JPWO2023181962A1 - - Google Patents

Info

Publication number
JPWO2023181962A1
JPWO2023181962A1 JP2024509983A JP2024509983A JPWO2023181962A1 JP WO2023181962 A1 JPWO2023181962 A1 JP WO2023181962A1 JP 2024509983 A JP2024509983 A JP 2024509983A JP 2024509983 A JP2024509983 A JP 2024509983A JP WO2023181962 A1 JPWO2023181962 A1 JP WO2023181962A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024509983A
Other languages
Japanese (ja)
Other versions
JP7652335B2 (ja
JPWO2023181962A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023181962A1 publication Critical patent/JPWO2023181962A1/ja
Publication of JPWO2023181962A5 publication Critical patent/JPWO2023181962A5/ja
Priority to JP2025036525A priority Critical patent/JP2025083427A/ja
Application granted granted Critical
Publication of JP7652335B2 publication Critical patent/JP7652335B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2024509983A 2022-03-24 2023-03-09 感光性樹脂組成物、硬化物及び画像表示装置 Active JP7652335B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025036525A JP2025083427A (ja) 2022-03-24 2025-03-07 感光性樹脂組成物、硬化物及び画像表示装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022048750 2022-03-24
JP2022048750 2022-03-24
PCT/JP2023/009033 WO2023181962A1 (ja) 2022-03-24 2023-03-09 感光性樹脂組成物、硬化物及び画像表示装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025036525A Division JP2025083427A (ja) 2022-03-24 2025-03-07 感光性樹脂組成物、硬化物及び画像表示装置

Publications (3)

Publication Number Publication Date
JPWO2023181962A1 true JPWO2023181962A1 (https=) 2023-09-28
JPWO2023181962A5 JPWO2023181962A5 (https=) 2025-01-31
JP7652335B2 JP7652335B2 (ja) 2025-03-27

Family

ID=88101223

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024509983A Active JP7652335B2 (ja) 2022-03-24 2023-03-09 感光性樹脂組成物、硬化物及び画像表示装置
JP2025036525A Pending JP2025083427A (ja) 2022-03-24 2025-03-07 感光性樹脂組成物、硬化物及び画像表示装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025036525A Pending JP2025083427A (ja) 2022-03-24 2025-03-07 感光性樹脂組成物、硬化物及び画像表示装置

Country Status (5)

Country Link
JP (2) JP7652335B2 (https=)
KR (2) KR102847470B1 (https=)
CN (1) CN118922782A (https=)
TW (1) TW202348638A (https=)
WO (1) WO2023181962A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61236805A (ja) * 1985-04-13 1986-10-22 Res Dev Corp Of Japan 機能性高分子重合体
JP2001092127A (ja) * 1999-09-22 2001-04-06 Fuji Photo Film Co Ltd 光重合性組成物
JP2009255510A (ja) * 2008-03-28 2009-11-05 Fujifilm Corp レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100852110B1 (ko) 2004-06-26 2008-08-13 삼성에스디아이 주식회사 유기 전계 발광 소자 및 그 제조 방법
JP2014091790A (ja) 2012-11-05 2014-05-19 Toyo Ink Sc Holdings Co Ltd 樹脂組成物
CN118151488A (zh) * 2016-12-02 2024-06-07 三菱化学株式会社 着色感光性树脂组合物、颜料分散液、间隔壁、有机场致发光元件、图像显示装置及照明

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61236805A (ja) * 1985-04-13 1986-10-22 Res Dev Corp Of Japan 機能性高分子重合体
JP2001092127A (ja) * 1999-09-22 2001-04-06 Fuji Photo Film Co Ltd 光重合性組成物
JP2009255510A (ja) * 2008-03-28 2009-11-05 Fujifilm Corp レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP2021024842A (ja) * 2019-08-08 2021-02-22 三菱ケミカル株式会社 含硫黄芳香族複素環を有する化合物とその製造方法、重合性組成物、及び重合物

Also Published As

Publication number Publication date
KR20240167623A (ko) 2024-11-27
CN118922782A (zh) 2024-11-08
KR20250124259A (ko) 2025-08-19
KR102847470B1 (ko) 2025-08-18
JP2025083427A (ja) 2025-05-30
JP7652335B2 (ja) 2025-03-27
WO2023181962A1 (ja) 2023-09-28
TW202348638A (zh) 2023-12-16

Similar Documents

Publication Publication Date Title
BR102022025291A2 (https=)
BR102023014872A2 (https=)
BR102023012440A2 (https=)
BR102023010976A2 (https=)
BR102023009641A2 (https=)
BR102023008688A2 (https=)
BR102023007252A2 (https=)
BR102023005164A2 (https=)
JPWO2023181962A1 (https=)
BR102023001987A2 (https=)
BR102023001877A2 (https=)
BR102023000289A2 (https=)
BR102022026909A2 (https=)
BR102022023461A2 (https=)
BR202022009269U2 (https=)
BR202022005961U2 (https=)
BR202022001779U2 (https=)
BR202022000931U2 (https=)
BY13137U (https=)
CN307049296S (https=)
CN307047267S (https=)
BY13163U (https=)
CN307046985S (https=)
CN307046378S (https=)
CN307047864S (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240725

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250123

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250123

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20250123

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250212

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250225

R150 Certificate of patent or registration of utility model

Ref document number: 7652335

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150