CN118922782A - 感光性树脂组合物、固化物及图像显示装置 - Google Patents

感光性树脂组合物、固化物及图像显示装置 Download PDF

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Publication number
CN118922782A
CN118922782A CN202380027127.XA CN202380027127A CN118922782A CN 118922782 A CN118922782 A CN 118922782A CN 202380027127 A CN202380027127 A CN 202380027127A CN 118922782 A CN118922782 A CN 118922782A
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CN
China
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Pending
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CN202380027127.XA
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English (en)
Chinese (zh)
Inventor
小泉裕贵
三岛康太郎
泽井良尚
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Publication of CN118922782A publication Critical patent/CN118922782A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN202380027127.XA 2022-03-24 2023-03-09 感光性树脂组合物、固化物及图像显示装置 Pending CN118922782A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022-048750 2022-03-24
JP2022048750 2022-03-24
PCT/JP2023/009033 WO2023181962A1 (ja) 2022-03-24 2023-03-09 感光性樹脂組成物、硬化物及び画像表示装置

Publications (1)

Publication Number Publication Date
CN118922782A true CN118922782A (zh) 2024-11-08

Family

ID=88101223

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380027127.XA Pending CN118922782A (zh) 2022-03-24 2023-03-09 感光性树脂组合物、固化物及图像显示装置

Country Status (5)

Country Link
JP (2) JP7652335B2 (https=)
KR (2) KR102847470B1 (https=)
CN (1) CN118922782A (https=)
TW (1) TW202348638A (https=)
WO (1) WO2023181962A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61236805A (ja) * 1985-04-13 1986-10-22 Res Dev Corp Of Japan 機能性高分子重合体
JP4037015B2 (ja) * 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
KR100852110B1 (ko) 2004-06-26 2008-08-13 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그 제조 방법
JP5322575B2 (ja) 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP2014091790A (ja) 2012-11-05 2014-05-19 Toyo Ink Sc Holdings Co Ltd 樹脂組成物
CN118151488A (zh) * 2016-12-02 2024-06-07 三菱化学株式会社 着色感光性树脂组合物、颜料分散液、间隔壁、有机场致发光元件、图像显示装置及照明
JP2021024842A (ja) 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

Also Published As

Publication number Publication date
KR20240167623A (ko) 2024-11-27
KR20250124259A (ko) 2025-08-19
KR102847470B1 (ko) 2025-08-18
JP2025083427A (ja) 2025-05-30
JP7652335B2 (ja) 2025-03-27
JPWO2023181962A1 (https=) 2023-09-28
WO2023181962A1 (ja) 2023-09-28
TW202348638A (zh) 2023-12-16

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