TW531452B - Adherent film recovering device and method of recovering adherent film - Google Patents

Abstract

An adherent film recovering device of the present invention includes a water-jet cleaning gun 51 for spraying water-jet with hydraulic pressure within a range of 30 MPa to 200 MPa against a depositing jig 25 having an adherent film adhered thereto, placed on a table 26 in a work room 22; and an exhaust fan 62 for use in setting the work room 22 to have negative room pressure, wherein the work room 22 is sealed so as to prevent droplets resulting from the water-jet as sprayed from sputtering outside of the work room 22. With the foregoing device, it is economically viable to recycle the adherent film made of metal or metal compound as recovered from the depositing jig, and at the same time, the depositing jig can be less ground, thereby suppressing the production of waste. Moreover, the target adherent film pieces resulting from the water-jet can be made larger in size, and it is therefore possible to surely recover the adherent film pieces in a simpler manner at lower cost. As a result, the recycling use of the adherent film can be expedited.

Description

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The present invention relates to a method for preventing metal from adhering to the device by a sputtering method and an electronic device, and recovering the metal or the metal. In recent years, a large number of machines, especially information-related core parts, can be exemplified by vacuum film formation using plating methods such as semi-batteries, semiconductor devices, and other electronic devices. Rare metals are used. The invention of the invention J: Or a kind of film recovery device and film deposition method vacuum vacuum plating method, ion plating method, CVD method or a thin film of a metal compound vacuum film forming device, shield, mask, substrate bracket, etc. The increase in the number of electronic devices in the society continues to change due to the background and large amount of waste produced by the film-forming tool metal compounds. Nuclear conductors of the above-mentioned electronic devices, flat display panels of liquid crystal panels, the sun, memory, and the like. It is produced by a vacuum film-forming device using sputtering, vacuum evaporation, and ionization. It is often used as a film-forming material. ^ Rare metals, especially indium, or rare metals such as buttons are used as film-forming materials. Depletion of resources is a problem. In order to alleviate the above-mentioned problems, one is seeking a method that can suppress the amount of waste in the conventional production phase or the use phase, and establish the recovery and treatment technology of the rare metals mentioned above. Here, the so-called rare metals can be inferred from the order of the burial amount from inferior to inferior, such as: indium (In) &lt; chain (Re) <button (Ta) <gold (Au) <platinum (pt) <Shixi (Se) <Plant (Cs) <Gallium (Ga) <Bi (Bi) <Mercury (Hg) &lt; Silver (eight §). Generally, in the aforementioned vacuum film forming method, in order to prevent the film from being formed on a substrate other than the substrate, for example, a thick film is attached to a vacuum container other than the substrate. -5- This paper size applies to China National Standard (CNS) A4 specifications ( 210 X 297 mm) 531452 A7 B7 V. Description of the invention (2 A peeled protective plate, a mask used to form a film at a specific place on a substrate (wafer), a substrate holder used to transport the substrate, etc. (general name These are referred to as film-forming tools (zero-film-forming tools), and there are also adhered films having the same composition, or about the same composition, as the films. Then, these film-forming tools are used repeatedly, so they are attached to The adhesion film of the film forming tool is thicker than the thin film formed on the substrate. If the adhesion film is thickened to a certain extent, it will be subject to the internal stress of the adhesion film or repeated thermal history, and the film will be formed from the film. The tool becomes a small film and peels off, and it is attached to the substrate to cause local film defects (this is generally referred to as particulate contamination). Therefore, the film-forming tool is an attached film that does not cause particulate contamination. Film thickness range, money The film is removed from the vacuum film forming device, and the so-called film cleaning tool is used to remove the adhered film and used for surface finishing for reuse. Here's a step-by-step detailed description of the film forming tool and film formation in vacuum. The film-forming tools used in the device are maintained in a vacuum state. The material is a metal material with little gas adsorption and easy to release gas. Even non-steel (SUS), Ni42Fe58 (42 alloy) nickel and alloy are used. , Aluminum, titanium, steel, etc. Furthermore, in the film-forming tool, 'to increase the cleaning interval of the film-forming tool to increase adhesion,-|' implement surface roughness finishing. For example, to implement in iron-based materials The surface roughness of several μπ ^ is finished. The surface treatment of Yu Ming is based on the fused spray film, and the surface roughness of dozens of _ is implemented. Also, the copper-based copper sheet is embossed. Kaiwei implements surface roughness. In the past, this film-forming tool was cleaned using so-called sand particles. For example, the oxide particles or carbonized particles on the right collided with -6-531452 A7.

The adhesion film of the film-forming tool is peeled and removed by the impact force at this time to implement the so-called sandblasting method, and part of it is a wet etching method using an acid. Japanese Patent Application Laid-Open No. n-198344 (published on July 27, 1999) discloses a method for removing an adhesive or an adhesive tape attached to a screen by damaging an abrasive material. Then, these conventional treatment methods discharge a large amount of sandblasting scraps or waste acid liquid. The content or concentration of the attachment sheet from the adhesion film contained in the sandblasting scraps or waste acid solution, for example, 〇 ·; [~ 5 重量 〇 /. Right and left, the waste acid solution in the etching is as small as about 0.2 to 1.1 g / 1 (103 cm3). Therefore, the conventional treatment methods are such that the attached film is low in content or concentration and cannot be economically (costly) recovered. Therefore, the attached film from the attached film cannot be recovered and treated as waste. From this point on, it is desirable to have a low-cost and low-cost treatment method that can replace these conventional treatment methods. Further, it is desirable to regenerate the removed adherent film. In particular, in the case of indium or buttons containing rare metals, it is important to use the rare metals effectively. IT〇 (Indium Tin Oxide) is a kind of visible light with high transmittance (high transparency) and small resistance (specific resistance). It is easy to pattern by photoetching, so transparent conductive films are widely used. Pixel electrodes or counter electrodes on liquid crystal panels, PDP or organic or inorganic el electrodes, electromagnetic wave filters for PDPs, touch panels, solar cells, etc. However, the indium contained in IT0 is a metal known as a rare metal with a small amount of burial. In addition, liquid crystal panels produced in China alone account for more than 40% of the world ’s use. At an annual rate of 16 The increase of a high growth rate of about% makes this paper scale applicable to the Chinese National Standard (CNS) A4 specification (21 × X 297 mm) 531452 A7 B7 V. Description of the invention (4 dosage, so the recovery and regeneration of indium can be described as extremely important. ITO For the thin film formation method, a vacuum film formation method such as a sputtering method, a vacuum evaporation method, and an ion electron microscope method is often used. For example, a transparent electrode made of ITO, such as a general liquid crystal display, is often formed by a sputtering method. The plating method is, for example, as shown in FIG. 6, and the estimated possible use amount of the target is about 30%. The amount of the target attached to the film-forming tool is estimated to be about half of this. About 15%. In terms of regeneration, the weight ratio is about 70%. The target system is returned to the manufacturer for regeneration, but other than that, it is currently unrecovered and regenerated. As can be seen from FIG. 6, if IT 0 is washed and recovered from the film-forming tool and regenerated, IT 0 can be substantially deleted. The amount of indium used is about half. For example, 'the ITO contained in the blasting scraps was dissolved with hydrochloric acid or nitric acid, and a number of processing methods have been proposed to recover the indium and regenerate. However, it has not been actually recovered. This is because of the blasting scraps or The ITO content of the etched waste acid solution is, for example, from 0 to 5% by weight at a sand blasting rate, and the etched waste acid solution is as small as 0.2 to 1 · 1 g / ι, which cannot be economically recovered. It is possible to develop a technology for cleaning and processing of low-quality shellfish film forming tools that can obtain recovered products with a high IT0 content rate, making it possible to recycle economically and to promote recycling. In the sandblasting method, during processing, It also crushed a part of the sand and the processing force b became smaller. &Amp;-Normally crushed and reduced sand particles or membranes were separated and removed by dust separation. At this time, the sandblasting debris of the amount of λ is discarded. It is troublesome to dispose of waste materials. Therefore, a treatment method with a small amount of waste is desired. Conventionally, a known method is to use a water jet device using a water system or a water jet device of abrasion type to remove dust, Coating film, cans-8- A7

Head tags, etc. But 'this temple removes ^ 4 the base material of dagger iron plates or cans is still hard, and the surface dust, coating film, cans and other foreign objects such as members wear a clean iron plate or cans Base material, * a &quot; A heat is used in the previous example of film cleaning tools. The film attached to the film-forming worker — + “The film of the attached film is generally high in hardness, and it is difficult to peel it by the conventional k + fire method of hydroponic method, which is relatively low in water pressure. The relatively simple method of ancient soil α mm 1 has been available, so it has not been studied for the use of tools for film cleaning. Guanji 'uses the water jet method without sufficient pretreatment of tap water, tap X All of the _ ions will become carbonate words and will come out of the high-pressure water generating device or the cleaning device. This is the original cause of the device failure, and it will cause the problem of corrosion caused by chlorine, which is not suitable for cleaning with film forming tools. In methods such as removing canned labels, the device used by A negative, high-pressure water directly touches the human body, and a simple fence is provided. The adhesive film will fly with the water and cannot effectively recover the attached film. Related from suspended water Various solid-liquid separation methods are known, such as precipitation, filtration, centrifugation, and membrane separation, and are used separately depending on the size of the suspended particles or the purpose of the treatment. However, the four known techniques are sandblasting. Or use acid The cleaning of the film-forming tools by the engraving method produces a large amount of sandblasting scraps or waste acid liquid, and the content rate of the adhered membranes contained in the sandblasting scraps or waste acid liquid is very small, which is difficult to recycle economically. Especially A film-forming tool having an attached film containing a rare metal, such as indium or tantalum, is very important to recover these rare metals for effective use (regeneration) when cleaning the tool, and it is difficult for the reasons mentioned above. -9- 531452

DESCRIPTION OF THE INVENTION The object of the present invention is to provide an adhesive film recovery device and an adhesive film recovery method that can suppress the occurrence of sandblasting debris or acid waste liquid, and easily recover the adhesion m, and can promote the regeneration of the above adhesion film. The adhesion film recovery device of the present invention is for recovering the adhesion film from a film-forming tool having an adhesion film placed on a holding table 'to achieve the above-mentioned feature, and has a pair of film formations for recovering the adhesion m. Use a tool to blow out the water (liquid) spraying part. According to the above structure, the water jet flow section having a high-pressure water jet can improve the recovery rate of the adhesion film and improve workability. / 、 Wen Wang Also, with the above-mentioned structure, the grinding amount of the film-forming tool when the film-forming tool is washed> r can be reduced more than the conventional sandblasting method. Therefore, the number of uses of the film-forming tool, that is, the life can be extended. Eighth, with the above configuration, the water-jet method can be used to remove the adhesion film of the film-forming tool to form an adhesion film, and the adhesion film can be enlarged more than the conventional sandblasting method, so that the adhesion film can be Simple and reliable recycling ^: Low cost. Therefore, with the above configuration, the adhesion film can be promoted. In addition, in the method for recovering an adherent film of the present invention, in order to achieve the foregoing object, a vacuum film forming device such as a plating method, a vacuum evaporation method, an ion plating method, a DVD method, and the like, and peeling off a tamper-proof plate attached to the device ： ==, substrate carriage, etc. are used for masking the adhesive film of the Guwei to carry out mask uw script. The double-drawing material is: the peeling method of the adhesive film attached to the film forming tool ^ or the liquid liquid jet method. ",, using water -10-

This paper is suitable for fiscal countries i ^ _ (CNS) Α4 size (21G χ 297 public love) 531452

If the above method is used, it can reduce the use of long-term film formation, and form a sheet on the film, so it can be localized. The invention is clear and white. Method, ® The peeling method of the adhesive film attached to the film forming tool is sprayed with water or a liquid liquid jet method, & compared with the conventional sandblasting method, the grinding amount (abrasion amount) of the film forming tool is washed , Can extend the number of times the tool is used. According to the method described above, the film attached to the film-forming tool can be removed by the water jet method. The adhesion film can be enlarged more than the conventional sandblasting method, and the recovery of the adhesion film can be simplified and assured. With the above structure, the regeneration of the adhesion film can be promoted. The other features and price points are sufficient according to the description below. The benefits of the present invention can be referred to the following description of the attached drawing. Brief description of the figure Figure 1 is the recovery of the attached film as the first form of the present invention A schematic diagram of an important part of the device, an example of a water jet device thereof. Fig. 2 is a schematic diagram of an important part of an example of a water jet device as an attached film recovery device according to a second embodiment of the present invention. Fig. 3 is a cross-sectional view of a major part of a sputtering apparatus as an example of a vacuum film-forming apparatus when the film-forming tool used in the above-mentioned film-collecting apparatus for cleaning is used to form a film. Fig. 4 is a conventional example of an example of a sand blasting device for removing an adhered film, and a sectional view of an important part thereof. Fig. 5 is a sectional view of an important part of an example of a liquid crystal panel in which a thin film is formed by the vacuum film forming apparatus. FIG. 6 is a graph showing a detailed discharge example of the material in the above-mentioned plating apparatus. . __ _ 11 _

This paper is taken from the Chinese Standard (CN &amp; A4 Specification (21. X 297 Public Director) 531452 A7 — _________ B7 _ V. Description of the Invention (8) &quot; --- -----, Figure 7 is the implementation of the present invention An explanatory diagram of the method for recovering the adherent film in the first aspect, and using δ to explain the flow of the operation of the water jet device shown in Fig. 1. Fig. 8 shows the water ejection device for the adherent film recovery device according to the third embodiment of the present invention. Figure 9 is a schematic diagram of an important part of an example of a flow device. Fig. 9 is an explanatory diagram of a method for recovering an adherent film according to a third embodiment of the present invention, and is a flowchart for explaining the operation of the water jet device shown in Fig. 8. Fig. 10 The side view of the cross section of the important part of the cleaning and cleaning of the water jet device according to the present invention. Fig. 11 is an explanatory diagram showing the size or purity obtained by the water jet device recovered and compared with the sem of the attached membrane. Δ Specific examples of Er Ming include the following: The attached film recovery device and the recovered film recovery method of the present invention, which are implemented in various forms, if described in accordance with FIGS. 1 to 11 are as follows. First, the attached film recovery device and Film-forming workers used for recovery method of adhered film An attached film is formed in the vacuum film forming apparatus, so the ship measuring device as an example of the above-mentioned vacuum film forming apparatus will be described with reference to Fig. 3. As shown in Fig. 3, in the film forming chamber 11 of the sputtering apparatus 11, It is provided with a pipe A for supplying a discharge gas, and a pipe B connected to a vacuum exhaust device and evacuating the film forming chamber 丨 2. Inside the film forming chamber 12 is a target holding plate which is electrically separated from the film forming chamber 12 13 is provided with a target 14 and an anode plate 15 is provided on its periphery. A magnet 16 is disposed on the outside of the film forming chamber 12 so as to hold the target holding plate 13 and approach the target 14. The substrate 17 forming the thin film 17 It is installed in a substrate holder 18 which is electrically separated from the film forming chamber in a way opposite to the standard 14. The above-mentioned substrate holder-12- This paper size applies to China National Standard (CNS) A4 (210 X 297) 531 452 A7 B7 V. Description of the invention (The frame 18 is installed in the film forming chamber 12 and it is detachable. It is arranged freely in front of the substrate 17 (the side opposite to the standard 14). A place where the substrate is not formed. In addition, the inner surface of the film formation chamber 12 and the anode plate 15 are marked. The side 14 can be detachably installed with a protective plate 20. Next, if the operation of the above-mentioned sputtering device 1 丨 is explained, first, a random gas such as argon is mixed from the pipe A, and oxygen or nitrogen is required as required. The discharge gas of the reactive rolling body is introduced into the film formation chamber 12, and the standard dry μ is used as the @ pole, and a high voltage is applied between the anode plates 15 to ionize the discharge gas. The ionized discharge gas collides with the target 14 and hit the target, so that the hit target is deposited in a thin film on the substrate 17 to form a film. At this time, the target is also attached to each member in the film forming chamber 12 other than the substrate 17 An adhesion film is formed. However, if the adhesion film is too thick, it will be peeled into dust (membrane) with the internal stress of the film or repeated thermal stress, and it will cause the defect of the film formed on the substrate 17, so it must be periodically Remove the attached film. To make this easy, a protective plate 20 is provided. The film-forming tools such as the substrate holder 18, the mask 19, and the protective plate 20 must be periodically used to remove the adhered adhesive film. First, in IT〇, the adhesive film is ⑽ μιη to 300 μίΏ After the thickness of the film is about 500 Å, after the metal of the button is thicker than the film thickness, the above-mentioned film forming X tool is washed from the device 卩 u 卩 and the film forming tool is washed. The cleaning of the tools for film formation has been conventionally performed by a method called sandblasting. FIG. 4 is an example of a cross-sectional view of an important part of a sandblasting device used in the sandblasting method. In the following, the structure and operation of the above-mentioned blasting device will be described. First,

