CN1201382C - Ic卡制造装置 - Google Patents

Ic卡制造装置 Download PDF

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CN1201382C
CN1201382C CN02155844.2A CN02155844A CN1201382C CN 1201382 C CN1201382 C CN 1201382C CN 02155844 A CN02155844 A CN 02155844A CN 1201382 C CN1201382 C CN 1201382C
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clamping part
laminated substrate
degas chamber
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CN1416161A (zh
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窪田穗伸
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Nissei Plastic Industrial Co Ltd
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Abstract

一种IC卡制造装置,该装置具备叠层基材夹持部和脱气部,该叠层基材夹持部由上夹持部和下夹持部构成,该上夹持部和下夹持部从两侧面夹住并密封由一对层状片材夹着IC芯片等电子部件而形成的叠层基材,上述脱气部对该叠层基材夹持部的内部进行脱气处理,对夹着叠层基材进行脱气的叠层基材夹持部进行加热及加压来制造IC卡,其特征在于:还具备脱气机构部,该脱气机构部通过从上下夹住上述叠层基材夹持部,形成靠近上述上夹持部的上表面的上脱气室和靠近上述下夹持部的下表面的下脱气室,且利用上述脱气部对上述上脱气室和上述下脱气室进行脱气;上述脱气机构部中具备控制器,在对上述叠层基材夹持部的内部脱气的同时,该控制器控制上述上脱气室和上述的下脱气室的脱气的开始、以及从开始经过预定时间后,上述上脱气室和上述下脱气室的脱气的解除。

Description

IC卡制造装置
技术领域
本发明涉及一种在制造薄型非接触式IC卡时适用的IC卡制造装置。
背景技术
一般来说,内装有IC芯片的电子器件的IC卡已众所周知。因为IC卡的内部容纳了电子器件,所以卡表面需要制造成不会由电子器件产生的凹凸不平的感觉,这种制造方法以及装置在日本特许公告公报No.2(1990)-16234,日本公开特许公报No.6(1994)-176214,日本公开特许公报No.9(1997)-277766以及日本公开特许公报No.11(1999)-48660中都已披露。
然而,近年来,厚数百微米的柔性薄型非接触IC卡也得到实用,本申请的发明人在日本公开特许公报No.2000-182014中提出了适合于该种薄型非接触IC卡控制制造中使用的IC卡制造装置。该IC卡制造装置是先用一对薄片材(叠层材料)夹着IC芯片等的电子器件形成叠层基材,然后,热压该叠层基材来制造IC卡,具体地说,具备由从两侧面夹着叠层基材并密封的上夹持部和下夹持部构成的叠层基材夹持部和使该叠层基材夹持部的内部脱气的脱气部,依次由预热压紧部、加热压紧部和冷却压紧部处理夹持着叠层基材脱气后的支基材夹持部后制造出IC卡。
但是,上述IC卡制造装置仍然存在以下需要改进的方面。
即,如图3所示,虽然叠层基材M被夹紧在上夹持部2u的上加压板21u和下夹持部2d的下加压板21d之间,但因为脱气开始前的叠层基材的厚度比热压后的叠层基材M的厚,而且,存在于叠层基材M外侧的叠层基材夹持部2的密封件(内密封件)12的厚度(高度)与热压后的叠层基材M的厚度吻合,所以因脱气开始,叠层基材夹持部上的位于叠层基材M外侧的部位变成比位于叠层基材M的内侧处的部位窄的状态,结果,叠屋基材M的外侧因受到比内侧更大的压力作用而成为密封的状态(参照图7)。因此,即使继续进行脱气处理,由于叠层基材M的内部空气被封闭住,导致不能可靠地时叠层基材进行脱气处理。
