CN101205621B - Method for cleaning aluminium parts - Google Patents

Method for cleaning aluminium parts Download PDF

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CN101205621B
CN101205621B CN2006101655608A CN200610165560A CN101205621B CN 101205621 B CN101205621 B CN 101205621B CN 2006101655608 A CN2006101655608 A CN 2006101655608A CN 200610165560 A CN200610165560 A CN 200610165560A CN 101205621 B CN101205621 B CN 101205621B
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water
cleaning
aluminium parts
tai
ace
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CN101205621A (en
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朱哲渊
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Beijing North Microelectronics Co Ltd
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Beijing North Microelectronics Co Ltd
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Abstract

The invention provides a cleaning method of aluminium material components, which mainly comprising of: cleaning with ultra-pure water; wiping with organic solvent; immersing and wiping with solution composed of acetic acid, ammonium acetate and aluminium sulphate; and cleaning with ultra audible sound. In the cleaning flows, the steps of cleaning without the ultra-pure water are all required washing with the ultra-pure water. The invention is a fast and efficient cleaning method without damage for the surfaces of aluminium components without protective treatment in an etching machine. The invention can achieve that the surfaces of the aluminium material components without surface treatment can be cleaned; moreover, the invention has simple and convenient operation, and has small damage or no damage to the surfaces of the components.

Description

A kind of purging method of aluminium parts
Technical field
The present invention relates to a kind of purging method of part, relate in particular to the not purging method on the surface of surface treated aluminium parts of microelectronic technique process.
Background technology
In the semiconductor plasma etching apparatus; people only pay close attention to the cleaning of the inner surface treated piece surface of reaction chamber usually; and the surface that non-protection is handled for aluminium parts in the etching machine; in technological process not with reaction chamber in high-density; the contact of highly corrosive plasma body; trim as chamber and liner; usually the surface treatment of not carrying out; after secular use; pollutents such as local corrosion speckle or color fringe often appear; generally be because the sealing-ring degradation; fail in time to change or other factors, cause the leakage of highly corrosive gas and corrode with the aluminium alloy of airborne moisture to trim.In order to guarantee normally carrying out of technological process and stablizing of process results, also need this some is cleaned without crossing surface-treated part (mainly being that aluminum is made).And prior art does not also have a kind of good method that its realization is cleaned at present.
Summary of the invention
The purging method that the purpose of this invention is to provide a kind of aluminium parts can realize the surface of surface treated aluminium parts is not cleaned, and this method is easy and simple to handle, to little or zero damage of surface damage of part.
The objective of the invention is to be achieved through the following technical solutions:
A kind of purging method of aluminium parts may further comprise the steps:
A, usefulness organic solvent wiper element surface;
B, with comprising ammonium acetate CH 3COONH 4, acetic acid CH 3COOH and Tai-Ace S 150 Al 2(SO 4) 3H 2The soak time that O aqueous solution soaking part is set; The weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is:
Ammonium acetate 1%-5%
Acetic acid 1%-10%
Tai-Ace S 150 1%-8%
Water surplus;
C, part is put into ultrasonic tank, clean the ultrasonic cleaning time of setting, carry out ultrasonic cleaning.
Also comprise behind the described step B:
D, usefulness comprise the wiping time that the aqueous solution wiper element of hydrochloric acid HCl and hydrofluoric acid HF is set; Hydrochloric acid, hydrofluoric acid and water H 2The weight percent content of O is:
Hydrochloric acid 6%-8%
Hydrofluoric acid 1%-2%
Water surplus.
Described step B comprises:
Surface with the cleaning piece wiper element of the low roughness of the aqueous solution that is soaked with ammonium acetate, acetic acid and Tai-Ace S 150.
Before the described steps A, after the steps A, behind the step B, also comprise behind the step C and/or behind the step D:
With ultrapure water cleaning components surface; Specifically spray the spray time that piece surface is no less than setting, dry up the surface of part with clean high pressure gas with ultrapure water.
Described steps A comprises: use the organic solvent wiper element, come off until the impurity that does not have the band look; Described organic solvent is straight alcohol or pure acetone.
The weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is among the described step B:
Ammonium acetate 1%-2%
Acetic acid 5%-6%
Tai-Ace S 150 3%-4%
Water surplus.
Described step C comprises:
C1, the ultrasonic tank of part being put into ultrapure water were cleaned 20-40 minute with the 10-26KHz frequency, and the ultrapure water water temperature is 40-70 ℃, and ultrasonic energy density is less than 30 watts/gallon; And/or,
C2, part is put into deionized water ultrasonic tank to clean 20-30 minute than the 30-45KHz frequency, the deionized water water temperature is 40-70 ℃, ultrasonic energy density is less than 30 watts/gallon.
Described purging method is lined with non-dust cloth to prevent the water seal between part and ultrasonic tank supporting plate in carrying out the ultrasonic cleaning process.
Described method also comprises at last:
Part is toasted part dry processing under 80 ℃~120 ℃ environment.
As seen from the above technical solution provided by the invention, the purging method of a kind of aluminium parts of the present invention mainly comprises with the ultrapure water cleaning, with the organic solvent wiping, with solution soaking and wiping that acetic acid, ammonium acetate, Tai-Ace S 150 are formed, uses ultrasonic cleaning again.And in above cleaning process, all need the ultrapure water flushing in the step that non-ultrapure water cleans.Be a kind of not damaged, the purging method on the non-protection of aluminium parts is handled in the etching machine fast and effectively surface.Can realize the surface of surface treated aluminium parts is not cleaned, and this method is easy and simple to handle, to little or zero damage of surface damage of part.
Embodiment
The purging method of a kind of aluminium parts of the present invention; be a kind of not damaged, the purging method on the non-protection of aluminium parts is handled in the etching machine fast and effectively surface; mainly comprise with the ultrapure water cleaning, with the organic solvent wiping, with solution soaking and wiping that acetic acid, ammonium acetate, Tai-Ace S 150 are formed, use ultrasonic cleaning again.And in above cleaning process, all need the ultrapure water flushing in the step that non-ultrapure water cleans.
Use and of the present inventionly may further comprise the steps generally:
One, with organic solvent wiper element surface;
The purpose of this process is the organic impurity on aluminium parts surface.Adopt the organic solvent wiper element, come off until the impurity that does not have the band look; Available non-dust cloth (clean cleaning piece) dips in the organic solvent wiper element, does not have color until non-dust cloth.
With after the organic solvent wiping,, and dry up the surface of part with the high pressure gas (using nitrogen usually) of cleaning with ultrapure water (resistance greater than 18 Ω/cm, 25 ℃) flushing piece surface.
The organic solvent here is:
The electronic-grade straight alcohol
The electronic-grade pure acetone,
Or described straight alcohol and pure acetone are not less than the primary standard of SEMI standard.
