CN112267099A - Method for cleaning surface of target material - Google Patents
Method for cleaning surface of target material Download PDFInfo
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- CN112267099A CN112267099A CN202011133191.0A CN202011133191A CN112267099A CN 112267099 A CN112267099 A CN 112267099A CN 202011133191 A CN202011133191 A CN 202011133191A CN 112267099 A CN112267099 A CN 112267099A
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- cleaning
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- target material
- ultrasonic vibration
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a cleaning method for the surface of a target, which comprises the following steps: and cleaning the surface of the target material with flowing water, wiping, and then sequentially carrying out ultrasonic vibration cleaning, jet cleaning, blowing and drying to obtain the cleaned target material. The method adopts a multi-stage cleaning process, and sequentially carries out flowing water cleaning, ultrasonic vibration cleaning and jet cleaning on the processed target material, so that the sputtering surface, the sand blasting fusion jetting area, the groove and other areas of the target material assembly can be cleaned, and the effects of completely removing dirt, oil, impurities and dust are achieved; the invention adopts a blowing and drying mode, and can be dried quickly, thereby avoiding the problem that the liquid is easy to form watermarks after being left for a long time; the invention does not use any organic solvent in the cleaning process, has low cleaning cost and generates less waste liquid.
Description
Technical Field
The invention belongs to the technical field of target preparation, and relates to a method for cleaning the surface of a target.
Background
With the rapid development of the semiconductor industry, the demand of coating materials as important materials for manufacturing semiconductor electronic devices is increasing. The target material is used as an important coating material and has wide application in the fields of integrated circuits, flat panel displays, solar energy, optical devices and the like, the main preparation method is a Physical Vapor Deposition (PVD) method, and the PVD method mainly comprises sputtering coating, vacuum evaporation, plasma coating and the like, wherein the most common method is the sputtering coating method.
In the sputtering coating process, the target material directly participates in sputtering, and if foreign matters such as oil stains, dust, granular impurities and the like are adhered to the surface of the target material, arc discharge is generated, so that a part of the target material is changed into a molten state and splash splashed in all directions is generated, the splash is adhered to a substrate or an already formed coating film, the coating quality is reduced, the product yield is reduced, and the production cost is increased. Therefore, the cleanliness of the target in the sputter coating process has important influences on the quality of the sputter coating, the qualification rate of products and the production cost. In order to ensure that the target has enough cleanliness in the production process, the target needs to be cleaned sufficiently.
Because the target is generally not used independently in the sputtering coating process, but in the form of a target assembly, the target assembly is generally composed of the target and a back plate, and therefore, the cleaning process can be carried out after the target assembly is assembled, and the cleanliness of the surface of the target is ensured. CN 108816929A discloses a cleaning method of a semi-finished tantalum thread in a tantalum target production process, which comprises the following steps: and (3) performing ultrasonic treatment on the tantalum threads for 3-10min, coating a cleaning agent on the surfaces, and then performing brushing, blow-drying and vacuum drying. The cleaning process is carried out in the manufacturing process of the target assembly, aims to improve the welding bonding rate of the target and the back plate, and does not relate to the cleaning of a target finished product and the cleaning of an area on the target finished product after sand blasting.
CN 110670083a discloses a method for cleaning a target, comprising the following steps: coating a cleaning agent on the surface of the target material, and then brushing; cleaning the cleaned target material by ultrasonic waves; and blowing the moisture on the surface of the target material subjected to ultrasonic cleaning by using inert gas, and then carrying out vacuum drying treatment to obtain the cleaned target material. The cleaning method is also carried out in the target production process, and how to clean the target after the target is machined is not related, the target also comprises a sand blasting fusion jetting area besides the sputtering surface after the target is machined, and the area has larger roughness and is different from the cleaning mode of a smooth sputtering surface.
In summary, for selecting the cleaning method of the target assembly finished product, it is necessary to select a reasonable operation step according to the actual structure of the target assembly, and the subsequent use of the target is not affected.