发明内容
本发明的目的在于提供一种能够充分可靠地对叠层基材进行脱气处理,进一步提高IC卡的品质及均质性的IC卡制造装置。
本发明的另一目的在于提供一种通过兼用多个机构,实现降低成本、缩小体积的IC卡制造装置。
为了完成该目的,本发明提供一种IC卡制造装置,该装置具备叠层基材夹持部和脱气部,该叠层基材夹持部由上夹持部和下夹持部构成,该上夹持部和下夹持部从两侧面夹住并密封由一对层状片材夹着IC芯片等电子部件而形成的叠层基材,上述脱气部对该叠层基材夹持部的内部进行脱气处理,对夹着叠层基材进行脱气的叠层基材夹持部进行加热及加压来制造IC卡,其特征在于:还具备脱气机构部,该脱气机构部通过从上下夹住上述叠层基材夹持部,形成靠近上述上夹持部的上表面的上脱气室和靠近上述下夹持部的下表面的下脱气室,且利用上述脱气部对上述上脱气室和上述下脱气室进行脱气;上述脱气机构部中具备控制器,在对上述叠层基材夹持部的内部脱气的同时,该控制器控制上述上脱气室和上述的下脱气室的脱气的开始、以及从开始经过预定时间后,上述上脱气室和上述下脱气室的脱气的解除。此时,该脱气机构部能够设置在对叠层基材夹持部进行预热处理的预热部上。
附图说明
图1是展示本发明的优选实施例的IC卡制造装置中的预热部的要部的部分剖视图;
图2是使用该制造装置的IC卡制造方法中的脱气工序的处理顺序的流程图;
图3是展示该制造装置的热施压部的要部的部分剖视图;
图4是展示该制造装置的热施压部的部分剖视图;
图5是展示该制造装置的叠层基材夹持部的平面图;
图6是该制造装置的要部和制得的IC卡的示意纵剖面图;
图7是用来说明该制造装置的动作的要部的示意纵剖面图;
图8是用来说明该制造装置的动作的要部的示意纵剖面图。
具体实施方式
下面,参照附图详细说明本发明的优选实施例。说明书附图并非为了限定本发明,而是为了便于理解本发明。对于公知部分,为避免不简明,省略了详细的说明。
首先,参照附图1-图6说明本实施例的制造装置1的构成。
制造装置1具备:制造装置本体20、和与该制造装置本体分体地构成的叠层基材夹持部2。叠层基材夹持部2,如图1及图3所示,具有上夹持部2u和下夹持部2d,因上夹持部2u重叠在下夹持部2d上,从而成为内部密封的叠层基材夹持部2。
上夹持部2u具有上加压板21u和比该上加压板21u大的、呈矩形框架的上支架22u,两者通过与上加压板21制成一体的多个矩形连接片联接起来。在此情况下,各连接片23u如图5所示分别从上加压板21u上的相对的一对端边缘向外突出,沿该端边缘按一定间隔设置,且各连接片23u制成弯曲状。连接片23u全部或者一部分用螺钉24u拧紧到上支架22u上。通过拧紧,就能够吸收加热造成的上加压板21u的变形。
上加压板21u使用在叠层基材M受压时于薄层件La未软化的状态下对应薄层件La的变形作弹性变形,而在薄层件软化的状态下弹性复原的一定厚度的弹性板,最好是,使用厚度为1(mm)左右的不锈钢板。当然,上加压板21u还可以使用其它的弹性金属板或具有耐热性的非铁材料,例如聚酰亚胺等的弹性合成树脂板。
另一方面,下夹持部2d基本上与上夹持部2u一样地形成的。在下夹持部2d上,21d、22d、23d分别表示下加压板,下支架,和多个连接片。内密封件12沿周缘固定在下加压板21d的上面。此时,内密封件12的厚度(高度)与热压后的叠层基材M的厚度相吻合。
此外,如图1(图5)所示,在上加压板21u上设计有脱气口26I,该脱气口26I经通气管28I与脱气部(真空泵等)3连接,通气管28I的中间连接有电磁开关阀27I。通过管道的连接,可以对叠层基材夹持部2的内部Ri进行脱气。也可用电在三通切换阀代替电磁开关阀27I连接到通气管上,从脱气口26I向叠层基材夹持部2的内部供给空气。在上支架22u和下支架22d的规定位置上设置着将两者重叠时对两者进行定位的图未示出的定位机构。
此外,制造装置本体20具备预热部Ua(图1),热施压部Ub(图3及图4)及冷却部(图未示出)。