Simultaneously, before cleaning with organic solvent, also comprise the spray time of setting with ultrapure water spray piece surface, the spray time of setting mainly is the requirement of removing the lower particulate pollutant of some adsorptivities of surface in order to satisfy, the spray time of the setting of general spray piece surface at least 5 minutes.Use clean high pressure gas (using nitrogen usually) to dry up the surface of part then, the concrete N2 rifle that has strainer (0.05-0.1 μ m) of using dries up the surface.
Two, use the aqueous solution soaking cleaning components surface of ammonium acetate, acetic acid and Tai-Ace S 150;
The purpose of this process is to remove the pollutent of piece surface.And suppress and prevent the dissolving of aluminium and aluminum alloy surface aluminium.The concrete soak time that adopts the H2O aqueous solution soaking part setting that comprises ammonium acetate CH3COONH4, acetic acid CH3COOH and Tai-Ace S 150 Al2 (SO4) 3; The purpose of the soak time of setting is in order fully to remove the pollutent of piece surface.Generally need to soak 5-10min.
The weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is:
Ammonium acetate 1%-5%
Acetic acid 1%-10%
Tai-Ace S 150 1%-8%
Water surplus;
The preferable weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is:
Ammonium acetate 1%-2%
Acetic acid 5%-6%
Tai-Ace S 150 3%-4%
Water surplus.
After immersion with the surface of cleaning piece wiper element of the low roughness of the aqueous solution that is soaked with ammonium acetate, acetic acid and Tai-Ace S 150.The cleaning piece of low roughness can be with dishcloth or non-dust cloth.
After wiping,, and dry up the surface of part with the high pressure gas (using nitrogen usually) of cleaning with ultrapure water (resistance greater than 18 Ω/cm, 25 ℃) flushing piece surface.
If also have the visible pollutent, can adopt the wiping time of the aqueous solution wiper element setting that comprises hydrochloric acid HCl and hydrofluoric acid HF through above-mentioned clean rear surface; The wiping time of setting is for the aqueous solution that prevents hydrochloric acid and hydrofluoric acid causes damage to piece surface, generally is short more good more, usually wiping 1-2min.
After wiping,, and dry up the surface of part with the high pressure gas (using nitrogen usually) of cleaning with ultrapure water (resistance greater than 18 Ω/cm, 25 ℃) flushing piece surface.
The weight percent content of hydrochloric acid and hydrofluoric acid water is:
Hydrochloric acid 6%-8%
Hydrofluoric acid 1%-2%
Water surplus.
Three, part is put into ultrasonic tank, clean the time of setting.
This process purpose is some remaining metallic particles of removing in the settling on reaction chamber aluminium parts surface.
Usually can be divided into low frequency and clean with high frequency and clean, it is that ultrasonic tank with part is put into ultrapure water was cleaned 20-40 minute with the 10-26KHz frequency that low frequency cleans, and the ultrapure water water temperature is 40-70 ℃, and ultrasonic energy density is less than 30 watts/gallon; High frequency clean be part is put into deionized water ultrasonic tank to clean 20-30 minute than the 30-45KHz frequency, the deionized water water temperature is 40-70 ℃, ultrasonic energy density is less than 30 watts/gallon.
In addition, in carrying out the ultrasonic cleaning process, between part and ultrasonic tank supporting plate, be lined with non-dust cloth to prevent the water seal.
After ultrasonic cleaning,, and dry up the surface of part with the high pressure gas (using nitrogen usually) of cleaning with ultrapure water (resistance greater than 18 Ω/cm, 25 ℃) flushing piece surface.
In addition, after carrying out the ultrasonic cleaning part, part need be dried processing under 80 ℃~120 ℃ environment usually.
Preferred embodiment of the present invention is:
Step 1, (the lower particulate pollutant of some adsorptivities of surface can be removed in the spray of resistance 〉=18 Ω/cm) aluminium parts surface at least 5 minutes, dries up the surface with the N2 rifle that has strainer (0.05-0.1 μ m) then at room temperature to use ultrapure water.
Step 2, use electronic-grade Virahol remove the organic impurity on aluminium parts surface, also can use as ethanol, acetone etc. if other organic solvent meets the requirements, but prerequisite are to cause the pollution once more of aluminium parts; Dry up again with the ultrapure water flushing, and with the N2 rifle.
Step 3, in the alum liquor of the acetic acid that contains the ammonium acetate of 1%-5%, 1%-10%, 1%-8%, soak 5-10min after, with roughness lower dishcloth or non-dust cloth wiping, wash with ultrapure water again.Wherein ammonium acetate and acetic acid form the pollutent that the tart inhibiting solution is removed aluminum alloy surface, and Tai-Ace S 150 can suppress and prevent the dissolving of aluminum alloy surface aluminium.Adopt this scavenging solution not only can effectively clean on the surface, particularly trim that the non-protection of aluminium parts handles, can not produce the problem that the surfaceness after the cleaning changes and influence sealing property.In the scavenging solution each component more suitably content be 1%-2% ammonium acetate, 5%-6% acetic acid, 3%-4% Tai-Ace S 150.
If step 4 also has the visible pollutent through above-mentioned clean rear surface, can adopt 6%-8% hydrochloric acid and 1%-2% hydrofluoric acid solution wiping 1-2min, and wash with ultrapure water
Step 5, put into ultrasonic tank and carry out oarse-grained removal with lower frequency (10-26KHz), ultrasonic 20-40 minute, the ultrapure water water temperature was 40-70 ℃, and ultrasonic energy density is lined with non-dust cloth to prevent the water seal less than 30 watts/gallon between part and the supporting plate.Time is not long, in order to avoid the infringement surface.
Step 6, part are put into ultrasonic tank and are carried out fine purifiation with upper frequency (30-45KHz), and ultrasonic 20-30 minute, 18,000,000 deionized water water temperatures were 40-70 ℃, and ultrasonic energy density is lined with non-dust cloth to prevent the water seal less than 30 watts/gallon between part and the supporting plate.Time is not long, in order to avoid the infringement surface.
Step 7, ultrapure water spray the aluminium parts surface, and dry up component surface, the non-dust cloth wiping with the N2 rifle that has strainer.
Step 8, oven dry, 80~120 degree, 1.5~2.5 hours.
In addition, the chemical liquids that is used in the purging method must meet the semicon industry standard, and its grade is minimum to be 1 grade.
The above; only for the preferable embodiment of the present invention, but protection scope of the present invention is not limited thereto, and anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.