Disclosure of Invention
Aiming at the problems in the prior art, the invention aims to provide a method for cleaning the surface of a target, which is used for sequentially carrying out flowing water cleaning, ultrasonic vibration cleaning and jet cleaning on the processed target, can complete the overall cleaning of each surface of a finished target product, achieves the effects of completely removing dirt, oil, impurities and dust, and is beneficial to improving the coating quality in the subsequent sputtering process.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a cleaning method for the surface of a target, which comprises the following steps:
and cleaning the surface of the target material with flowing water, wiping, and then sequentially carrying out ultrasonic vibration cleaning, jet cleaning, blowing and drying to obtain the cleaned target material.
In the invention, the target material needs to be used for sputtering coating after being processed, however, the sputtering surface often has stains, the full cleaning effect is difficult to achieve after the cleaning by adopting the prior art, and the target material back plate needs to be subjected to sand blasting and meltallizing after being welded, so that the formed sand blasting and meltallizing area has high roughness and is easy to be attached with impurities such as dust, and the impurities are difficult to completely remove by adopting the common process; therefore, the invention adopts a multi-stage cleaning process, combines flowing water cleaning, ultrasonic cleaning and jet cleaning, enables all areas such as a sputtering surface, a sand blasting fusion jetting area, a groove and the like of the target material assembly to be cleaned, achieves the effects of completely removing dirt, oil, impurities and dust, and finally adopts a blowing and drying mode to blow and dry quickly, thereby avoiding the problem that the watermark is easily formed after the liquid is remained for a long time and realizing the surface cleaning of the target material at the finished product stage.
The following technical solutions are preferred technical solutions of the present invention, but not limited to the technical solutions provided by the present invention, and technical objects and advantageous effects of the present invention can be better achieved and achieved by the following technical solutions.
As a preferred embodiment of the present invention, the target material includes any one of a metal target material, an alloy target material or a ceramic target material, or a combination of at least two of them, and typical but non-limiting examples of the combination are: the combination of the metal target and the alloy target, the combination of the alloy target and the ceramic target, the combination of the metal target, the alloy target and the ceramic target and the like.
Preferably, the target surface comprises a target sputtering surface and a sand blasting meltdown area.
In a preferred embodiment of the present invention, the flowing water cleaning is to rinse the surface of the target with ultrapure water.
In the invention, the ultrapure water adopted in the running water cleaning stage is water with the resistivity of 18M omega cm, and almost no impurities are contained in the ultrapure water, so that impurities cannot be introduced into the target cleaning, and the washed dust particles and the like can be timely discharged along with the running water by adopting a running water method, so that the particles are prevented from being attached to the surface of the target again.
Preferably, the wiping is to wipe the sputtering surface, the sand blasting and meltallizing area, the sealing ring groove and the hole groove of the target by using a cleaning sponge.
Preferably, the cleaning sponge comprises a swabberlin sponge or a nanosponge.
In the invention, the cleaning is carried out simultaneously in the flowing water cleaning process, and for areas on the surface, such as stains which are difficult to remove, grooves and the like, in which water flow is difficult to directly flow out, the cleaning sponge is adopted for cleaning until the sponge used for cleaning has no stains, and then the cleaning is carried out by using ultrapure water, so that the wiped stains or foams generated by water are removed, and the flowing water cleaning and cleaning operations are completed.
As a preferable technical solution of the present invention, when the target is subjected to the running water cleaning and wiping, the target is placed on a placing table.
Preferably, the placing table is padded with a purifying cloth.
According to the invention, due to the fineness required by the target material, when the target material is cleaned and wiped on the placing table in running water, the cleaning cloth is required to be padded to prevent the back of the product from being scratched, the used cleaning cloth needs to be clean and free of black stains, and meanwhile, the target material is not suitable for being directly moved during wiping to prevent scratching.