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A robot arm 2 丨 is provided in the working chamber 22 formed by the protective wall, and a nozzle 23 is installed at the front end of the crying arm 21. The nozzle 23 is connected to a compression mixer 24 that mixes sand and air and ejects from the nozzle 23. The film forming tool 25 is arranged in the working chamber 22 so that the film attachment surface becomes the nozzle 23 side. The nozzle 23 is sequentially moved by the robot arm 21, and then compressed air and sand are sprayed onto the film forming tool 25 to adhere to the film. The attached film is peeled off by the impact force on the surface. The sand system uses particles of alumina or carbon carbide with high hardness, and the size is selected from the processing speed and finishing. ‘But’ generally uses a size of about 100 μm to 800 μm. A part of the sand on the film attachment surface of the impact film forming tool 25 will be crushed and become smaller, and the force of peeling the adhesion film will be reduced. Therefore, a commercially available dust collector 27 is introduced from below the opening table 26 to separate The dust collector 27 separates the sand of the same size as the original sand, the reduced sand, and the attached membrane. The former is returned to the compression mixer 24 for use, and the latter is discharged toward the arrow to become sandblasting debris. Therefore, in the above-mentioned conventional method, a large number of sandblasting chips are generated, and the content of the attached film is as small as 0. 5 to 5% by weight, and the separation of the two is economically difficult. Fig. 5 shows an example of a liquid crystal panel using an example of a substrate 17 which forms a thin film in the aforementioned vacuum film forming apparatus. The liquid crystal panel shown in the figure is provided with active elements such as TFT (Thin Film Transistor). In addition, the present invention is naturally applicable to TN (Twisted Nematic) liquid crystal panels, STN (Super

Duty LCD panels such as Twisted Nematic) LCD panels. Furthermore, it can be applied to inorganic EL panels, organic EL panels, PDPs, etc. other than liquid crystal panels. -14- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

Binding

Line 531452 A7 ______B7 V. Description of the invention (H) flat display panel, electromagnetic wave filter for PDP, touch film panel, etc. The above-mentioned liquid crystal panel is shown in FIG. 5, for example, a transparent glass substrate 3 1 a, 3 1 b having a thickness of 0.7 mm or 1.1 mm is passed along the periphery of the glass substrate 3 1 a, 3 1 b. A sealing material 32 arranged on the frontal edge is bonded together, and liquid crystal is filled in between to form a structure serving as a liquid crystal layer 33. The substrate 17 shown in Fig. 3 corresponds to the glass substrates 31a and 31b in Fig. 5. Polarizing plates 34 and 34 having a thickness of 0.2 to 0.4 mm are attached to the surfaces on the opposite sides of the liquid crystal layers 3 3 of the glass substrates 3 a and 3 1 b, respectively, via an adhesive. The thickness of the liquid crystal layer 33 (the distance between the glass substrates 31a and 31b) is generally 4 μm to 6 μm. The thicknesses of the glass substrates 31a and 31b, the polarizing plates 34 and 34, and the liquid crystal layer 33 should not be limited to the above-mentioned values. The surface of the glass substrate 3 1 a on the liquid crystal layer 3 3 side is a color filter 35 composed of organic substances as the main body, and the color filters 35 and the indium-containing transparent film are opposite to each other. The electrodes 37 and the alignment film 38 made of an organic substance are laminated in this order toward the liquid crystal layer 33. In addition, on the surface of the liquid crystal layer 33 side of the glass substrate 31b, a gate bus electrode 39, a target insulating film 40, a silicon semiconductor film 41 ', a source bus electrode 42, and a drain electrode 43 are sequentially formed. The day element electrode 44 'composed of an IT0 film is an alignment film 38 composed of an organic substance. The gate bus electrode 39, the source bus electrode 42, and the drain electrode 43 are composed of a thin film of a metal or a metal compound of any of niobium, aluminum, and titanium, and these are made of a transparent ITO thin film containing indium. The opposing electrode 37 and the day electrode 44 are formed into a thin film by a vacuum thin film formation method. Such a vacuum film formation method mainly uses a sputtering method. -15- 531452

Next, each example of the adhered film recovery device for cleaning film-forming tools in various forms according to the present invention is shown, and schematic diagrams of important parts are shown in FIG. 2 and FIG. 2. Hereinafter, it will be described with reference to FIGS. 1 and 2. In the water jet device of the adhesive film recovery device according to the first embodiment of the present invention, as shown in FIG. 1, a box-shaped work chamber formed by a table 26, which is a work table for cleaning operations, is covered from above. 22, the film forming tool 25 is carried on the above-mentioned table to be washed, and a door for carrying out is provided on the side. Furthermore, the above-mentioned working chamber 22 is used in a washing operation to prevent the droplets caused by the spray of water (liquid) from leaking to the outside, and it can be sealed and an inner wall is formed on a protective wall (preferably hydrophilic). ^ A multi-joint arm-shaped manipulator (moving part) 2 1 is installed in the working room 22, and a plurality of joints are provided on the multi-joint part of the above-mentioned manipulator 21 so as to hang down from the upper part (top surface) of the work room 22 Rotary joints are part of the high-pressure water piping. As a result, the robot arm 21 has a multi-joint arm shape and has a plurality of rotating joints, so it can carry high-pressure water while carrying the film-forming surface of the film-forming tool 25 that is the object to be washed (the object to be washed). The front end of the robot arm 21 is moved three-dimensionally in shape. A cleaning cylinder (water jet portion) 51 having a substantially cylindrical shape at the front end portion of the robot arm 21 is rotatably mounted coaxially with the front end portion of the arm and centered on the central axis of the cleaning barrel 51. The high-pressure water generating device (high-pressure liquid generating section) 52 for generating high-pressure water is connected to the cleaning gun 51 and close to the outside of the working chamber 22 by supplying high-pressure water through the robot arm 21. In the high-pressure water generating device 52 -16-

