CN1191039A - 用于集成电路晶片传送组件的对接和环境净化系统 - Google Patents

用于集成电路晶片传送组件的对接和环境净化系统 Download PDF

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Publication number
CN1191039A
CN1191039A CN96195606A CN96195606A CN1191039A CN 1191039 A CN1191039 A CN 1191039A CN 96195606 A CN96195606 A CN 96195606A CN 96195606 A CN96195606 A CN 96195606A CN 1191039 A CN1191039 A CN 1191039A
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CN
China
Prior art keywords
door
blocking cover
butt joint
insulation blocking
docking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN96195606A
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English (en)
Chinese (zh)
Inventor
小格伦·A·罗伯逊
罗伯特·M·根科
G·凯尔·蒙特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SEMIFAB
Original Assignee
SEMIFAB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SEMIFAB filed Critical SEMIFAB
Publication of CN1191039A publication Critical patent/CN1191039A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775—Docking arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
CN96195606A 1995-07-18 1996-06-26 用于集成电路晶片传送组件的对接和环境净化系统 Pending CN1191039A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/503,677 1995-07-18
US08/503,677 US5674123A (en) 1995-07-18 1995-07-18 Docking and environmental purging system for integrated circuit wafer transport assemblies

Publications (1)

Publication Number Publication Date
CN1191039A true CN1191039A (zh) 1998-08-19

Family

ID=24003066

Family Applications (1)

Application Number Title Priority Date Filing Date
CN96195606A Pending CN1191039A (zh) 1995-07-18 1996-06-26 用于集成电路晶片传送组件的对接和环境净化系统

Country Status (8)

Country Link
US (3) US5674123A (enExample)
EP (1) EP0839385A1 (enExample)
JP (1) JP4008494B2 (enExample)
KR (1) KR100281942B1 (enExample)
CN (1) CN1191039A (enExample)
AU (1) AU6396296A (enExample)
TW (1) TW304902B (enExample)
WO (1) WO1997004479A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101510498B (zh) * 2008-02-15 2010-09-01 北京北方微电子基地设备工艺研究中心有限责任公司 减少半导体基片颗粒污染的方法及系统
CN1743254B (zh) * 2004-08-30 2010-12-22 阿尔卡特公司 在微环境晶片传送盒和设备零件之间的真空接口
CN101000882B (zh) * 2005-12-16 2011-04-20 应用材料公司 用于打开和关闭衬底载具的方法及设备
CN103943533A (zh) * 2013-01-23 2014-07-23 上海微电子装备有限公司 密封对接装置

