CN1314833A - 放电表面处理方法和放电表面处理用电极 - Google Patents
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Abstract
使用含钼等有固体润滑作用的材料的放电电极,在水等不含碳成分的加工液中,使该放电电极与被表面处理材料间产生脉冲放电,在被表面处理材料的处理对象表面堆积并附着脉冲放电的放电能量产生的放电电极的电极消耗熔融物质,从而在处理对象表面形成有润滑作用的被膜。
Description
技术领域
本发明涉及放电表面处理方法和放电表面处理用电极,尤其涉及在作表面处理的材料的处理对象表面,堆积并附着由放电电极与作表面处理材料之间的液体中放电的放电能量产生的放电电极的电极消耗熔融物质,从而在处理对象表面形成电极材料构成的被膜的放电表面处理方法和该放电表面处理方法中使用的放电电极。
背景技术
使放电电极与作表面处理的材料之间的液体中放电的放电能量产生的放电电极的电极消耗熔融物质堆积并附着在作表面处理的材料的处理对象表面,从而在处理对象表面形成电极材料构成的被膜的放电表面处理方法,已由日本发明公开公报(特开平6-182626号、特开平9-19829号、特开平9-192937号)所公知。
以往的放电表面处理方法,为得到抗磨损性,专门在处理对象表面,形成金属碳化物等材料构成的硬质被膜。
通常,摩擦面、滑动面的润滑,通过使用润滑油或润滑脂等液体状的润滑剂进行流体润滑。
但是,在半导体制造流水线和宇宙空间这种真空气氛中,液体状润滑剂因要蒸发而不能使用,另外,在制铁流水线等高温环境下,液体状润滑剂也因要蒸发而不能使用,这种润滑剂不能使用的环境还有很多。
尤其,在半导体制造流水线中,滑动面上存在的油性润滑剂,会在半导体制造过程造成重大故障,因而不能用采用油性润滑剂的流体润滑。
为此,已有技术使用MOS2、WS2等二硫属化合物这类具有自润滑性的固体润滑剂被膜(所谓固体润滑膜)的结合剂,由离子涂敷法等方法涂敷滑动面。
但是,以往涂敷法中的固体润滑膜有寿命有限的缺点,此外,用离子涂敷法,具有装置规模大且可处理工件大小受到限制的缺点。
本发明为解决上述装置而作出,其目的在于提供一种不需大型装置、不限制工件大小且可在直线导轨的滑动面等处良好地形成长寿命的固体润滑膜的放电表面处理方法及该放电表面处理方法中使用的放电电极。
发明揭示
本发明提供一种放电表面处理方法,使用含具有固体润滑作用的材料的放电电极,在不含碳成分的加工液中,使该放电电极与被表面处理材料间产生脉冲放电,在所述被表面处理材料的处理对象表面上堆积并附着脉冲放电的放电能量产生的、放电电极的电极消耗熔融物质,在所述处理对象表面形成有润滑作用的被膜。
从而,通过放电表面处理方法,有固体润滑作用的放电电极的电极材料不变成碳的化合物,有固体润滑作用的材料按原样堆积并附着在处理对象表面,可在处理对象表面形成有润滑作用的被膜,即固体润滑膜。
与离子涂敷法等的情况不同,该固体润滑膜,作为放电表面处理方法的特性,与母材间不产生明确边界,而呈现倾斜材料特性,成为对母材有强粘合力的被膜。
除在存储加工液的加工槽内进行加工液中的脉冲放电外,由喷嘴等向放电电极与被表面处理材料间喷出加工液。
本发明提供一种放电表面处理方法,作为有固体润滑作用的材料,使用钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite(乙烯-三氟氯乙烯)(特沙脱)。
从而,通过该放电表面处理方法,在处理对象表面堆积并附着含钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite的放电电极材料,可在处理对象表面形成含钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite的有润滑作用的被膜(固体润滑膜)。
本发明提供使用水作为不含碳成分的加工液的放电表面处理方法。
从而,通过水中脉冲放电,具有固体润滑作用的电极材料不变成碳等的化合物,有固体润滑作用的材料按原样堆积并附着在处理对象表面,可在处理对象表面形成有润滑作用的被膜(固体润滑膜)。
作为实施上述放电表面处理方法的放电电极,本发明可提供钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite的粉体压缩成形后的压粉体电极或含这些成分的金属电极。
从而,通过放电表面处理方法,含钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite的放电电极的电极材料堆积并附着在处理对象表面,可在处理对象表面形成含钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的Turcite的有润滑作用的被膜(固体润滑膜)。
附图概述
图1实施本发明的放电表面处理方法使用的放电加工装置的构成图,图2是本发明的放电表面处理方法用于直线导轨的实施例的图。
实施发明的最佳形态
参照附图,说明本发明的最佳实施形态。
图1中,1表示存贮加工液的加工槽,2表示配置在加工槽1中、承载被表面处理材料即工件100的工件台,3表示放电电极,4表示向压粉体电极3与工件100间施加放电电压的电源,5表示开关向压粉体电极3与工件W间施加的放电电压与电流的开关元件,6表示对开关元件5进行通断控制的控制电路,7表示电阻器。
在本发明的放电表面处理方法中,作为放电电极3,使用把MO(钼)粉末压缩成形的压粉体电极或含Mo粉末的Ti系电极。作为加工液,使用不含碳的自来水、处理水、纯水。
由放电加工装置通常装备的、未图示的公知位置控制机构,在加工液中,把放电电极3与工件100的间隙,即放电间隙控制成适当间隙(10μm~几十μm),在放电电极3与工件100之间间歇施加放电电压,在水中使放电电极3与工件100之间产生脉冲放电。
一旦产生放电,该放电能量消耗放电电极3,放电电极3的电极消耗熔融物质堆积并附着在工件100的处理对象表面,在处理对象表面形成钼构成的有固体润滑作用的固体润滑膜101。