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Generally, those who can use the booster type use the pressure generated by the hydraulic unit on the secondary side, and then get the high-pressure water with the secondary side booster. The pressurized water production device 52 is connected to a pure water production device (liquid purification section%) for supplying water to the high-pressure water production device 52. The pure water production device 61 removes calcium ions or gas from tap water by ion exchange. The ions are separated by ^, and the above water is sent out. The multi-joint arm-shaped robot arm 21 is controlled by the swing playback mode (not shown, part), and is aligned with the shape of the film forming tool 25 for cleaning. And the rocking action is repeated in advance to clean the film-forming tool. Fig. 10 is a side view showing a cross section of an important part of an example of the cleaning 51. Only the cross section of the nozzle portion 69 is shown. The nozzle portion 69 is directed toward the front end. It is formed into a slightly cylindrical shape in order to become smaller, and is connected to the high-pressure water generating device 52 through the washing machine 51. For example, a plurality of the above-mentioned nozzle portions 69 are installed on the end face before the washing machine 51 (as opposed to washing The rotation axis of the cleaning unit 51 is on an orthogonal plane), and the center axes of the nozzle portions 69 are parallel to each other. One of the above-mentioned nozzle portions is provided on the coaxial (rotation axis) with the cleaning unit 51. The above each For example, 6 other than the nozzle part 69 are for washing On the front face of 51, the circumference of the imaginary circle centered on the rotation axis of the cleaning 51 is set to be adjacent to each other at equal intervals. The diameter of the imaginary circle is the hole diameter D relative to the opening of the nozzle tip of the nozzle portion 69, which is 200 times to 2500 times, more preferably 400 to 1500 times. In addition, each nozzle portion 69 on such an imaginary circle is centered on the rotation axis of the washing machine 5 丨Net grab 51 together, viewed from the front end side of the nozzle section 69_17_ This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) &quot; ----- 5. When the invention description (14), you can Rotate clockwise (direction E in the circle). Such a rotary drive system uses an air motor, a hydraulic motor, or a hydraulic motor, and the number of rotations is 500 rpm to 2000 rpm, and more preferably 1,000 rpm to 2〇 Within the range of 〇rpm. These nozzle portions 69 are suitable for the structure that normally sprays high-pressure water, for example, the inner wall surface of the nozzle portion 69 is a clock face finish, and the nozzle hole openings at the front end are two, In terms of wear resistance and workability, it can be embedded in sapphire or diamond Wafer (not shown) 0 Cleaning gun 5 1 The distance between the nozzle portion 69 and the film-forming tool 25 is adjusted to be within a range called a "impact zone", that is, L / D = 50 to 300. Here L is the distance between the front end portion of the nozzle portion 69 of the washing and scavenging 51 and the surface of the film forming tool 25, and D is the hole diameter of the nozzle front end opening of the above nozzle portion 69. ▲ Furthermore, these nozzle portions 69 are preferably mechanical The arm 21 is set to be slightly orthogonal to the central axis of each nozzle portion 69 with respect to the surface to be cleaned of the film forming tool 25. Further, if necessary, the central axis of each nozzle portion 69 may be relative to the The normal direction of the surface to be cleaned of the film tool 25 is inclined, for example, to 10. about. In this way, 'the south pressure water of each nozzle part rotating along the imaginary circle is inclined with respect to the adhesion film', and becomes a suspicious pulsed water which sequentially changes back and forth within a specific range with an impact force, In some cases, peeling of the adhesive film from the adhesive film can be made more efficient. Furthermore, when the "film forming X tool 25 has a relatively simple shape called a rough rectangle, each joint-arm-shaped robot arm 21 can be a cheap desired robot arm" control or a numerical control method. In addition, for example, using the χγ stage, instead of moving each nozzle portion 69, the film-forming worker 25 can be moved. -18- This paper is suitable for @China National Standard (CNS) Α4 size (21〇 x 297 mm) 531452 A7

The inner wall of the working room 22 is made of a hydrophilic material. It is installed on the top surface of the working room 2 2 _ spray for wetting the inner wall of the # room 2 2 = sprinkler (humidifying section) 59 . Or "The film-recovering device used in this way is a film-forming tool 25, and the film-adhering surface is used for cleaning and grabbing 5 1 side, and it is arranged on a table (holding table) 26 in the operating room 22, and a robot arm is used. 21 Moving and washing 51 in sequence and spraying high-pressure water on the film attachment surface, and using the impact force to peel off and remove the attached film. The film forming tool 25 is described later, and it can also be washed in advance with a mold. The film forming tool is cleaned in the state on the tool mounting table (support structure) 53. The film forming tool 25 or the cleaning tool mounting table 53 are omitted in the figure, but they are moved to the working room 22 by a trolley and a guide. The inner table 26 is moved, and the load is arranged at a specific position by a load. Fig. 1 A centrifugal separator (solid-liquid separation section) 57 is arranged below the table 26 with a large number of holes in a mesh shape. The centrifugal separator 57 is provided with · Bottom cylindrical fixed container 54 and bottomed cylindrical rotary container 56 which rotates coaxially and rotates at a high speed in the fixed container 54. A large number of holes are opened on the peripheral surface of the rotary container 56 To cover most of the above holes on the inner side of the rotating container 56 Install the filter material 5 5. The high-pressure water sprayed by the film forming tool 25 becomes a suspended water containing the attached film from the film forming tool 25. The above-mentioned suspended water is directly or transmitted to the inner wall surface of the working chamber 22. And the water sprayed from the sprayer or sprinkler 59 flows from the table 26 with many holes to the bottom at the same time, enters the rotating container 5 6 and is centrifuged by the centrifugal separator 5 7 to separate into an attached film. Sheet and drained water. -19- This paper size applies to China National Standard (CNS) A4 (21〇X 297mm) 531452 A7 B7

In addition, the above-mentioned suspended water or drained water may be water as a main component (0% by weight or more), and may also contain other liquid polymers for increasing, for example, rust inhibitors or grinding power. The centrifugal separator 57 may be a centrifugal sedimentation apparatus using a centrifugal sedimentation method. A drainage pipe 5 8 is provided on the bottom surface of the solid grain maker 5 4. The drain pipe 58 is connected to the high-pressure water generating device 52 through a pipe 77 (not shown) for adjusting the flow rate through a pipe 77, and the drain water generated by the centrifugal separation can be returned to the high-pressure water generating device 52. In this way, the drainage can be reused, so at least the amount of waste can be reduced, and the generation of waste can be completely avoided. In the second embodiment of the present invention, as shown in FIG. 2, instead of the centrifugal separator 57, the table 26 under the opening is provided in such a manner that it can accept the suspended water falling from the hole of the table. Bottom cylindrical sedimentation tank (solid-liquid separation section) 60. A drainage pipe 58 is provided at a specific height on the side of the sedimentation tank 60. The drainage from the drainage pipe 58 is returned to the high-pressure water generating device 52 via a pipe 77 through a water tank (not shown) for adjusting the flow rate. The piping knife from the drain pipe 58 shown in Figs. 1 and 2 is connected to a pure water production device 61 instead of the high-pressure water generating device 52 by a water tank (not shown) for adjusting the flow rate. FIG. 7 is a flowchart for explaining a method for recovering an adhesive film using the adhesive film recovery device shown in FIG. First, the film forming tool 25 is aligned and installed in a state where the trolley is located at the origin of the trolley in the operating room U, and the start switch of the control phase is turned on (step 1, hereinafter, the step is called $). Then, the door of the working room 22 will be opened (S2), the trolley will move along the guide rail (S3), and it will stop when it reaches the working position (S4).

531452 A7 _______ B7 5. The door of invention description (17) will be closed (S6). The stop position of the trolley is sensed by the limit switch ’but other methods are also possible. The rotary container 56 of the centrifugal separator 57 has a certain rotation speed before the centrifugal separation operation, and starts to operate before the door of the working chamber 22 is closed (S5). Also, an exhaust fan 62 is installed on the top surface of the working room 22, and at least the film forming tool is cleaned, and then it is operated only in the working room 22, but in a decompressed state (relative to the working room) The outside of 22 is in a negative pressure state), which can prevent droplets containing water or attached membranes from leaking from the operating room 22 to the surroundings due to high-pressure water spraying. Next, the valve of the sprinkler head 59 is opened to start water spraying (S7), and the high-pressure pump of the high-pressure water generating device 52 and the cleaning air motor are started, and the south-pressure water supply is started (S8). The spraying of water before the operation of the robot arm 21 is started is to wet the inner wall surface of the working chamber 22 in advance. The high-pressure water supply is started in advance. After the high-pressure water sprayed from the cleaning gun 51 has a constant flow rate, the operation is performed to obtain a stable cleaning condition for the film-forming tool. It is omitted in the figure, but the time from when the film-forming tool cleaning is started is set by a timer in advance. Then, if the inner wall surface of the working chamber 2 2 is wet, the flow velocity of the high-pressure water becomes constant, and the robot arm 2 1 moves in advance to the shape of each of the film forming tools 25 and moves like a swing to clean the film forming tools. (S9). If the film forming tool is cleaned, the high-pressure pump and the cleaning air motor are stopped, and then the high-pressure water supply is stopped (S 10). Then, the robot arm 21 returns to the origin of the robot arm (S 11), and stops spraying water from the sprinkler 59 (S 12). ‘, Then’ Open the door of the working room 22 (S 13), move it by removing the trolley from the working room 22 (S14), stop at the origin of the trolley (Si5), and close the door -21-

