CN121488622A - 基板处理装置及基板处理方法 - Google Patents

基板处理装置及基板处理方法

Info

Publication number
CN121488622A
CN121488622A CN202480045700.4A CN202480045700A CN121488622A CN 121488622 A CN121488622 A CN 121488622A CN 202480045700 A CN202480045700 A CN 202480045700A CN 121488622 A CN121488622 A CN 121488622A
Authority
CN
China
Prior art keywords
temperature
pressure
processing
fluid
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480045700.4A
Other languages
English (en)
Chinese (zh)
Inventor
山田浩平
枇杷聪
铃木启之
小川雅之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN121488622A publication Critical patent/CN121488622A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
CN202480045700.4A 2023-07-14 2024-07-01 基板处理装置及基板处理方法 Pending CN121488622A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023-116085 2023-07-14
JP2023116085 2023-07-14
PCT/JP2024/023748 WO2025018134A1 (ja) 2023-07-14 2024-07-01 基板処理装置及び基板処理方法

Publications (1)

Publication Number Publication Date
CN121488622A true CN121488622A (zh) 2026-02-06

Family

ID=94281431

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480045700.4A Pending CN121488622A (zh) 2023-07-14 2024-07-01 基板处理装置及基板处理方法

Country Status (5)

Country Link
JP (1) JPWO2025018134A1 (https=)
KR (1) KR20260038910A (https=)
CN (1) CN121488622A (https=)
TW (1) TW202510067A (https=)
WO (1) WO2025018134A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7109328B2 (ja) * 2018-09-26 2022-07-29 東京エレクトロン株式会社 基板処理システム
JP7493325B2 (ja) * 2019-11-25 2024-05-31 東京エレクトロン株式会社 基板処理装置
JP7353227B2 (ja) * 2020-03-30 2023-09-29 株式会社Screenホールディングス 基板処理方法
JP7529629B2 (ja) * 2021-07-26 2024-08-06 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP7775000B2 (ja) * 2021-09-07 2025-11-25 東京エレクトロン株式会社 基板処理装置および基板処理方法

Also Published As

Publication number Publication date
KR20260038910A (ko) 2026-03-19
TW202510067A (zh) 2025-03-01
WO2025018134A1 (ja) 2025-01-23
JPWO2025018134A1 (https=) 2025-01-23

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