CN1223411C - Adhesive film recovery device and method - Google Patents

Abstract

An adherent film recovering device of the present invention includes a water-jet cleaning gun 51 for spraying water-jet with hydraulic pressure within a range of 30 MPa to 200 MPa against a depositing jig 25 having an adherent film adhered thereto, placed on a table 26 in a work room 22; and an exhaust fan 62 for use in setting the work room 22 to have negative room pressure, wherein the work room 22 is sealed so as to prevent droplets resulting from the water-jet as sprayed from sputtering outside of the work room 22. With the foregoing device, it is economically viable to recycle the adherent film made of metal or metal compound as recovered from the depositing jig, and at the same time, the depositing jig can be less ground, thereby suppressing the production of waste. Moreover, the target adherent film pieces resulting from the water-jet can be made larger in size, and it is therefore possible to surely recover the adherent film pieces in a simpler manner at lower cost. As a result, the recycling use of the adherent film can be expedited.

Description

The recovery method of coherent film retracting device and coherent film

Technical field

The present invention relates to receive the coherent film retracting device of coherent film and the recovery method of coherent film last time from depositing jig having an adherent film, this coherent film is to adopt the coherent film that adheres on the depositing jig having an adherent film such as the protective plate that uses in the vacuum film formation apparatus for the film that forms metal or metallic compound on electronic equipment such as sputtering method, vacuum vapour deposition, ion plating method, CVD method, mask, substrate holder, formed by above-mentioned metal or metallic compound.

Background technology

In recent years, in oriented a large amount of outputs and a large amount of discarded social transformations, electronic equipment, particularly the increase with the information relevant device is significant.As the core component of above-mentioned electronic equipment, can enumerate semiconductor, comprise flat display panel, solar cell, semiconductor device and the memory etc. of liquid crystal board.

Above-mentioned electronic equipment can become the vacuum film formation apparatus preparation of embrane method by using sputtering method, vacuum vapour deposition, ion plating method equal vacuum, uses the situation of rare metal also a lot of in the filmogen.

Adopt rare metal, particularly rare metal such as indium or tantalum to use the problem that has its resource exhaustion as filmogen.In order to alleviate the problems referred to above, seeking the discarded amount that can be controlled at existing production phase and operational phase, reclaim and the determining and concrete countermeasure of the treatment technology of the above-mentioned rare metal that circulates.

Here said rare metal is indium (In)＜rhenium (Re)＜tantalum (Ta)＜gold (Au)＜platinum (Pt)＜selenium (Se)＜caesium (Cs)＜gallium (Ga)＜bismuth (Bi)＜mercury (Hg)＜silver (Ag) according to the size order of inferring reserve.

Usually, adopt above-mentioned vacuum film formation method, place outside film forming substrate, for example adhering to coherent film thickly in the vacuum tank outside the substrate, for prevent the protective plate peeled off, only be used for mask in the given position film forming of substrate (wafer), (it are referred to as depositing jig having an adherent film (film forming parts)) such as substrate holders that be used to transport substrate gone up and used, also adhering to thereon and film with forming or basic with the coherent film of forming.

Because these depositing jig having an adherent film are used repeatedly, therefore, compare thickening attached to the film of film forming on the coherent film on the depositing jig having an adherent film and the substrate.If this coherent film forms certain thickness, will peel off because of the internal stress of coherent film and the stress that produced by thermal process repeatedly form little diaphragm from depositing jig having an adherent film, become attached to the reason that causes the localized membrane defective on the substrate.(being referred to as particle contamination usually).

Therefore, regularly impose depositing jig having an adherent film and be referred to as in the thickness scope of the coherent film that does not cause particle contamination, from vacuum film formation apparatus, take out, carry out the Surface Finishing that the coherent film of depositing jig having an adherent film washing is removed and is used to re-use.

Below depositing jig having an adherent film is further described.The depositing jig having an adherent film that uses in vacuum film formation apparatus in order to keep vacuum state, as material, must be that gas absorption is few and emit the metal material of gas easily, can use stainless steel (SUS), be called as Ni ₄₂Fe ₅₈The dilval of (42 alloy), aluminium, titanium, copper etc.

Therefore, in depositing jig having an adherent film, for the washroom that strengthens adhesive force and prolong depositing jig having an adherent film every, impose surface roughness processing usually.For example, to ferrous material, impose several microns surface roughness processing, for aluminium,, impose tens of microns surface roughness processing by the surface treatment of aluminium sputtered films of bismuth, and, impose surface roughness processing by the processing of the embossing on the tablet that with copper is main component for copper.

At present; the washing of this depositing jig having an adherent film is undertaken by the processing method that is referred to below as sandblast; promptly utilize air pressure will be called as on the coherent film that alumina particles about for example hundreds of micron diameters of sand or silicon-carbide particle impact depositing jig having an adherent film; peel off coherent film with impulsive force at this moment, also can adopt the wet etch method of acid to carry out in addition except that attachment removal.For example, open to disclose in the flat 11-198344 communique (open day on July 27th, 1999) the spy and remove method attached to bonding agent on the screen frame and adhesive tape by the jet grinding material.

Adopt these existing processing methods, can discharge a large amount of sandblast bits and acid pickle, the containing ratio or the concentration of contained attachment flaps from coherent film in these sandblast bits and the acid pickle, for example, in the sandblast bits is about 0.1～5 weight %, is low to moderate 0.2～1.1g/ liter (10 in the etching acid pickle ³Cm ³).

Therefore, adopt these existing processing methods, because it is low or concentration is low to adhere to the content of diaphragm, therefore (on the cost) can't reclaim economically, so, do not reclaim and adhere to diaphragm from coherent film, and as offal treatment.

Thus, need a kind of these existing processing methods, that the discarded object discharge rate is few, processing method cheaply that replace.And the diaphragm that adheres to that hope will be removed utilizes again.Particularly, when containing rare metal indium or tantalum, it is important effectively utilizing above-mentioned rare metal.

ITO (indium tin oxide) is because the transmitance height of visible light (transparency is high), resistance (than resistance) is little, it is easy to form pattern by photo-engraving process, therefore, as nesa coating, can be widely used in the pixel capacitors of liquid crystal board or counter electrode, PDP or organic-inorganic EL electrode, PDP with electromagnetic wave filter, touch-screen, solar cell etc.

But contained indium is the few metal of reserve that is called as rare metal among the ITO, and only the liquid crystal board of domestic production has just used more than 4 one-tenth of whole world use amount, and in addition, just the high growth rate with annual rate about 16% constantly increases use amount.Therefore, the recovery and reuse of indium are very important.

As the ito thin film manufacturing process, adopt sputtering method, vacuum vapour deposition, ion plating method equal vacuum to become embrane method mostly.For example, usually the transparency electrode that is formed by ITO of LCD etc. adopts sputtering method to carry out film to form mostly.

In sputtering method, for example, as shown in Figure 6, but the use amount of target is about 30%, the amount of adhering on the depositing jig having an adherent film be estimated as its approximately half, promptly about 15%.Aspect utilizing, the untapped target of weight ratio about 70% returns manufacturer again, utilize again, still, and in addition, the present situation that existence can't utilize again.As seen from Figure 6, if utilize from depositing jig having an adherent film washing and recycling ITO, in fact, each ITO can subdue the consumption of indium to only about half of degree again.

On the other hand, the someone propose several for example by with ITO contained in the sandblast bits with hydrochloric acid or nitric acid dissolve, carry out chemical extraction and handle, reclaim indium, the processing method of utilizing again still, in fact can't be utilized again.This is because the ITO containing ratio of sandblast bits or etching acid pickle for example, is about 0.1～5 weight % in the sandblast bits, is low to moderate 0.2～1.1 grams per liter in the etching acid pickle, it can't be reclaimed economically.

Replace these if can develop, can obtain the cheap depositing jig having an adherent film carrying out washing treatment technology of the regenerant of high ITO containing ratio, just can make economic utilization again become possibility, and promote to utilize again.

And, in sand-blast, adding man-hour, a part of sand takes place broken, and working ability reduces, and therefore, usually, can adopt cyclone separator to separate to remove sand grains that fragmentation diminishes and diaphragm etc.At this moment, a large amount of sandblast bits produce with the form of discarded object, and this waste treatment expends time in and the labour.Therefore, need the few processing method of discarded object amount.