531452 A7 B7 V. Description of the invention (18) (S16), stop the rotating container% (si7) of the centrifuge 57, and a series of film forming tools have been washed (S 18). The above is explained based on the flowchart of FIG. 7. However, for example, the operation of the rotating container 56 of the centrifugal separator 57 starts. Before the door is opened, the performance of the high-pressure water generating device 52 is the start of water spray and the supply of high-pressure water. The starting sequence can also start in the same order. In the range where there is no obstacle in a series of operations, some changes can be made. The present invention is not limited by FIG. 7. A schematic diagram of an important part of an adhesive film recovery device according to a third embodiment of the present invention is shown in FIG. 8. In the above-mentioned adhesive film recovery device, a multi-joint arm-shaped robot arm 21 is provided in the working chamber 22 formed by the automatic door 68 and the protective wall. A washing grab 51 is installed at the front end of the robot arm 21, and a washing grab ^ It is connected to a high-pressure water generating device 52 pumped by three plungers, and further connected to a pure water production device 61. The robot arm 21 is a tool for cleaning and forming a film by repeatedly performing a swing motion in advance by a controller (not shown) of a swing heavy rose method. The exhaust fan 62 is mounted on the top surface of the working chamber 22. On the floor 65 of the working room 22, a guide rail 64 for moving the carriage 63 to be aligned with a specific position, and limit switches LSI and LS2 are provided. The rotary table 70, on which the film forming tool 25 is held and held on the trolley 63, is performed 90 'with the normal direction of the mounting surface of the σ car 63 as the rotation axis. Or 180 ° rotation. By providing such a rotary table 70, the moving range of the robot arm 21 can be set to be very narrow, and the cost can be reduced. Of course, the robot arm 21 can also be placed on the floor. A drainage opening 66 is provided on the floor 65 in the working room 22. Drain outlet 66 is straight -22- This paper size applies to China National Standard (CNS) Α4 size (210 X 297 public love) 531452

The j is connected to the sedimentation tank 60 by a pipe. The suspended inlet system flowing into the sedimentation tank 60 will settle in the sedimentation tank 60 to form a sedimentation layer 67, and the supernatant liquid is discharged from the drainage pipe 58. Fig. 9 is a flowchart illustrating a method for recovering an adhered film using the adhered film recovery device shown in Fig. 8. If the start switch of the control box is ON (S21), the exhaust fan 62 will start to operate (S22), the automatic door 68 will open (S23), the pressure pump will start to operate (S24), and the trolley 63 will move from the operating room 22 The inside moves to the outside of the working chamber 22 (S25), moves to the position where the limit switch LS1 is ON, stops and fixes, and enters a standby state (S26). Then, the film-forming tool 25 is mounted on a specific place of the trolley 63, for example, on the rotary table 70 (S27), and if the cleaning start switch (not shown) is ON (S28), the trolley 63 will face the working room 22 Move inside (S29), move to the position where the limit switch LS2 is turned on at the place where the film forming tool is cleaned in the working room 22, and stop and fix it (S30) 'The automatic door 68 will be closed (S31). Thereafter, in the state of the robot arm 2 1 at the origin position of the robot arm, the valve of the high-pressure water generating device 52 will be opened and the high-pressure pump will supply high-pressure water from the load, that is, from the south pressure pump to the washing 5 1 High-pressure water (S3 2) is sprayed from the washing machine 5. At about the same time, the washing machine air motor will be ON and the plural nozzles 69 provided in the washing machine 5 will start to rotate ( S33). Secondly, if the load of the south pressure pump starts, only when the first timer is set in advance, the meeting will act and send a time signal (S34). In this way, if the spray of high-pressure water is very son-in-law ', the robot arm 21 will perform a swinging motion and clean the film forming tool (S35). Then, unload the high-pressure pump and stop the jet of high-pressure water (S36), so that the cleaning is grabbed. -23- This paper size applies to China National Standard (CNS) A4 (210X297). 531452 A7

The air motor is 0FF (S37), the origin of the moving robot arm (S38). When the robotic arm 21 leaves the film-forming tool 25 from the trolley 63, or the safety of the operator is taken into consideration, so as not to be directed toward the high-speed automatic door 68, from the center of the film-forming tool 25: 2 to 22 The back side (opposite to the automatic door 68) is half-faced or I &quot; Mask 2 is washed with a tool, and then the pancreas forming tool 25 is rotated by 180 using a rotating table attached to the trolley 63. Or 90. (S39), wash the film-forming tools in sequence and repeat to the end (S3 2 to S40). The figure is simplified and described in the figure. However, the operation of the robot arm 21 for cleaning the finished tool is sometimes based on 90. The rotation or the shape of the film forming tool 25 (especially when it is not a target shape) is different from the previous operation. After washing with tools, the second timer will operate (S41), and the preset angle is set. The time when the water vapor disappears due to the droplets in the working room 22, the automatic door 68 will open (S42), the trolley 63 moves (S43), moves to the ON position of the limit switch LSI outside the working chamber 22, stops, fixes, and enters a standby state (S44). Here, until the washing of all the film forming tools is terminated ', the film forming tool 25 is removed (S45) and (S46), and the steps S27 to S45 are repeatedly performed. After all the film-forming tools have been cleaned, the control box's termination switch turns ON. If the end of the operation is indicated (S46), the high-pressure pump will stop (S47), and the trolley 63 moves to the working room 22 (S48). The limit switch LS2 in the working chamber 22 is stopped and fixed (S49), the automatic door 68 is opened and closed (S50), the exhaust fan 62 is turned off and stopped (S51), and the film-forming tool cleaning operation is completed. (S52) 〇-24- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) binding

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At the end of the operation, 'the trolley 63 is stored in the trolley 63 to prevent it from adhering to the trolley 6 µ' and is the periphery of the drying stage. As early as 3, the attachment film was scattered outside the working room 22. In the above, the recovery film of the attachment film from the film forming tool of the vacuum film forming apparatus was taken as an example, and the invention was extended into a gland. It is not limited to the above, for example, it can also be applied to thin films of metals or metal compounds such as indium or buttons contained in electronic equipment such as liquid panels discarded by Guangnai. [Example 1] 'Sus 43 ° used in a liquid crystal panel and a counter electrode + a ITO film forming sputtering device (Fig. 3) for the ITO for the private electrode. The thickness is limited to 20 ° The 5 mm thick substrate holder 18 is processed, and the film formation process is performed using a water jet device of the water method, that is, the adhered film recovery device of the present invention. Film-forming tool 25 ° Finishes the surface of the substrate holder 18 at a thickness of 3 μηι to 50 μχη to improve the adhesion of the adhesive film, but it is difficult to peel off in the vacuum film forming device, and even thicker adhesion The film is adhered. In order to suppress the occurrence of dust from the above-mentioned adhered film, the substrate holder 18 can be used to reduce the frequency of cleaning of the film-forming tool for the adhered film. Use a cleaning nozzle 5 1 with a plurality of nozzle portions 69 having a nozzle hole diameter of 1 mm or less. The distance between the cleaning nozzle 51 and the film forming tool 25 is adjusted to be 100 mm in the impact area, so that the water of high pressure water The pressure was changed within a range of 30 MPa to 200 MPa, and the ITO adhesion film removed from the substrate holder 18 was removed. The surface of the substrate bracket 18 was observed after the ITO adhesion film was removed and the surface curvature was evaluated. 0 -25- present Paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 531452

