconductor-processing apparatus equipped with robot diagnostic module |
US8886354B2 (en) * | 2009-01-11 | 2014-11-11 | Applied Materials, Inc. | Methods, systems and apparatus for rapid exchange of work material |
US20100191618A1 (en) * | 2009-01-28 | 2010-07-29 | Dan Zhu | Centralized database supported electronic catalog and order system for merchandise distribution |
JP5083278B2 (ja) * | 2009-06-15 | 2012-11-28 | 村田機械株式会社 | 装置前自動倉庫 |
US8911554B2 (en) * | 2010-01-05 | 2014-12-16 | Applied Materials, Inc. | System for batch processing of magnetic media |
JP5318005B2 (ja) | 2010-03-10 | 2013-10-16 | 株式会社Sokudo | 基板処理装置、ストッカー装置および基板収納容器の搬送方法 |
JP5617708B2 (ja) * | 2011-03-16 | 2014-11-05 | 東京エレクトロン株式会社 | 蓋体開閉装置 |
JP6526660B6 (ja) | 2013-08-12 | 2019-06-26 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | ファクトリインターフェースの環境制御を伴う基板処理のシステム、装置、及び方法 |
KR20210080633A (ko) | 2014-11-25 | 2021-06-30 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 캐리어 및 퍼지 챔버 환경 제어들을 이용하는 기판 프로세싱 시스템들, 장치, 및 방법들 |
US10446428B2 (en) * | 2017-03-14 | 2019-10-15 | Applied Materials, Inc. | Load port operation in electronic device manufacturing apparatus, systems, and methods |
JP1612912S (zh) * | 2018-03-29 | 2018-09-03 | ||
JP1612908S (zh) * | 2018-03-29 | 2018-09-03 | ||
JP1612766S (zh) * | 2018-03-29 | 2018-09-03 | ||
JP1619125S (zh) * | 2018-03-29 | 2018-11-26 | ||
USD892881S1 (en) * | 2018-03-29 | 2020-08-11 | Daihen Corporation | Power transmission unit and power receiving unit of an industrial robot arm |
US11569102B2 (en) | 2020-02-14 | 2023-01-31 | Applied Materials, Inc. | Oxidation inhibiting gas in a manufacturing system |
Family Cites Families (32)
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US4775281A (en) * | 1986-12-02 | 1988-10-04 | Teradyne, Inc. | Apparatus and method for loading and unloading wafers |
US4843497A (en) * | 1987-02-20 | 1989-06-27 | Leyden Robin D | Lead screw servo system controlled by a control track |
JP3947761B2 (ja) * | 1996-09-26 | 2007-07-25 | 株式会社日立国際電気 | 基板処理装置、基板搬送機および基板処理方法 |
US5765890A (en) * | 1996-10-03 | 1998-06-16 | Memc Electronic Materials, Inc. | Device for transferring a semiconductor wafer |
KR100230987B1 (ko) * | 1996-10-04 | 1999-11-15 | 윤종용 | 광문자인식기가 부착된 반도체 웨이퍼 검사장치 |
US6053688A (en) * | 1997-08-25 | 2000-04-25 | Cheng; David | Method and apparatus for loading and unloading wafers from a wafer carrier |
US6138721A (en) * | 1997-09-03 | 2000-10-31 | Asyst Technologies, Inc. | Tilt and go load port interface alignment system |
KR100292612B1 (ko) * | 1997-12-08 | 2001-08-07 | 윤종용 | 반도체 웨이퍼 정렬시스템 및 이를 이용하는 웨이퍼 정렬방법 |
US6082951A (en) * | 1998-01-23 | 2000-07-04 | Applied Materials, Inc. | Wafer cassette load station |
US6281516B1 (en) * | 1998-07-13 | 2001-08-28 | Newport Corporation | FIMS transport box load interface |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
US6283692B1 (en) * | 1998-12-01 | 2001-09-04 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
JP2000322105A (ja) * | 1999-05-07 | 2000-11-24 | Toshiba Mach Co Ltd | サーボ制御装置およびサーボ制御装置の安定化調整方法 |
US6249342B1 (en) * | 1999-07-06 | 2001-06-19 | David Cheng | Method and apparatus for handling and testing wafers |
US6428262B1 (en) * | 1999-08-11 | 2002-08-06 | Proteros, Llc | Compact load lock system for ion beam processing of foups |
US6506009B1 (en) * | 2000-03-16 | 2003-01-14 | Applied Materials, Inc. | Apparatus for storing and moving a cassette |
JP4021125B2 (ja) * | 2000-06-02 | 2007-12-12 | 東京エレクトロン株式会社 | ウェハ移載装置の装置ユニット接続時に用いられるレールの真直性保持装置 |
US20020090282A1 (en) * | 2001-01-05 | 2002-07-11 | Applied Materials, Inc. | Actuatable loadport system |
US20030031538A1 (en) * | 2001-06-30 | 2003-02-13 | Applied Materials, Inc. | Datum plate for use in installations of substrate handling systems |
