CN1248030C - 成膜方法及装置、基板的制造方法及装置以及电子设备 - Google Patents
成膜方法及装置、基板的制造方法及装置以及电子设备 Download PDFInfo
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- CN1248030C CN1248030C CNB2004100282343A CN200410028234A CN1248030C CN 1248030 C CN1248030 C CN 1248030C CN B2004100282343 A CNB2004100282343 A CN B2004100282343A CN 200410028234 A CN200410028234 A CN 200410028234A CN 1248030 C CN1248030 C CN 1248030C
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Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Abstract
Description
Claims (28)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003060253 | 2003-03-06 | ||
JP2003060253A JP4168788B2 (ja) | 2003-03-06 | 2003-03-06 | 成膜方法、カラーフィルタ基板の製造方法、エレクトロルミネッセンス装置用基板の製造方法、表示装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1527102A CN1527102A (zh) | 2004-09-08 |
CN1248030C true CN1248030C (zh) | 2006-03-29 |
Family
ID=33122855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100282343A Expired - Lifetime CN1248030C (zh) | 2003-03-06 | 2004-03-08 | 成膜方法及装置、基板的制造方法及装置以及电子设备 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7413765B2 (zh) |
JP (1) | JP4168788B2 (zh) |
KR (1) | KR100583291B1 (zh) |
CN (1) | CN1248030C (zh) |
TW (1) | TW200426430A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102650789A (zh) * | 2011-02-28 | 2012-08-29 | 三星电子株式会社 | 电泳显示装置及其制造方法 |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4103830B2 (ja) * | 2003-05-16 | 2008-06-18 | セイコーエプソン株式会社 | パターンの形成方法及びパターン形成装置、デバイスの製造方法、アクティブマトリクス基板の製造方法 |
JP4712372B2 (ja) * | 2004-12-16 | 2011-06-29 | 株式会社半導体エネルギー研究所 | 発光装置 |
WO2006076604A2 (en) * | 2005-01-14 | 2006-07-20 | Cabot Corporation | Processes for planarizing substrates and encapsulating printable electronic features |
JP4539518B2 (ja) | 2005-03-31 | 2010-09-08 | セイコーエプソン株式会社 | 電気光学装置及び電気光学装置の製造方法 |
KR100703541B1 (ko) * | 2005-05-02 | 2007-04-03 | 삼성에스디아이 주식회사 | 터치패널이 포함된 발광표시장치 |
JP4142064B2 (ja) * | 2005-08-05 | 2008-08-27 | セイコーエプソン株式会社 | 液晶装置、電気光学装置、プロジェクタ、及びマイクロデバイス |
JP4483757B2 (ja) * | 2005-09-30 | 2010-06-16 | セイコーエプソン株式会社 | 有機el装置及び光学装置 |
TWI267447B (en) * | 2005-11-25 | 2006-12-01 | Icf Technology Co Ltd | Method of manufacturing a thin film pattern layer |
JP5217122B2 (ja) * | 2006-07-11 | 2013-06-19 | 株式会社日立製作所 | パターン形成装置および有機薄膜トランジスタの製造方法ならびに有機薄膜トランジスタ |
US8889271B2 (en) * | 2006-11-26 | 2014-11-18 | Duksan High Metal Co., Ltd. | Compound containing a 5-membered heterocycle and organic light-emitting diode using same, and terminal for same |
KR100872774B1 (ko) * | 2007-05-15 | 2008-12-09 | 엘지전자 주식회사 | 이방성 전도 필름의 제조 방법 |
JP2007319857A (ja) * | 2007-08-03 | 2007-12-13 | Seiko Epson Corp | 成膜装置 |
US20090086291A1 (en) * | 2007-09-28 | 2009-04-02 | General Electric Company | Method of printing marks on an optical article |
KR101716828B1 (ko) | 2009-12-07 | 2017-03-16 | 삼성디스플레이 주식회사 | 터치스크린 기판 및 터치스크린 기판의 제조 방법 |
JP5283647B2 (ja) * | 2010-03-03 | 2013-09-04 | 富士フイルム株式会社 | パターン転写方法及びパターン転写装置 |
US8586129B2 (en) * | 2010-09-01 | 2013-11-19 | Solarworld Innovations Gmbh | Solar cell with structured gridline endpoints and vertices |
JP2012109581A (ja) * | 2011-12-19 | 2012-06-07 | Mitsubishi Electric Corp | 半導体製造方法および半導体装置 |
JP5906472B2 (ja) * | 2012-02-01 | 2016-04-20 | パナソニックIpマネジメント株式会社 | インクジェット印刷装置およびその制御方法 |
CN103579019A (zh) * | 2012-07-31 | 2014-02-12 | 无锡市葆灵电子科技有限公司 | 利用粘合剂封装芯片的设备 |
US11673155B2 (en) | 2012-12-27 | 2023-06-13 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
CN107757153B (zh) | 2012-12-27 | 2020-05-01 | 科迪华公司 | 用于打印油墨体积控制以在精确公差内沉积流体的技术 |
EP3434483A1 (en) * | 2012-12-27 | 2019-01-30 | Kateeva, Inc. | Techniques for print ink volume control to deposit fluids within precise tolerances |
JP6659532B2 (ja) * | 2013-04-26 | 2020-03-04 | カティーバ, インコーポレイテッド | 印刷インク液滴測定および精密な公差内で流体を堆積する制御のための技法 |
KR20190138705A (ko) * | 2013-04-26 | 2019-12-13 | 카티바, 인크. | 인쇄 잉크 액적 측정 및 정밀 공차 내로 유체를 증착하기 위한 제어 기법 |
JP6285558B2 (ja) * | 2013-09-23 | 2018-02-28 | イー・インク・カリフォルニア・リミテッド・ライアビリティ・カンパニーE Ink California,Llc | 予備パターン化像を有するディスプレイパネル |
US10816868B2 (en) | 2013-09-23 | 2020-10-27 | E Ink California, Llc | Active molecule delivery system comprising microcells |
CN107825886B (zh) | 2013-12-12 | 2020-04-14 | 科迪华公司 | 制造电子设备的方法 |
JP6487250B2 (ja) * | 2015-03-27 | 2019-03-20 | 武藤工業株式会社 | インク飽和量の測定方法及び判定方法及びインクパッチチャートの作成方法 |
US10335995B2 (en) | 2015-12-16 | 2019-07-02 | Xerox Corporation | System and method for compensating for dissimilar shrinkage rates in different materials used to form a three-dimensional printed object during additive manufacturing |
SG10201709153VA (en) * | 2016-12-12 | 2018-07-30 | Canon Kk | Fluid droplet methodology and apparatus for imprint lithography |
US10634993B2 (en) * | 2016-12-12 | 2020-04-28 | Canon Kabushiki Kaisha | Fluid droplet methodology and apparatus for imprint lithography |
US10468247B2 (en) * | 2016-12-12 | 2019-11-05 | Canon Kabushiki Kaisha | Fluid droplet methodology and apparatus for imprint lithography |
US10481491B2 (en) * | 2016-12-12 | 2019-11-19 | Canon Kabushiki Kaisha | Fluid droplet methodology and apparatus for imprint lithography |
US10005302B1 (en) * | 2017-04-03 | 2018-06-26 | Xerox Corporation | Object holder for a direct-to-object printer |
CN107102458B (zh) * | 2017-06-20 | 2023-05-16 | 南京信息职业技术学院 | 一种液晶显示器光刻胶成膜的装置及方法 |
CN111192905A (zh) * | 2020-01-08 | 2020-05-22 | 武汉华星光电半导体显示技术有限公司 | 有机发光二极体显示器件及其制造方法 |
US11424270B2 (en) * | 2020-06-02 | 2022-08-23 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Flexible display device and manufacturing method thereof |
US11774849B2 (en) | 2020-09-22 | 2023-10-03 | Canon Kabushiki Kaisha | Method and system for adjusting edge positions of a drop pattern |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3058257B2 (ja) * | 1996-02-16 | 2000-07-04 | キヤノン株式会社 | カラーフィルタの製造方法、カラーフィルタの製造装置、表示装置の製造方法及び表示装置を備えた装置の製造方法 |
ATE348709T1 (de) * | 2000-03-27 | 2007-01-15 | Seiko Epson Corp | Vorrichtung zum ausstossen von flüssigkeit aus düsen mit mikrovibrationsanlage |
JP2002148422A (ja) | 2000-11-08 | 2002-05-22 | Seiko Epson Corp | フィルタ及びフィルタの製造方法並びにこのフィルタを用いた電気光学装置 |
JP2002221616A (ja) * | 2000-11-21 | 2002-08-09 | Seiko Epson Corp | カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、el装置の製造方法及び製造装置、インクジェットヘッドの制御装置、材料の吐出方法及び材料の吐出装置、並びに電子機器 |
JP3953776B2 (ja) * | 2001-01-15 | 2007-08-08 | セイコーエプソン株式会社 | 材料の吐出装置、及び吐出方法、カラーフィルタの製造装置及び製造方法、液晶装置の製造装置及び製造方法、el装置の製造装置及び製造方法 |
JP3580308B2 (ja) * | 2002-04-19 | 2004-10-20 | セイコーエプソン株式会社 | デバイスの製造方法、デバイス及び電子機器 |
JP4200810B2 (ja) * | 2002-05-17 | 2008-12-24 | セイコーエプソン株式会社 | ディスプレー製造装置、及び、ディスプレー製造方法 |
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2003
- 2003-03-06 JP JP2003060253A patent/JP4168788B2/ja not_active Expired - Fee Related
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2004
- 2004-02-19 TW TW093104117A patent/TW200426430A/zh unknown
- 2004-02-24 KR KR1020040012292A patent/KR100583291B1/ko active IP Right Grant
- 2004-03-05 US US10/794,772 patent/US7413765B2/en active Active
- 2004-03-08 CN CNB2004100282343A patent/CN1248030C/zh not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102650789A (zh) * | 2011-02-28 | 2012-08-29 | 三星电子株式会社 | 电泳显示装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
US7413765B2 (en) | 2008-08-19 |
JP4168788B2 (ja) | 2008-10-22 |
US20040228964A1 (en) | 2004-11-18 |
JP2004267874A (ja) | 2004-09-30 |
CN1527102A (zh) | 2004-09-08 |
TW200426430A (en) | 2004-12-01 |
KR20040079854A (ko) | 2004-09-16 |
KR100583291B1 (ko) | 2006-05-25 |
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