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6799932B2 (en) 1994-04-28 2004-10-05 Semitool, Inc. Semiconductor wafer processing apparatus
US6447232B1 (en) * 1994-04-28 2002-09-10 Semitool, Inc. Semiconductor wafer processing apparatus having improved wafer input/output handling system
US6599075B2 (en) * 1994-04-28 2003-07-29 Semitool, Inc. Semiconductor wafer processing apparatus
US5674123A (en) * 1995-07-18 1997-10-07 Semifab Docking and environmental purging system for integrated circuit wafer transport assemblies
US6942738B1 (en) 1996-07-15 2005-09-13 Semitool, Inc. Automated semiconductor processing system
US6723174B2 (en) 1996-03-26 2004-04-20 Semitool, Inc. Automated semiconductor processing system
US5980195A (en) * 1996-04-24 1999-11-09 Tokyo Electron, Ltd. Positioning apparatus for substrates to be processed
KR100238944B1 (ko) * 1997-01-09 2000-01-15 윤종용 반도체장치 제조용 베이크설비의 공정챔버 도어개폐장치
TW393741B (en) * 1997-08-11 2000-06-11 Ind Tech Res Inst An automated picking and placing method for IC packing processes of magazine covering plate
US5900047A (en) * 1997-11-26 1999-05-04 Sony Corporation Exhaust system for a semiconductor etcher that utilizes corrosive gas
DE19805624A1 (de) * 1998-02-12 1999-09-23 Acr Automation In Cleanroom Schleuse zum Öffnen und Schließen von Reinraumtransport-Boxen
US6106213A (en) 1998-02-27 2000-08-22 Pri Automation, Inc. Automated door assembly for use in semiconductor wafer manufacturing
NL1009327C2 (nl) * 1998-06-05 1999-12-10 Asm Int Werkwijze en inrichting voor het overbrengen van wafers.
US6261044B1 (en) * 1998-08-06 2001-07-17 Asyst Technologies, Inc. Pod to port door retention and evacuation system
US6041817A (en) * 1998-08-21 2000-03-28 Fairchild Semiconductor Corp. Processing system having vacuum manifold isolation
US6249990B1 (en) * 1999-03-23 2001-06-26 Alliedsignal, Inc. Method and apparatus for transporting articles
DE19913886A1 (de) * 1999-03-26 2000-09-28 Siemens Ag Anlage zur Fertigung von Halbleiterprodukten
JP2000286319A (ja) * 1999-03-31 2000-10-13 Canon Inc 基板搬送方法および半導体製造装置
AU2001268656A1 (en) * 2000-07-07 2002-01-21 Semitool, Inc. Automated processing system
US6660055B2 (en) * 2001-10-25 2003-12-09 Asm Technology Singapore Pte Ltd. Compartment for maintaining a clean production environment
US6976340B2 (en) * 2002-12-05 2005-12-20 Venturedyne Ltd. Universal access port
US7578647B2 (en) 2003-01-27 2009-08-25 Applied Materials, Inc. Load port configurations for small lot size substrate carriers
US7611318B2 (en) 2003-01-27 2009-11-03 Applied Materials, Inc. Overhead transfer flange and support for suspending a substrate carrier
US7203563B2 (en) * 2004-04-08 2007-04-10 Taiwan Semiconductor Manufacturing Company, Ltd. Automatic N2 purge system for 300 mm full automation fab
JP2008546191A (ja) * 2005-06-03 2008-12-18 シーエスジー ソーラー アクチェンゲゼルシャフト 薄膜シリコン・オン・グラスの水素化装置およびその方法
US11024527B2 (en) 2005-06-18 2021-06-01 Frederick A. Flitsch Methods and apparatus for novel fabricators with Cleanspace
US10627809B2 (en) 2005-06-18 2020-04-21 Frederick A. Flitsch Multilevel fabricators
US9339900B2 (en) 2005-08-18 2016-05-17 Futrfab, Inc. Apparatus to support a cleanspace fabricator
US9457442B2 (en) * 2005-06-18 2016-10-04 Futrfab, Inc. Method and apparatus to support process tool modules in a cleanspace fabricator
US9059227B2 (en) 2005-06-18 2015-06-16 Futrfab, Inc. Methods and apparatus for vertically orienting substrate processing tools in a clean space
US9159592B2 (en) 2005-06-18 2015-10-13 Futrfab, Inc. Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator
US7513822B2 (en) 2005-06-18 2009-04-07 Flitsch Frederick A Method and apparatus for a cleanspace fabricator
US10651063B2 (en) 2005-06-18 2020-05-12 Frederick A. Flitsch Methods of prototyping and manufacturing with cleanspace fabricators
WO2007025199A2 (en) * 2005-08-26 2007-03-01 Flitsch Frederick A Multi-level cleanspace fabricator elevator system
US20070140822A1 (en) * 2005-12-16 2007-06-21 Applied Materials, Inc. Methods and apparatus for opening and closing substrate carriers
US8668146B1 (en) 2006-05-25 2014-03-11 Sean I. Mcghie Rewards program with payment artifact permitting conversion/transfer of non-negotiable credits to entity independent funds
US8201734B1 (en) 2006-05-25 2012-06-19 Mcghie Sean I Conversion of non-negotiable credits associated with an entity into entity independent negotiable funds
US8267315B1 (en) 2006-05-25 2012-09-18 Mcghie Sean I Exchange of non-negotiable credits for entity independent funds
US8376224B2 (en) 2006-05-25 2013-02-19 Sean I. Mcghie Self-service stations for utilizing non-negotiable credits earned from a game of chance
US8342399B1 (en) 2006-05-25 2013-01-01 Mcghie Sean I Conversion of credits to funds
US8162209B2 (en) 2006-05-25 2012-04-24 Buchheit Brian K Storefront purchases utilizing non-negotiable credits earned from a game of chance
US7703673B2 (en) 2006-05-25 2010-04-27 Buchheit Brian K Web based conversion of non-negotiable credits associated with an entity to entity independent negotiable funds
IL180875A0 (en) * 2007-01-22 2007-07-04 Ricor Ltd Gas purge method and apparatus
JP5564271B2 (ja) * 2010-01-20 2014-07-30 株式会社日立ハイテクノロジーズ 真空処理装置
US20130265720A1 (en) * 2012-04-09 2013-10-10 Tyco Electronics Raychem Bvba Heat dissipation device for telecommunications equipment
US20140096483A1 (en) * 2012-10-04 2014-04-10 Brookhaven Science Associates, Llc Transfer Chamber for Air-Sensitive Sample Processing
US10446428B2 (en) * 2017-03-14 2019-10-15 Applied Materials, Inc. Load port operation in electronic device manufacturing apparatus, systems, and methods
US10854490B2 (en) * 2018-08-14 2020-12-01 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer carrier handling apparatus and method thereof
WO2025097058A1 (en) * 2023-11-03 2025-05-08 Entegris, Inc. Methods and apparatus for purifying substrate containers

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4616683A (en) * 1983-09-28 1986-10-14 Hewlett-Packard Company Particle-free dockable interface for integrated circuit processing
US4728389A (en) * 1985-05-20 1988-03-01 Applied Materials, Inc. Particulate-free epitaxial process
US5373806A (en) * 1985-05-20 1994-12-20 Applied Materials, Inc. Particulate-free epitaxial process
US4957781A (en) * 1985-07-22 1990-09-18 Hitachi, Ltd. Processing apparatus
US4705444A (en) * 1985-07-24 1987-11-10 Hewlett-Packard Company Apparatus for automated cassette handling
US4724874A (en) * 1986-05-01 1988-02-16 Asyst Technologies Sealable transportable container having a particle filtering system
US4863561A (en) * 1986-12-09 1989-09-05 Texas Instruments Incorporated Method and apparatus for cleaning integrated circuit wafers
JPS6422429A (en) * 1987-07-20 1989-01-25 Sankyo Seisakusho Kk Roll fielding device
JP2608565B2 (ja) * 1987-11-10 1997-05-07 アシスト テクノロジース インコーポレーテッド 粒子濾過システムを有する可搬式コンテーナ
US5026239A (en) * 1988-09-06 1991-06-25 Canon Kabushiki Kaisha Mask cassette and mask cassette loading device
US5354198A (en) * 1988-12-05 1994-10-11 Cyrco Twenty-Two, Inc. Movable cantilevered purge system
US5219464A (en) * 1990-10-09 1993-06-15 Tokyo Electron Limited Clean air apparatus
US5032545A (en) * 1990-10-30 1991-07-16 Micron Technology, Inc. Process for preventing a native oxide from forming on the surface of a semiconductor material and integrated circuit capacitors produced thereby
US5145303A (en) * 1991-02-28 1992-09-08 Mcnc Method and apparatus for reducing particulate contamination in processing chambers
JPH05299312A (ja) * 1992-04-21 1993-11-12 Sumitomo Electric Ind Ltd 半導体製造設備
KR970006728B1 (ko) * 1992-08-31 1997-04-29 마쯔시다 덴기 산교 가부시끼가이샤 환경제어장치
JP3275390B2 (ja) * 1992-10-06 2002-04-15 神鋼電機株式会社 可搬式密閉コンテナ流通式の自動搬送システム
US5674123A (en) * 1995-07-18 1997-10-07 Semifab Docking and environmental purging system for integrated circuit wafer transport assemblies

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1743254B (zh) * 2004-08-30 2010-12-22 阿尔卡特公司 在微环境晶片传送盒和设备零件之间的真空接口
CN101000882B (zh) * 2005-12-16 2011-04-20 应用材料公司 用于打开和关闭衬底载具的方法及设备
CN101510498B (zh) * 2008-02-15 2010-09-01 北京北方微电子基地设备工艺研究中心有限责任公司 减少半导体基片颗粒污染的方法及系统
CN103943533A (zh) * 2013-01-23 2014-07-23 上海微电子装备有限公司 密封对接装置
CN103943533B (zh) * 2013-01-23 2017-12-29 上海微电子装备（集团）股份有限公司 密封对接装置

Also Published As

Publication number Publication date
TW304902B (enExample) 1997-05-11
JPH11509688A (ja) 1999-08-24
EP0839385A1 (en) 1998-05-06
US5674123A (en) 1997-10-07
US5848933A (en) 1998-12-15
WO1997004479A1 (en) 1997-02-06
US6120371A (en) 2000-09-19
KR19990029029A (ko) 1999-04-15
AU6396296A (en) 1997-02-18
KR100281942B1 (ko) 2001-03-02
JP4008494B2 (ja) 2007-11-14

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