As a preferred technical solution of the present invention, the ultrasonic vibration cleaning employs an ultrasonic device having a throwing function, preferably an ultrasonic device having a throwing bearing support.
In the invention, the ultrasonic equipment adopted during ultrasonic vibration cleaning is provided with the throwing component, otherwise, impurities vibrated by ultrasonic waves still adhere to the surface of the target material or impact the target material to cause the target material to have stains or scars.
Preferably, the medium for ultrasonic vibration cleaning is ultrapure water.
In a preferred embodiment of the present invention, the power of the ultrasonic vibration cleaning is 1500 to 2500W, for example, 1500W, 1560W, 1680W, 1800W, 1920W, 2040W, 2160W, 2280W, 2400W, 2460W, 2500W, etc., but the power is not limited to the above-mentioned values, and other values not listed in the above-mentioned range of values are also applicable.
Preferably, the ultrasonic vibration cleaning temperature is 15 to 25 ℃, for example, 15 ℃, 16 ℃, 18 ℃, 20 ℃, 22 ℃, 24 ℃ or 25 ℃, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
Preferably, the ultrasonic vibration cleaning time is 5-15 min, such as 5min, 6min, 8min, 10min, 12min, 14min or 15min, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
As the preferable technical scheme of the invention, the jet cleaning is to impact a sand blasting fusion jetting area by adopting a high-pressure water gun.
In the invention, a high-pressure water gun is adopted for spraying, and the strong impact force of the high-pressure water gun is utilized to ensure that sand blasting particles or dust attached to a sand blasting fusion spraying area can be impacted.
Preferably, the medium used by the high-pressure water gun is high-purity water.
Preferably, the high-pressure water gun has a jet pressure of 10 to 25MPa, for example, 10MPa, 12MPa, 14MPa, 16MPa, 18MPa, 20MPa, 22MPa or 25MPa, but the high-pressure water gun is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
Preferably, the time of the spray cleaning is 0.5 to 2min, such as 0.5min, 0.75min, 1min, 1.2min, 1.5min, 1.8min or 2min, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
As a preferred technical solution of the present invention, the purging and drying is performed by purging and drying the target with compressed gas.
In the invention, compressed gas is adopted for blowing and drying, and compared with vacuum drying, the advantages of the invention are as follows: the purging efficiency is high, the used time is short, and water stain marks cannot exist on the surface of the dried target material.
Preferably, the compressed gas comprises an inert gas and/or nitrogen.
Preferably, the pressure of the compressed gas is 0.1 to 0.3MPa, such as 0.1MPa, 0.15MPa, 0.2MPa, 0.25MPa or 0.3MPa, but not limited to the recited values, and other values not recited within the range of values are also applicable.
Preferably, the time for the purge drying is 3-5 min, such as 3min, 3.5min, 4min, 4.5min or 5min, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
As a preferable technical scheme of the invention, the target material is subjected to vacuum packaging after being cleaned.
Preferably, the vacuum is applied for not less than 10s, such as 10s, 15s, 20s, 25s, 30s, 40s, or 50s, and the like, but not limited to the recited values, and other values not recited in the range of values are also applicable.
As a preferred technical scheme of the invention, the method comprises the following steps:
(1) cleaning the surface of the target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting meltallizing area, the seal ring groove and the hole groove of the target material with cleaning sponge;
(2) performing ultrasonic vibration cleaning on the target material treated in the step (1) by adopting ultrasonic equipment with a throwing function, wherein the medium is ultrapure water, the ultrasonic vibration cleaning power is 1500-2500W, the temperature is 15-25 ℃, and the time is 5-15 min;
(3) spraying and cleaning the target material treated in the step (2) on a sand blasting spray area by using a high-pressure water gun, wherein the medium used by the high-pressure water gun is high-purity water, the pressure for spraying and cleaning is 10-25 MPa, and the time is 0.5-2 min;
(4) and (3) blowing and drying the target material treated in the step (3) by adopting compressed gas, wherein the compressed gas comprises inert gas and/or nitrogen, the pressure of the compressed gas is 0.1-0.3 MPa, and the blowing and drying time is 3-5 min, so that the cleaned target material is obtained.