When the mouth opening is in the range of 0.1mm and the water pressure is as low as 30Mpa, the removal time of the attached film will be longer, but the water pressure is in the range of 30 Mpa ~ 200 MP: In the peeled and removed state, the surface condition of the substrate holder i8 was good. The tortoise curvature of the substrate holder 18 was also below the measurement limit. If workability is taken into consideration, a water pressure of 60 MPa ~ 200 is more preferable. After that, in order to remove the rust on the surface of the substrate holder 18, the surface is processed by sandblasting to perform ultrasonic cleaning and washing with jade, followed by drying in a short time. The grinding amount of the substrate holder 8 cleaned according to the present invention is about 2, which is smaller than the grinding amount of about 20 pm when the film forming tool is cleaned by the sandblasting method. The nozzle portion 69 is formed into a plurality, and the attachment surface of the attachment film of the film forming tool 25 is usually several cm wide. Therefore, in order to simplify the movement of the robot arm 21 and align the movement of the film forming tool 25 used Shape, and the number or arrangement of the nozzle portions 69 is selected. It is also possible to use a liquid containing a rust inhibitor such as hydrazine, polyscale acid, etc. as high-pressure water in the water used, and omit the surface finishing treatment to remove surface rust by sandblasting. The same applies to Examples 2 and 3. The thus obtained film forming tool 25 which has been cleaned by a sputtering apparatus and formed into a film forming tool 25, such as distortion, the amount of dust generated, or the occurrence of defects in the film formed on the substrate 7 are examined. The results are the same as those for cleaning tools by sand blasting, and it is known that there is no problem in practical use. Also, the case of recovering a case where the Shen Dian trough 60 (Fig. 2) is arranged under the water jet device and Shen Dian attaches the diaphragm is also studied. Results scattered from the sedimentation tank ^ -26-

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The paper size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 531452 A7 _____B7_ V. Description of the invention (23) Insufficient outside or Shen Dian time, about 64% of IT0 formed by the peeled off attached film The attached membrane can be recovered as a precipitate. The specific gravity of ΙΟ is as large as 7, so the spraying device or sprinkler 59 is used to disperse the 1-but attached film 60 out of the sedimentation tank 60 to guide the water flow to the sedimentation tank 60. The sedimentation tank 60 is designed to increase the precipitation time. Alternatively, the centrifugal separation method can be used to increase the recovery to about 100%. FIG. 11 shows the results of SEM (scanning electron microscope) measurement of the recovered ITO adhesion film. The recovered IT0 attachment film is shown in Figure 丨 i. The ratio is as large as several μm to tens of μηι, and it is a high-purity ITO adhesion film, which is used as a substrate holder for the film forming tool 25. Impurities other than iron and chromium contained in 31; 343 of 18 were hardly detected. As a result, the recovered I TO adhered film sheet can be easily implemented in the subsequent step of recovering and regenerating indium, which is excellent in economy. [Example 2] A 2 mm-thick protective sheet made of thin film sus 43 ° (Fig. 3-20) used in a thin-film sputtering device (Fig. 3-11) for forming a pixel electrode and a counter electrode for a liquid crystal panel. ), Using a water jet device of the water method, the film-forming tool was cleaned in the same manner as in Example i above. The adhesive film was removed by changing the water pressure in the range of 30 MPa to i20 MPa. It is thought that the pressure generated by water pressure is greater than the sand blasting method, which is about 90MPa ~ 120MPa, and the protective plate used is high-pressure water == deformation, and warpage can be seen. Therefore, this protective plate should be placed in a bracket-shaped metal container with the adhesive film side facing up (Figure 1, Figure 2).

531452 A7 B7 V. Description of the invention (24) Shi Xigang resin flowed back, and the side wall was made with poly donimide tape or inscription tape, and the silicone resin SHI_850A and SH-850B for molding were processed at a ratio of 1 to 1. Those who mix and defoam flow into a metal container and shape it along the opposite side (inner surface) from the film surface of the protective plate, and then harden it at room temperature to make a cleaning tool mounting table (Fig. 1, 53 of Fig. 2) ). In order to increase the hardness, it can also be hardened in an oven at a specific temperature below 150 ° C. Such a formed silicone resin body can be used as a cleaning tool mounting table by removing the adhesive tape. However, the cleaning tool mounting table composed of the above-mentioned Shi Xi S and the resin is highly flexible, and is suitable for water jets of water. The durability of the high-pressure water is relatively high. Further, the metal container 'closely in contact with the washing tool mounting table and held inside thereof has the effect of improving the strength of the washing tool mounting table. On this washing tool mounting table, the aforementioned protective plate is mounted on its inner surface by means of the upper surface of the washing tool mounting table and being elastically supported along the above upper surface, in a range of 30 MPa to 120 MPa in water pressure, The protective sheet was washed with a film forming tool under the same conditions as in Example 1. As a result, both the peeled and removed state of the adhesive film of the protective plate and the surface state of the protective plate after removal were good, and the protective plate of the film forming tool 25, which is the subject, was also good without deformation. Thereafter, the surface of the protective sheet was subjected to a surface finishing treatment by a sandblasting method, followed by ultrasonic washing and water washing finishing, and then dried in a short time. In the sputtering apparatus (Fig. 3), the above-mentioned protective plate was used to examine the amount of dust generated or the occurrence of film defects formed on the substrate 17. As a result, it was found that the same results as those obtained when the tool was cleaned by the sandblasting method were obtained, and good results in practical use were obtained. -28-U0X297 mm) 531452 A7 ------- B7___ 5. Description of the invention (%) The Shen Dian trough 60 was added under the water spray ^ IL and the Shen Dianzhi attached membrane was recovered. The results are the same as in Example 1, and are good results. [Example 3] The gate bus line (Fig. 5-9) of a liquid crystal panel was used in a sputtering device (Fig. 3) for forming a thin film of tantalum and a button compound (nitriding group), and was processed by aluminum spraying The mask made of aluminum was cleaned with a tool for film formation using the water jet device of the water system of the first embodiment. A cleaning nozzle 5 with a plurality of rotatable nozzle portions 69 was used, and the distance between the cleaning nozzle 51 and the film forming tool 25 was adjusted to several cm. The nozzle diameter of the nozzle portion 69 was 0.1 mm to 1.0 mm. Within this range, the adhesive film was removed by changing the water pressure. The condition of peeling and removal of the adhesive film and the amount of grinding of the mask base material were examined. First, when the water pressure is lowered to 50 MPa and the moving speed of the cleaning nozzle 51 is 2 m / min or more, a part of the adhesion film in the aluminum spray film of the mask remains without peeling off. When the water pressure was increased to around 200 MPa, it was found that the aluminum mask was also removed. In the range of water pressure of 60 MPa to 150 MPa, the amount of grinding for peeling off the adhesion film 'aluminum mask from the aluminum dissolution film was almost zero, and good results were obtained. The aluminum mask thus obtained was washed with water, refined, dried, and added with aluminum ejaculation, and was used in a base plating apparatus to investigate the occurrence of dust or the occurrence of thin film defects formed on the substrate 17. The results show that the system is the same as that for cleaning tools by sandblasting, and the film is also free of air pollution, which is actually a problem in actual use. Furthermore, a Shen Dian trough 60 is disposed below the convection device, and the adhered membrane is recovered. As a result, the proportion of the button reaches 16.6, so the recovery in the Shendian tank 60 is easy, -29-

531452 A7 _ -_ B7 V. Description of the invention (26) The precipitate is a mixture of about 70% of the button and about 30% of aluminum, and can be close to 100% of the high-recovery button attached film. The recovered membrane of the button is almost free of impurities other than aluminum, and the recovery and regeneration of tantalum metal in the subsequent steps are simple to implement and economical. The present invention adopts a water jet water method using pure water, instead of a normal water pressure of 10 MPa to 30 MPa, but a water pressure of 30 MPa or more, 200 MPa or less, and more preferably 60 MPa or more. ， 200 MPa or less can be cleaned with the tools for film formation, and it can be known that (1) the tools for film formation can be cleaned well; (2) the grinding amount of the tools for film formation after washing is less than that of the sandblasting method (3) Compared with the sand-blasting method of the adhered film of the metal or metal compound that was peeled off and separated, the ratio of the particle size of several μηι to several tens μμη is very large (that is, easy to recover). In addition, the present invention has found that the specific gravity of a metal or a metal compound is generally 2 or more, which is larger than water, and it can be easily recovered at a low cost and high purity by a solid-liquid separation method called a filtration method, a precipitation method, or a centrifugation method. / In addition, the combined water jet method and solid-liquid separation method have a very small amount of impurities other than water, and the metal recovery and regeneration processes in the subsequent steps are easy and cost-effective. In order to achieve the above-mentioned objective, the adhesive film recovery device of the present invention is to recover the adhesive film from the adhesive film recovery device for recovering the adhesive film from the film forming tool placed on the holding table and having the adhesive film. The film-forming tool has a water jet section capable of blowing a water jet. According to the above structure, f can reduce the amount of film forming tools compared with the conventional sand blasting method, and the amount of film forming tools can be reduced. Therefore, the number of film forming operations, that is, the life can be extended. ^ ^ -30- The paper size is suitable for SS Standards (CNS) A4 specifications (21Gχ 531452

