CN116113491A8 - 等离子体处理的方法和装置 - Google Patents
等离子体处理的方法和装置 Download PDFInfo
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- CN116113491A8 CN116113491A8 CN202180062404.1A CN202180062404A CN116113491A8 CN 116113491 A8 CN116113491 A8 CN 116113491A8 CN 202180062404 A CN202180062404 A CN 202180062404A CN 116113491 A8 CN116113491 A8 CN 116113491A8
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- treatment
- sample
- plasma processing
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- temperature control
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- 238000000034 method Methods 0.000 title abstract 4
- 238000009832 plasma treatment Methods 0.000 abstract 1
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Abstract
本发明涉及一种使用辉光放电等离子体处理样品的方法,所述方法包括一个或多个处理步骤,其中所述用于处理的样品在设有温度控制系统的处理容器中进行等离子体处理,其中,在所述一个或多个处理步骤期间,所述处理容器围绕轴线旋转以搅动所述样品,所述温度控制系统用于冷却或加热所述样品。本发明还涉及一种在这种方法中使用的装置。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2014776.5A GB2598934B (en) | 2020-09-18 | 2020-09-18 | Method and apparatus for plasma processing |
GB2014776.5 | 2020-09-18 | ||
GB2014779.9 | 2020-09-18 | ||
GB2014779.9A GB2598936B (en) | 2020-09-18 | 2020-09-18 | Method and apparatus for plasma processing |
PCT/EP2021/075697 WO2022058546A1 (en) | 2020-09-18 | 2021-09-17 | Method and apparatus for plasma processing |
Publications (2)
Publication Number | Publication Date |
---|---|
CN116113491A CN116113491A (zh) | 2023-05-12 |
CN116113491A8 true CN116113491A8 (zh) | 2024-05-28 |
Family
ID=77821782
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
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CN202180062764.1A Pending CN116133743A (zh) | 2020-09-18 | 2021-09-08 | 输送等离子体处理原料的方法和装置 |
CN202180062428.7A Pending CN116133742A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
CN202180062404.1A Pending CN116113491A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
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CN202180062764.1A Pending CN116133743A (zh) | 2020-09-18 | 2021-09-08 | 输送等离子体处理原料的方法和装置 |
CN202180062428.7A Pending CN116133742A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
Country Status (6)
Country | Link |
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US (3) | US20240024840A1 (zh) |
EP (3) | EP4213982A1 (zh) |
JP (1) | JP2023542903A (zh) |
KR (1) | KR20230069960A (zh) |
CN (3) | CN116133743A (zh) |
WO (3) | WO2022058218A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2610394A (en) | 2021-09-01 | 2023-03-08 | Haydale Graphene Ind Plc | Shoe sole |
GB2612057A (en) | 2021-10-20 | 2023-04-26 | Haydale Graphene Ind Plc | Heatable garment, fabrics for such garments, and methods of manufacture |
GB2625980A (en) | 2022-09-23 | 2024-07-10 | Haydale Graphene Ind Plc | Composition |
Family Cites Families (16)
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US3772799A (en) * | 1969-08-19 | 1973-11-20 | Mitsubishi Edogawa Kagaku Kk | Apparatus for treating a mixture |
US5012158A (en) * | 1986-07-25 | 1991-04-30 | National Research Institute For Metals | Plasma CVD apparatus |
JPH059075Y2 (zh) * | 1987-01-27 | 1993-03-05 | ||
US5006706A (en) * | 1989-05-31 | 1991-04-09 | Clemson University | Analytical method and apparatus |
US6428861B2 (en) * | 2000-06-13 | 2002-08-06 | Procter & Gamble Company | Apparatus and process for plasma treatment of particulate matter |
US6447719B1 (en) * | 2000-10-02 | 2002-09-10 | Johnson & Johnson | Power system for sterilization systems employing low frequency plasma |
JP2007508135A (ja) * | 2003-10-15 | 2007-04-05 | ダウ・コーニング・アイルランド・リミテッド | 粒子の官能基化 |
US7893182B2 (en) * | 2003-10-15 | 2011-02-22 | Dow Corning Corporation | Manufacture of resins |
US7276283B2 (en) * | 2004-03-24 | 2007-10-02 | Wisconsin Alumni Research Foundation | Plasma-enhanced functionalization of carbon-containing substrates |
EP2440323B1 (en) | 2009-06-09 | 2019-08-28 | Haydale Graphene Industries plc | Methods and apparatus for particle processing with plasma |
JP6124796B2 (ja) | 2010-12-08 | 2017-05-10 | ヘイデール・グラフェン・インダストリーズ・ピーエルシー | 粒状物質、それらを含む複合材料、それらの調製および使用 |
JP6705170B2 (ja) * | 2013-12-26 | 2020-06-03 | 住友化学株式会社 | 積層フィルムおよびフレキシブル電子デバイス |
GB201405614D0 (en) | 2014-03-28 | 2014-05-14 | Perpetuus Res & Dev Ltd | Particles |
GB201405973D0 (en) | 2014-04-02 | 2014-05-14 | Haydale Graphene Ind Plc | Method of characterising surface chemistry |
WO2015157204A1 (en) * | 2014-04-07 | 2015-10-15 | Powder Treatment Technology LLC | Surface energy modified particles, method of making, and use thereof |
KR102534238B1 (ko) * | 2017-08-24 | 2023-05-19 | 포지 나노, 인크. | 분말의 합성, 기능화, 표면 처리 및/또는 캡슐화를 위한 제조 공정, 및 그의 응용 |
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2021
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KR20230069960A (ko) | 2023-05-19 |
EP4213984A1 (en) | 2023-07-26 |
CN116113491A (zh) | 2023-05-12 |
WO2022058546A1 (en) | 2022-03-24 |
US20240024840A1 (en) | 2024-01-25 |
US20230330619A1 (en) | 2023-10-19 |
JP2023542903A (ja) | 2023-10-12 |
CN116133743A (zh) | 2023-05-16 |
WO2022058542A1 (en) | 2022-03-24 |
CN116133742A (zh) | 2023-05-16 |
CN116133743A8 (zh) | 2024-05-28 |
US20240024841A1 (en) | 2024-01-25 |
WO2022058218A1 (en) | 2022-03-24 |
EP4213983A1 (en) | 2023-07-26 |
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