CN116113882A - 印制模板及其制造方法 - Google Patents
印制模板及其制造方法 Download PDFInfo
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- CN116113882A CN116113882A CN202080103754.3A CN202080103754A CN116113882A CN 116113882 A CN116113882 A CN 116113882A CN 202080103754 A CN202080103754 A CN 202080103754A CN 116113882 A CN116113882 A CN 116113882A
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- 238000007639 printing Methods 0.000 title claims abstract description 111
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 78
- 239000000463 material Substances 0.000 claims abstract description 204
- 239000000758 substrate Substances 0.000 claims abstract description 119
- 230000001678 irradiating effect Effects 0.000 claims abstract description 11
- 125000006850 spacer group Chemical group 0.000 claims description 25
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 16
- 238000001723 curing Methods 0.000 description 28
- 230000007547 defect Effects 0.000 description 13
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000011295 pitch Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000007607 die coating method Methods 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 206010040844 Skin exfoliation Diseases 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
一种印制模板(100)及其制造方法。印制模板(100)制造方法包括：提供基底层(10)、可固化材料层(20)和母板组件(30)；提供掩模板(40)，连接件(34)在基底层(10)上的正投影位于掩模板(40)的非透光区域(410)在基底层(10)上的正投影内，并且印制图(31)在基底层(10)上的正投影位于掩模板(40)的透光区域(420)在基底层(10)上的正投影内；利用光(UV)经由掩模板(40)对可固化材料层(20)进行照射以使可固化材料层(20)的对应于透光区域(420)的部分被固化，可固化材料层(20)的对应于非透光区域(410)的部分未被固化；去除可固化材料层(20)的未被固化的部分。印制模板(100)制造方法提高了印制模板(100)的美观性，保证了印制模板(100)的质量。
Description
PCT国内申请，说明书已公开。
Claims (23)
- PCT国内申请，权利要求书已公开。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2020/119189 WO2022067613A1 (zh) | 2020-09-30 | 2020-09-30 | 印制模板及其制造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116113882A true CN116113882A (zh) | 2023-05-12 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080103754.3A Pending CN116113882A (zh) | 2020-09-30 | 2020-09-30 | 印制模板及其制造方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN116113882A (zh) |
| WO (1) | WO2022067613A1 (zh) |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7686970B2 (en) * | 2004-12-30 | 2010-03-30 | Asml Netherlands B.V. | Imprint lithography |
| US8703406B2 (en) * | 2012-07-12 | 2014-04-22 | Transfer Devices Inc. | Method of forming large-area masters for replication of transfer lithography templates |
| CN103226288B (zh) * | 2013-04-27 | 2016-01-20 | 苏州大学 | 一种紫外固化微纳米结构拼版装置及拼版工艺 |
| CN103336418B (zh) * | 2013-05-31 | 2016-06-08 | 湖北兴龙包装材料有限责任公司 | Uv拼版方法及装置 |
| KR102336499B1 (ko) * | 2014-08-04 | 2021-12-07 | 삼성전자주식회사 | 패턴 구조체 및 그 제조방법과, 금속 와이어 그리드 편광판을 채용한 액정 표시장치 |
| KR20160024410A (ko) * | 2014-08-25 | 2016-03-07 | 삼성전자주식회사 | 패턴 구조체 및 그 제조방법 |
| CN105652590A (zh) * | 2014-12-04 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 压印模板的制作方法 |
| KR20160119896A (ko) * | 2015-04-06 | 2016-10-17 | 삼성디스플레이 주식회사 | 임프린트 리소그래피 방법, 이를 이용한 임프린트 리소그래피용 마스터 템플릿의 제조 방법 및 이에 의해 제조된 임프린트 리소그래피용 마스터 템플릿 |
| CN105911815B (zh) * | 2016-05-24 | 2019-07-05 | 京东方科技集团股份有限公司 | 纳米压印模板的制作系统及方法 |
| KR20180034776A (ko) * | 2016-09-27 | 2018-04-05 | 삼성디스플레이 주식회사 | 임프린트 마스터 템플릿의 제조 방법 |
| CN107121890A (zh) * | 2017-07-04 | 2017-09-01 | 京东方科技集团股份有限公司 | 一种纳米压印模板及其制备方法 |
| TWI646389B (zh) * | 2017-09-12 | 2019-01-01 | 友達光電股份有限公司 | 壓印模具以及壓印模具製造方法 |
| JP2021526735A (ja) * | 2018-06-06 | 2021-10-07 | レイア、インコーポレイテッドＬｅｉａ Ｉｎｃ． | サブミクロン特徴部を有する大面積金型マスタを形成するためのウエハのタイリング方法 |
| CN108873605A (zh) * | 2018-07-06 | 2018-11-23 | 京东方科技集团股份有限公司 | 一种纳米压印模板及其制作方法 |
| CN108873607A (zh) * | 2018-07-26 | 2018-11-23 | 京东方科技集团股份有限公司 | 一种纳米压印模板及其制作方法 |
| CN109116680A (zh) * | 2018-09-27 | 2019-01-01 | 京东方科技集团股份有限公司 | 压印模板及其制作方法 |
| CN109240041B (zh) * | 2018-11-19 | 2020-06-26 | 京东方科技集团股份有限公司 | 拼接式压印模板及其制备方法和母模板 |
| CN109541885A (zh) * | 2019-01-14 | 2019-03-29 | 京东方科技集团股份有限公司 | 纳米图案的拼接方法、纳米压印板、光栅及制作方法 |
| CN109613799A (zh) * | 2019-01-29 | 2019-04-12 | 京东方科技集团股份有限公司 | 纳米图案的拼接方法、纳米压印板及光栅 |
| CN110824835B (zh) * | 2019-11-26 | 2023-05-12 | 京东方科技集团股份有限公司 | 拼接式纳米压印模板、其拼接缝的修复方法及其制作方法 |
| CN111624851A (zh) * | 2020-06-16 | 2020-09-04 | 京东方科技集团股份有限公司 | 压印模板及其制备方法 |
| CN111694214A (zh) * | 2020-06-29 | 2020-09-22 | 京东方科技集团股份有限公司 | 纳米图案的拼接方法和拼接设备 |
-
2020
- 2020-09-30 WO PCT/CN2020/119189 patent/WO2022067613A1/zh active Application Filing
- 2020-09-30 CN CN202080103754.3A patent/CN116113882A/zh active Pending
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| Publication number | Publication date |
|---|---|
| WO2022067613A1 (zh) | 2022-04-07 |
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