US7100340B2 (en) * | 2001-08-31 | 2006-09-05 | Asyst Technologies, Inc. | Unified frame for semiconductor material handling system |
US20030110649A1 (en) * | 2001-12-19 | 2003-06-19 | Applied Materials, Inc. | Automatic calibration method for substrate carrier handling robot and jig for performing the method |
US20030202865A1 (en) * | 2002-04-25 | 2003-10-30 | Applied Materials, Inc. | Substrate transfer apparatus |
US7243003B2 (en) * | 2002-08-31 | 2007-07-10 | Applied Materials, Inc. | Substrate carrier handler that unloads substrate carriers directly from a moving conveyor |
US7930061B2 (en) * | 2002-08-31 | 2011-04-19 | Applied Materials, Inc. | Methods and apparatus for loading and unloading substrate carriers on moving conveyors using feedback |
US20040081546A1 (en) * | 2002-08-31 | 2004-04-29 | Applied Materials, Inc. | Method and apparatus for supplying substrates to a processing tool |
US7684895B2 (en) * | 2002-08-31 | 2010-03-23 | Applied Materials, Inc. | Wafer loading station that automatically retracts from a moving conveyor in response to an unscheduled event |
TWI367192B (en) * | 2003-11-13 | 2012-07-01 | Applied Materials Inc | Calibration of high speed loader to substrate transport system |
TW200524073A (en) * | 2003-11-13 | 2005-07-16 | Applied Materials Inc | Kinematic pin with shear member and substrate carrier for use therewith |
US7230702B2 (en) * | 2003-11-13 | 2007-06-12 | Applied Materials, Inc. | Monitoring of smart pin transition timing |
US7168553B2 (en) * | 2003-11-13 | 2007-01-30 | Applied Materials, Inc. | Dynamically balanced substrate carrier handler |
US7409263B2 (en) * | 2004-07-14 | 2008-08-05 | Applied Materials, Inc. | Methods and apparatus for repositioning support for a substrate carrier |
US20070258796A1 (en) * | 2006-04-26 | 2007-11-08 | Englhardt Eric A | Methods and apparatus for transporting substrate carriers |
-
2002
- 2002-06-28 US US10/186,256 patent/US20030031538A1/en not_active Abandoned
- 2002-06-29 WO PCT/US2002/020916 patent/WO2003005422A2/en not_active Application Discontinuation
- 2002-06-29 CN CNB028146468A patent/CN1319118C/zh not_active Expired - Lifetime
- 2002-06-29 KR KR1020037017100A patent/KR100939597B1/ko active IP Right Grant
- 2002-06-29 EP EP02746806A patent/EP1405335A2/en not_active Withdrawn
- 2002-07-01 TW TW091114560A patent/TW557476B/zh not_active IP Right Cessation
-
2005
- 2005-11-16 US US11/280,028 patent/US7360981B2/en not_active Expired - Lifetime
-
2008
- 2008-04-08 US US12/099,773 patent/US7794195B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100939597B1 (ko) | 2010-02-01 |
US7794195B2 (en) | 2010-09-14 |
US7360981B2 (en) | 2008-04-22 |
TW557476B (en) | 2003-10-11 |
EP1405335A2 (en) | 2004-04-07 |
US20030031538A1 (en) | 2003-02-13 |
WO2003005422A3 (en) | 2003-09-25 |
CN1319118C (zh) | 2007-05-30 |
US20060104749A1 (en) | 2006-05-18 |
WO2003005422A2 (en) | 2003-01-16 |
KR20040062449A (ko) | 2004-07-07 |
US20080213068A1 (en) | 2008-09-04 |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
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C56 | Change in the name or address of the patentee |
Owner name: APPLIED MATERIALS INC. Free format text: FORMER NAME: APPLIED MATERIALS, INC. |
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Address after: American California Patentee after: APPLIED MATERIALS, Inc. Address before: American California Patentee before: Applied Materials, Inc. |
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Address after: American California Patentee after: APPLIED MATERIALS, Inc. Address before: American California Patentee before: APPLIED MATERIALS, Inc. |
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Granted publication date: 20070530 |
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CX01 | Expiry of patent term |