Compared with the prior art, the invention has the following beneficial effects:
(1) the method adopts a multi-stage cleaning process, sequentially carries out flowing water cleaning, ultrasonic vibration cleaning and jet cleaning on the processed target material, so that all areas such as a sputtering surface, a sand blasting fusion jetting area, a groove and the like of the target material assembly can be cleaned, the effects of completely removing dirt, oil, impurities and dust are achieved, and the cleaning rate can reach more than 99.9%;
(2) the invention adopts a blowing and drying mode, and can be dried quickly, thereby avoiding the problem that the liquid is easy to form watermarks after being left for a long time;
(3) the invention does not use any organic solvent in the cleaning process, has low cleaning cost and generates less waste liquid.
Detailed Description
In order to better illustrate the present invention and facilitate the understanding of the technical solutions of the present invention, the present invention is further described in detail below. However, the following examples are only simple examples of the present invention and do not represent or limit the scope of the present invention, which is defined by the claims.
The specific embodiment of the invention provides a method for cleaning the surface of a target material, which comprises the following steps:
and cleaning the surface of the target material with flowing water, wiping, and then sequentially carrying out ultrasonic vibration cleaning, jet cleaning, blowing and drying to obtain the cleaned target material.
The following are typical but non-limiting examples of the invention:
example 1:
the embodiment provides a method for cleaning the surface of a target, which comprises the following steps:
(1) cleaning the surface of a titanium target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting meltallizing area, the seal ring groove and the hole groove of the target material with Wiskacrilin sponge;
(2) carrying out ultrasonic vibration cleaning on the titanium target material treated in the step (1) by adopting ultrasonic equipment with a polishing bearing bracket, wherein the medium is ultrapure water, the power of the ultrasonic vibration cleaning is 2160W, the temperature is 20 ℃, and the time is 10 min;
(3) spraying and cleaning the titanium target material treated in the step (2) on a sand blasting fusion jetting area by using a high-pressure water gun, wherein the medium of the high-pressure water gun is high-purity water, the spraying and cleaning pressure is 20MPa, and the time is 1 min;
(4) and (4) blowing and drying the titanium target material treated in the step (3) by adopting compressed argon, wherein the pressure of the compressed argon is 0.1MPa, and the blowing and drying time is 5min, so as to obtain the cleaned titanium target material, and then carrying out vacuum packaging.
Example 2:
the embodiment provides a method for cleaning the surface of a target, which comprises the following steps:
(1) cleaning and wiping the surface of the tantalum target material by flowing water, wherein the cleaning by flowing water is to wash the surface of the target material by adopting ultrapure water, and the wiping is to scrub the sputtering surface, the sand blasting and meltalling area, the seal ring groove and the hole groove of the target material by adopting Wiscolin sponge;
(2) carrying out ultrasonic vibration cleaning on the tantalum target material treated in the step (1) by adopting ultrasonic equipment with a throwing bearing support, wherein the medium is ultrapure water, the power of the ultrasonic vibration cleaning is 1500W, the temperature is 15 ℃, and the time is 15 min;
(3) spraying and cleaning the tantalum target material treated in the step (2) on a sand blasting fusion jetting area by using a high-pressure water gun, wherein the medium of the high-pressure water gun is high-purity water, the spraying and cleaning pressure is 15MPa, and the time is 1.5 min;
(4) and (4) blowing and drying the tantalum target material treated in the step (3) by adopting compressed argon, wherein the pressure of the compressed argon is 0.2MPa, and the blowing and drying time is 4min, so as to obtain the cleaned tantalum target material, and then carrying out vacuum packaging.
