CN117845180A - 一种刀具及其镀膜方法 - Google Patents
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Abstract
本发明公开了一种刀具及其镀膜方法。所述刀具包括刀具本体,以及从刀具本体表面向外依次镀有的离子注入层、结合层、梯度层、耐磨层、隔热层和润滑层;所述离子注入层的注入离子为氮离子;所述结合层的材质为TiN;所述梯度层的材质为AlTiN;所述耐磨层的材质为AlTiSiN;所述隔热层的材质为;所述润滑层的材质为CrN。通过本发明提供的镀膜方法对刀具进行镀膜,大幅度提高了刀具的耐磨性、耐热性等,提高了刀具的综合切削性能,可满足更高、更苛刻的环境要求。
Description
技术领域
本发明属于刀具PVD镀膜技术领域,具体涉及一种刀具及其镀膜方法。
背景技术
刀具是指机械制造中用于切削加工的工具,又称切削工具。现有刀具的基体材料包括有高速钢、硬质合金、金属陶瓷、陶瓷、聚晶立方氮化硼以及聚晶金刚石等。因金属陶瓷、陶瓷、聚晶立方氮化硼以及聚晶金刚石等材料做的刀具,本身硬度较高、耐磨,一般不做PVD镀膜。如果没有明确说明,做PVD镀膜的刀具通常指高速钢和硬质合金刀具。PVD镀膜使刀具在切削时的磨损速度减慢,镀膜刀具的寿命与不镀膜的相比大约提高1~10倍以上。
传统的刀具镀膜大多是在其表面镀一层AlTiN/AlTiSiN,为刀具增加耐磨性能和耐热性能,但在加工高温合金时,AlTiN/AlTiSiN的耐磨、耐热性能仍不能满足需求,且摩擦系数也相对较高。
发明内容
本发明的目的在于提供一种刀具及其镀膜方法,以提高刀具的硬度、耐磨性以及耐热性,降低刀具的摩擦系数,解决传统的镀膜耐热性及耐磨性差、结合力弱、容易出现热裂纹等问题。
为实现上述目的,本发明提供如下技术方案:
本发明提供一种刀具,包括刀具本体,以及从刀具本体表面向外依次镀有的离子注入层、结合层、梯度层、耐磨层、隔热层和润滑层。
进一步的,所述离子注入层的注入离子为氮离子,深度为0.01~0.03μm。通过注入氮离子,能够提高刀具表面的硬度和耐磨性。
进一步的,所述结合层的材质为TiN,厚度为0.1~0.2μm。结合层能提高刀具和镀膜之间的结合力。
进一步的,所述梯度层的材质为AlTiN,梯度层的厚度为0.5~1.0μm。梯度层能缩小刀具和镀膜之间的硬度差,为耐磨层和隔热层提供支撑。
进一步的,所述耐磨层的材质为AlTiSiN,耐磨层的厚度为0.3~0.6μm。耐磨层能提高刀具的硬度、红硬性、耐磨性。
进一步的,所述隔热层的材质为,隔热层的厚度为0.1~0.2μm。隔热层能降低刀具和镀膜温度,保持较高的硬度。
进一步的,所述润滑层的材质为CrN,润滑层的厚度为0.2~0.5μm。润滑层能降低刀具的摩擦系数,降低摩擦力和热量的产生。
所述刀具本体为硬质合金或高速钢刀具。
所述刀具镀膜表面硬度为33~40GPa,压痕等级为HF1~2。
本发明还提供一种所述刀具的镀膜方法,该方法是将待镀膜的刀具本体清洗干燥后,放置到真空镀膜设备的炉腔内按以下工艺步骤和条件进行镀膜:
1)先将腔体内真空抽至mbar后,加热40~90min,使温度保持在450~540℃;再通入氢气100~300sccm、氩气200~400sccm,直流偏压保持在0~-50V,对刀具表面进行清洗,时间为15~50min;然后通入氩气50~100sccm,直流偏压保持在-600~-1000V,Ti蒸发源靶电流控制在40~90A,时间为5~10min;
2)注入离子:通入100~300sccm的氮气,直流偏压保持在-400~-1000V,在刀具表面上注入氮离子,控制氮离子注入深度为0.01~0.03μm,形成离子注入层;
3)镀制结合层:直流偏压保持在-40~-200V,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,Ti蒸发源靶电流控制在60~120A,控制TiN层的厚度为0.1~0.2μm;
4)镀制梯度层:使用原子数比Al:Ti=50~70:30~50的靶材,控制靶电流在70~125A,通入900~1500 sccm的氮气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-150V,控制AlTiN层的厚度在0.5~1.0μm;
5)镀制耐磨层:使用原子数比Al:Ti:Si=45~65:25~45:5~15的靶材,控制靶电流在80~125A,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-150V,控制AlTiSiN层的厚度在0.3~0.6 μm;
6)镀制隔热层:使用Al靶,控制靶电流在50~80A,通入900~1500sccm的氧气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-130V,控制/>层的厚度为0.2~0.3μm;
7)镀制润滑层:使用Cr靶,控制靶电流在50~80A,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-200V,控制CrN层的厚度为0.2~0.5μm。
本发明先采用离子注入的方法在刀具本体表面形成注入层,增加刀具表层的硬度、耐磨性;然后通过沉积TiN层,进一步提升刀具本体与镀膜的结合强度;再通过沉积AlTiN层缩小刀具本体与镀膜的硬度差并为耐磨层、隔热层做支撑;沉积AlTiSiN层提高刀具的硬度、红硬性、耐磨性;沉积层起到隔热左右、可降低刀具和镀膜的温度、提高刀具和镀膜的抗氧化性;沉积CrN层降低刀具的摩擦系数、降低摩擦力和热量的产生,解决了传统的镀膜耐热性差、耐磨性差、结合力差、容易出现热裂纹等不能满足需求的问题。
本发明提供的PVD镀膜技术,避免了膜层因升温过快引起的内应力过大而发生爆裂或脱落现象,使膜层与刀具本体之间具有很好的附着力,从而使得刀具在生产加工时膜层不会因冲击导致脱落而影响加工效率和效果,大幅度提高了刀具的耐磨性和使用寿命,提高了刀具的综合切削性能,可满足更高、更苛刻的环境要求。
本发明提供的刀具镀膜表面硬度为33~40GPa,压痕等级为HF1~2,能用于高温合金切削加工。
附图说明
图1为本发明刀具的结构示意图;
1-刀具本体;2-离子注入层;3-结合层;4-梯度层;5-耐磨层;6-隔热层;7-润滑层;
图2为实施例1刀具柄部表面压痕形貌图;
图3为对比例1 AlTiN/AlTiSiN涂层刀具柄部表面压痕形貌图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚明白,以下结合实施例,对本发明进一步详细说明。
实施例1
使用干喷砂的方式对硬质合金铣刀进行喷砂处理,再经过超声波清洗机清洗掉残留的油污,然后用合适的夹具装夹好放入真空镀膜机中。炉腔抽真空至mbar,对铣刀加热60min,使温度保持在540℃;通入200sccm氢气和300sccm氩气,控制铣刀的直流偏压为-40V,等离子清洗铣刀20min;通入60sccm氩气,使用60A靶电流加热Ti蒸发源,直流偏压-800V,轰击铣刀10min;通入200sccm的氮气,直流偏压-800V,离子注入60min;用电弧蒸发Ti靶,靶电流80A,通入1000sccm氮气,腔压控制在/>mbar,在直流偏压-120V镀制30min;用电弧蒸发Al、Ti原子数之比为60:40的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-80V镀制60min;用电弧蒸发Al:Ti:Si=60:30:10的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-100V镀制50min;用电弧蒸发Al靶,靶电流50A,通入900sccm氧气,在直流偏压-80V镀制30min;用电弧蒸发Cr靶,靶电流80A,通入1000sccm氮气,在直流偏压-150V镀制30min;炉内冷却60min后,即可取出铣刀。
该铣刀镀上复合涂层后测得硬度约为37GPa,摩擦系数为0.3,涂层总厚度2.7μm,压痕等级为HF1。
图2为实施例1刀具柄部表面压痕形貌图,从图中可以看出,压坑周围镀膜无明显裂纹、掉落等情况。
实施例2
使用干喷砂的方式对高速钢钻头进行喷砂处理,再经过超声波清洗机清洗掉残留的油污,然后用合适的夹具装夹好放入真空镀膜机中。炉腔抽真空至mbar,对钻头加热40min,使温度保持在480℃;通入200sccm氢气和300sccm氩气,控制钻头的直流偏压为-40V,等离子清洗钻头30min;通入100sccm氩气,使用50A靶电流加热Ti蒸发源,直流偏压-600V,轰击钻头5min;通入300sccm的氮气,直流偏压-600V,离子注入50min;用电弧蒸发Ti靶,靶电流60A,通入1000sccm氮气,腔压控制在/>mbar,在直流偏压-50V镀制50min;用电弧蒸发Al:Ti=67:33的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-60V镀制60min;用电弧蒸发Al:Ti:Si=65:30:5的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-60V镀制50min;用电弧蒸发Al靶,靶电流50A,通入900sccm氧气,在直流偏压-60V镀制30min;用电弧蒸发Cr靶,靶电流60A,通入1000sccm氮气,在直流偏压-80V镀制30min;炉内冷却90min后,即可取出钻头。
该钻头镀上复合涂层后测得硬度约为33GPa,摩擦系数为0.35,涂层总厚度3.1μm,压痕等级为HF1。
实施例3
使用湿喷砂的方式对硬质合金车刀片进行喷砂处理,再经过超声波清洗机清洗掉残留的油污,然后用合适的夹具装夹好放入真空镀膜机中。炉腔抽真空至mbar,对车刀片加热60min,使温度保持在540℃;通入150sccm氢气和200sccm氩气,控制车刀片的直流偏压为0V,等离子清洗车刀片30min;通入50sccm氩气,使用60A靶电流加热Ti蒸发源,直流偏压-1000V,轰击车刀片10min;通入100sccm的氮气,直流偏压-1000V,离子注入60min;用电弧蒸发Ti靶,靶电流100A,通入1000sccm氮气,腔压控制在/>mbar,在直流偏压-150V镀制30min;用电弧蒸发Al:Ti=50:50的合金靶,靶电流100A,通入1000sccm氮气,在直流偏压-100V镀制60min;用电弧蒸发Al:Ti:Si=55:30:15的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-120V镀制50min;用电弧蒸发Al靶,靶电流50A,通入900sccm氧气,在直流偏压-100V镀制30min;用电弧蒸发Cr靶,靶电流80A,通入1000sccm氮气,在直流偏压-200V镀制30min;炉内冷却60min后,即可取出车刀片。
该车刀片镀上复合涂层后测得硬度为39GPa,摩擦系数为0.3,涂层总厚度2.5μm,压痕等级为HF2。
对比例1
使用干喷砂的方式对硬质合金铣刀进行喷砂处理,再经过超声波清洗机清洗掉残留的油污,然后用合适的夹具装夹好放入真空镀膜机中。炉腔抽真空至mbar,对铣刀加热60min;通入200sccm氢气和300sccm氩气,控制铣刀的直流偏压为-260V,等离子清洗铣刀20min;通入400sccm氩气,直流偏压-650V,轰击铣刀20min;用电弧蒸发Al:Ti=60:40的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-50V镀制60min;用电弧蒸发Al:Ti:Si=60:30:10的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-100V镀制50min;炉内冷却60min后,即可取出铣刀。
该铣刀镀上复合涂层后测得硬度约为36GPa,摩擦系数为0.6,涂层总厚度2.6μm,压痕等级为HF2。
图3为对比例1 AlTiN/AlTiSiN涂层刀具柄部表面压痕形貌图,从图中可以看出,压坑周围镀膜出现明显环形裂纹。
对比例2
使用湿喷砂的方式对硬质合金车刀片进行喷砂处理,再经过超声波清洗机清洗掉残留的油污,然后用合适的夹具装夹好放入真空镀膜机中。炉腔抽真空至mbar,对车刀片加热60min;通入150sccm氢气和200sccm氩气,控制车刀片的直流偏压为-300V,等离子清洗车刀片30min;通入400sccm氩气,直流偏压-650V,轰击车刀片20min;用电弧蒸发Al:Ti=50:50的合金靶,靶电流100A,通入1000sccm氮气,在直流偏压-60V镀制60min;用电弧蒸发Al:Ti:Si=55:30:15的合金靶,靶电流80A,通入1000sccm氮气,在直流偏压-120V镀制50min;炉内冷却60min后,即可取出车刀片。
该车刀片镀上复合涂层后测得硬度约为39GPa,摩擦系数为0.55,涂层总厚度2.5μm,压痕等级为HF3。
Claims (4)
1.一种刀具,其特征在于,所述刀具包括刀具本体,以及从刀具本体表面向外依次镀有的离子注入层、结合层、梯度层、耐磨层、隔热层和润滑层;所述离子注入层的注入离子为氮离子,深度为0.01~0.03μm;所述结合层的材质为TiN,厚度为0.1~0.2μm;所述梯度层的材质为AlTiN,梯度层的厚度为0.5~1.0μm;所述耐磨层的材质为AlTiSiN,耐磨层的厚度为0.3~0.6μm;所述隔热层的材质为,隔热层的厚度为0.1~0.2μm;所述润滑层的材质为CrN,润滑层的厚度为0.2~0.5μm。
2.根据权利要求1所述的刀具,其特征在于,所述刀具本体为硬质合金或高速钢刀具。
3.根据权利要求1所述的刀具,其特征在于,所述刀具镀膜表面硬度为33~40GPa,压痕等级为HF1~2。
4.一种根据权利要求1~3任一项所述刀具的镀膜方法,其特征在于,所述镀膜方法是将待镀膜的刀具本体清洗干燥后,放置到真空镀膜设备的炉腔内按以下工艺步骤和条件进行镀膜:
1)先将腔体内真空抽至mbar后,加热40~90min,使温度保持在450~540℃;再通入氢气100~300sccm、氩气200~400sccm,直流偏压保持在0~-50V,对刀具表面进行清洗,时间为15~50min;然后通入氩气50~100sccm,直流偏压保持在-600~-1000V,Ti蒸发源靶电流控制在40~90A,时间为5~10min;
2)注入离子:通入100~300sccm的氮气,直流偏压保持在-400~-1000V,在刀具表面上注入氮离子,控制氮离子注入深度为0.01~0.03μm,形成离子注入层;
3)镀制结合层:直流偏压保持在-40~-200V,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,Ti蒸发源靶电流控制在60~120A,控制TiN层的厚度为0.1~0.2μm;
4)镀制梯度层:使用原子数比Al:Ti=50~70:30~50的靶材,控制靶电流在70~125A,通入900~1500 sccm的氮气,腔压控制在mbar~/> mbar,直流偏压保持在-40~-150V,控制AlTiN层的厚度在0.5~1.0μm;
5)镀制耐磨层:使用原子数比Al:Ti:Si=45~65:25~45:5~15的靶材,控制靶电流在80~125A,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-150V,控制AlTiSiN层的厚度在0.3~0.6 μm;
6)镀制隔热层:使用Al靶,控制靶电流在50~80A,通入900~1500sccm的氧气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-130V,控制/>层的厚度为0.2~0.3μm;
7)镀制润滑层:使用Cr靶,控制靶电流在50~80A,通入900~1500sccm的氮气,腔压控制在mbar~/>mbar,直流偏压保持在-40~-200V,控制CrN层的厚度为0.2~0.5μm。
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