▲ Progress' In the above configuration, the water-jet stream from the water-jetting unit can remove the adhesion film of the film-forming tool from the film-forming tool as the adhesion film, and the adhesion film can be larger than the sandblasting method known by f Therefore, it is possible to simplify and secure the recovery of the attached film sheet and reduce the cost. Therefore, in the above configuration, the regeneration of the above-mentioned adhesion film can be promoted. # In the above-mentioned attached film recovery device, it is preferable to provide a high-house water generating unit for generating high-pressure water in the water jetting unit in a manner of generating water pressure in a range of 30 MPa to 2000 MPa. According to the above structure, the water pressure of the high-pressure water is as high as 30 MPa ~ 200 Mpa, preferably 60 MPa ~ 200 MPa, so the recovery rate of the above-mentioned attached film can be improved. In the above-mentioned adhered film recovery device, it is preferable that a working chamber for storing the holding table can be provided in a hermetically sealed manner so that droplets generated by the water jet can be prevented from scattering to the outside. ° In the above-mentioned adhesive film recovery device, an exhaust fan set to a negative pressure in the working room should be provided. According to the above structure, since an exhaust fan set to a negative pressure in the working room is provided, it can prevent the easily attached adhesive film from leaking out of the working room, so the recovery rate of the attached film can be further improved, and the improvement can be improved. For operator safety. In the above-mentioned attached film recovery device, it is preferable to supply water for a water jet to the high-pressure water generating device, and at the same time, a pure water production section for purifying the water is provided. According to the above structure, since the water for the high-pressure water generating unit is purified by the pure water manufacturing department, the occurrence of a failure can be suppressed. This failure is caused by impurities such as calcium ions contained in the water in the high-pressure water generating unit being broken out into Calcium acid. In the above-mentioned adhesive film recovery device, it may be arranged on the holding table from below -31-

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The support member is elastically supported to form a guard. The production of π m Γ constitutes 'high pressure at the time of removal of water jets by attaching a supporting member even if it is used—for example, thick ΓΓ1!', That is, the above-mentioned supporting member is used to elastically support the film-forming 〃. The pressure of water is applied to the gland τ mesh L, χ. ^, Using tools, and the pressure is also dispersed by the supporting members elastically supporting the tools. From this, the pressure applied by the film-forming tool is also dispersed by the support member, and the deformation of the film-forming tool due to the pressure can be reduced. In the above-mentioned attached film recovery device, it is preferable that the holding table has a hole portion, and the eight portions of the hole can allow a suspended water containing an attached film sheet to be peeled off by a water jet from the tool for dropping the film; The solid-liquid separation section is used to separate the adhered membrane from the suspended water falling from the holding table. According to the above structure, since the holding table is provided with a hole portion, the hole portion can be a piece of suspended water containing an attached membrane sheet peeled off from the film forming tool by a water jet, and can be easily removed from the operation. The indoor suspension is large. In addition, the above-mentioned structure can easily separate the adhered membrane from the suspended water by providing a solid-liquid separation unit, so that the recovery of the adhered membrane can be improved. In the above-mentioned attached film recovery device, it is preferable to provide a pipe which can return the residual drainage of the separated and adhered membrane in the solid-liquid separation section to the high-pressure water generation section. In addition, in order to remove the adhered membranes all over, the wastewater after the solid-liquid separation is subjected to precise filtration, external filtration, reverse osmosis, and other membrane separations, and then returned to the high-pressure water generation unit. If according to the above structure, the comparison of the adhered film stripped and removed by water jet -32-This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm)

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Line 531452 A7 ---------- B7 V. Description of the invention (^ Shi ★ Therefore, the drainage after solid-liquid separation of precipitation treatment or centrifugal separation, the removal of the attached diaphragm is almost complete, so it is used There is almost no problem in the actual use of abrasion of water jets such as washing and spraying holes. Shikou, in the above-mentioned structure, even if the drainage is returned to the original place and used for the water jet machine, it is possible to repeatedly drain the water. '$ It can be recycled and reused, and it is possible to clean almost no waste film-forming tools. Because of the above-mentioned structure, ifc is used for water jets, which can further reduce costs and reduce environmental impact. In addition, in addition to the water jet stream, a humidifying section for moisturizing the inner wall surface of the working chamber should be provided in the above-mentioned adhesive film recovery device. The above-mentioned structure is adopted in accordance with the above-mentioned structure. The humidification of the mist device or sprinkler P will cause the high-pressure water of the Baizhi water jet method to be caught in the attached film, and the moon will owe it to the inner wall surface of the operating room. It can also prevent the attached film from being washed. Small attached membranes are dried and scattered by air Outdoors' and can improve the recovery rate of the attached film. In the above-mentioned attached film recovery device, a cleaning% for spouting water jets should be provided, and a water jet for improving the water jets from the washing room should be provided in the working room. The moving part in the direction is provided with a control part for controlling the moving part in the manner of swinging or numerically controlling the moving part. The right structure is installed on the moving part (the front end of the robot arm by cleaning) according to the above structure. In the special place (attachment film surface of the film forming tool), the film forming tool that automatically peels and removes the adhesion film by the control part with the above cleaning is cleaned, and the queen is efficiently operated, and It is easy to recycle the attached film from the attached film. -33- This paper size is applicable to the Chinese country @ (CNS) A4 specification (Mo tear) 531452 A7

Plating method, straight recovery method, in order to achieve the above-mentioned purpose, the use of extinguished direct air formation ;, ion money method, CVD method and other vacuum film forming methods, such as the use of protective plates, masks, substrate carriers, etc.中 2 相 附 # Adhesive film recovery method recovered on the adhesive film: It is characterized in that the peeling of the adhesive film attached to the film forming tool is a water jet method using water or liquid. : According to the above method, it is used in the peeling method of the adhesive film attached to the film forming tool:-using the water jet method of water or liquid, so the conventional sand blasting method can reduce the object to be washed, that is, the film forming tool The grinding amount (abrasion amount), and the number of times of use of the film forming tool, that is, the life-span-and in the above method, the film of the film forming tool can be removed by the water jet method as an attachment film, and, The adhesive film can be made larger than the conventional sandblasting method, so the recovery of the adhesive film can be simplified, assured, and reduced in cost. Therefore, in the above method, the regeneration of the adhesion film can be promoted. Moreover, the above method uses a water jet method using water or liquid, so that the attached film from the attached film can be economically regenerated at a low cost recovery, drainage can be regenerated, and waste is hardly come out. Become an environmentally friendly film-forming tool. In the above-mentioned recovery method, it is preferable to purify the tap water used in the water jet method in such a manner as to reduce at least the carbonic acid # 5 contained in the tap water. According to the above method, since at least one carbonate of water or liquid used in the water jet method can be reduced, the water jet method can reduce the trouble caused by the precipitation of the carbonate carbonate I and can be reliably recovered. In the above recovery method, the solid-liquid separation method is used to produce the paper from the water jet method. -34- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm).

