CN1162027A - 单晶拉制装置 - Google Patents
单晶拉制装置 Download PDFInfo
- Publication number
- CN1162027A CN1162027A CN97101233.4A CN97101233A CN1162027A CN 1162027 A CN1162027 A CN 1162027A CN 97101233 A CN97101233 A CN 97101233A CN 1162027 A CN1162027 A CN 1162027A
- Authority
- CN
- China
- Prior art keywords
- crucible
- quartz
- single crystal
- air bubble
- internal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20257/1996 | 1996-02-06 | ||
JP02025796A JP3533416B2 (ja) | 1996-02-06 | 1996-02-06 | 単結晶引上装置 |
JP20257/96 | 1996-02-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1162027A true CN1162027A (zh) | 1997-10-15 |
CN1138877C CN1138877C (zh) | 2004-02-18 |
Family
ID=12022151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB971012334A Expired - Lifetime CN1138877C (zh) | 1996-02-06 | 1997-02-05 | 单晶拉制装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5895527A (zh) |
JP (1) | JP3533416B2 (zh) |
KR (1) | KR100482702B1 (zh) |
CN (1) | CN1138877C (zh) |
DE (1) | DE19703620B4 (zh) |
TW (1) | TW585940B (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1946881B (zh) * | 2004-04-29 | 2010-06-09 | 维苏维尤斯·克鲁斯布公司 | 用于硅结晶的坩埚 |
CN101857969A (zh) * | 2009-04-02 | 2010-10-13 | 日本超精石英株式会社 | 硅单晶提拉用石英玻璃坩埚 |
CN101724887B (zh) * | 2008-10-31 | 2012-07-18 | 日本超精石英株式会社 | 具有多层结构的石英玻璃坩埚 |
CN108059325A (zh) * | 2017-06-22 | 2018-05-22 | 内蒙古欧晶科技股份有限公司 | 复合石英砂制备石英坩埚的方法及新型石英坩埚 |
CN109112613A (zh) * | 2017-06-22 | 2019-01-01 | 内蒙古欧晶科技股份有限公司 | 新型石英坩埚制备工艺 |
CN113631763A (zh) * | 2019-02-07 | 2021-11-09 | 格勒诺布尔理工学院 | 冷坩埚 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4398527B2 (ja) * | 1998-05-25 | 2010-01-13 | 信越石英株式会社 | シリコン単結晶引き上げ用石英ガラスるつぼ |
JP4447738B2 (ja) * | 2000-05-31 | 2010-04-07 | 信越石英株式会社 | 多層構造の石英ガラスルツボの製造方法 |
US6510707B2 (en) * | 2001-03-15 | 2003-01-28 | Heraeus Shin-Etsu America, Inc. | Methods for making silica crucibles |
JP5288384B2 (ja) * | 2008-03-19 | 2013-09-11 | 株式会社Sumco | ガラスルツボの切断方法および切断装置 |
KR101457504B1 (ko) * | 2009-09-09 | 2014-11-03 | 쟈판 스파 쿼츠 가부시키가이샤 | 복합 도가니, 그 제조 방법, 및 실리콘 결정의 제조 방법 |
CN108330532A (zh) * | 2018-04-20 | 2018-07-27 | 周俭 | 一种单晶硅坩埚 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3014311C2 (de) * | 1980-04-15 | 1982-06-16 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens |
SE443676B (sv) * | 1983-01-27 | 1986-03-03 | Prismavision Ab | Stomme for vridbara bildskermar for skyltar |
US4632686A (en) * | 1986-02-24 | 1986-12-30 | Gte Products Corporation | Method of manufacturing quartz glass crucibles with low bubble content |
JPS63303894A (ja) * | 1987-06-01 | 1988-12-12 | Mitsubishi Metal Corp | シリコン単結晶育成方法 |
US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
JPH0676274B2 (ja) * | 1988-11-11 | 1994-09-28 | 東芝セラミックス株式会社 | シリコン単結晶の製造装置 |
JPH035392A (ja) * | 1989-05-30 | 1991-01-11 | Nkk Corp | シリコン単結晶の製造装置 |
JPH0825833B2 (ja) * | 1990-04-27 | 1996-03-13 | 東芝セラミックス株式会社 | シリコン単結晶の製造方法 |
JP2933404B2 (ja) * | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
JPH04305091A (ja) * | 1991-03-29 | 1992-10-28 | Mitsubishi Materials Corp | 単結晶引上方法及びその装置 |
JPH0585879A (ja) * | 1991-09-04 | 1993-04-06 | Mitsubishi Materials Corp | 単結晶引上装置 |
US5306473A (en) * | 1992-01-31 | 1994-04-26 | Toshiba Ceramics Co., Ltd. | Quartz glass crucible for pulling a single crystal |
-
1996
- 1996-02-06 JP JP02025796A patent/JP3533416B2/ja not_active Expired - Lifetime
-
1997
- 1997-01-16 TW TW086100443A patent/TW585940B/zh not_active IP Right Cessation
- 1997-01-29 US US08/791,777 patent/US5895527A/en not_active Expired - Lifetime
- 1997-01-31 DE DE19703620A patent/DE19703620B4/de not_active Expired - Lifetime
- 1997-02-05 KR KR1019970003626A patent/KR100482702B1/ko not_active IP Right Cessation
- 1997-02-05 CN CNB971012334A patent/CN1138877C/zh not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1946881B (zh) * | 2004-04-29 | 2010-06-09 | 维苏维尤斯·克鲁斯布公司 | 用于硅结晶的坩埚 |
CN101724887B (zh) * | 2008-10-31 | 2012-07-18 | 日本超精石英株式会社 | 具有多层结构的石英玻璃坩埚 |
CN101857969A (zh) * | 2009-04-02 | 2010-10-13 | 日本超精石英株式会社 | 硅单晶提拉用石英玻璃坩埚 |
CN101857969B (zh) * | 2009-04-02 | 2013-02-27 | 日本超精石英株式会社 | 硅单晶提拉用石英玻璃坩埚 |
CN108059325A (zh) * | 2017-06-22 | 2018-05-22 | 内蒙古欧晶科技股份有限公司 | 复合石英砂制备石英坩埚的方法及新型石英坩埚 |
CN109112613A (zh) * | 2017-06-22 | 2019-01-01 | 内蒙古欧晶科技股份有限公司 | 新型石英坩埚制备工艺 |
CN109112613B (zh) * | 2017-06-22 | 2021-03-12 | 内蒙古欧晶科技股份有限公司 | 石英坩埚制备工艺 |
CN108059325B (zh) * | 2017-06-22 | 2024-05-10 | 内蒙古欧晶科技股份有限公司 | 复合石英砂制备石英坩埚的方法及石英坩埚 |
CN113631763A (zh) * | 2019-02-07 | 2021-11-09 | 格勒诺布尔理工学院 | 冷坩埚 |
Also Published As
Publication number | Publication date |
---|---|
KR970062083A (ko) | 1997-09-12 |
TW585940B (en) | 2004-05-01 |
US5895527A (en) | 1999-04-20 |
KR100482702B1 (ko) | 2005-06-16 |
DE19703620B4 (de) | 2008-10-02 |
JP3533416B2 (ja) | 2004-05-31 |
CN1138877C (zh) | 2004-02-18 |
DE19703620A1 (de) | 1997-08-07 |
JPH09208370A (ja) | 1997-08-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: CO., LTD. SUMCO; JAPAN SUPERFINE QUARTZ CO., LTD. Free format text: FORMER OWNER: CO., LTD. SUMCO; JAPAN SUPERFINE QUARTZ CO., LTD.; MITSUBISHI MATERIALS CORP. Effective date: 20070914 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee |
Owner name: CO., LTD. SUMCO; JAPAN SUPERFINE QUARTZ CO., LTD.; Free format text: FORMER NAME OR ADDRESS: MITSUBISHI MATERIALS CORPORATION; MITSUBISHI SILICON MATERIAL K; MITSUBISHI MATERIALS CORP. |
|
CP03 | Change of name, title or address |
Address after: Tokyo, Japan Co-patentee after: Japan Super Quartz Corp. Patentee after: SUMCO Corp. Co-patentee after: Mitsubishi Materials Corp. Address before: Tokyo, Japan Co-patentee before: Mitsubishi Matriyal Quartz Material Co.,Ltd. Patentee before: Sumitomo Mitsubishi Silicon Corp. Co-patentee before: Mitsubishi Materials Corp. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20070914 Address after: Tokyo, Japan Co-patentee after: Japan Super Quartz Corp. Patentee after: SUMCO Corp. Address before: Tokyo, Japan Co-patentee before: Japan Super Quartz Corp. Patentee before: SUMCO Corp. Co-patentee before: Mitsubishi Materials Corp. |
|
CX01 | Expiry of patent term |
Granted publication date: 20040218 |
|
CX01 | Expiry of patent term |