CN1526161A - 清除由形成通孔的处理所产生的蚀刻残余物的方法 - Google Patents
清除由形成通孔的处理所产生的蚀刻残余物的方法 Download PDFInfo
- Publication number
- CN1526161A CN1526161A CNA018195822A CN01819582A CN1526161A CN 1526161 A CN1526161 A CN 1526161A CN A018195822 A CNA018195822 A CN A018195822A CN 01819582 A CN01819582 A CN 01819582A CN 1526161 A CN1526161 A CN 1526161A
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- gas
- microwave
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- power
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- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 49
- 230000008569 process Effects 0.000 title abstract description 6
- 239000007789 gas Substances 0.000 claims abstract description 41
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052786 argon Inorganic materials 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract 8
- 239000001301 oxygen Substances 0.000 claims abstract 8
- 229910052760 oxygen Inorganic materials 0.000 claims abstract 8
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract 7
- 239000011737 fluorine Substances 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 238000002242 deionisation method Methods 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- 230000005284 excitation Effects 0.000 claims 1
- 238000011010 flushing procedure Methods 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 abstract description 15
- 239000000126 substance Substances 0.000 abstract description 8
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000008367 deionised water Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 11
- 230000008901 benefit Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
- H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/906—Cleaning of wafer as interim step
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (23)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/707,595 | 2000-11-07 | ||
US09/707,595 US6554004B1 (en) | 2000-11-07 | 2000-11-07 | Method for removing etch residue resulting from a process for forming a via |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1526161A true CN1526161A (zh) | 2004-09-01 |
CN1265443C CN1265443C (zh) | 2006-07-19 |
Family
ID=24842325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018195822A Expired - Fee Related CN1265443C (zh) | 2000-11-07 | 2001-11-06 | 清除由形成通孔的处理所产生的蚀刻残余物的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6554004B1 (zh) |
JP (1) | JP2004517470A (zh) |
KR (1) | KR20030093186A (zh) |
CN (1) | CN1265443C (zh) |
AU (1) | AU2002232520A1 (zh) |
TW (1) | TW523827B (zh) |
WO (1) | WO2002039489A2 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102468144A (zh) * | 2010-11-12 | 2012-05-23 | 北大方正集团有限公司 | 一种提高通孔中钛和氮化钛填充能力的方法 |
CN103361690A (zh) * | 2012-03-31 | 2013-10-23 | 北大方正集团有限公司 | Pcb的盲孔清洗方法 |
CN103377913A (zh) * | 2012-04-18 | 2013-10-30 | 中芯国际集成电路制造(上海)有限公司 | 开口的形成方法 |
CN103972055A (zh) * | 2013-01-31 | 2014-08-06 | 中微半导体设备(上海)有限公司 | 光刻胶去除方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6911349B2 (en) * | 2001-02-16 | 2005-06-28 | Boxer Cross Inc. | Evaluating sidewall coverage in a semiconductor wafer |
JP4838464B2 (ja) * | 2001-09-26 | 2011-12-14 | 東京エレクトロン株式会社 | 処理方法 |
US7235489B2 (en) * | 2004-05-21 | 2007-06-26 | Agere Systems Inc. | Device and method to eliminate shorting induced by via to metal misalignment |
US8399360B1 (en) * | 2005-11-17 | 2013-03-19 | Cypress Semiconductor Corporation | Process for post contact-etch clean |
US20070269975A1 (en) * | 2006-05-18 | 2007-11-22 | Savas Stephen E | System and method for removal of photoresist and stop layer following contact dielectric etch |
US7510965B2 (en) * | 2006-11-30 | 2009-03-31 | United Microelectronics Corp. | Method for fabricating a dual damascene structure |