Example 3:
the embodiment provides a method for cleaning the surface of a target, which comprises the following steps:
(1) cleaning the surface of the copper alloy target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting and meltallizing area, the seal ring groove and the hole groove of the target material with nano sponge;
(2) carrying out ultrasonic vibration cleaning on the copper alloy target material treated in the step (1) by adopting ultrasonic equipment with a polishing bearing support, wherein the medium is ultrapure water, the ultrasonic vibration cleaning power is 2400W, the temperature is 25 ℃, and the time is 5 min;
(3) spraying and cleaning the copper alloy target treated in the step (2) on a sand blasting spray area by using a high-pressure water gun, wherein the medium of the high-pressure water gun is high-purity water, the spraying and cleaning pressure is 10MPa, and the time is 2 min;
(4) and (4) blowing and drying the copper alloy target material treated in the step (3) by adopting compressed nitrogen, wherein the pressure of the compressed nitrogen is 0.3MPa, and the blowing and drying time is 3min, so as to obtain the cleaned copper alloy target material, and then carrying out vacuum packaging.
Example 4:
the embodiment provides a method for cleaning the surface of a target, which comprises the following steps:
(1) cleaning the surface of an alumina target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting meltdown area, the seal ring groove and the hole groove of the target material with Wiscolecan sponge;
(2) carrying out ultrasonic vibration cleaning on the alumina target material treated in the step (1) by adopting ultrasonic equipment with a polishing bearing support, wherein the medium is ultrapure water, the ultrasonic vibration cleaning power is 1800W, the temperature is 18 ℃, and the time is 12 min;
(3) spraying and cleaning the aluminum oxide target material treated in the step (2) on a sand blasting fusion jetting area by using a high-pressure water gun, wherein the medium of the high-pressure water gun is high-purity water, the spraying and cleaning pressure is 18MPa, and the time is 1.2 min;
(4) and (4) blowing and drying the aluminum oxide target material treated in the step (3) by adopting compressed neon, wherein the pressure of the compressed neon is 0.15MPa, and the blowing and drying time is 4.5min, so as to obtain the cleaned aluminum oxide target material, and then carrying out vacuum packaging.
Example 5:
the embodiment provides a method for cleaning the surface of a target, which comprises the following steps:
(1) cleaning the surface of a titanium target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting and meltallizing area, the seal ring groove and the hole groove of the target material with nano sponge;
(2) carrying out ultrasonic vibration cleaning on the titanium target material treated in the step (1) by adopting ultrasonic equipment with a polishing bearing bracket, wherein the medium is ultrapure water, the power of the ultrasonic vibration cleaning is 2040W, the temperature is 22 ℃, and the time is 8 min;
(3) spraying and cleaning the titanium target material treated in the step (2) on a sand blasting fusion jetting area by using a high-pressure water gun, wherein the medium of the high-pressure water gun is high-purity water, the spraying and cleaning pressure is 25MPa, and the time is 0.5 min;
(4) and (4) blowing and drying the titanium target material treated in the step (3) by adopting compressed argon, wherein the pressure of the compressed argon is 0.25MPa, and the blowing and drying time is 3.5min, so as to obtain the cleaned titanium target material, and then carrying out vacuum packaging.
In examples 1 to 5, the target material finished product is cleaned by the method, after the cleaning is completed, the target material surface is clean, has no stain and watermark residue, and achieves the effects of completely removing dirt, oil, impurities and dust, and the cleaning rate can reach more than 99.9%.
Comparative example 1:
this comparative example provides a method of cleaning a target surface, which method is referenced to the method of example 1, except that: wiping is not carried out in the flowing water cleaning process in the step (1).
In the comparative example, when ultrapure water is used for running water cleaning, the ultrapure water is not wiped, the water flow effect is weak, only surface stains can be removed, the removal effect on impurity stains in structures such as grooves of the target assembly is weak, the cleaned target still has stains, and the cleaning rate is obviously reduced.
Comparative example 2:
this comparative example provides a method of cleaning a target surface, which method is referenced to the method of example 1, except that: and (4) adopting a vacuum drying mode.