如图4所示,热施压部Ub具备配置在上方的固定压盘31u和配置在下方的可动压盘31d。固定压盘31u具备压盘本体部32u,该压盘本体部32u如图3所示,将前端为压紧面的热盘33u、绝热部34u以及支持盘35u依次重叠而构成的,经固定螺钉36u的作用而与一体。该压盘本体32u与后述的下侧的压盘本体32d不同,被直接安装在固定着的图未示出的太盘基座上。在此情况下,热盘33u上内装了多个加热用棒状加热器37u。在热盘33u的下表面上粘接着一定厚度的、用橡胶等弹性材料形成的缓冲垫38u。因为缓冲垫38u的绝热性高,所以为提高其导热性能,要做得尽可能的薄,在本实施例中,使用厚度为0.3(mm)左右的硅橡胶片。因为即使把如此薄的硅胶粘接到至少一边达数十(cm)左右的平坦压紧面上,仍不能获得所期望的弹性(缓冲性),所以在缓冲垫38u的下表面上,利用一定宽度的沟槽v形成多个分隔块,而构成凸部39u,借此既确保良好的导热性,又能确保缓冲垫38u具有足够且合适的缓冲性。
如图4所示,可动压盘31d具备压盘本体部32d和承载该压盘本体部32d的压盘基座40d。如图3所示,压盘本体部32d是将前端成为压紧面的热盘部33d、绝热部34d以及支持盘35d依次重叠而构成,通过固定螺栓36d成为一体。此时,热盘部33d内装多个加热棒用加热器37d。将缓冲垫片38d粘接到热盘部33d的上面。该缓冲垫片38d可以使用与上述的缓冲垫片38u相同的材料和结构。因而,与缓冲垫片38u的下表面一样,由沟槽v在缓冲垫片38d的上表面形成多个凸起39d。
此外,51是机台部,该动压盘31d由曲柄连接机构52支承,该曲柄连接机构52架设在该机台部51和可动压盘31d之间。53是驱动曲柄连接机构52的驱动机构,该驱动机构53具备安装在机台51上的伺服电机54和由该伺服电机54驱动丝杠机构55。借助于这样的机构,丝杆机构55的丝杆56受到伺服电机54的旋转驱动,且丝杆机构55的螺母部57成为曲柄机构52的输入部。
另一方面,图1示出预热部Ua。该预热部Ua具备配置在上侧的固定盘60u和配置在下侧的可动盘60d。可动盘60D受到与图4所示的热压部Ub上的曲柄机构52及驱动机构53同样的机构支承。固定盘60具备盘本体61u,该盘本体61u是将前端为上加热面11u的热盘部62u、绝热部63u和支持盘64u依次重叠构成,并用图未示出的固定螺栓形成一体。盘本体部61u直接安装在固定的图未示出的基座上。另外,热盘部62u内装多个加热用棒型加热器65u,而且,沿周缘把上密封部13u固定在上加热面11u上。此时,如图1所示,上密封部13u的位置在夹持叠层基材夹持部2时与内密封部12的位置一致。上密封部13u的厚度(高度)若做得较大则会损坏预热性能,所以希望在1-2(mm)左右。此外,在热盘部62u的内部形成脱气通路66u,该通路66u的内端开口临近位于上密封部13u内侧的上加热面11u,其外端开口靠近外侧面,且通过中间安装有电磁开关阀27u的通气管连接到脱气部3上。这样,用固定盘60u从上方夹持叠层基材夹持部2时,从而形成了一个与上夹持部2u的上面相临的上脱气室Ru,即上夹持部2u,上加热面11u及上密封部13u围起来的上脱气室Ru。
可动盘60d具备盘本体部61d。该盘本体部61d是将前端面成为下加热面11d的热盘62d、绝热部63d等依次重叠而构成的,并用图未示出的固定螺栓连成一体。热盘部62d内装有多根加热用棒型加热器65d,而且,在下加热面11d上沿周缘固定着下密封部13d。此时,下密封部13d的位置如图1所示,在夹持叠层基材夹持部2时与内密封部12的位置相一致。下密封部13d的厚度(高度)也与上密封部13u的一样,要求设定为1-2(mm)左右。此外,在热盘部62d的内部形成一脱气通路66d,该通路66d的内端开口靠近下密封部13d内侧的下加热面11d处,而其外端开口靠近外侧面,且通过中间连接有电磁开关阀27d的通气管28d与脱气部3连接。因此,用固定盘60d从下夹持叠层基材夹持2时,形成下夹持部2d的下面靠近的下脱气室Rd,即由下夹持部2d,下加热面11d和下密封部13d围成的下脱气室Rd。
各电磁开关阀27u、27d、27i与具备计算机功能的控制器70连接。通过连接,各电磁开关阀27u、27d、27i根据预先设定的程序进行逐步控制。于是,利用以上的构成,从上下用固定盘60u和可动盘60d夹住叠层基材夹持部2,就能够形成上夹持部2u的上面临近的上脱气室Ru和下夹持部2d的下面临近的下脱气室Rd,而且,利用脱气部3构成通过对上脱气室Ru和下脱气室Rd进行脱气操作的脱气机构4。
下面,参照各图并根据图2所示的流程说明包含制造装置1的动作(功能)的IC卡的制造方法。
首先,用叠层材料La,Lb制作叠层基材M。图6示出叠层基材M。叠层材料La、Lb是厚度约为20-300(μm)左右的热塑性树脂薄片以2-6张重叠的板材,本实施例的叠层材料La、Lb包含热塑性板和聚对苯二甲酸乙二酯。P是由IC芯片Pi和天线Pa构成的电子元件。若把电子元件P装到基板B上,并用叠层材料La及Lb夹位其两面,从而可得到叠层基材M。叠层基材M通常是把多枚IC卡(一般是n×m)连续地排列在一块上,用制造装置热压该叠层基材后,切割而得到最终的IC卡Mi。
把得到的叠层基材M收纳在叠层基材夹持部2内。即,把叠层基材M装载在下夹持部2d的上面,再从上重叠上夹持部2u,因此,由上夹持部2u和下夹持部2d夹持着叠层基材M,并在此状态下设定预热部Ua(步骤S1)。在此情况下,把叠层基材夹持部2装到可动盘60d上,使可动盘60d上升,使叠层基材夹持部2位于固定盘60u和可动盘60d之间。图1示出此状态。因此,在叠层基材夹持部2的上下分别形成上夹持部2u的上面相临的上脱气室Ru,即由上夹持部2u、上加热面11u及上密封部13u围成的上脱气室Ru和下夹持部2d的下面相临的下脱气室Rd,即由下夹持部2d、下加热面11d及下密封部13d围成的上脱气室Rd。另一方面,预热部Ua以比热压时的正常加热温度低的预热温度,具体地以薄层片La、Lb的塑性变形或熔融刚要开始前的温度(例如,70度左右)进行预热。因而,从预热部Ua设定的时刻起叠层基材夹持部2受到了预热处理。
接着,进行脱气处理(脱气步骤)。首先,控制器70控制三个电磁开关阀27u,27d,27i处于打开侧,而且,使脱气部3动作,进行叠层基材夹持2的内部Ri、上脱气室Ru及下脱气室Rd进行脱气(真空吸气)处理(步骤S2)。脱气开始后,一边抽气至设定的真空度一边开始计时(步骤S3、S4),经过设定时间(通常,10秒)后,解除上脱气室Ru及下脱气室Rd的脱气操作。因此,以后只继续对叠层基材夹持部2的内部Ri进行脱气处理(步骤S5,S6)。
此时,脱气开始后,在达到规定时间以前,对叠层基材夹持部2的内部Ri和上脱气室Ru以及下脱气室Rd同时以相同负压进行脱气处理。因而,如图1所示,虽然叠层基材M处于被上夹持部2u的上加压板21u和下夹持部2d的下加压板21d夹持的状态下,但因为叠层基材夹持部2的内部Ri侧和外部侧(上脱气室Ru及下脱气室Rd)作用着相同的负压,所以能够避免叠层基材夹持部2上的上加压板21u的上表面和下加压板21d的下表面因受到大气压作用而发生现有技术中的缺陷,即成为位于叠层基材M外侧的部位比位于叠层基材M内侧的部位窄的状态,结果成为叠层基材M的外侧受到的压力比其内侧受到的压力大而被密封的状态这样的缺陷,从而,可对叠层基材可靠充分地进行脱气。对叠层基材M的内部Ri进行充分的脱气的规定时间经过后,解除上脱气室Ru及下脱气室Rd的脱气。因此,脱气处理(脱气步骤)结束。叠层基材夹持2的内部Ri的负压状态仍然维持。
与这种脱气同时进行的是对叠层基材夹持部2以上述预热温度连续地加热预处理(步骤S7)。之后,若预热处理结束,叠层基材夹持部2被送到热压部Ub(步骤S8、S9)。此时,因为可动压盘31d如图4所示那样下降,所以把叠层基材夹持2装载到可动压盘31D上后,若使伺服电机54动作,则螺母57上升,曲柄连杆机构52使可动压盘31d上升。叠层基材夹持部2压接到上侧的缓冲垫片38u上,从对叠层基材夹持部2施加了极低压力时刻起,停止可动压盘31d的上升。此时,固定压盘31u和可动压盘31d分别受加热用棒型加热器37u、37d...以正常温度(例如140度左右)加热。叠层基材M的两侧被上夹持部2u和下夹持部2d夹持着,而且容纳在密封状态的叠层基材夹持部2的内部,且由脱气部3对该叠层基材夹持部2的内部进行脱气处理,所以即使叠层基材M从预热部Ua移动到热压部Ub,能够确保加热状态及加压状态的连续性,即能够确保对叠层基材M的保温性和保压性。
设定时间经过后,叠层基材M软化,再次使伺服电机54动作,使可动压盘31d上升,若热盘部33d的上面达到IC卡的厚度位置或设定力(转矩)后就停止。因此,叠层基材夹持部2受固定盘部31u和可动压盘31d从上下加热及加压,从而,热压着叠层基材M。虽然叠层基材夹持部2上的各加压板21u及21d受热(高温)变形(膨胀),但因为该变形被多个结合片23u及23d吸收,所以叠层基材M一直受到平行度很高的一对加压板21u、21d热压,能够提高制造时的生产效率,且显著地提高IC卡的品质及均质性和商品性。
因为在叠层基材M热压时,在加压初期,叠层基材M自身并非处于充分加热的状态下被加压,所以利用没有充分软化的薄层片La、Lb对电子元件P施加压力。而且,如图7所示,因为使用弹性板的各加压板21u、21d对应于由电子元件P造成的薄层片La、Lb的变形而作弹性变形,所以该薄层片La、Lb的变形被各加压板21u、21d以及各缓冲垫38u、38d吸收。另一方面,经过了一段时间后,若薄层片La、Lb足够软了,则各加压板21u、21d弹性恢复到原来的形状,如图8所示,叠层基材M受到各加压板21u、21d具有本来的平坦形状的热压。此时,因为在各缓冲垫38u、38d上由规定宽度的沟槽形成了多个凸部39u、39d,所以能够确保各缓冲垫38u、38d上的良好传热效率的同时,还可确保足够的最合适的缓冲性。
之后,达到设定时间(例如,20秒左右)后,如图6所示,使可动压盘2d下降,将热压着的叠层基材M,即制造的IC卡Mi移动到冷却部进行冷却处理。在该冷却处理过程中,IC卡边受压边冷却。冷却处理后,为从叠层基材夹持部2上取出IC卡Mi,可以从脱气口26向叠层基材夹持部2内部Ri供给空气。由此,解除了叠层基材夹持部2的脱气状态,而且,可从叠层基材夹持部2上剥离下IC卡Mi。于是,使上夹持部2u上升,取出制造好的IC卡Mi。
以上对实施例作了详细说明,但本发明并不限于上述实施例的结构,对于局部的构成、形状、数量、用材及数值等可以在本发明的构思范围内作出任意的变化,而且,根据需要,可以增加或减少。例如,在构成脱气机构4时,示出的是与预热处理叠层基材夹持部2的预热部Ua兼用的情况,但也可以独立地只构成脱气机构4。叠层基材M(IC卡Mi)的构成和用材不限于例示的,可适用任何合适的种类。

Claims (6)

1.一种IC卡制造装置,该装置具备叠层基材夹持部和脱气部,该叠层基材夹持部由上夹持部和下夹持部构成,该上夹持部和下夹持部从两侧面夹住并密封由一对层状片材夹着IC芯片等电子部件而形成的叠层基材,上述脱气部对该叠层基材夹持部的内部进行脱气处理,对夹着叠层基材进行脱气的叠层基材夹持部进行加热及加压来制造IC卡,其特征在于:还具备脱气机构部,该脱气机构部通过从上下夹住上述叠层基材夹持部,形成靠近上述上夹持部的上表面的上脱气室和靠近上述下夹持部的下表面的下脱气室,且利用上述脱气部对上述上脱气室和上述下脱气室进行脱气;
上述脱气机构部中具备控制器,在对上述叠层基材夹持部的内部脱气的同时,该控制器控制上述上脱气室和上述的下脱气室的脱气的开始、以及从开始经过预定时间后,上述上脱气室和上述下脱气室的脱气的解除。
2.根据权利要求1记载的IC制造装置,其特征在于:上述脱气机构部根据同一负压对上述叠层基材夹持部的内部和上述上脱气室和上述下脱气室进行脱气。
3.根据权利要求1记载的IC制造装置,其特征在于:上述脱气机构部设置在对叠层基材夹持部进行预热处理的预热部上。
4.根据权利要求3记载的IC制造装置,其特征在于:上述脱气机构部具备控制上述预热部的控制器。
5.根据权利要求4记载的IC制造装置,其特征在于:上述控制器在脱气的同时控制对上述叠层基材夹持部的预热处理。
6.根据权利要求1记载的IC制造装置,其特征在于上述脱气机构具备:装在位于上述预热部的上侧的上加热面和上述上夹持部的上表面之间、且位置与上述上夹持部和上述下夹持部间的内密封部的位置一致的上密封部;和安装在位于上述预热部的下侧的下加热面和上述下夹持部的下表面之间、位置与上述内密封部的位置一致的下密封部。
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