KR20080060017A (ko) * | 2006-12-26 | 2008-07-01 | 주식회사 하이닉스반도체 | 반도체 소자의 제조방법 |
CN110299285B (zh) * | 2019-06-19 | 2021-10-15 | 上海华力集成电路制造有限公司 | 一种改善晶圆表面缺陷的方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5595707A (en) * | 1990-03-02 | 1997-01-21 | Ventana Medical Systems, Inc. | Automated biological reaction apparatus |
JP3259380B2 (ja) | 1992-12-04 | 2002-02-25 | ソニー株式会社 | 半導体装置の製造方法 |
JP3529849B2 (ja) | 1994-05-23 | 2004-05-24 | 富士通株式会社 | 半導体装置の製造方法 |
US5780359A (en) * | 1995-12-11 | 1998-07-14 | Applied Materials, Inc. | Polymer removal from top surfaces and sidewalls of a semiconductor wafer |
KR100194789B1 (ko) * | 1995-12-16 | 1999-06-15 | 김영환 | 반도체 소자의 폴리머 제거 방법 |
US5817579A (en) | 1997-04-09 | 1998-10-06 | Vanguard International Semiconductor Corporation | Two step plasma etch method for forming self aligned contact |
US6117786A (en) | 1998-05-05 | 2000-09-12 | Lam Research Corporation | Method for etching silicon dioxide using fluorocarbon gas chemistry |
US6432830B1 (en) | 1998-05-15 | 2002-08-13 | Applied Materials, Inc. | Semiconductor fabrication process |
DE69934326T2 (de) | 1998-08-27 | 2007-06-21 | Best Label Co., Inc., Cerritos | Verfahren zur entfernung organischen materials von trägern |
US6207583B1 (en) * | 1998-09-04 | 2001-03-27 | Alliedsignal Inc. | Photoresist ashing process for organic and inorganic polymer dielectric materials |
US6130166A (en) * | 1999-02-01 | 2000-10-10 | Vlsi Technology, Inc. | Alternative plasma chemistry for enhanced photoresist removal |
US6376384B1 (en) * | 2000-04-24 | 2002-04-23 | Vanguard International Semiconductor Corporation | Multiple etch contact etching method incorporating post contact etch etching |
-
2000
- 2000-11-07 US US09/707,595 patent/US6554004B1/en not_active Expired - Fee Related
-
2001
- 2001-11-06 KR KR10-2003-7006261A patent/KR20030093186A/ko not_active Application Discontinuation
- 2001-11-06 WO PCT/US2001/047140 patent/WO2002039489A2/en active Application Filing
- 2001-11-06 AU AU2002232520A patent/AU2002232520A1/en not_active Abandoned
- 2001-11-06 CN CNB018195822A patent/CN1265443C/zh not_active Expired - Fee Related
- 2001-11-06 JP JP2002541715A patent/JP2004517470A/ja active Pending
- 2001-11-06 TW TW090127537A patent/TW523827B/zh not_active IP Right Cessation
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102468144A (zh) * | 2010-11-12 | 2012-05-23 | 北大方正集团有限公司 | 一种提高通孔中钛和氮化钛填充能力的方法 |
CN102468144B (zh) * | 2010-11-12 | 2015-11-25 | 北大方正集团有限公司 | 一种提高通孔中钛和氮化钛填充能力的方法 |
CN103361690A (zh) * | 2012-03-31 | 2013-10-23 | 北大方正集团有限公司 | Pcb的盲孔清洗方法 |
CN103377913A (zh) * | 2012-04-18 | 2013-10-30 | 中芯国际集成电路制造(上海)有限公司 | 开口的形成方法 |
CN103377913B (zh) * | 2012-04-18 | 2016-08-31 | 中芯国际集成电路制造(上海)有限公司 | 开口的形成方法 |
CN103972055A (zh) * | 2013-01-31 | 2014-08-06 | 中微半导体设备(上海)有限公司 | 光刻胶去除方法 |
CN103972055B (zh) * | 2013-01-31 | 2016-09-07 | 中微半导体设备(上海)有限公司 | 光刻胶去除方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2002039489A2 (en) | 2002-05-16 |
TW523827B (en) | 2003-03-11 |
JP2004517470A (ja) | 2004-06-10 |
AU2002232520A1 (en) | 2002-05-21 |
CN1265443C (zh) | 2006-07-19 |
KR20030093186A (ko) | 2003-12-06 |
WO2002039489A3 (en) | 2003-12-11 |
US6554004B1 (en) | 2003-04-29 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: FREEDOM SEMICONDUCTORS CO. Free format text: FORMER OWNER: MOTOROLA, INC. Effective date: 20040820 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20040820 Address after: Texas in the United States Applicant after: FreeScale Semiconductor Address before: Illinois Instrunment Applicant before: Motorola, Inc. |
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060719 Termination date: 20131106 |