In the comparative example, the target material is cleaned and then dried in vacuum, so that the drying speed is low, watermarks are easily remained on the surface of the target material, and the subsequent sputtering use of the target material is influenced.
By combining the embodiment and the comparative example, the method adopts a multi-stage cleaning process, and sequentially performs flowing water cleaning, ultrasonic vibration cleaning and jet cleaning on the processed target material, so that all areas such as the sputtering surface, the sand blasting and meltallizing area, the groove and the like of the target material assembly can be cleaned, the effects of completely removing dirt, oil, impurities and dust are achieved, and the cleaning rate can reach more than 99.9%; the invention adopts a blowing and drying mode, and can be dried quickly, thereby avoiding the problem that the liquid is easy to form watermarks after being left for a long time; the invention does not use any organic solvent in the cleaning process, has low cleaning cost and generates less waste liquid.
The applicant states that the present invention is illustrated in detail by the above examples, but the present invention is not limited to the above detailed methods, i.e. it is not meant that the present invention must rely on the above detailed methods for its implementation. It will be apparent to those skilled in the art that any modification, equivalent substitution of the process of the invention and addition of ancillary operations, selection of specific means, etc., of the present invention are within the scope and disclosure of the invention.
Claims (10)
1. A method for cleaning the surface of a target material is characterized by comprising the following steps:
and cleaning the surface of the target material with flowing water, wiping, and then sequentially carrying out ultrasonic vibration cleaning, jet cleaning, blowing and drying to obtain the cleaned target material.
2. The cleaning method according to claim 1, wherein the target comprises any one of a metal target, an alloy target or a ceramic target or a combination of at least two of the metal target, the alloy target and the ceramic target;
preferably, the target surface comprises a target sputtering surface and a sand blasting meltdown area.
3. The cleaning method according to claim 1 or 2, wherein the running water cleaning is a rinsing of the target surface with ultrapure water;
preferably, the wiping is to wipe the sputtering surface, the sand blasting and meltallizing area, the sealing ring groove and the hole groove of the target by using a cleaning sponge;
preferably, the cleaning sponge comprises a swabberlin sponge or a nanosponge.
4. The cleaning method according to any one of claims 1 to 3, wherein the target is placed on a placement table while the target is subjected to running water cleaning and wiping;
preferably, the placing table is padded with a purifying cloth.
5. The cleaning method according to any one of claims 1 to 4, wherein the ultrasonic vibration cleaning employs an ultrasonic device having a throwing function, preferably an ultrasonic device having a throwing bearing support;
preferably, the medium for ultrasonic vibration cleaning is ultrapure water.
6. The cleaning method according to any one of claims 1 to 5, wherein the power of the ultrasonic vibration cleaning is 1500 to 2500W;
preferably, the temperature of the ultrasonic vibration cleaning is 15-25 ℃;
preferably, the ultrasonic vibration cleaning time is 5-15 min.
7. The cleaning method according to any one of claims 1 to 6, wherein the jet cleaning is performed by impacting a sand blast fusion area with a high pressure water gun;
preferably, the medium used by the high-pressure water gun is high-purity water;
preferably, the injection pressure of the high-pressure water gun is 10-25 MPa;
preferably, the time of the jet cleaning is 0.5-2 min.
8. The cleaning method according to any one of claims 1 to 7, wherein the purge drying is performed by purge drying the target material with a compressed gas;
preferably, the compressed gas comprises an inert gas and/or nitrogen;
preferably, the pressure of the compressed gas is 0.1-0.3 MPa;
preferably, the time of blowing and drying is 3-5 min.
9. The cleaning method according to any one of claims 1 to 8, wherein vacuum packaging is performed after the target cleaning is completed;
preferably, the vacuum packaging is carried out for not less than 10 s.