Line 531452

The suspended water was separated and recovered from the attached cavity; η + 10 p team diaphragm. Among the above recovery methods, the solid-liquid separation method is preferably a centrifugal separation method or a precipitation method. According to the above method, the recovery of the attached film sheet by the solid-liquid knife separation method using the so-called centrifugal separation method or precipitation method can simplify and secure the recovery. In the above recovery method, the recovered attachment film is preferably a metal or a metallized mouthpiece. According to the above method, if the attached film is a metal or a metal compound, it is used for water or liquid of the water jet method, and the above-mentioned attached film is set to have a large specific gravity difference, so it can be obtained from the suspended water containing the above-mentioned attached film. It is easy to separate and recover the attached film. In the recovery method described above, the adhesion film attached to the film-forming tool may contain at least a rare metal such as indium, tantalum, or a compound thereof. In the recovery method described above, the 'film forming X tool is a film forming guard for a gadolinium device, and the adhesion film attached to the film forming tool may be indium tin oxide. According to the above method, since rare metals such as indium or buttons can be recovered at low cost, the regeneration of the aforementioned rare metals can be promoted. Therefore, in the above method, the depletion of resources of so-called rare metals can be reduced. In the above-mentioned recovery method, water or liquid after solid-liquid separation is used, and the adhesion film attached to the film-forming tool can be separated and separated by the water A machine method. According to the above method, water or liquid used in the water jet method can be reused, so the amount of waste to be washed by the film forming tool can be reduced, and the waste can be made zero. In the above recovery method, the film-forming tool is stainless steel, titanium, copper, or iron-nickel alloy, and at least the surface of the film-forming tool to which the film is adhered is preferably finished with a thickness of 3 μm to 50 μm. In the above recycling method, the film-forming tool is composed of aluminum, at least -35- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 531452

The surface of the film-forming guard to which the adhesive film is attached can also be processed by chain ejaculation. According to the above recovery method, stainless steel, titanium, copper, or iron-nickel alloys, or inscriptions have a small amount of gas adsorption and easy gas release. Therefore, they can be suitably used as a film forming tool for a vacuum film forming apparatus. Moreover, in the above-mentioned recovery method, the surface of steel, titanium, copper, or iron-nickel alloys or inscriptions is subjected to a rough finishing of 3 μm to 5 () ㈣, or a shot of energy can be extended to 1 Shangkai &gt; Adhesion of the adhesion film formed on the surface. For this reason, the above method can suppress the occurrence of dust (diaphragm) from the adhered film in the vacuum film forming apparatus, and can be suitably used as a film forming tool of the vacuum film forming apparatus. In addition, the above-mentioned method can reduce the grinding amount of the film-forming tool when the film-forming tool is cleaned, so that the adhered film formed by the film-forming tool used in the vacuum film-forming apparatus can be appropriately removed. The details of the invention are particularly clear; the specific implementation mode or embodiment of the member-in-structure is basically a person who discloses the technical content of the present invention, and is not limited to such specific examples and explained in a narrow sense. Within the spirit and scope of the patent application described below, various changes can be made and implemented. [Explanation of Symbols] 11 Sputtering Device (Vacuum Film Forming Device) 12 Film Forming Room 13 Target Holding Plate 14 Target 15 Anode Plate 16 Magnet-36- This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm) Staple

Line 531452 A7 B7 V. Description of the invention (33) 17 Substrate 18 Substrate holder 19 Mask 20 Protective plate 21 Robot arm (moving part) 22 Working chamber 23 Nozzle 24 Compression mixer 25 Film forming tool 26 Table (holding table) 27 Dust collector 31a &3; b glass substrate 32 sealing member 33 liquid crystal layer 34 polarizer 35 color transition device 37 counter electrode 38 alignment film 39 gate bus electrode 40 gate insulation film 41 silicon semiconductor film 42 source Bus electrode 43 Drain electrode 44 Pixel electrode -37- This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) 531452 A7 B7 V. Description of the invention (34) 51 Washing (liquid jet) Parts) 52 High-pressure water generating device (high-pressure liquid generating part) 53 Washing tool mounting table (supporting member) 54 Fixed container 55 Filter medium 56 Rotating container 57 Centrifugal separator (solid-liquid separation section) 58 Drain pipe 59 Sprayer or sprinkler (Humidification section) 60 Sedimentation tank (Solid-liquid separation section) 61 Pure water manufacturing equipment (Liquid hardcover section) 62 Exhaust fan 63 Trolley 64 Guide 65 Floor 66 Precipitation tank outlet 67 (solid-liquid separation unit) 68 automatic door 69 of the nozzle portion 70 rotates the table -38- sheet stapling present scale applies China National Standard (CNS) A4 size (210 X 297 mm) _

Claims (1)

531452 The scope of application for patent L Recycling clothes is for recovering the above-mentioned adhesion film from the mounting table with a tool for attaching pancreas to form the pancreas, which is characterized in that for recovering the above-mentioned adhesion film 'has the above-mentioned film-forming workers and blows out a liquid jet Of the liquid jet. 2. According to the scope of application patent No. 11M, the adhesion film can be recovered from chrome buckets of 30 MPa to 200 MPa, and the pressure of the Pa in China and China can generate liquid pressure to generate the high pressure for the liquid jet. High-pressure liquid production of liquids 3. According to the scope of the patent application, the attached film recovery device X can prevent flying beads caused by liquid jets from flying to the outside: a working room that can store the holding table can be set in a sealed manner. 4. According to the attached film recovery device in the scope of patent application No. 3, set the exhaust fan in the working chamber to a negative pressure. Λ 5. The attachment / recovery device according to item 3 of the scope of the patent application can supply liquid for the liquid jet to the high-pressure liquid generating part, and at the same time: a liquid purifying part for purifying the liquid. 6. The attached film recovery device according to item 3 of the scope of patent application, wherein a support member for elastically supporting the film-forming tool from below is disposed on the holding table. 7. The attached film recovery device according to item 3 of the scope of patent application Wherein, the holding table has a hole portion, which can drop the suspended liquid containing the adhered membrane stripped off by the liquid jet from the film-forming tool; and a solid-liquid separation portion is provided, which can be dropped from the holding table. The suspended liquid is separated and attached to the membrane. 8. The attached film recovery device according to item 7 of the scope of patent application, which is provided with -39- 531452 AB c D The scope of patent application Xiji tube 'It can return the residual liquid due to the solid-liquid separation part separating the attached membrane To the high-pressure liquid generation section. 9 · = Applied film recovery device No. 3 in the scope of patent application, in which a humidification part is provided to wet the inner wall surface of the working chamber, in addition to the liquid and the jet flow. 10 · According to the attached patent film recovery device No. 3, there is a cleaning device for discharging liquid jets; a moving part for changing the direction of liquid spraying from the cleaning tanks is provided in the working room; The control part for controlling the moving part is set by moving the moving part by a swing recovery method or a numerical control method. U.-A method for recovering an attached film, which is a protection used in a true and empty film forming apparatus used in vacuum forming using sputtering, direct space plating, ion plating, CVD, etc. The method for peeling and recovering the adhesion film of a film-forming tool such as a plate, a mask, and a substrate carriage is characterized in that the method for peeling the adhesion film attached to the film-forming tool is a liquid jet method using water or liquid. 12. The method for recovering an adherent film according to item n of the scope of the patent application, wherein the tap water used in the liquid jet method is purified by at least reducing the calcium carbonate contained in the tap water. 13. The method for recovering an adherent membrane according to the scope of application patent item No. 丨 or 12, wherein the suspended liquid produced by the liquid jet method is separated and recovered by a solid-liquid separation method. 14 · According to the recovery method of attached film according to item 13 of the scope of application for patent, τ prison liquid 40- This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) 531452 A8 B8 C8 The separation method is a centrifugation method or a precipitation method. 15. According to the method for attaching the film in item n of the application material, the attached film is a metal or a metal compound. ', ° 16. According to the method for attaching a film according to item u of the scope of the patent application, the film attached to the film-forming tool includes a small number of females and / or eight-hearted bamboos containing pancreatic compounds such as indium and buttons. Inch heart has metal or 17. According to item i i of the scope of patent application, the tool is used to form a film for a sputtering device, and the adhesion film is indium tin oxide. 18. The method for recovering the adhered film on the adhered film of the film-forming tool according to the water or liquid after solid-liquid separation according to the scope of application for patent application item 丨}, wherein the adhered film of the film-forming tool is adhered to the adhered film Recycling method, which uses the liquid jet method, peeling and separation. 19. The method for recovering the adhesive film according to item n of the patent application scope, wherein the forming tool is composed of non-recorded steel, steel, copper, or iron-nickel alloy. · At least the surface of the attached film forming film is finished to a thickness of μm to 50 μm. Among them, film forming 20. The method for recovering the adhered film according to item 丨 丨 of the patent application scope. The tool is composed of aluminum; at least the surface of the film forming tool to which the adhered film is adhered is processed by aluminum spraying. _ -41-^ Paper size suitable for S S home materials (CNS) A4 size (21G X 297 mm) ------- 1