At present, known has, and adopt to use the water injector of wet type or uses the water injector of the abrasive material mode of abrasive grains, removes dust (dust), films, the methods such as label of involucrum.

But, these be with remove the dust of comparing the little surface of hardness with grounds such as iron plate or shells, film, foreign matter such as the label of involucrum and to obtain grounds such as clean iron plate or shell be that purpose is used, be not used in the precedent of depositing jig having an adherent film washing.

The common hardness height of the membrane material of the coherent film that adheres on the depositing jig having an adherent film, it is the material that adopts the lower existing wet type spraying difficulty of hydraulic pressure to peel off, and, because the fairly simple method of so-called sand-blast has been available method, therefore, can think the research of the washing that is not applicable to depositing jig having an adherent film.

In fact, adopt spraying, running water not being carried out sufficient pre-treatment just uses, calcium ion contained in the running water is separated out in high pressure water generating device or in the cleaning gun with the form of calcium carbonate, become the reason of plant failure, and take place to cause the problem that corrosion is such by chlorine, be not suitable for the washing of depositing jig having an adherent film.

And, adopt the methods such as label of removing dejacketing, wherein the device that is adopted also is to be provided with simple bib so that water under high pressure does not directly face toward the device of human body, coherent film disperses with water, can't effectively reclaim and adhere to diaphragm.

For the method from the Separation of Solid and Liquid of suspension, known have the whole bag of tricks such as precipitation, filtration, centrifugal separation, membrane separation process, can use according to application targets such as the size of suspended particles or treating capacities.

But, at the sand-blast of prior art or adopt in the washing of depositing jig having an adherent film of etching method of acid, exist to produce a large amount of sandblast bits or acid pickle, and, the containing ratio that adheres to diaphragm contained in sandblast bits and the acid pickle is little, is difficult to utilize economically such problem again.Particularly, when the frame washing has the depositing jig having an adherent film of the coherent film that contains rare metal indium or tantalum, be important though reclaim and effectively utilize (utilizing again) these rare metals, because above-mentioned reason is difficult.

Summary of the invention

The object of the present invention is to provide the generation that can suppress sandblast bits or acid waste liquid, the recovery of simplifying coherent film also can promote the coherent film retracting device that utilizes again of above-mentioned coherent film and the recovery method of coherent film.

In order to achieve the above object, coherent film retracting device of the present invention is characterised in that: reclaiming the coherent film retracting device of above-mentioned coherent film from being placed on the depositing jig having an adherent film with coherent film that keeps on the platform, in order to reclaim above-mentioned coherent film, have water spray (liquid) parts to above-mentioned depositing jig having an adherent film water spray (liquid).

According to above-mentioned formation,, therefore can improve the above-mentioned rate of recovery of adhering to diaphragm, and can improve security the operator owing to have the sprinkler part of inject high pressure water spray.

And, adopt above-mentioned formation, compare with existing sand-blast, can reduce the stock removal of depositing jig having an adherent film when washing depositing jig having an adherent film, can prolong the access times of depositing jig having an adherent film, promptly improve the life-span.

Adopt above-mentioned formation, can the coherent film of depositing jig having an adherent film be removed with the form of adhering to diaphragm by water spray, and, can make above-mentioned diaphragm big than existing sand-blast of adhering to, therefore, can simplify and guarantee above-mentioned recovery of adhering to diaphragm, but and cost degradation.And above-mentioned formation can promote the utilization again of coherent film.

In order to achieve the above object, coherent film recovery method of the present invention is characterised in that: in the recovery method of the coherent film that the coherent film that will adopt sputtering method, vacuum vapour deposition, ion plating method, CVD method equal vacuum to become to adhere on the depositing jig having an adherent film such as employed protective plate, mask, substrate holder in the vacuum film formation apparatus of embrane method is peeled off and reclaimed, the stripping means of the coherent film that adheres on the depositing jig having an adherent film is to use water spray (liquid) method of water or liquid.

According to said method, owing to adopted the spraying that makes water or liquid in the stripping means of the coherent film that adheres on the depositing jig having an adherent film, therefore, compare with existing sand-blast, can reduce washings is the stock removal (abrasion loss) of depositing jig having an adherent film, prolong the access times of depositing jig having an adherent film, promptly improve the life-span.

And, in said method, can the coherent film of depositing jig having an adherent film be removed with the form of adhering to diaphragm by spraying, and, can make above-mentioned diaphragm big than existing spraying of adhering to, therefore, can simplify and guarantee above-mentioned recovery of adhering to diaphragm, but and cost degradation.And said method can promote the utilization again of coherent film.

Other purposes of the present invention, feature and advantage fully manifest by following record.And advantage of the present invention can be by brighter and clearer with reference to the following explanation of accompanying drawing.

Description of drawings

Fig. 1 is the schematic diagram of expression one example as the water injector key component of the coherent film retracting device of first embodiment of the invention.

Fig. 2 is the schematic diagram of expression one example as the water injector key component of the coherent film retracting device of second embodiment of the invention.

Fig. 3 as be used in the routine above-mentioned coherent film retracting device to wash, the key component sectional view of the sputter equipment of vacuum film formation apparatus when forming coherent film on the depositing jig having an adherent film.

Fig. 4 is the key component sectional view of sand blasting unit that is used to remove coherent film of expression one routine conventional example.

Fig. 5 is the key component sectional view of film forming liquid crystal board in the expression one routine above-mentioned vacuum film formation apparatus.

Fig. 6 is the figure that the material of the above-mentioned sputter equipment of expression is discharged the detailed catalogue example.

Fig. 7 is the key diagram of the coherent film recovery method of first embodiment of the invention, is the operational block diagram that is used to illustrate water injector shown in Figure 1.

Fig. 8 is the key component schematic diagram of expression one example as the water injector of the coherent film retracting device of third embodiment of the invention.

Fig. 9 is the key diagram of the coherent film recovery method of third embodiment of the invention, is the operational block diagram that is used to illustrate water injector shown in Figure 8.

Figure 10 is the side view in key component cross section of cleaning gun of the water injector of each embodiment of the present invention.

Figure 11 is that the size of above-mentioned water injector SEM that reclaim, that adhere to diaphragm and the key diagram of purity are adopted in expression.

The specific embodiment

Carry out following explanation according to Fig. 1 to Figure 11 for each scheme that coherent film retracting device of the present invention is relevant with the coherent film recovery method.At first, because the depositing jig having an adherent film that is adopted in relative coherent film retracting device and the coherent film recovery method, coherent film forms in vacuum film formation apparatus, and therefore, the sputter equipment to as a routine above-mentioned vacuum film formation apparatus describes based on Fig. 3.

As shown in Figure 3, in the film forming room 12 of sputter equipment 11, the pipe arrangement A that supplies with discharge gas is set and links to each other with vacuum pumping hardware, the pipe arrangement B of vacuum evacuates film forming room 12.In film forming room 12, with target holding plate 13 that film forming room 12 electricity separate on target 14 is set, positive plate 15 is set around it.In the outside of film forming room 12 with clamping target holding plate 13 and near target 14 mode distributed magnets 16.

The substrate 17 that carries out forming thin film is in the mode relative with target 14, can be installed in with freely loading and unloading with substrate holder 18 that film forming room 12 electricity separate on.Aforesaid substrate support 18 is arranged in the film forming room 12, and is provided with removably.

Can be freely on the front of substrate 17 (side relative) with target 14 with loading and unloading configuration covered substrate 17 do not have the mask 19 in the place of film forming.And, on target 14 sides of the inner face side of film forming room 12 and positive plate 15, protective plate 20 can be installed freely with loading and unloading.

Operation to above-mentioned sputter equipment 11 describes below, at first, by pipe arrangement A inert gas such as argon or the discharge gas that as required oxygen and nitrogen isoreactivity gas mixed are imported film forming room 12, with target 14 as negative electrode, between itself and positive plate 15, apply high voltage, make the discharge gas ionization.Ionized discharge gas strikes on the target 14, gets target material, and the target material of getting is deposited on the substrate 17 with the film shape, carries out film forming.

At this moment, on each parts in the film forming room 12 beyond substrate 17, also adhere to target material and form coherent film, if this coherent film becomes blocked up, the internal stress of coherent film or thermal stress repeatedly cause to be peeled off, form chip (diaphragm), become the reason of the film defects that forms on the substrate 17, therefore must regularly remove coherent film.

In order to simplify this operation, protective plate 20 can be set.Depositing jig having an adherent film such as substrate holder 18, mask 19 and protective plate 20 must regularly remove the washing of depositing jig having an adherent film of the coherent film of attachment removal, usually, adopt ITO, the thickness of coherent film is about 100～300 microns, adopt metals such as tantalum, form Film Thickness Ratio its thicker after, above-mentioned depositing jig having an adherent film is unloaded from sputter equipment 11, carry out the washing of depositing jig having an adherent film.

The washing of depositing jig having an adherent film can adopt the existing method that is called as sand-blast to carry out.The key component sectional view of the sand blasting unit that adopts in the expression one routine sand-blast among Fig. 4.

Formation and operation to above-mentioned sand blasting unit describes below, at first, in the operating room 22 that protective bulkhead forms mechanical hand 21 is set, and on the top of mechanical hand 21 nozzle 23 is installed.Said nozzle 23 links to each other with the compressed mixed machine 24 that is used for sand and air are mixed and spray from nozzle 23.

Depositing jig having an adherent film 25 is to become the form configuration of nozzle 23 sides at operating room 22 inner membrance attachment surfaces, by mechanical hand 21 moving nozzle successively 23, sand is ejected on the film attachment surface of depositing jig having an adherent film 25 with compressed air, and the coherent film that leans on its impulsive force to adhere to is peeled off and is removed.Sand can adopt high aluminium of hardness or silicon-carbide particle usually, and its size is considered processing speed and processed and can select suitable size, but adopts particle big or small about 100 microns～800 microns usually.

The sand fragmentation that a part strikes on the film attachment surface of depositing jig having an adherent film 25 diminishes, the power of peeling off coherent film reduces, therefore, import the commercially available cyclone separator 27 from the below of the platform 26 of perforate, adopt cyclone separator 27, separate and sand and the sand that diminishes and the mixture that adhere to diaphragm of original sand facies with size, the former turns back to compressed mixed machine 24 again and uses, and the latter discharges by arrow C as the sandblast bits.

Therefore, adopts above-mentioned existing processing method, produce a large amount of sandblast bits, and the containing ratio that adheres to diaphragm is with respect to the also little degree to 0.1～5 weight % of sandblast bits, be difficult to separate economically above-mentioned both.

Represent in Fig. 5 as adopting the liquid crystal board of film forming substrate 17 in the routine above-mentioned vacuum film formation apparatus.Illustrated liquid crystal board has TFT active components such as (thin film transistor (TFT)s).The present invention is certainly also applicable to TN (type of turning round is to row) liquid crystal board, STN (the super type of turning round is to row) liquid crystal board even load liquid crystal board.And, also applicable to flat display panels such as the inorganic EL plate outside the liquid crystal board, organic EL plate, PDP, PDP electromagnetic wave filter, touch-screen etc.

Above-mentioned liquid crystal board as shown in Figure 5, thickness is the transparent glass substrate 31a.31b of 0.7mm or 1.1mm by for example fitting along the periphery of this glass substrate 3la, 31b with the seal member 32 of frame shape configuration, filling liquid crystal between it becomes the structure that forms liquid crystal layer 33.Substrate 17 shown in Figure 3 is suitable with glass substrate 31a, the 31b among Fig. 5.

In glass substrate 31a31b with the face of liquid crystal layer 33 opposite sides on, by bonding agent respectively coating thickness be the Polarizer 34,34 of 0.2～0.4mm.The thickness of liquid crystal layer 33 (distance between glass substrate 31a, the 31b) is generally 4～6 microns.Glass substrate 31a, 31b, Polarizer 34,34, the thickness of liquid crystal layer 33 is not limited to above-mentioned value.

On the face of liquid crystal layer 33 sides of glass substrate 31a, will be arranged in order alignment films 38 that R, the G based on organic matter, the colour film 35 that the B shades of colour forms, the film formed counter electrode 37 of transparent ITO that contains indium, organic matter form towards liquid crystal layer 33 1 sides order lamination.

On the other hand, on the face of liquid crystal layer 33 sides of glass substrate 31b, order forms the alignment films 38 that gate open path electrode 39, gate insulation film 40, silane semiconductor film 41, power path electrode 42, drain electrode 43, the film formed pixel electrode 44 of transparent ITO that contains indium, organic matter constitute.

Gate open path electrode 39, power path electrode 42, drain electrode 43 are made of at least a metal among tantalum, aluminium, the titanium etc. or the film of metallic compound, itself and contain counter electrode 37 and the pixel electrode 44 that the transparent ito thin film of indium forms and can adopt the vacuum film forming method to form film.Above-mentioned vacuum film forming method mainly adopts sputtering method.

Below, represent that respectively the depositing jig having an adherent film washing of each embodiment of the present invention is represented in Fig. 1 and Fig. 2 with each routine key component schematic diagram of coherent film retracting device.Below, describe according to Fig. 1 and Fig. 2.

In water injector as the coherent film retracting device of first embodiment of the invention, as shown in Figure 1, to cover the operating desk that is used for washing operation from the top is the operating room 22 of the formation case shape of platform 26, is that depositing jig having an adherent film 25 is transported to and transports out the door on above-mentioned 26 to be provided in the side washings.

In washing operation, drain to the outside in order to prevent the spittle that water spray (liquid) forms, aforesaid operations chamber 22 forms inwall can use protective bulkhead (preferred possess hydrophilic property) hermetically.

In operating room 22, the shaft-like mechanical hand of multi-joint (moving part) 21 is in the mode of the below of dangling from operating room 22 tops (top plate portion), and the return bend joint that partly has a plurality of parts as the water under high pressure pipe arrangement at the multi-joint of above-mentioned mechanical hand 21 is set up.

Thus, mechanical hand 21 is that multi-joint is shaft-like, owing to have a plurality of return bend joints, and therefore, when carrying water under high pressure, the head portion of mechanical hand 21 can be moved along the shape that the coherent film as the depositing jig having an adherent film 25 of washings (washing object) forms face three-dimensionally.

In the masthead portion of mechanical hand 21, it is coaxial with above-mentioned masthead end to be roughly columned cleaning gun (water spray part) 51, and is the center with the central shaft of cleaning gun 51, installs to rotate freely mode.

The water under high pressure generation device (highly pressurised liquid generation part) 52 that is used to produce water under high pressure connects in the mode of supplying with water under high pressures to cleaning gun 51 by mechanical hand 21 and near the outer setting of operating room 22.Usually can adopt pressure that the inlet side oil gear produces and the supercharger that adopts outlet side to obtain the supercharging type device of water under high pressure in the water under high pressure generation device 52.

Connect the Water Purifiers (liquid FF) 61 that is used for supplying with water on the water under high pressure generation device 52 to water under high pressure generation device 52.In Water Purifiers 61, from running water, remove calcium ion or chlorion plasma by ion-exchange, and export above-mentioned water.

The shaft-like mechanical hand 21 following settings of multi-joint, promptly (not shown by the controller that reappears control mode (テ イ-テ イ Application グ Block レ イ バ Star Network), control section), meet the action that the shape of washing depositing jig having an adherent film 25 controls in advance repeatedly and carry out the washing of depositing jig having an adherent film.

In Figure 10, represent the side view in the key component cross section of a routine cleaning gun 51.The cross section that only shows nozzle segment 69.Nozzle segment 69 forms roughly cylindric with the form that reduces gradually near the top internal diameter, is connected with water under high pressure generation device 52 by cleaning gun 51.

On said nozzle part more than 69 top end face that for example 7 are installed in cleaning gun 51 (on the plane that intersects vertically with the rotating shaft of cleaning gun 51), the central shaft of each nozzle segment 69 is provided with in the mode that is parallel to each other.In above-mentioned each nozzle segment 69 one is provided with cleaning gun 51 coaxial (rotating shaft).