Claims (8)

1. the purging method of an aluminium parts is characterized in that, may further comprise the steps:
A, usefulness organic solvent wiper element surface; Described organic solvent is straight alcohol or pure acetone;
B, used the aqueous solution soaking part that constitutes by ammonium acetate, acetic acid and Tai-Ace S 150 5-10 minute; The weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is:
Ammonium acetate 1%-5%
Acetic acid 1%-10%
Tai-Ace S 150 1%-8%
Water surplus;
C, part is put into ultrasonic tank, clean the ultrasonic cleaning time of setting, carry out ultrasonic cleaning, its step comprises:
C1, the ultrasonic tank of part being put into ultrapure water were cleaned 20-40 minute with the 10-26KHz frequency, and the ultrapure water water temperature is 40-70 ℃, and ultrasonic energy density is less than 30 watts/gallon; And/or,
C2, the ultrasonic tank of part being put into deionized water were cleaned 20-30 minute with the 30-45KHz frequency, and the deionized water water temperature is 40-70 ℃, and ultrasonic energy density is less than 30 watts/gallon;
Before the described steps A, after the steps A, also comprise behind the step B and behind the step C:
With ultrapure water cleaning components surface; Specifically spray the spray time that piece surface is no less than setting, dry up the surface of part with clean high pressure gas with ultrapure water.
2. the purging method of aluminium parts according to claim 1 is characterized in that, also comprises behind the described step C:
D, use the aqueous solution wiper element 1-2min that constitutes by hydrochloric acid and hydrofluoric acid; The weight percent content of hydrochloric acid, hydrofluoric acid and water is:
Hydrochloric acid 6%-8%
Hydrofluoric acid 1%-2%
Water surplus.
3. the purging method of aluminium parts according to claim 1 and 2 is characterized in that, described step B comprises:
Surface with the cleaning piece wiper element of the low roughness of the aqueous solution that is soaked with ammonium acetate, acetic acid and Tai-Ace S 150.
4. the purging method of aluminium parts according to claim 2 is characterized in that, also comprises behind the described step D:
With ultrapure water cleaning components surface; Specifically spray the spray time that piece surface is no less than setting, dry up the surface of part with clean high pressure gas with ultrapure water.
5. the purging method of aluminium parts according to claim 1 and 2 is characterized in that, described steps A comprises: use the organic solvent wiper element, come off until the impurity that does not have the band look.
6. the purging method of aluminium parts according to claim 1 and 2 is characterized in that, the weight percent content of ammonium acetate, acetic acid and Tai-Ace S 150 and water is among the described step B:
Ammonium acetate 1%-2%
Acetic acid 5%-6%
Tai-Ace S 150 3%-4%
Water surplus.
7. the purging method of aluminium parts according to claim 6 is characterized in that, is lined with non-dust cloth to prevent the water seal in carrying out the ultrasonic cleaning process between part and ultrasonic tank supporting plate.
8. the purging method of aluminium parts according to claim 1 and 2 is characterized in that, described method also comprises at last:
Part is toasted part dry processing under 80 ℃~120 ℃ environment.
CN2006101655608A 2006-12-21 2006-12-21 Method for cleaning aluminium parts Active CN101205621B (en)

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CN102886367B (en) * 2012-10-22 2015-03-11 哈尔滨工业大学 Cleaning method for precise aluminium alloy components
CN103849882B (en) * 2014-03-13 2016-03-09 江苏省轻工业科学研究设计院有限公司 A kind of electric bicycle controller aluminum hull treatment agent and preparation method thereof
CN108368539A (en) * 2015-09-10 2018-08-03 生命技术公司 Nucleic acid purification in environment or biological sample
CN105478946A (en) * 2015-12-28 2016-04-13 东莞市青麦田数码科技有限公司 Method for improving cleaning quality of aluminum alloy vacuum brazing part
CN105903710B (en) * 2016-05-11 2018-07-03 中国工程物理研究院激光聚变研究中心 A kind of clean treatment method of the copper of device of high power laser, aluminium element surface
CN105921453B (en) * 2016-05-11 2018-10-09 中国工程物理研究院激光聚变研究中心 A kind of clean treatment method on the large-size box surface of device of high power laser
CN105921454B (en) * 2016-05-11 2018-10-09 中国工程物理研究院激光聚变研究中心 A kind of clean treatment method on the stainless steel parts surface of device of high power laser
CN109341482A (en) * 2018-11-20 2019-02-15 中国航发贵州黎阳航空动力有限公司 A kind of measurement fanjet pressurized strut cylinder wall thickness tooling and its measurement method
CN114405918B (en) * 2022-01-12 2023-03-28 合肥微睿光电科技有限公司 Method for regenerating the liner of an etcher or PECVD apparatus

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JP2000355795A (en) * 1999-06-15 2000-12-26 Aisin Seiki Co Ltd Surface treatment of aluminum and aluminum alloy
CN1106864C (en) * 1998-06-19 2003-04-30 杨晓梅 Masseur

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1106864C (en) * 1998-06-19 2003-04-30 杨晓梅 Masseur
JP2000355795A (en) * 1999-06-15 2000-12-26 Aisin Seiki Co Ltd Surface treatment of aluminum and aluminum alloy

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Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No.

Patentee after: Beijing North China microelectronics equipment Co Ltd

Address before: 100016, building 2, block M5, No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District

Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing