CN1298017C - 抬升及支撑装置、覆层和蚀刻的方法和设备 - Google Patents
抬升及支撑装置、覆层和蚀刻的方法和设备 Download PDFInfo
- Publication number
- CN1298017C CN1298017C CNB028143817A CN02814381A CN1298017C CN 1298017 C CN1298017 C CN 1298017C CN B028143817 A CNB028143817 A CN B028143817A CN 02814381 A CN02814381 A CN 02814381A CN 1298017 C CN1298017 C CN 1298017C
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- Prior art keywords
- cylinder
- lifting
- bracing
- strutting arrangement
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 229910052878 cordierite Inorganic materials 0.000 claims description 2
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Spinning Or Twisting Of Yarns (AREA)
- Load-Engaging Elements For Cranes (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10134513.5 | 2001-07-16 | ||
DE10134513A DE10134513A1 (de) | 2001-07-16 | 2001-07-16 | Hebe-und Stützvorichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1533587A CN1533587A (zh) | 2004-09-29 |
CN1298017C true CN1298017C (zh) | 2007-01-31 |
Family
ID=7691945
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028143817A Expired - Fee Related CN1298017C (zh) | 2001-07-16 | 2002-07-15 | 抬升及支撑装置、覆层和蚀刻的方法和设备 |
Country Status (11)
Country | Link |
---|---|
US (1) | US7662302B2 (zh) |
EP (1) | EP1435106B1 (zh) |
JP (1) | JP2004535081A (zh) |
KR (1) | KR100901999B1 (zh) |
CN (1) | CN1298017C (zh) |
AT (1) | ATE364899T1 (zh) |
DE (2) | DE10134513A1 (zh) |
ES (1) | ES2287313T3 (zh) |
HK (1) | HK1066323A1 (zh) |
TW (1) | TWI224842B (zh) |
WO (1) | WO2003008323A2 (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10329976A1 (de) * | 2003-06-26 | 2005-02-03 | Sentech Instruments Gmbh | Vorrichtung zum Fixieren von Substraten |
KR101202151B1 (ko) | 2003-09-10 | 2012-11-15 | 외를리콘 솔라 아게, 트뤼프바흐 | 직사각형 대면적 기판 처리용 고주파 플라즈마 반응기의전압 불균일성 보상 방법 |
US20080105201A1 (en) * | 2006-11-03 | 2008-05-08 | Applied Materials, Inc. | Substrate support components having quartz contact tips |
ATE466118T1 (de) | 2007-02-02 | 2010-05-15 | Applied Materials Inc | Prozesskammer, inline-beschichtungsanlage und verfahren zur behandlung eines substrats |
US7781867B2 (en) * | 2007-12-28 | 2010-08-24 | Fujitsu Limited | Method and system for providing an aligned semiconductor assembly |
US8313612B2 (en) * | 2009-03-24 | 2012-11-20 | Lam Research Corporation | Method and apparatus for reduction of voltage potential spike during dechucking |
US9748077B2 (en) * | 2012-05-29 | 2017-08-29 | Jusung Engineering Co., Ltd. | Substrate processing device and substrate processing method |
CN103607836A (zh) * | 2013-11-27 | 2014-02-26 | 苏州市奥普斯等离子体科技有限公司 | 一种新型等离子体处理装置 |
CN112602021A (zh) | 2018-08-23 | 2021-04-02 | Asml荷兰有限公司 | 衬底支撑件、光刻设备、衬底检查设备、器件制造方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US614504A (en) * | 1898-11-22 | Switch-heddle | ||
JPH09246362A (ja) * | 1996-03-05 | 1997-09-19 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置および回転式基板処理方法 |
CN1209216A (zh) * | 1995-12-22 | 1999-02-24 | 兰姆研究公司 | 用于半导体加工设备的形状记忆合金顶升杆 |
US5879128A (en) * | 1996-07-24 | 1999-03-09 | Applied Materials, Inc. | Lift pin and support pin apparatus for a processing chamber |
US6132517A (en) * | 1997-02-21 | 2000-10-17 | Applied Materials, Inc. | Multiple substrate processing apparatus for enhanced throughput |
US6214122B1 (en) * | 1997-03-17 | 2001-04-10 | Motorola, Inc. | Rapid thermal processing susceptor |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3249765B2 (ja) * | 1997-05-07 | 2002-01-21 | 東京エレクトロン株式会社 | 基板処理装置 |
US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