Other above-mentioned each nozzle segments 69, for example other 6 on the top end face of cleaning gun 51, is on the circumference of imaginary circle at center, with uniformly-spaced setting adjacent one another are at the rotating shaft with cleaning gun 51.Above-mentioned imaginary diameter of a circle with respect to the aperture D of the nozzle tip opening of nozzle segment 69 in 200～2500 times scope, more preferably in 400～1500 times scope.

Each nozzle segment 69 on this imaginary circle is the center with the rotating shaft of cleaning gun 51, rises to be clockwise direction (E direction the figure) rotation when the tip side of nozzle segment 69 is seen with cleaning gun 51-.Air compressor machine, hydraulic press or hydraulic press are used in the driving of above-mentioned rotation, and revolution is 500rpm～2000rpm, more preferably at 1000rpm～2000rpm.

Above-mentioned each nozzle segment 69 has the structure that is fit to common inject high pressure water, for example, the internal face of each nozzle segment 69 has carried out mirror finish, and the opening portion of the nozzle bore of its head portion has been imbedded corundum bits or boart (not shown) from abrasion performance and the consideration of processability aspect.

Adjust the scope of distance in being called as impingement region of nozzle segment 69 with the depositing jig having an adherent film 25 of cleaning gun 51, i.e. L/D=50～300.Here, L is the head portion of nozzle segment 69 of cleaning gun 51 and the distance on depositing jig having an adherent film 25 surfaces, and D is the aperture of the nozzle tip opening of said nozzle part 69.

These each nozzle segments 69 are preferably approximately vertically set with respect to the surface that is washed of depositing jig having an adherent film 25 with the central shaft of each nozzle segment 69 by mechanical hand 21.

In addition, as required, the central shaft of each nozzle segment 69 can tilt with respect to the normal to a surface direction that is washed of depositing jig having an adherent film 25, for example can tilt to about 10 °.Thus, from along each water under high pressure of each nozzle segment 69 of above-mentioned imaginary circle rotation by inclination with respect to coherent film, become the simulation pulsation water that in given scope, changes impulsive force successively repeatedly, can peel off from coherent film effectively and adhere to diaphragm.

When depositing jig having an adherent film 25 was roughly rectangular more simple shape, the shaft-like mechanical hand 21 of multi-joint can be to wish cheap XY mechanical hand, also can be controlled to be digital control scheme.For example, adopt the XY level, replace moving the method for each nozzle segment 69, also can mobile depositing jig having an adherent film 25.

The inner surface of operating room 22 is made of hydrophilic material, and sprayer or the shower nozzle (humidification part) 59 that is used for wet operation chamber 22 inner surfaces is installed on the top board of operating room 22.

In this coherent film retracting device, place depositing jig having an adherent film 25 on the platform in operating room 22 (maintenance platform) 26, make and adhere to the side that face becomes cleaning gun 51 on it, by the mobile successively cleaning gun 51 of mechanical hand 21, high pressure water jets is mapped on the above-mentioned film attachment surface, peels off coherent film except that attachment removal by its impulsive force.Depositing jig having an adherent film 25 can carry out the washing of depositing jig having an adherent film with the state on the washing frame mounting table (support component) 53 that is placed on setting-out as described later.

Depositing jig having an adherent film 25 or washing frame mounting table 53 all omit in the drawings, but move on the platform 26 in operating room 22 by bogie and guide rail, are placed on given position by stopper.

In Fig. 1, below with the netted platform 26 of having opened a plurality of holes, configuration centrifugal separator (Separation of Solid and Liquid part) 57.Centrifugal separator 57 have round-ended cylinder shape fixed container 54 is arranged and in fixed container 54 rotation of coaxial high speed round-ended cylinder shape rotary container 56 arranged.In the rotary container 56, on its side face, opened a plurality of holes, filtering material 55 has been set on the medial surface of rotary container 56 to cover above-mentioned a plurality of hole.

The water under high pressure that is ejected on the depositing jig having an adherent film 25 becomes the suspension that adheres to diaphragm that contains from the coherent film of depositing jig having an adherent film 25.Above-mentioned suspension directly or along the internal face of operating room 22 with water from sprayer or shower nozzle 59, below flowing to, the platform 26 that has a plurality of holes enters the rotary container 56, carry out centrifugation by centrifugal separator 57, will adhere to diaphragm and separate with draining.

Above-mentioned suspension and draining can be main component (more than the 50 weight %) with water, also can contain for example antirust agent or be used to increase the liquid polymer of grinding force of other material.And centrifugal separator 57 can be the centrifugal sedimentation device that adopts centrifugal settling method.

In the bottom surface of fixed container 54 discharge outlet 58 is set.Above-mentioned discharge outlet 58 is by pipe arrangement 77, and the groove through being used to adjust flow (not shown) links to each other with water under high pressure generation device 52, and the draining that produces by centrifugation turns back to water under high pressure generation device 52.Thus,, therefore, the discarded object amount can be reduced at least, generation of waste can be avoided comprehensively owing to can utilize draining again.

In second embodiment of the present invention, as shown in Figure 2, replace centrifugal separator 57, below perforate platform 26, be provided with the stillpot (Separation of Solid and Liquid part) 60 of round-ended cylinder shape, to receive the suspension that falls from the hole of platform 26.At the sidepiece of stillpot 60, discharge outlet 58 is arranged on given height.Draining from discharge outlet 58 turns back to high pressure water generating device 52 by the groove (not shown) of pipe arrangement 77 through being used for the flow adjustment.

By being used for the groove (not shown) that flow is adjusted, replace high pressure water generating device 52 to link to each other from the pipe arrangement 77 of discharge outlet illustrated in figures 1 and 2 58 with Water Purifiers 61.

Fig. 7 is the block diagram that is used to illustrate the coherent film recovery method that adopts the coherent film retracting device that Fig. 1 represents.At first, under the bogie origin position state, position and depositing jig having an adherent film 25 are fixed with being harmonious outside bogie is in operating room 22, with the switch opens (step 1 is abbreviated as S with step below) of controller.

Then, the door of opening operation chamber 22 (S2), bogie moves (S3) along guide rail, stops (S4) once arriving operating position, fixes the door of shutoff operation chamber 22 (S6) by stopper.The stop position of bogie can be learnt by limit switch, also can adopt other method.In addition, the rotary container 56 of centrifugal separator 57 brought into operation before the door of shutoff operation chamber 22, to carry out having certain rotary speed (S5) before the centrifugation operation.

Exhaust fan 62 is installed on the top board of operating room 22, at least in the depositing jig having an adherent film washing operation, make its operation, only make and be decompression state (outside with respect to operating room 22 is a negative pressure state) in the operating room 22, by inject high pressure water, prevent that the spittle that contains water and adhere to diaphragm from leaking into periphery from operating room 22.

Then, open the valve of shower nozzle 59, begin water spray (S7), the high-pressure pump of the high pressure water generating device 52 that brings into operation and cleaning gun air compressor machine begin to supply with water under high pressure (S8).Began to spray water before the operation of mechanical hand 21 begins is for the internal face of wet operation chamber 22 in advance.And begin to supply with water under high pressure in advance, be to obtain stable depositing jig having an adherent film wash conditions in order to operate after certain by the flow velocity that makes the water under high pressure that sprays from cleaning gun 51.Though omit among the figure, set with timer in advance until the time of depositing jig having an adherent film washing beginning.

Then, reach necessarily, meet the control that the shape of each depositing jig having an adherent film 25 carries out in advance according to mechanical hand 21 and move, carry out the washing (S9) of depositing jig having an adherent film in case the internal face of operating room 22 becomes the flow velocity of wet and water under high pressure.The washing of depositing jig having an adherent film stops to supply with water under high pressure (S10) in case end stops the operation of high-pressure pump and cleaning gun air compressor machine.Then, mechanical hand 21 returns mechanical hand initial point (S11), stops shower nozzle 59 water sprays (S12).

Then, the door of opening operation chamber 22 (S13), mobile bogie is so that it takes out of (S14) from operating room 22, stop (S15) at the bogie origin position, close door (S16), stop the rotary container 56 (S17) of centrifugal separator 57, finish the washing (S18) of a series of depositing jig having an adherent film.

