CN117957439A - 显示处理装置、显示处理方法及显示处理程序 - Google Patents

显示处理装置、显示处理方法及显示处理程序 Download PDF

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Publication number
CN117957439A
CN117957439A CN202280061993.6A CN202280061993A CN117957439A CN 117957439 A CN117957439 A CN 117957439A CN 202280061993 A CN202280061993 A CN 202280061993A CN 117957439 A CN117957439 A CN 117957439A
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China
Prior art keywords
region
detection
regions
display processing
correlation
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Pending
Application number
CN202280061993.6A
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English (en)
Chinese (zh)
Inventor
池田辽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication of CN117957439A publication Critical patent/CN117957439A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G06V10/44—Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/18—Investigating the presence of flaws defects or foreign matter
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G06F18/23—Clustering techniques
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T11/00—Two-dimensional [2D] image generation
    • G06T11/20—Drawing from basic elements
    • G06T11/23—Drawing from basic elements using straight lines or curves
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/10—Segmentation; Edge detection
    • G06T7/11—Region-based segmentation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/25—Determination of region of interest [ROI] or a volume of interest [VOI]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/26—Segmentation of patterns in the image field; Cutting or merging of image elements to establish the pattern region, e.g. clustering-based techniques; Detection of occlusion
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00—Indexing scheme relating to image or video recognition or understanding
    • G06V2201/06—Recognition of objects for industrial automation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00—Indexing scheme relating to image or video recognition or understanding
    • G06V2201/07—Target detection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Data Mining & Analysis (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • Artificial Intelligence (AREA)
  • General Engineering & Computer Science (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Evolutionary Biology (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Image Analysis (AREA)
CN202280061993.6A 2021-09-29 2022-08-09 显示处理装置、显示处理方法及显示处理程序 Pending CN117957439A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-159740 2021-09-29
JP2021159740 2021-09-29
PCT/JP2022/030414 WO2023053728A1 (ja) 2021-09-29 2022-08-09 表示処理装置、表示処理方法、及び、表示処理プログラム

Publications (1)

Publication Number Publication Date
CN117957439A true CN117957439A (zh) 2024-04-30

Family

ID=85782287

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280061993.6A Pending CN117957439A (zh) 2021-09-29 2022-08-09 显示处理装置、显示处理方法及显示处理程序

Country Status (5)

Country Link
US (1) US20240221343A1 (https=)
EP (1) EP4411356A4 (https=)
JP (1) JP7828357B2 (https=)
CN (1) CN117957439A (https=)
WO (1) WO2023053728A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118318157A (zh) * 2022-10-21 2024-07-09 株式会社东芝 判断装置
JPWO2025023191A1 (https=) * 2023-07-21 2025-01-30

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0563897A1 (en) * 1992-03-30 1993-10-06 Fuji Photo Film Co., Ltd. Defect inspection system
JP4211092B2 (ja) * 1998-08-27 2009-01-21 株式会社Ｉｈｉ 放射線透過検査における溶接欠陥自動検出法
JP3964267B2 (ja) * 2002-06-04 2007-08-22 大日本スクリーン製造株式会社 欠陥検出装置、欠陥検出方法、およびプログラム
JP4702952B2 (ja) * 2006-06-01 2011-06-15 大日本スクリーン製造株式会社 ムラ検査方法、ムラ検査装置およびプログラム
JP2008170256A (ja) * 2007-01-11 2008-07-24 Seiko Epson Corp 欠陥検出方法、欠陥検出プログラムおよび検査装置
JP4970101B2 (ja) 2007-03-26 2012-07-04 大日本スクリーン製造株式会社 欠陥検出方法
JP4262297B2 (ja) * 2008-07-25 2009-05-13 大日本スクリーン製造株式会社 クラスタ生成装置、欠陥分類装置、クラスタ生成方法およびプログラム
JP5085573B2 (ja) * 2009-01-13 2012-11-28 新日本製鐵株式会社 欠陥検査方法および欠陥検査装置
JP5351673B2 (ja) * 2009-09-09 2013-11-27 パナソニック株式会社 外観検査装置、外観検査方法
JP5943722B2 (ja) * 2012-06-08 2016-07-05 三菱重工業株式会社 欠陥判定装置、放射線撮像システム、及び欠陥判定方法
JP2015040827A (ja) * 2013-08-23 2015-03-02 シャープ株式会社 欠陥判定装置および欠陥判定方法
JP2016200444A (ja) * 2015-04-08 2016-12-01 一般財団法人電力中央研究所 ボイドの計測方法、計測装置、及び計測プログラム
JP6654649B2 (ja) * 2015-12-14 2020-02-26 株式会社ニコン・トリンブル 欠陥検出装置及びプログラム
US10325363B2 (en) * 2016-01-15 2019-06-18 Instrumental, Inc. Methods for automatically generating a common measurement across multiple assembly units
JP2020144688A (ja) 2019-03-07 2020-09-10 株式会社Ihi 学習方法、学習装置、及び当該学習装置を備える溶接欠陥検出装置
KR102814354B1 (ko) * 2019-12-05 2025-05-30 차나안 브라이트 사이트 컴퍼니 리미티드 문자 분할 방법, 장치 및 컴퓨터 판독 가능 저장 매체
CN111462113B (zh) * 2020-04-24 2021-12-28 上海精测半导体技术有限公司 无图形晶圆的复检方法
WO2022116109A1 (en) * 2020-12-03 2022-06-09 Boe Technology Group Co., Ltd. Computer-implemented method for defect analysis, apparatus for defect analysis, computer-program product, and intelligent defect analysis system

Also Published As

Publication number Publication date
EP4411356A1 (en) 2024-08-07
JPWO2023053728A1 (https=) 2023-04-06
JP7828357B2 (ja) 2026-03-11
EP4411356A4 (en) 2025-01-22
WO2023053728A1 (ja) 2023-04-06
US20240221343A1 (en) 2024-07-04

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