CN119895367A - 布线基板、遮光层形成用正型感光性树脂组合物、遮光层转印膜及布线基板的制造方法 - Google Patents

布线基板、遮光层形成用正型感光性树脂组合物、遮光层转印膜及布线基板的制造方法 Download PDF

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Publication number
CN119895367A
CN119895367A CN202380065843.7A CN202380065843A CN119895367A CN 119895367 A CN119895367 A CN 119895367A CN 202380065843 A CN202380065843 A CN 202380065843A CN 119895367 A CN119895367 A CN 119895367A
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CN
China
Prior art keywords
shielding layer
light shielding
forming
light
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380065843.7A
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English (en)
Chinese (zh)
Inventor
池田龙太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of CN119895367A publication Critical patent/CN119895367A/zh
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16Constructional details or arrangements
    • G06F1/18Packaging or power distribution
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
CN202380065843.7A 2022-12-20 2023-10-25 布线基板、遮光层形成用正型感光性树脂组合物、遮光层转印膜及布线基板的制造方法 Pending CN119895367A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022202949 2022-12-20
JP2022-202949 2022-12-20
PCT/JP2023/038439 WO2024135082A1 (ja) 2022-12-20 2023-10-25 配線基板、遮光層形成用ポジ型感光性樹脂組成物、遮光層転写フィルムおよび配線基板の製造方法

Publications (1)

Publication Number Publication Date
CN119895367A true CN119895367A (zh) 2025-04-25

Family

ID=91588557

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380065843.7A Pending CN119895367A (zh) 2022-12-20 2023-10-25 布线基板、遮光层形成用正型感光性树脂组合物、遮光层转印膜及布线基板的制造方法

Country Status (3)

Country Link
JP (1) JPWO2024135082A1 (https=)
CN (1) CN119895367A (https=)
WO (1) WO2024135082A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6576020B2 (ja) * 2013-03-06 2019-09-18 日東電工株式会社 画像表示装置
JP6204858B2 (ja) * 2014-03-25 2017-09-27 富士フイルム株式会社 タッチパネルモジュールおよび電子機器
JP2017202631A (ja) * 2016-05-12 2017-11-16 東レ株式会社 転写フィルム、積層基材、カバーガラス、積層基材の製造方法
CN112352199A (zh) * 2018-08-23 2021-02-09 富士胶片株式会社 转印薄膜、层叠体及图案形成方法
KR102813261B1 (ko) * 2019-03-14 2025-05-28 도레이 카부시키가이샤 감광성 수지 조성물, 감광성 수지 시트, 경화막, 경화막의 제조 방법, 유기 el 표시 장치, 및 전자 부품
KR102624811B1 (ko) * 2020-01-21 2024-01-16 도레이 카부시키가이샤 포지티브형 감광성 수지 조성물, 경화막, 적층체, 도전 패턴이 형성된 기판, 적층체의 제조 방법, 터치 패널 및 유기 el 표시 장치
WO2021199996A1 (ja) * 2020-03-30 2021-10-07 富士フイルム株式会社 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び感光性転写材料用仮支持体
JP7115635B2 (ja) * 2020-03-30 2022-08-09 東レ株式会社 樹脂組成物、遮光膜、および隔壁付き基板
US12349269B2 (en) * 2020-12-15 2025-07-01 Toray Industries, Inc. Wiring board
JP2022112699A (ja) * 2021-01-22 2022-08-03 東レ株式会社 着色樹脂組成物、遮光膜、加飾基板及び加飾フィルム

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JPWO2024135082A1 (https=) 2024-06-27
WO2024135082A1 (ja) 2024-06-27

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