More than be illustrated according to the block diagram of Fig. 7, but, for example begin can be before opening door in the action of the rotary container 56 of centrifugal separator 57, also can supply with begin the reversed order that begins with it according to will spray water beginning and water under high pressure of the performance of water under high pressure generation device 52, in a series of operation, in the scope that no problem takes place, can carry out several changes, the present invention is not limited to Fig. 7.

The schematic diagram of the key component of the coherent film retracting device of expression third embodiment of the invention is represented in Fig. 8.In above-mentioned coherent film retracting device, the shaft-like mechanical hand 21 of multi-joint is set in the operating room 22 that forms by automatically-controlled door 68 and protective bulkhead, cleaning gun 51 is installed on the top of mechanical hand 21.Cleaning gun 51 links to each other with the water under high pressure generation device 52 that is formed by three company's plunger displacement pumps, links to each other with Water Purifiers 61 again.

Mechanical hand 21 carries out the washing of depositing jig having an adherent film by the action that the controller (not shown) that can repeat control mode repeats to control in advance.

On the top board of operating room 22, above-mentioned exhaust fan 62 is installed.On the base plate 65 of operating room 22, be provided for mobile bogie 63 and meet guide rail 64 and each limit switch LS1, LS2 of given position.

On bogie 63, with the turntable 70 that loads thereon and keep so that it is provided with in the normal direction of the bogie 63 loading surfaces mode as rotating shaft half-twist or 180 °.By this turntable 70 is set, the narrow setting of the moving range of mechanical hand 21 can be able to be realized cost degradation.Certainly, mechanical hand 21 also can be a console mode.

On the base plate 65 in operating room 22 discharge outlet 66 is set.Discharge outlet 66 directly or by pipe arrangement is connected with stillpot 60.To flowing into the suspension of stillpot 60, in stillpot 60, adhere to diaphragm and precipitate, form the beds of precipitation 67, supernatant liquor is discharged from discharge outlet 58.

Fig. 9 is the block diagram that is used to illustrate the coherent film recovery method that adopts the coherent film retracting device that Fig. 8 represents.Open the starting switch (S21) of control cabinet, start exhaust fan 62 (S22), open automatically-controlled door 68 (S23), the operation (S24) of beginning high-pressure pump, simultaneously, bogie 63 moves to (S25) outside the operating room 22 in operating room 22, move to that position that limit switch LS1 opens stops and fixing, is in holding state (S26).

Then, depositing jig having an adherent film 25 is installed in the given position of bogie 63, for example be installed in (S27) on the turntable 70, one opens washing beginning switch (not shown) (S28), bogie 63 just moves (S29) in operating room 22, move to the depositing jig having an adherent film in the operating room 22 washing location, be that the position of opening limit switch LS2 stops and fixing (S30), close automatically-controlled door 68 (S31).

Then, be positioned at the valve of opening water under high pressure generation device 52 under the state of mechanical hand origin position at mechanical hand 21, the high-pressure pump load, promptly, supply with water under high pressure from high-pressure pump to cleaning gun 51, begin from cleaning gun 51 inject high pressure water (S32), almost meanwhile, open the air compressor machine of cleaning gun, be arranged on a plurality of nozzle segments 69 interlock and bring into operation (S33) respectively on the cleaning gun 51.

Then, in case high-pressure pump begins load, only, send the signal that time is up (S34) in the predefined time operation of first timer.Like this, the injection one of water under high pressure is stable, and mechanical hand 21 can carry out carrying out the washing (S35) of depositing jig having an adherent film according to the action of control in advance.

Then, the emptying high-pressure pump stops the injection (S36) of water under high pressure, closes cleaning gun air compressor machine (S37), mechanical hand 21 is moved to the mechanical hand initial point (S38) that leaves bogie 63.

Consider the size cases of depositing jig having an adherent film 25 and operator's safety, in the injection of water under high pressure during not towards automatically-controlled door 68 1 sides, from the central side of depositing jig having an adherent film 25 after the inboard of operating room 22 (side relative with automatically-controlled door 68) carries out demifacet or 1/4 's the washing of depositing jig having an adherent film, adopt the turntable of setting up on the bogie 63 70, with depositing jig having an adherent film 25 Rotate 180s ° or 90 ° (S39), reiteration finishes (S32～S40) until the washing of depositing jig having an adherent film.

Simplify among the figure and put down in writing, but, at this moment be certain situation, the action of the mechanical hand 21 of depositing jig having an adherent film washing also has the situation of half-twist or according to the shape of depositing jig having an adherent film 25 when asymmetric shape (particularly) and the situation different with previous action.

The washing one of depositing jig having an adherent film finishes, second timer operation (S41), if through the time of the steam disappearance predefined, that the operating room 22 interior spittle cause, automatically-controlled door 68 is opened (S42), bogie 63 moves (S43), move to that position that the outer limit switch LS1 of operating room 22 open stops and fixing, be in holding state (S44).This is the EO until whole depositing jig having an adherent film washings, carries out depositing jig having an adherent film 25 is taken out (S45) and (S46) is installed, and carries out each operation of S27～S45 repeatedly.

If the operation one of all depositing jig having an adherent film washings finishes, open the end switch of control cabinet, indication EO (S46), high-pressure pump stops (S47), bogie 63 moves in the operating room 22 (S48), moves to the position that the limit switch LS2 in the operating room 22 open and stops and fixing (S49), and automatically-controlled door 68 is closed (S50), exhaust fan 62 cuts out and stops (S51), and the washing operation of depositing jig having an adherent film finishes (S52).

Behind the EO, it is to adhere to disperse periphery outside operating room 22 of diaphragm for what prevent to adhere on the dry and bogie 63 of bogie that bogie 63 is kept in the operating room 22.

Enumerated the example that reclaims the coherent film that adheres on the depositing jig having an adherent film of vacuum film formation apparatus above, but the present invention is not limited to this, for example, also can be used for reclaiming the film of metals such as indium contained in the electronic equipments such as discarded liquid crystal board or tantalum or metallic compound.

[embodiment 1]

Use about 20 microns alligatoring substrate holders 18 processing, 5 millimeters thick of the SUS430 system of using in the sputter equipment (Fig. 3) as depositing jig having an adherent film 25 with the film formation of ITO the pixel electrode and the counter electrode of liquid crystal board, adopt the wet type water injector, be coherent film retracting device of the present invention, carry out the washing of depositing jig having an adherent film.

The alligatoring that the surface of substrate holder 18 is carried out 3 microns～5 microns is processed, be in order to improve the adhesion force of coherent film, be difficult in the vacuum film formation apparatus peel off, until adhering to thicker coherent film, inhibition is from the generation of the dust of above-mentioned coherent film, can be used as substrate holder 18 and use, reduce the washing frequency of the depositing jig having an adherent film of coherent film.

Employing has the cleaning gun 51 that nozzle bore is a plurality of jet elements 69 below 1 millimeter, the distance of cleaning gun 51 and depositing jig having an adherent film 25 is adjusted in the impingement region, for example 100 millimeters, in 30MPa～200MPa scope, change the hydraulic pressure of water under high pressure, remove the ITO coherent film that adheres on the substrate holder 18, substrate holder 18 surfaces after the ITO coherent film is removed are observed and are carried out the amount of deflection evaluation.

Nozzle bore is in 0.1 millimeter～1.0 millimeters scope, when hydraulic pressure is low to moderate 30MPa, the operating time of removing of coherent film prolongs, and hydraulic pressure is in the scope of 30MPa～200MPa, the surface state of peeling off the state of removing, substrate holder 18 of coherent film is good especially, and the amount of deflection of substrate holder 18 is also less than measuring limit.If the consideration operability, more preferably hydraulic pressure is in the scope of 60MPa～200MPa.

Afterwards,, adopt sand-blast to carry out Surface Machining and handle, afterwards, carry out ultrasonic washing and washing processing in order to take off the rust on substrate holder 18 surfaces, dry at short notice.The stock removal of the substrate holder 18 by the present invention washing is about 2 microns, and the stock removal when carrying out the depositing jig having an adherent film washing by sand-blast is about 20 microns and makes a gesture of measuring few mutually.