10. The cleaning method according to any one of claims 1 to 9, wherein the method comprises the steps of:
(1) cleaning the surface of the target material with running water, wherein the cleaning with running water is to wash the surface of the target material with ultrapure water, and the cleaning is to scrub the sputtering surface, the sand blasting meltallizing area, the seal ring groove and the hole groove of the target material with cleaning sponge;
(2) performing ultrasonic vibration cleaning on the target material treated in the step (1) by adopting ultrasonic equipment with a throwing function, wherein the medium is ultrapure water, the ultrasonic vibration cleaning power is 1500-2500W, the temperature is 15-25 ℃, and the time is 5-15 min;
(3) spraying and cleaning the target material treated in the step (2) on a sand blasting spray area by using a high-pressure water gun, wherein the medium used by the high-pressure water gun is high-purity water, the pressure for spraying and cleaning is 10-25 MPa, and the time is 0.5-2 min;
(4) and (3) blowing and drying the target material treated in the step (3) by adopting compressed gas, wherein the compressed gas comprises inert gas and/or nitrogen, the pressure of the compressed gas is 0.1-0.3 MPa, and the blowing and drying time is 3-5 min, so that the cleaned target material is obtained.
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| CN202011133191.0A CN112267099A (en) | 2020-10-21 | 2020-10-21 | Method for cleaning surface of target material |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112959224A (en) * | 2021-02-03 | 2021-06-15 | 合肥江丰电子材料有限公司 | Method for preventing oxidation of target material after sand blasting |
| CN113173284A (en) * | 2021-04-26 | 2021-07-27 | 宁波江丰电子材料股份有限公司 | Management method of semi-finished target backboard |
| CN113369182A (en) * | 2021-04-21 | 2021-09-10 | 芜湖映日科技股份有限公司 | Seam cleaning method after target binding |
| CN113458036A (en) * | 2021-07-19 | 2021-10-01 | 宁波江丰电子材料股份有限公司 | Method for cleaning ceramic target |
| CN113458048A (en) * | 2021-07-05 | 2021-10-01 | 合肥江丰电子材料有限公司 | Cleaning method for surface of LCD target material |
| CN114887963A (en) * | 2022-04-29 | 2022-08-12 | 宁波江丰电子材料股份有限公司 | Method for cleaning titanium target material |
| CN115213530A (en) * | 2022-07-26 | 2022-10-21 | 华能国际电力股份有限公司 | Method and device for cleaning sand blowing between narrow-gap multilayer TIG welding layers |
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| CN111185659A (en) * | 2020-02-18 | 2020-05-22 | 宁波江丰电子材料股份有限公司 | Diffusion welding method for titanium target and back plate and prepared titanium target assembly |
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| CN111185659A (en) * | 2020-02-18 | 2020-05-22 | 宁波江丰电子材料股份有限公司 | Diffusion welding method for titanium target and back plate and prepared titanium target assembly |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112959224A (en) * | 2021-02-03 | 2021-06-15 | 合肥江丰电子材料有限公司 | Method for preventing oxidation of target material after sand blasting |
| CN113369182A (en) * | 2021-04-21 | 2021-09-10 | 芜湖映日科技股份有限公司 | Seam cleaning method after target binding |
| CN113173284A (en) * | 2021-04-26 | 2021-07-27 | 宁波江丰电子材料股份有限公司 | Management method of semi-finished target backboard |
| CN113458048A (en) * | 2021-07-05 | 2021-10-01 | 合肥江丰电子材料有限公司 | Cleaning method for surface of LCD target material |
| CN113458036A (en) * | 2021-07-19 | 2021-10-01 | 宁波江丰电子材料股份有限公司 | Method for cleaning ceramic target |
| CN114887963A (en) * | 2022-04-29 | 2022-08-12 | 宁波江丰电子材料股份有限公司 | Method for cleaning titanium target material |
| CN115213530A (en) * | 2022-07-26 | 2022-10-21 | 华能国际电力股份有限公司 | Method and device for cleaning sand blowing between narrow-gap multilayer TIG welding layers |
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