TW277139B (zh) * | 1993-09-16 | 1996-06-01 | Hitachi Seisakusyo Kk | |
US5491603A (en) * | 1994-04-28 | 1996-02-13 | Applied Materials, Inc. | Method of determining a dechucking voltage which nullifies a residual electrostatic force between an electrostatic chuck and a wafer |
JP3005461B2 (ja) * | 1995-11-24 | 2000-01-31 | 日本電気株式会社 | 静電チャック |
KR970052738A (ko) * | 1995-12-23 | 1997-07-29 | 김광호 | 반도체소자 제조용 플라즈마를 이용한 건식식각 장치 |
US5796066A (en) * | 1996-03-29 | 1998-08-18 | Lam Research Corporation | Cable actuated drive assembly for vacuum chamber |
US6174377B1 (en) * | 1997-03-03 | 2001-01-16 | Genus, Inc. | Processing chamber for atomic layer deposition processes |
US6287435B1 (en) * | 1998-05-06 | 2001-09-11 | Tokyo Electron Limited | Method and apparatus for ionized physical vapor deposition |
US6146504A (en) * | 1998-05-21 | 2000-11-14 | Applied Materials, Inc. | Substrate support and lift apparatus and method |
US6228438B1 (en) * | 1999-08-10 | 2001-05-08 | Unakis Balzers Aktiengesellschaft | Plasma reactor for the treatment of large size substrates |
US6572708B2 (en) * | 2000-02-28 | 2003-06-03 | Applied Materials Inc. | Semiconductor wafer support lift-pin assembly |
US6635117B1 (en) * | 2000-04-26 | 2003-10-21 | Axcelis Technologies, Inc. | Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
-
2001
- 2001-07-16 DE DE10134513A patent/DE10134513A1/de not_active Withdrawn
-
2002
- 2002-07-15 WO PCT/EP2002/007856 patent/WO2003008323A2/de active IP Right Grant
- 2002-07-15 DE DE50210325T patent/DE50210325D1/de not_active Expired - Lifetime
- 2002-07-15 JP JP2003513889A patent/JP2004535081A/ja active Pending
- 2002-07-15 CN CNB028143817A patent/CN1298017C/zh not_active Expired - Fee Related
- 2002-07-15 AT AT02767211T patent/ATE364899T1/de not_active IP Right Cessation
- 2002-07-15 KR KR1020047000758A patent/KR100901999B1/ko not_active IP Right Cessation
- 2002-07-15 ES ES02767211T patent/ES2287313T3/es not_active Expired - Lifetime
- 2002-07-15 US US10/484,174 patent/US7662302B2/en not_active Expired - Fee Related
- 2002-07-15 EP EP02767211A patent/EP1435106B1/de not_active Expired - Lifetime
- 2002-07-15 TW TW091115688A patent/TWI224842B/zh not_active IP Right Cessation
-
2004
- 2004-11-19 HK HK04109166A patent/HK1066323A1/xx not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US614504A (en) * | 1898-11-22 | Switch-heddle | ||
CN1209216A (zh) * | 1995-12-22 | 1999-02-24 | 兰姆研究公司 | 用于半导体加工设备的形状记忆合金顶升杆 |
JPH09246362A (ja) * | 1996-03-05 | 1997-09-19 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置および回転式基板処理方法 |
US5879128A (en) * | 1996-07-24 | 1999-03-09 | Applied Materials, Inc. | Lift pin and support pin apparatus for a processing chamber |
US6132517A (en) * | 1997-02-21 | 2000-10-17 | Applied Materials, Inc. | Multiple substrate processing apparatus for enhanced throughput |
US6214122B1 (en) * | 1997-03-17 | 2001-04-10 | Motorola, Inc. | Rapid thermal processing susceptor |
Also Published As
Publication number | Publication date |
---|---|
JP2004535081A (ja) | 2004-11-18 |
ATE364899T1 (de) | 2007-07-15 |
WO2003008323A3 (de) | 2003-12-04 |
KR20040028930A (ko) | 2004-04-03 |
EP1435106A2 (de) | 2004-07-07 |
ES2287313T3 (es) | 2007-12-16 |
HK1066323A1 (en) | 2005-03-18 |
US20040248391A1 (en) | 2004-12-09 |
EP1435106B1 (de) | 2007-06-13 |
US7662302B2 (en) | 2010-02-16 |
CN1533587A (zh) | 2004-09-29 |
DE50210325D1 (de) | 2007-07-26 |
WO2003008323A2 (de) | 2003-01-30 |
TWI224842B (en) | 2004-12-01 |
DE10134513A1 (de) | 2003-01-30 |
KR100901999B1 (ko) | 2009-06-11 |
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