使用Mo压粉体电极,在钢材上形成被膜时,被膜和母材(钢材)的边界几乎不存在,形成粘着力极强的钼被膜。由此,可得到长寿命的固体润滑膜。
钼被膜,作为固体润滑剂具有自润滑作用,可用于真空装置与宇宙空间中使用的机械部件。
作为上述有自润滑作用的物质(固体润滑材料),有银Ag,金Au,铅Pb,锡Sn,铟In,镍Ni等软金属、二硫化钼MoS2、氮化硼BN、二硫化钨WS2等、作为固体润滑剂已知的层状结晶物质、碳与氟的化合物(PFPE树脂)即Turcite。除钼构成的压粉体电极外,即使采用含上述这些材料的压粉体电极、金属电极,也可在工件处理对象表面形成有润滑作用的长寿命的固体润滑膜。
通常,所谓润滑是使用润滑油或润滑脂等润滑剂,但很多环境不能使用润滑剂。例如,在半导体制造流水线这种真空气氛中,润滑剂因要蒸发而不能使用,另外,在制铁流水线等这种高温环境下,润滑剂要蒸发,也不能使用。
对在半导体制造生产线、宇宙空间这类真空气氛或制铁生产线这类高温环境下,因使用液状润滑剂的过程中,润滑剂蒸发而不能采用该润滑剂的环境下使用的机械部件而言,如上所述,由放电加工机相当简单的装置构造,形成具有自润滑作用且对母材有强贴合力的被膜(固体润滑膜)是有意义的。
在工件是直线导轨这种长物体时,如图2所示,由喷嘴10向放电电极3与直线导轨110的放电间隙间喷加工液(即水),可进行与加工槽中的液中放电同样的液中的放电。图2中,与图1对应的部分附加与图1相同的符号,省略其说明。
这种场合,也把放电电极3与作为工件的直线导轨110间的间隙(放电间隙)控制成适当间隙(10μm~几十μm),由喷嘴10向该处喷作为加工液的水,同时,向放电电极3与直线导轨110间间歇施加放电电压,使放电电极3与直流导轨110间产生脉冲放电。
一旦产生放电,放电能量消耗放电电极3,放电电极3的电极消耗熔融物质堆积并附着在直线导轨110的处理对象表面,在该处理对象表面形成钼等有润滑作用的自润滑被膜,即形成固体润滑膜111。由此,得到即使在真空气氛中和高温环境下也可使用的具有自润滑性的直线导轨。
产业利用可能性
如上所述,本发明的放电表面处理方法,对真空气氛和高温环境下使用而不能用液状润滑剂的物体,可由自润滑被膜有效提供固体润滑作用,因而可用于真空气氛和高温环境下使用的机械部件。
Claims (4)
1.一种放电表面处理方法,其特征在于,使用含具有固体润滑作用的材料的放电电极,在不含碳的加工液中,使所述放电电极与被表面处理材料间产生脉冲放电,在所述被表面处理材料的处理对象表面,堆积并附着脉冲放电的放电能量产生的所述放电电极的电极消耗熔融物质,从而,在所述处理对象表面,形成有润滑作用的被膜。
2.如权利要求1所述的放电表面处理方法,其特征在于,作为有固体润滑作用的材料,使用钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的特沙脱。
3.如权利要求1所述的放电表面处理方法,其特征在于,使用水作为不含碳的加工液。
4.一种实施放电表面处理方法所用的放电表面处理用电极,其特征在于,该电极是钼、二硫化钼、氮化硼、二硫化钨、碳、银、金、铅、锡、铟、镍、或作为碳与氟化合物的特沙脱的粉体经压缩成形的压粉体电极,或是含上述成分的电属电极。
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PCT/JP1998/005106 WO2000029157A1 (fr) | 1998-11-13 | 1998-11-13 | Procede de traitement de surface par decharge et electrode utilisee pour ce traitement |
CH00917/01A CH693665A5 (de) | 1998-11-13 | 1998-11-13 | Oberflächenbehandlungsverfahren mittels elektrischer Entladung und eine Elektrode für das Oberflächenbehandlungsverfahren. |
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KR (1) | KR100411455B1 (zh) |
CN (1) | CN1103654C (zh) |
CH (1) | CH693665A5 (zh) |
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- 1998-11-13 KR KR20017005545A patent/KR100411455B1/ko not_active IP Right Cessation
- 1998-11-13 CN CN98814301A patent/CN1103654C/zh not_active Expired - Lifetime
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CH693665A5 (de) | 2003-12-15 |
CN1103654C (zh) | 2003-03-26 |
DE19883017B4 (de) | 2007-09-27 |
WO2000029157A1 (fr) | 2000-05-25 |
DE19883017T1 (de) | 2001-08-30 |
US20010014405A1 (en) | 2001-08-16 |
KR100411455B1 (ko) | 2003-12-18 |
US6821579B2 (en) | 2004-11-23 |
KR20010107938A (ko) | 2001-12-07 |
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