Make nozzle segment 69 for a plurality of, be because owing to attachment surface in the coherent film of depositing jig having an adherent film 25 is wide usually to several centimetres, therefore in order to make simple to operateization of mechanical hand 21, the shape that preferably meets the depositing jig having an adherent film 25 that is adopted is selected nozzle segment 69 and quantity and configuration.

With the liquid that has for example added antirust agent such as hydrazine, polyphosphoric acid, can omit the Surface Machining processing that is used to remove surperficial rust in the sand-blast by hydromining used in the water under high pressure.To this, can be suitable equally in each embodiment 2 and 3 described later.

Depositing jig having an adherent film 25 after the washing that use obtains like this in sputter equipment, a situation arises for the film defective of film forming on distortion, dust generating capacity and the substrate 17 of research depositing jig having an adherent film 25.As a result, identical with the frame that adopts the sand-blast washing, judge the problem that does not have in the actual use.

Also configuration stillpot 60 (Fig. 2) below water injector being reclaimed the situation of adhering to diaphragm that precipitates studies.As a result, owing to disperse outside stillpot 60 or the sedimentation time deficiency, therefore, that peels off that about 64% the ITO that adheres to diaphragm that removes forms adheres to diaphragm and can reclaim with sedimentary form.

It is 7 so big that the proportion of ITO is about, therefore, by sprayer unit or shower nozzle 59, the diaphragm that adheres to of the ITO outside stillpot 60 of dispersing can be imported in the stillpot 60 with flowing water, prolong the sedimentation time or adopt centrifugal separation the rate of recovery can be brought up to almost 100% by stillpot 60 is studied.

In Figure 11, expression is measured with the ITO that reclaims and is adhered to the relevant SEM of diaphragm (scanning electron microscope) measurement result.The ITO that reclaims adheres to diaphragm as shown in figure 11, be roughly several microns to tens of microns diaphragm ratio height, and, be that highly purified ITO adheres to diaphragm, almost do not detect iron contained among the SUS430 as the substrate holder 18 of depositing jig having an adherent film 25 and the impurity outside the chromium.Thus, the ITO of recovery adheres to diaphragm, and the indium recovery and reuse in the postorder operation are handled and can simply be carried out, and are outstanding aspect economy.

[embodiment 2]

The pixel electrode of liquid crystal board and counter electrode are formed thin SUS430 system protective plate with 2 millimeters thick of using in the sputter equipment (Fig. 3 11) (Fig. 3 20) with the film of ITO adopt the wet type water injector, carry out the washing of depositing jig having an adherent film with method similarly to Example 1.Hydraulic pressure can change in the scope of 30MPa～120MPa, removes attachment surface.

Compare with sand-blast, can think that the pressure that is produced by hydraulic pressure is big, if but the hydraulic pressure height to 90MPa～120MPa, in the protective plate that is adopted, the part of contact water under high pressure deforms, and as seen has amount of deflection.

Therefore, adhere to face in order on this protective plate, to form, place in the canister interior (Fig. 1, Fig. 2) of support shape, do not flow back to adhering on the face of protective plate in order to make profiling with silane resin, adopt poly-imines band and aluminium strip to make dike, profiling is mixed deaeration with silane resin SH-85A and SH-850B with 1 to 1 ratio, the product that generates flows in the canister, along being shaped with the relative face of face (inner face) that adheres to of protective plate, at room temperature solidify, make washing frame mounting table (Fig. 1, Fig. 2 53).In order to improve hardness, can solidify giving in the baking oven of fixed temperature below 150 ℃.

The silicones body that is shaped is like this peeled off band, uses as washing frame mounting table, still, the washing frame mounting table springiness of making by above-mentioned silicones, to the durability of the water under high pressure of wet shotcrete technology than higher.And then the canister that bonding above-mentioned washing frame mounting table keeps by inside has the effect of the intensity that improves above-mentioned washing frame mounting table.

On this washing frame mounting table, place above-mentioned protective plate, its inner face is flexibly supported above above-mentioned by the top of above-mentioned washing frame mounting table, in the scope of hydraulic pressure 30MPa～120MPa, under condition similarly to Example 1, above-mentioned protective plate is carried out the washing of depositing jig having an adherent film.

As a result, the surface state of peeling off the state of removing, removing back shroud of the coherent film of protective plate is all good, as the also not distortion of protective plate of the depositing jig having an adherent film 25 of problem, is good.Afterwards, to above-mentioned protective plate, after the employing sand-blast carries out the Surface Machining processing, carry out ultrasonic washing and washing processing, drying at short notice.

Use sputter equipment (Fig. 3), use above-mentioned protective plate, the defective production of the film of film forming etc. on the generating capacity of research dust and the substrate 17.As a result, with same, can obtain good result in actual use in the washing of sputtering method mid frame.

And configuration stillpot 60 also reclaims the diaphragm that adheres to of precipitation below water injector.As a result, has good similarly to Example 1 result.

[embodiment 3]

The aluminum mask that the aluminium spraying plating that will use in the gate of liquid crystal board bus line (Fig. 5 39) forms with sputter equipment (Fig. 3) with the film of tantalum or tantalum compound (tantalum nitride) is processed, adopt the wet type water injector same, carry out the washing of depositing jig having an adherent film with the foregoing description 1.

Employing has the cleaning gun 51 of a plurality of jet elements 69 of rotation, the distance of cleaning gun 51 and depositing jig having an adherent film 25 is adjusted into several centimetres, in being 0.1 millimeter～1.0 millimeters scope, the nozzle bore of nozzle segment 69 changes hydraulic pressure, remove attachment surface, the stock removal of peeling off the situation of removing and mask mother metal of investigation attachment surface.

At first, hydraulic pressure is reduced to 50MPa, the translational speed that makes cleaning gun 51 is that 2m/ divides when above, and some is unstripped and remaining down for coherent film on the aluminium sputtered films of bismuth of mask.And when being increased to hydraulic pressure near 200MPa, the aluminum mask is also cut down.In the scope of hydraulic pressure 60MPa～150MPa, peel off down coherent film from the aluminium sputtered films of bismuth, almost there is not the stock removal of the mask of aluminum, can obtain good result.

After the above-mentioned aluminum mask that obtains washed processing, drying, aluminium spraying plating processing, investigation was used the defective of the film of film forming on the generation of sputter equipment dust and the substrate 17 a situation arises etc.As a result, carry out the frame washing equally with adopting spraying, and film there is not chlorine pollution, no problem when reality is used.

In addition, diaphragm is adhered in configuration stillpot 60 and recovery below water injector.As a result, because the ratio of tantalum is great to 16.6, therefore, the recovery in the stillpot 60 is easy, and sediment can be about 70% with tantalum, the form of the mixture of aluminium about 30%, reclaim near 100% high-recovery with the diaphragm that adheres to of tantalum.The diaphragm that adheres to of the tantalum that reclaims does not almost detect impurity outside the aluminium, and the recovery and reuse of tantalum metal are handled and can simply be carried out in the postorder operation, also are outstanding aspect economy.

The present invention is by adopting the wet type spraying of pure water, usually at hydraulic pressure 10MPa to 30MPa, more than the hydraulic pressure 30MPa, below the 200MPa, more preferably more than the hydraulic pressure 60MPa, carry out the washing of depositing jig having an adherent film in the scope below the 200MPa, can judge thus: (1) can carry out the washing of good depositing jig having an adherent film, (2) stock removal of the depositing jig having an adherent film after the washing is compared few with sand-blast, (3) diaphragm that adheres to of the metal of peel separation or metallic compound is compared with sand-blast, and particle size is several microns to tens of microns ratio big (promptly reclaiming easily).

And the present invention finds that also usually, the proportion of metal and metallic compound is more than 2, and is bigger than water, can be easily with low-cost, high-purity ground recovery by such solid-liquid isolation method of filtration method, the precipitation method and centrifugal separation.

And, find that also with the processing method of wet type spraying and solid-liquid isolation method combination, the mixed volume of the impurity outside the water can be few, therefore, the metal recovery in the subsequent handling and utilize processing easily to carry out again with low cost.

