CN117882014A - 直接描绘装置及其控制方法 - Google Patents
直接描绘装置及其控制方法 Download PDFInfo
- Publication number
- CN117882014A CN117882014A CN202280058943.2A CN202280058943A CN117882014A CN 117882014 A CN117882014 A CN 117882014A CN 202280058943 A CN202280058943 A CN 202280058943A CN 117882014 A CN117882014 A CN 117882014A
- Authority
- CN
- China
- Prior art keywords
- pattern
- substrate
- direct drawing
- error data
- direct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 98
- 238000012545 processing Methods 0.000 claims abstract description 41
- 238000005259 measurement Methods 0.000 claims description 32
- 238000012937 correction Methods 0.000 claims description 16
- 238000003754 machining Methods 0.000 claims description 8
- 238000013461 design Methods 0.000 claims description 5
- 239000011229 interlayer Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 37
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000012886 linear function Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-143710 | 2021-09-03 | ||
| JP2021143710 | 2021-09-03 | ||
| PCT/JP2022/032547 WO2023032962A1 (ja) | 2021-09-03 | 2022-08-30 | 直接描画装置及びその制御方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117882014A true CN117882014A (zh) | 2024-04-12 |
Family
ID=85411249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280058943.2A Pending CN117882014A (zh) | 2021-09-03 | 2022-08-30 | 直接描绘装置及其控制方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2023032962A1 (ko) |
| KR (1) | KR20240055034A (ko) |
| CN (1) | CN117882014A (ko) |
| TW (1) | TW202319841A (ko) |
| WO (1) | WO2023032962A1 (ko) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005311145A (ja) * | 2004-04-23 | 2005-11-04 | Canon Inc | 露光装置、露光方法、デバイス製造方法、パターン形成装置および位置合わせ方法 |
| JP2007220937A (ja) * | 2006-02-17 | 2007-08-30 | Toppan Printing Co Ltd | 基板の重ね描画方法 |
| JP2011158718A (ja) * | 2010-02-01 | 2011-08-18 | Hitachi High-Technologies Corp | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
| KR101059811B1 (ko) * | 2010-05-06 | 2011-08-26 | 삼성전자주식회사 | 마스크리스 노광 장치와 마스크리스 노광에서 오버레이를 위한 정렬 방법 |
| JP2014066870A (ja) * | 2012-09-26 | 2014-04-17 | Hitachi High-Technologies Corp | パターン形成方法及び装置、露光装置並びに表示用パネル製造方法 |
| JP6900284B2 (ja) * | 2017-09-27 | 2021-07-07 | 株式会社Ｓｃｒｅｅｎホールディングス | 描画装置および描画方法 |
-
2022
- 2022-08-30 JP JP2023545591A patent/JPWO2023032962A1/ja active Pending
- 2022-08-30 CN CN202280058943.2A patent/CN117882014A/zh active Pending
- 2022-08-30 WO PCT/JP2022/032547 patent/WO2023032962A1/ja active Application Filing
- 2022-08-30 KR KR1020247010318A patent/KR20240055034A/ko unknown
- 2022-09-02 TW TW111133310A patent/TW202319841A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202319841A (zh) | 2023-05-16 |
| WO2023032962A1 (ja) | 2023-03-09 |
| JPWO2023032962A1 (ko) | 2023-03-09 |
| KR20240055034A (ko) | 2024-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |