CN1285526C - 高纯度合成石英玻璃粒子 - Google Patents
高纯度合成石英玻璃粒子 Download PDFInfo
- Publication number
- CN1285526C CN1285526C CNB028130499A CN02813049A CN1285526C CN 1285526 C CN1285526 C CN 1285526C CN B028130499 A CNB028130499 A CN B028130499A CN 02813049 A CN02813049 A CN 02813049A CN 1285526 C CN1285526 C CN 1285526C
- Authority
- CN
- China
- Prior art keywords
- synthetic quartz
- quartz glass
- high purity
- purity synthetic
- glass particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 118
- 239000002245 particle Substances 0.000 title claims abstract description 44
- 239000012535 impurity Substances 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 15
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- 230000002950 deficient Effects 0.000 claims abstract description 11
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 9
- 239000010453 quartz Substances 0.000 abstract description 13
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- 230000007547 defect Effects 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 description 35
- 239000000377 silicon dioxide Substances 0.000 description 28
- 229960001866 silicon dioxide Drugs 0.000 description 24
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 14
- 239000002994 raw material Substances 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 10
- 230000004927 fusion Effects 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000008187 granular material Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000000862 absorption spectrum Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 239000005049 silicon tetrachloride Substances 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 230000010748 Photoabsorption Effects 0.000 description 1
- 238000000563 Verneuil process Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002969 artificial stone Substances 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 229910052728 basic metal Inorganic materials 0.000 description 1
- 150000003818 basic metals Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000009617 vacuum fusion Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/026—Pelletisation or prereacting of powdered raw materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001195407A JP2003012331A (ja) | 2001-06-27 | 2001-06-27 | 高純度合成石英ガラス粒子 |
JP195407/2001 | 2001-06-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1541194A CN1541194A (zh) | 2004-10-27 |
CN1285526C true CN1285526C (zh) | 2006-11-22 |
Family
ID=19033382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028130499A Expired - Fee Related CN1285526C (zh) | 2001-06-27 | 2002-06-27 | 高纯度合成石英玻璃粒子 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040213724A1 (zh) |
EP (1) | EP1413559A4 (zh) |
JP (1) | JP2003012331A (zh) |
KR (1) | KR20040073966A (zh) |
CN (1) | CN1285526C (zh) |
WO (1) | WO2003002473A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200422273A (en) | 2002-11-29 | 2004-11-01 | Shinetsu Quartz Prod | Method for producing synthetic quartz glass and synthetic quartz glass article |
DE102008033945B4 (de) * | 2008-07-19 | 2012-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung, Verfahren zur Herstellung eines Quarzglasstrangs und Verfahren zur Herstellung eines Quarzglastiegels |
JP6141710B2 (ja) * | 2013-07-16 | 2017-06-07 | 野口 崇 | 高純度合成シリカ粉末の製造方法 |
CN106219555A (zh) * | 2016-07-31 | 2016-12-14 | 福建师范大学泉港石化研究院 | 一种多孔二氧化硅的制备方法 |
CN110255570B (zh) * | 2019-07-02 | 2022-11-04 | 中建材衢州金格兰石英有限公司 | 一种高纯合成石英砂的制备方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6148422A (ja) * | 1984-08-17 | 1986-03-10 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製法 |
JPH0776101B2 (ja) * | 1988-04-25 | 1995-08-16 | 日東化学工業株式会社 | ガラス成形体の製造方法 |
JPH0264027A (ja) * | 1988-08-30 | 1990-03-05 | Shin Etsu Chem Co Ltd | 石英ガラスの製造方法 |
US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
JPH0345530A (ja) * | 1989-07-13 | 1991-02-27 | Shin Etsu Chem Co Ltd | 高粘度石英ガラスの製造方法 |
JPH0717370B2 (ja) * | 1989-11-30 | 1995-03-01 | イー・アイ・デュポン・ドゥ・メムール・アンド・カンパニー | 高純度ケイ酸水溶液の製造方法 |
JPH07309615A (ja) * | 1994-05-17 | 1995-11-28 | Shin Etsu Chem Co Ltd | 合成石英ガラス粉末の製造方法 |
JP3040315B2 (ja) * | 1994-08-03 | 2000-05-15 | 信越化学工業株式会社 | 高粘度合成石英ガラス部材およびその製造方法 |
JP2542797B2 (ja) * | 1994-09-29 | 1996-10-09 | 日本化学工業株式会社 | 高純度シリカの製造方法 |
DE69630951T2 (de) * | 1995-05-26 | 2004-10-21 | Mitsubishi Chem Corp | Synthetisches quarzglaspulver, geformtes quarzglas, hochreines tetraalkoxysilan und deren herstellungsverfahren |
JP4000399B2 (ja) * | 1997-06-20 | 2007-10-31 | 三菱レイヨン株式会社 | 超高純度シリカ粉の製造方法および該製造方法で得られた超高純度シリカ粉並びにそれを用いた石英ガラスルツボ |
JP2001048571A (ja) * | 1999-06-04 | 2001-02-20 | Sumitomo Metal Ind Ltd | 短波長光の透過性に優れた石英ガラスとその製造方法 |
JP2001072409A (ja) * | 1999-09-01 | 2001-03-21 | Kyokado Eng Co Ltd | 高純度シリカの製造方法および利用方法 |
WO2001047808A1 (fr) * | 1999-12-28 | 2001-07-05 | M. Watanabe & Co., Ltd. | Procedes de production de particules de silice, de particules de quartz de synthese et de verre au quartz de synthese |
-
2001
- 2001-06-27 JP JP2001195407A patent/JP2003012331A/ja active Pending
-
2002
- 2002-06-27 CN CNB028130499A patent/CN1285526C/zh not_active Expired - Fee Related
- 2002-06-27 WO PCT/JP2002/006504 patent/WO2003002473A1/ja not_active Application Discontinuation
- 2002-06-27 KR KR10-2003-7016820A patent/KR20040073966A/ko not_active Application Discontinuation
- 2002-06-27 US US10/481,063 patent/US20040213724A1/en not_active Abandoned
- 2002-06-27 EP EP02741357A patent/EP1413559A4/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
JP2003012331A (ja) | 2003-01-15 |
EP1413559A4 (en) | 2005-06-29 |
WO2003002473A1 (fr) | 2003-01-09 |
KR20040073966A (ko) | 2004-08-21 |
US20040213724A1 (en) | 2004-10-28 |
EP1413559A1 (en) | 2004-04-28 |
CN1541194A (zh) | 2004-10-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: WATANABE M & CO., LTD.; CO., LTD. ADEKA Free format text: FORMER NAME OR ADDRESS: WATANABE M + CO., LTD.; ASAHI DENKA KOGYO K. K. |
|
CP03 | Change of name, title or address |
Address after: Tokyo, Japan, Japan Co-patentee after: Asahi Denka Co., Ltd. Patentee after: M. Watanabe & Co., Ltd. Address before: Tokyo, Japan, Japan Co-patentee before: Asahi Electro-chemical Co. Patentee before: M. Watanabe & Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20061122 Termination date: 20190627 |