In order to achieve the above object, coherent film retracting device of the present invention is characterised in that: from reclaiming the coherent film retracting device of above-mentioned coherent film at the depositing jig having an adherent film with coherent film that keeps platform to place, in order to reclaim above-mentioned coherent film, has sprinkler part with respect to above-mentioned depositing jig having an adherent film water spray.

According to above-mentioned formation, the stock removal of the depositing jig having an adherent film during the depositing jig having an adherent film washing is compared and can be reduced with present sand-blast, therefore, can prolong the access times of depositing jig having an adherent film, promptly improves the life-span.

Adopt above-mentioned formation, can be by the coherent film of depositing jig having an adherent film being removed from depositing jig having an adherent film with the form of adhering to diaphragm from the sprinkler part water spray, and, compare with existing sand-blast, can increase the above-mentioned diaphragm that adheres to, therefore, can simplify and guarantee above-mentioned recovery of adhering to diaphragm, make cost degradation become possibility.Therefore, in the above-described configuration, can promote the utilization again of above-mentioned coherent film.

In above-mentioned coherent film retracting device, preferably be provided for the water under high pressure production part of the generation water under high pressure of above-mentioned sprinkler part, to produce the hydraulic pressure in 3MPa～200MPa scope.

According to above-mentioned formation, because the hydraulic pressure height of water under high pressure is to 30MPa～20MPa, therefore preferred 60MPa～20MPa, can improve the above-mentioned rate of recovery of adhering to diaphragm.

In above-mentioned coherent film retracting device, the operating room that holds above-mentioned maintenance platform should disperse to the outside with the spittle that suppresses to be caused by water spray with the form setting that can seal.

In above-mentioned coherent film retracting device, preferably be provided for and be set at the exhaust fan of negative pressure in the operating room.According to above-mentioned formation, by being provided for and being set at the exhaust fan of negative pressure in the operating room, can suppress the outside that diaphragm leaks into operating room of adhering to that is easy to disperse, therefore, can further improve the above-mentioned rate of recovery of adhering to diaphragm, and can improve security the operator.

In above-mentioned coherent film retracting device, preferably be arranged on when the water under high pressure production part is supplied with the water that is used to spray water the pure water fabrication portion of refining above-mentioned water.

According to above-mentioned formation, by the refining water of pure water fabrication portion, therefore, in above-mentioned water under high pressure production part, can suppress by impurity contained in the water to the water under high pressure production part, for example calcium ion is separated out the fault generation that causes with the form of calcium carbonate.

In above-mentioned coherent film retracting device, can keep configuration on the platform from below the support component of resiliency supported depositing jig having an adherent film.

According to above-mentioned formation, by support component is set, even adopt thin thickness for example be called the depositing jig having an adherent film of protective plate the time, also can suppress the distortion of above-mentioned depositing jig having an adherent film.That is, by flexibly supporting above-mentioned depositing jig having an adherent film with above-mentioned support component, even on above-mentioned depositing jig having an adherent film, apply by water spray produce remove coherent film the time the pressure of water under high pressure, above-mentioned pressure also can be disperseed by the support component of resiliency supported depositing jig having an adherent film.Therefore, applied pressure also can disperse by supported parts on above-mentioned depositing jig having an adherent film, and the distortion that can alleviate the depositing jig having an adherent film that is caused by above-mentioned pressure.

In above-mentioned coherent film retracting device, preferred keep platform to have making containing the cave part that the suspension that adheres to diaphragm peeled off from depositing jig having an adherent film by water spray falls downwards, and be provided for from by separating the Separation of Solid and Liquid part of adhering to diaphragm the suspension that keeps platform to fall.

According to above-mentioned formation,, can in operating room, suspension be transported at an easy rate owing to contain the cave part that the suspension that adheres to diaphragm peeled off from depositing jig having an adherent film by water spray falls downwards keeping being provided with on the platform making.And, in the above-described configuration,, can from suspension, separate at an easy rate and adhere to diaphragm by the Separation of Solid and Liquid part is set, therefore, can improve the recovery of adhering to diaphragm.

In above-mentioned coherent film retracting device, the remaining draining of diaphragm of adhering to that preferably is provided for partly separating in Separation of Solid and Liquid turns back to the pipe arrangement that water under high pressure produces part.And, in order to adhere to removing of diaphragm more completely,, the draining after the Separation of Solid and Liquid can be turned back to the water under high pressure production part carrying out film after separatings such as smart filtration, ultrafiltration and counter-infiltration.

According to above-mentioned formation, since by water spray peel off remove to adhere to diaphragm bigger, therefore, draining after the such Separation of Solid and Liquid of precipitation process or centrifugation, adhere to diaphragm by removing fully basically, can adopt in water spray, for example the abrasion of the cave of the nozzle segment of cleaning gun reach upward no problem degree of actual use.

And, in the above-described configuration, though with draining return the original place be used for the water spray also no problem, draining can be returned the original place repeatedly and recycle, make the washing of the depositing jig having an adherent film that does not have discarded object basically become possibility.Therefore, above-mentioned formation by with drainage water reuse to water spray, further cost degradation, and also be outstanding aspect environment can improve environmental safety.

In above-mentioned coherent film retracting device, except water spray, preferred disposition is used for the humidification part of the indoor wall of wet operation.

According to above-mentioned formation, by setting the such humidification part of sprayer unit or shower nozzle, even becoming the water under high pressure of problem in existing spraying is involved in and adheres to diaphragm and disperse, and attached on internal face of operating room etc., also can adhere to diaphragm by washing this, to adhere to the diaphragm drying for a short time, and prevent to disperse outside operating room, improve the rate of recovery of adhering to diaphragm by air stream.

In above-mentioned coherent film retracting device, the cleaning gun of water spray preferably is provided for spuing, in operating room, be provided for changing the movable part of the direction of the water spray that comes out from cleaning gun, be provided for controlling the control section of movable part, to move movable part by reappearing control mode or mathematical control mode.

According to above-mentioned formation, cleaning gun is unloaded from movable part (top of robotic arm), only in given position (depositing jig having an adherent film adhere to face), by control section (control), adopt above-mentioned cleaning gun to carry out the depositing jig having an adherent film washing that peeling off of coherent film removed automatically, thus, can operate safely and effectively, be easy to absorbing diaphragm last time from coherent film.

In order to achieve the above object, coherent film recovery method of the present invention is characterised in that: in the coherent film recovery method of the coherent film that adheres on peeling off depositing jig having an adherent film such as the protective plate that reclaim to adopt sputtering method, vacuum vapour deposition, ion plating method, CVD method equal vacuum to become to use in the vacuum film formation apparatus of embrane method, mask, substrate holder, the stripping means of the coherent film that adheres on the depositing jig having an adherent film is to use the spraying of water or liquid.

According to said method, because the stripping means attached to the coherent film on the depositing jig having an adherent film has adopted the spraying that makes water or liquid, therefore, compare with existing sand-blast, can reduce stock removal (abrasion loss) as the depositing jig having an adherent film of washings, and can prolong the access times of depositing jig having an adherent film, promptly improve the life-span.

In addition, adopt said method, the coherent film of depositing jig having an adherent film can be removed with the form of adhering to diaphragm by spraying, and, above-mentionedly adhere to diaphragm big than existing sand-blast, therefore, can be with above-mentioned recovery easy, pragmatize and the cost degradation that adheres to diaphragm.Therefore, in said method, can promote the utilization again of above-mentioned coherent film.

In addition, said method makes the spraying of water or liquid by employing, can reclaim at low cost by what coherent film produced and adhere to diaphragm, and can utilize again economically, water vent can utilize once more, therefore, almost do not have discarded object, can carry out washing the favourable depositing jig having an adherent film of environment.

In above-mentioned recovery method, preferably that the running water that adopts in the spraying is refining, to reduce calcium carbonate contained in the running water at least.

According to said method, owing to reduced calcium carbonate at least in water that from spraying, uses or the liquid, therefore, in spraying, can reduce the fault that causes by separating out of above-mentioned calcium carbonate, therefore, can guarantee above-mentioned recovery.

In above-mentioned recovery method, preferably from the suspension that spraying produces, separate to reclaim and adhere to diaphragm by solid-liquid isolation method.In above-mentioned recovery method, solid-liquid isolation method is the centrifugal separation or the precipitation method preferably.

According to said method,, can simplify and guarantee above-mentioned recovery by the recovery that so-called centrifugal separation or precipitation method solid-liquid isolation method are used to adhere to diaphragm.

In above-mentioned recovery method, recovery adhere to diaphragm preferably metal or metallic compound.According to said method, be metal or metallic compound if adhere to diaphragm, can set increase water or liquid and above-mentioned difference in specific gravity of adhering to diaphragm that spraying adopted, simplify from containing the above-mentioned suspension that adheres to diaphragm and separate the above-mentioned diaphragm that adheres to of recovery.

In above-mentioned recovery method, the coherent film that adheres on the depositing jig having an adherent film can contain rare metal or its compounds such as indium, tantalum at least.In above-mentioned recovery method, depositing jig having an adherent film is the sputter equipment depositing jig having an adherent film, and the coherent film that adheres on the depositing jig having an adherent film is an indium oxide.

According to said method,, therefore can promote the utilization again of above-mentioned rare metal owing to can reclaim rare metals such as indium or tantalum with low cost.Therefore, adopt said method, can alleviate the problem of the resource exhaustion of so-called rare metal.

In above-mentioned recovery method, by adopting the water after the Separation of Solid and Liquid or the spraying of liquid, the coherent film that adheres on can the peel separation depositing jig having an adherent film.According to said method, owing to can utilize water or the liquid that uses in the spraying again, can reduce the discarded object amount in the washing of depositing jig having an adherent film, make zero discarded object become possibility.

In above-mentioned recovery method, depositing jig having an adherent film is made by stainless steel, titanium, copper or iron-nickel alloy, and the surface of preferably adhering to the depositing jig having an adherent film of coherent film at least is processed to 3 microns to 50 microns rugosity.

In above-mentioned recovery method, depositing jig having an adherent film is made of aluminum, adheres to the surface of the depositing jig having an adherent film of coherent film at least and can carry out aluminium spraying plating processing.

According to said method, stainless steel, titanium, copper or iron-nickel alloy and aluminium, the gas absorption amount is little, and, discharge gas easily, therefore, be suitable for depositing jig having an adherent film as vacuum film formation apparatus.

In addition, in said method, the surface of stainless steel, titanium, copper or iron-nickel alloy and aluminium is processed into 3 microns to 50 microns rugosity, and, by imposing aluminium spraying plating processing, can improve the adhesive force of the coherent film that forms on the above-mentioned surface.

This shows that said method can be suppressed in the vacuum film formation apparatus and produce dust (diaphragm) from above-mentioned coherent film, applicable to the depositing jig having an adherent film of vacuum film formation apparatus.

In addition, in said method,, therefore be suitable for removing the coherent film that forms on the depositing jig having an adherent film that adopts at vacuum film formation apparatus owing to can reduce depositing jig having an adherent film when washing stock removal to depositing jig having an adherent film.

Specific embodiments of finishing in the detailed description of the invention every or embodiment are in order to illustrate technology contents of the present invention, not only should not only limit to these concrete examples and carry out the explanation of narrow sense ground, and, spirit of the present invention and below in the scope of claims of putting down in writing, can carry out various variations and implement.

Claims (20)

1. coherent film retracting device, it is to reclaim the coherent film retracting device of above-mentioned coherent film from being placed on the depositing jig having an adherent film with coherent film that keeps on the platform, it is characterized in that having in order to reclaim above-mentioned coherent film, liquid ejecting portion free to rotate to above-mentioned depositing jig having an adherent film atomizing of liquids, highly pressurised liquid with the aforesaid liquid spout part, be designed to produce the highly pressurised liquid generation part of hydraulic pressure in 30MPa～200MPa scope, be arranged at a plurality of nozzles of the above-mentioned highly pressurised liquid of injection of the tip side of aforesaid liquid spout part, the drive part of rotating drive aforesaid liquid spout part.

2. the coherent film retracting device of claim 1 record, wherein above-mentioned a plurality of nozzles are setting adjacent one another are on the imaginary circle at center at the rotating shaft with above-mentioned liquid ejecting portion.

3. the coherent film retracting device of claim 1 or 2 records wherein holds the form setting of operating room sealing of above-mentioned maintenance platform, is dispersed to the outside by the spittle that liquid jet produces with inhibition.

4. the coherent film retracting device of claim 3 record wherein is provided for and will be set at the exhaust fan of negative pressure in the operating room.

5. the coherent film retracting device of claim 3 record wherein is arranged on and highly pressurised liquid is produced part supplies with when being used for the liquid of liquid jet the liquid FF of refining aforesaid liquid.

6. the coherent film retracting device of claim 3 record wherein will be configured in from the support component of below resiliency supported depositing jig having an adherent film on the maintenance platform.

7. the coherent film retracting device of claim 3 record, wherein keep platform to have making containing the cave part that the suspension that adheres to diaphragm peeled off by liquid jet from the depositing jig having an adherent film falls downwards, and be provided for from by separating the Separation of Solid and Liquid part of adhering to diaphragm the suspension that keeps platform to fall.

8. the coherent film retracting device of claim 7 record wherein is provided for turning back to the pipe arrangement that highly pressurised liquid produces part with partly separated the residual discharge opeing of adhering to diaphragm by Separation of Solid and Liquid.

9. the coherent film retracting device of claim 3 record wherein except that liquid jet, is provided for the humidification part of the indoor wall of wet operation.

10. the coherent film retracting device of claim 3 record, the cleaning gun of liquid jet wherein is provided for spuing, in operating room, be provided for changing movable part from the direction of the liquid jet of cleaning gun, be provided for controlling the control section of movable part, to move movable part by reappearing control mode and mathematical control mode.

11. the recovery method of a coherent film, it is characterized in that: in the coherent film recovery method of the coherent film that adheres on the depositing jig having an adherent film of the protective plate that in peeling off the vacuum film formation apparatus that reclaims the vacuum film formation method that adopts sputtering method, vacuum vapour deposition, ion plating method, CVD method, uses, mask, substrate holder, the stripping means of the coherent film that adheres on the depositing jig having an adherent film is to use the liquid gunite of water or liquid, the pressure of above-mentioned water or liquid is set in 30MPa～200MPa scope, and above-mentioned water or liquid spray with the simulation pulsation above-mentioned coherent film.

12. the recovery method of the coherent film of claim 11 record wherein refiningly is used for the running water that the liquid gunite is used, to reduce calcium carbonate contained in the running water at least.

13. the recovery method of the coherent film of claim 11 or 12 records wherein separates to reclaim from the suspension that the liquid gunite produces by solid-liquid isolation method and adheres to diaphragm.

14. the recovery method of the coherent film of claim 13 record, wherein solid-liquid isolation method is the centrifugal separation or the precipitation method.

15. the recovery method of the coherent film of claim 11 record, wherein the diaphragm that adheres to of Hui Shouing is metal or metallic compound.

16. the recovery method of the coherent film of claim 11 record, wherein the coherent film that adheres on the depositing jig having an adherent film contains indium, tantalum rare metal or its compound at least.

17. the recovery method of the coherent film of claim 11 record, wherein depositing jig having an adherent film is the sputter equipment depositing jig having an adherent film, and the coherent film that adheres on the depositing jig having an adherent film is an indium oxide.

18. the recovery method of the coherent film of claim 11 record wherein adopts water or liquid after the Separation of Solid and Liquid, by the liquid gunite, and the coherent film that adheres on the peel separation depositing jig having an adherent film.

19. the recovery method of the coherent film of claim 11 record, wherein depositing jig having an adherent film is to be made by stainless steel, titanium, copper or iron-nickel alloy, and the surface that is attached with the depositing jig having an adherent film of coherent film at least is processed to 3 microns to 5 microns rugosity.

20. the recovery method of the coherent film of claim 11 record, wherein depositing jig having an adherent film is made of aluminum, and aluminium spraying plating processing has been carried out on the surface that is attached with the depositing jig having an adherent film of coherent film at least.

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